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1. 发明授权

US07643157B2 Phase shift amount measurement apparatus and transmittance measurement apparatus 有权
标题翻译：相移量测量装置和透射率测量装置
公开(公告)号：US07643157B2
公开(公告)日：2010-01-05
申请号：US12005882
申请日：2007-12-28
申请人： Hideo Takizawa , Koji Miyazaki , Haruhiko Kusunose
发明人： Hideo Takizawa , Koji Miyazaki , Haruhiko Kusunose
IPC分类号： G01B9/02
CPC分类号： G03F1/84 , G01J9/0215 , G01J2009/0234 , G01N21/45 , G03F1/32
摘要： A phase shift amount measurement apparatus able to further correctly measure a phase shift amount of a phase shifter, wherein a laterally offset interference image of a phase shift mask is formed by a shearing interferometer, the interference image is captured by a two-dimensional imaging device, an output signal output from each light receiving element of the two-dimensional imaging device is supplied to a signal processing device, the phase shift amount is calculated for each light receiving element, the light receiving area of the light receiving element is very small, therefore the phase shift amount of any light receiving element outputting a peculiar phase amount due to incidence of diffraction light or multi-reflection light is excluded and the phase shift amount is determined based on the phase shift amount found from output signals of the remaining light receiving elements.
摘要翻译：一种相移量测量装置，其能够进一步正确地测量移相器的相移量，其中通过剪切干涉仪形成相移掩模的横向偏移干涉图像，所述干涉图像由二维成像装置从二维成像装置的每个光接收元件输出的输出信号被提供给信号处理装置，针对每个光接收元件计算相移量，光接收元件的光接收面积非常小，因此排除由于衍射光或多反射光的入射而输出特殊相位量的任何光接收元件的相移量，并且基于从剩余的光接收的输出信号中发现的相移量来确定相移量元素。

2. 发明申请

US20080174786A1 Phase shift amount measurement apparatus and transmittance measurement apparatus 有权
标题翻译：相移量测量装置和透射率测量装置
公开(公告)号：US20080174786A1
公开(公告)日：2008-07-24
申请号：US12005882
申请日：2007-12-28
申请人： Hideo Takizawa , Koji Miyazaki , Haruhiko Kusunose
发明人： Hideo Takizawa , Koji Miyazaki , Haruhiko Kusunose
IPC分类号： G01B9/02
CPC分类号： G03F1/84 , G01J9/0215 , G01J2009/0234 , G01N21/45 , G03F1/32
摘要： A phase shift amount measurement apparatus able to further correctly measure a phase shift amount of a phase shifter, wherein a laterally offset interference image of a phase shift mask is formed by a shearing interferometer, the interference image is captured by a two-dimensional imaging device, an output signal output from each light receiving element of the two-dimensional imaging device is supplied to a signal processing device, the phase shift amount is calculated for each light receiving element, the light receiving area of the light receiving element is very small, therefore the phase shift amount of any light receiving element outputting a peculiar phase amount due to incidence of diffraction light or multi-reflection light is excluded and the phase shift amount is determined based on the phase shift amount found from output signals of the remaining light receiving elements.
摘要翻译：一种相移量测量装置，其能够进一步正确地测量移相器的相移量，其中通过剪切干涉仪形成相移掩模的横向偏移干涉图像，所述干涉图像由二维成像装置从二维成像装置的每个光接收元件输出的输出信号被提供给信号处理装置，针对每个光接收元件计算相移量，光接收元件的光接收面积非常小，因此排除由于衍射光或多反射光的入射而输出特殊相位量的任何光接收元件的相移量，并且基于从剩余的光接收的输出信号中发现的相移量来确定相移量元素。

3. 发明申请

US20090168191A1 PHOTOMASK INSPECTION APPARATUS 有权
标题翻译：光电检测设备
公开(公告)号：US20090168191A1
公开(公告)日：2009-07-02
申请号：US11964318
申请日：2007-12-26
申请人： Kiwamu Takehisa , Haruhiko Kusunose , Naoki Awamura
发明人： Kiwamu Takehisa , Haruhiko Kusunose , Naoki Awamura
IPC分类号： G02B3/12
CPC分类号： G03F1/84
摘要： According to one aspect of the present invention, there is provided a photomask inspection apparatus which observes a pattern provided on a mask substrate of a mask to inspect the mask including an object lens, and a liquid that is present between a last lens in the side closer to the mask of the object lens and the mask.
摘要翻译：根据本发明的一个方面，提供了一种光掩模检查装置，其观察设置在掩模的掩模基板上的图案，以检查包括物镜的掩模和存在于侧面的最后一个透镜之间的液体更靠近物镜的掩模和掩模。

