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1. 发明申请

US20090168191A1 PHOTOMASK INSPECTION APPARATUS 有权
标题翻译：光电检测设备
公开(公告)号：US20090168191A1
公开(公告)日：2009-07-02
申请号：US11964318
申请日：2007-12-26
申请人： Kiwamu Takehisa , Haruhiko Kusunose , Naoki Awamura
发明人： Kiwamu Takehisa , Haruhiko Kusunose , Naoki Awamura
IPC分类号： G02B3/12
CPC分类号： G03F1/84
摘要： According to one aspect of the present invention, there is provided a photomask inspection apparatus which observes a pattern provided on a mask substrate of a mask to inspect the mask including an object lens, and a liquid that is present between a last lens in the side closer to the mask of the object lens and the mask.
摘要翻译：根据本发明的一个方面，提供了一种光掩模检查装置，其观察设置在掩模的掩模基板上的图案，以检查包括物镜的掩模和存在于侧面的最后一个透镜之间的液体更靠近物镜的掩模和掩模。

2. 发明授权

US07796343B2 Photomask inspection apparatus 有权
标题翻译：光掩模检查装置
公开(公告)号：US07796343B2
公开(公告)日：2010-09-14
申请号：US11964318
申请日：2007-12-26
申请人： Kiwamu Takehisa , Haruhiko Kusunose , Naoki Awamura
发明人： Kiwamu Takehisa , Haruhiko Kusunose , Naoki Awamura
IPC分类号： G02B3/00 , G02B9/00 , G02B1/06 , G02B3/12 , G01N21/00
CPC分类号： G03F1/84
摘要： According to one aspect of the present invention, there is provided a photomask inspection apparatus which observes a pattern provided on a mask substrate of a mask to inspect the mask including an object lens, and a liquid that is present between a last lens in the side closer to the mask of the object lens and the mask.
摘要翻译：根据本发明的一个方面，提供了一种光掩模检查装置，其观察设置在掩模的掩模基板上的图案，以检查包括物镜的掩模和存在于侧面的最后一个透镜之间的液体更靠近物镜的掩模和掩模。

3. 发明授权

US5771097A Mach-zehnder type interferometer 失效
标题翻译： Mach-zehnder型干涉仪
公开(公告)号：US5771097A
公开(公告)日：1998-06-23
申请号：US694522
申请日：1996-08-09
申请人： Haruhiko Kusunose , Naoki Awamura
发明人： Haruhiko Kusunose , Naoki Awamura
IPC分类号： G01B9/02
CPC分类号： G01B9/02056 , G01B9/02024 , G01B9/02058
摘要： An interferometer of Mach-Zehnder type includes a first half mirror dividing an entrance light flux into first and second light fluxes, a first reflection mirror reflecting the first light flux toward a second half mirror, and a second reflection mirror reflecting the second light flux toward the second half mirror. At the second half mirror, the first and second light fluxes are mixed to derive an exit light flux including interference fringes. The first half mirror and first reflection mirror are secured to opposing side walls of a first hollow supporting block made of ceramics, and the second half mirror and second reflection mirror are secured to a second hollow supporting blocks made of ceramics. The first and second supporting blocks are coupled with each other at their side walls and an assembly of the supporting blocks is mounted on a surface of an optical bench by means of kinetic mounts. The half mirrors and reflection mirrors can be provided easily and precisely, and shrinkage and expansion of the optical bench due to a temperature variation do not produce any stress of the optical elements.
摘要翻译：马赫 - 策德尔型的干涉仪包括将入射光束分成第一和第二光束的第一半反射镜，将第一光束反射到第二半反射镜的第一反射镜和反射第二光束的第二反射镜朝向下半镜。在第二半反射镜处，第一和第二光束被混合以得出包括干涉条纹的出射光通量。第一半反射镜和第一反射镜被固定到由陶瓷制成的第一中空支撑块的相对侧壁上，并且第二半反射镜和第二反射镜被固定到由陶瓷制成的第二中空支撑块。第一和第二支撑块在其侧壁处彼此联接，并且支撑块的组件通过动力学支架安装在光学平台的表面上。可以容易且准确地提供半反射镜和反射镜，并且由于温度变化导致的光学平台的收缩和膨胀不会产生光学元件的任何应力。

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