4. 发明授权

US07548309B2 Inspection apparatus, inspection method, and manufacturing method of pattern substrate 有权
标题翻译：图案基板的检查装置，检查方法和制造方法
公开(公告)号：US07548309B2
公开(公告)日：2009-06-16
申请号：US12025521
申请日：2008-02-04
申请人： Haruhiko Kusunose , Tomoya Tamura
发明人： Haruhiko Kusunose , Tomoya Tamura
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/956
摘要： A defect inspection apparatus according to an aspect of the present invention includes a laser source generating light beam, an objective lens focusing the light beam emitted from the laser source to form a light spot on a surface of a sample W, a prism dividing the light beam reflected from the sample into two light beams, two light receiving elements receiving the light beams divided by the prism to output output signals based on the beam amount of the received beams, and a real defect determination part determining a candidate detect as a real defect when output signals from the two light receiving elements are detected substantially at the same time.
摘要翻译：根据本发明的一个缺点检查装置包括产生光束的激光源，将从激光源发射的光束聚焦以在样品W的表面上形成光斑的物镜，将光分开的棱镜从样品反射的光束分成两束光束，两个光接收元件接收由棱镜分割的光束，以基于接收光束的光束量输出输出信号;以及确定候选检测作为实际缺陷的实际缺陷确定部件当基本上同时检测来自两个光接收元件的输出信号时。

5. 发明申请

US20080144148A1 ILLUMINATION APPARATUS AND ILLUMINATION METHOD 有权
标题翻译：照明装置和照明方法
公开(公告)号：US20080144148A1
公开(公告)日：2008-06-19
申请号：US11959051
申请日：2007-12-18
申请人： Haruhiko Kusunose , Kiwamu Takehisa
发明人： Haruhiko Kusunose , Kiwamu Takehisa
IPC分类号： G02B26/08
CPC分类号： G02B27/0944 , G02B27/0933 , G02B27/0994
摘要： According to one aspect of the present invention, there is provided an illumination apparatus 110 including a laser source 11, a two dimensional diffraction optics 13 on which laser beam from the laser source is made incident, a rectangular rod 14 on which diffraction beams from the two dimensional diffraction optics 13 are made incident and through which incident beams travel while repeating total reflection, and a galvano mirror 12 changing an incident position of the diffraction beams from the two dimensional diffraction optics 13 in an incident end surface of the rectangular rod 14.
摘要翻译：根据本发明的一个方面，提供了一种照明装置110，其包括激光源11，来自激光源的激光束入射的二维衍射光学元件13，矩形棒14，来自二维衍射光学器件13被入射并且入射光束在重复全反射的同时移动，并且电流镜12在矩形棒14的入射端面中改变来自二维衍射光学元件13的衍射光束的入射位置。

6. 发明授权

US06665326B2 Light source device 失效
公开(公告)号：US06665326B2
公开(公告)日：2003-12-16
申请号：US09976144
申请日：2001-10-15
申请人： Haruhiko Kusunose
发明人： Haruhiko Kusunose
IPC分类号： H01S3223
CPC分类号： B82Y10/00 , G02B26/0816 , G03F7/70025 , G03F7/70033 , G03F7/70041 , G03F7/7005 , H01S3/225
摘要： Disclosed is a light source device capable of further enhancing an effective pulse rate. A light source device according to the present invention comprises: a plurality of light sources (1a to 1h) emitting radiation light; a rotating reflection body (2) having one or more reflection surfaces (2a) and emitting the radiation light emitted from the respective light sources (1a to 1h) along an optical path (L) common to the light sources; a position detecting device (5) detecting a position of the reflection surface (2a) of the rotating reflection body (2); a timing control circuit (6) generating a synchronization signal for driving the plurality of light sources in synchronization with the position of the rotating reflection body based on an output signal from the position detecting device; and a power supply circuit (7) sequentially pulse-driving the light sources based on an output signal from the timing control circuit.

7. 发明申请

US20090187378A1 Depth measurement apparatus and depth measurement method 有权
标题翻译：深度测量装置和深度测量方法
公开(公告)号：US20090187378A1
公开(公告)日：2009-07-23
申请号：US12218745
申请日：2008-07-17
申请人： Haruhiko Kusunose
发明人： Haruhiko Kusunose
IPC分类号： G01B11/22 , G06F15/00
CPC分类号： G01B11/22
摘要： A depth measurement apparatus and a method capable of measuring a via hole having a high aspect ratio with a high resolution is provided. The depth measurement apparatus in accordance with the present invention is provided with means (1) for generating a light beam of white light; a beam splitter (10) for dividing the light beam into a measurement beam and a reference beam; an objective lens (16) for focusing the measurement beam and projecting it onto the sample; a reference mirror (14) for reflecting the reference beam and advancing it along the original optical path; fringe scanning means (14, 15) for continuously changing a relative optical path length difference between an optical path length of the measurement beam and an optical path length of the reference beam; beam combining means (10) for combining the reflected light from the sample and the reflected light from the reference mirror and generating an interference beam; a drive mechanism (20) for changing a relative distance between the objective lens and the sample; position detecting means (21) for detecting a relative position between the objective lens and the sample; light detecting means (22) for receiving the interference beam and outputting an interference signal; and a signal processing circuit for outputting recessed portion depth information based on displacement information based on the interference signal outputted from the light detecting means and relative position information outputted from the position detecting means.
摘要翻译：提供了一种能够以高分辨率测量具有高纵横比的通孔的深度测量装置和方法。根据本发明的深度测量装置设置有用于产生白光的光束的装置（1）用于将光束分成测量光束和参考光束的分束器（10）; 用于聚焦测量光束并将其投影到样品上的物镜（16）; 用于反射参考光束并沿原始光路推进的参考反射镜（14）; 用于连续地改变测量光束的光路长度与参考光束的光程长度之间的相对光程长度差的边缘扫描装置（14,15）; 光束组合装置（10），用于组合来自样品的反射光和来自参考反射镜的反射光并产生干涉光束; 用于改变所述物镜与所述样本之间的相对距离的驱动机构（20）; 用于检测物镜与样本之间的相对位置的位置检测装置（21）光检测装置（22），用于接收干扰波束并输出干扰信号; 以及信号处理电路，用于基于从光检测装置输出的干涉信号和从位置检测装置输出的相对位置信息，基于位移信息输出凹部深度信息。

8. 发明申请

US20080186476A1 INSPECTION APPARATUS AND METHOD, AND PRODUCTION METHOD FOR PATTERN SUBSTRATES 有权
标题翻译：检验装置和方法，以及图案基板的生产方法
公开(公告)号：US20080186476A1
公开(公告)日：2008-08-07
申请号：US12015059
申请日：2008-01-16
申请人： Haruhiko Kusunose
发明人： Haruhiko Kusunose
IPC分类号： G01N21/00
CPC分类号： G01N21/956
摘要： According to a first aspect of the present invention, there is provided an inspection apparatus including an objective lens, a reflected illumination optical system that illuminates a first area which is part of a field of view of the objective lens, a transmitted illumination optical system that illuminates the first area and a second area; an adjusting unit that adjusts positions on the sample of transmitted illumination light from the transmitted illumination optical system and reflected illumination light from the reflected illumination optical system; a first detector that detects a transmitted light transmitted by the sample and a reflected light reflected by the sample in the first area; and a second detector that detects through the objective lens a transmitted light transmitted by the sample in the second area.
摘要翻译：根据本发明的第一方面，提供了一种检查装置，其包括：物镜;照射作为物镜的视场的一部分的第一区域的反射照明光学系统;透射照明光学系统，照亮第一区域和第二区域; 调整单元，其调整来自透射照明光学系统的透射照明光的样本的位置和来自反射照明光学系统的反射照明光的位置; 第一检测器，其检测由所述样品透射的透射光和由所述第一区域中的样品反射的反射光; 以及第二检测器，其通过物镜检测由第二区域中的样品透射的透射光。

9. 发明授权

US06195202B1 Laser microscope and a pattern inspection apparatus using such laser microscope 有权
标题翻译：激光显微镜和使用这种激光显微镜的图案检查装置
公开(公告)号：US06195202B1
公开(公告)日：2001-02-27
申请号：US09510524
申请日：2000-02-22
申请人： Haruhiko Kusunose
发明人： Haruhiko Kusunose
IPC分类号： G02B2100
CPC分类号： G02B21/002
摘要： A laser microscope for picking up an image of a specimen at a high speed and a pattern checking apparatus for checking a pattern at a high speed with a high sensitivity can be provided. A plurality of light beams aligned in a first direction are produced from a light source device (1, 10), and these light beams are projected onto a specimen (7, 30) by an objective lens (6, 29) to form a light spot array on the specimen. The specimen is moved in a direction perpendicular to the light spot array or the light beams are moved by a beam deflecting device in said direction to scan the specimen two-dimensionally. Light beams emanating from the light spots on the specimen are made incident upon corresponding light receiving elements of a linear image sensor (11, 33). In case of checking periodic patterns such as memory cell patterns, a pitch of the light spots is corresponded to a pitch of the patterns, and defects in the patterns can be detected by comparing output signals from respective light receiving elements.
摘要翻译：可以提供用于高速拾取样本的图像的激光显微镜和用于以高灵敏度检查图案的图案检查装置。从光源装置（1,10）产生沿第一方向排列的多个光束，并且这些光束通过物镜（6,29）投影到样本（7,30）上以形成光样品上的斑点阵列。样本沿垂直于光点阵列的方向移动，或者光束通过光束偏转装置沿所述方向移动，以二维扫描样本。从样品上的光点发出的光束入射到线性图像传感器（11,33）的对应的光接收元件上。在检查诸如存储单元图案的周期性图案的情况下，光点的间距对应于图案的间距，并且可以通过比较来自各个光接收元件的输出信号来检测图案中的缺陷。

10. 发明授权

US6043932A Laser microscope and a pattern inspection apparatus using such laser microscope 失效
标题翻译：激光显微镜和使用这种激光显微镜的图案检查装置
公开(公告)号：US6043932A
公开(公告)日：2000-03-28
申请号：US53679
申请日：1998-04-02
申请人： Haruhiko Kusunose
发明人： Haruhiko Kusunose
IPC分类号： G01B11/30 , G01N21/88 , G01N21/956 , G02B21/00 , H01L21/66
CPC分类号： G02B21/002
摘要： A laser microscope for picking up an image of a specimen at a high speed and a pattern checking apparatus for checking a pattern at a high speed with a high sensitivity can be provided. A plurality of light beams aligned in a first direction are produced from a light source device (1, 10), and these light beams are projected onto a specimen (7, 30) by an objective lens (6, 29) to form a light spot array on the specimen. The specimen is moved in a direction perpendicular to the light spot array or the light beams are moved by a beam deflecting device in said direction to scan the specimen two-dimensionally. Light beams emanating from the light spots on the specimen are made incident upon corresponding light receiving elements of a linear image sensor (11, 33). In case of checking periodic patterns such as memory cell patterns, a pitch of the light spots is corresponded to a pitch of the patterns, and defects in the patterns can be detected by comparing output signals from respective light receiving elements.
摘要翻译：可以提供用于高速拾取样本的图像的激光显微镜和用于以高灵敏度检查图案的图案检查装置。从光源装置（1,10）产生沿第一方向排列的多个光束，并且这些光束通过物镜（6,29）投影到样本（7,30）上以形成光样品上的斑点阵列。样本沿垂直于光点阵列的方向移动，或者光束通过光束偏转装置沿所述方向移动，以二维扫描样本。从样品上的光点发出的光束入射到线性图像传感器（11,33）的对应的光接收元件上。在检查诸如存储单元图案的周期性图案的情况下，光点的间距对应于图案的间距，并且可以通过比较来自各个光接收元件的输出信号来检测图案中的缺陷。

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