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1. 发明授权

US07195845B2 Spin-coating method, determination method for spin-coating condition and mask blank 有权
标题翻译：旋涂法，旋涂条件和掩模毛坯的测定方法
公开(公告)号：US07195845B2
公开(公告)日：2007-03-27
申请号：US10405505
申请日：2003-04-03
申请人： Hideo Kobayashi , Takao Higuchi
发明人： Hideo Kobayashi , Takao Higuchi
IPC分类号： G03F1/00 , G03F9/00
CPC分类号： G03F7/162 , G03F7/091
摘要： A spin-coating method according to the present invention includes a uniforming step of rotating a substrate at a predetermined main rotation speed for a predetermined main rotation time so as to primarily make a resist film thickness uniform, and a subsequent drying step of rotating the substrate at a predetermined drying rotation speed for a predetermined drying rotation time so as to primarily dry the uniform resist film. In the present invention, a contour map, for example, of film thickness uniformity within an effective region (critical area) shown in FIG. 3A is determined (generated), and resist-coating is performed by selecting a condition within the optimum region in this contour map in which the film thickness uniformity (within an effective region) can be the maximum, or within the region in which the film thickness uniformity (within an effective region) can be high enough for a desirably specified.
摘要翻译：根据本发明的旋涂方法包括以预定的主旋转时间以预定的主旋转速度旋转基板以使主要使抗蚀剂膜厚度均匀的均匀步骤，以及随后的干燥步骤，使基板以预定的干燥旋转速度以预定的干燥旋转时间，以便主要干燥均匀的抗蚀剂膜。在本发明中，例如图3所示的有效区域（临界区域）内的膜厚均匀性的等高线图。确定（生成）3A，并且通过选择其中膜厚度均匀性（有效区域内）可以是最大值的该轮廓图中的最佳区域内的条件，或者在膜厚度均匀性（在有效区域内）可以足够高以达到理想的规定。

2. 发明申请

US20070148344A1 SPIN-COATING METHOD, DETERMINATION METHOD FOR SPIN-COATING CONDITION AND MASK BLANK 有权
标题翻译：旋涂方法，旋涂条件和掩模层的测定方法
公开(公告)号：US20070148344A1
公开(公告)日：2007-06-28
申请号：US11676692
申请日：2007-02-20
申请人： Hideo KOBAYASHI , Takao Higuchi
发明人： Hideo KOBAYASHI , Takao Higuchi
IPC分类号： B05D3/12
CPC分类号： G03F7/162 , G03F7/091
摘要： A spin-coating method according to the present invention includes a uniforming step of rotating a substrate at a predetermined main rotation speed for a predetermined main rotation time so as to primarily make a resist film thickness uniform, and a subsequent drying step of rotating the substrate at a predetermined drying rotation speed for a predetermined drying rotation time so as to primarily dry the uniform resist film. In the present invention, a contour map, for example, of film thickness uniformity within an effective region (critical area) shown in FIG. 3A is determined (generated), and resist-coating is performed by selecting a condition within the optimum region in this contour map in which the film thickness uniformity (within an effective region) can be the maximum, or within the region in which the film thickness uniformity (within an effective region) can be high enough for a desirably specified.
摘要翻译：根据本发明的旋涂方法包括以预定的主旋转时间以预定的主旋转速度旋转基板以使主要使抗蚀剂膜厚度均匀的均匀步骤，以及随后的干燥步骤，使基板以预定的干燥旋转速度以预定的干燥旋转时间，以便主要干燥均匀的抗蚀剂膜。在本发明中，例如图中所示的有效区域（临界区域）内的膜厚均匀性的等高线图。确定（生成），并且通过选择其中膜厚度均匀性（有效区域内）可以是最大值，或者在该区域内的该轮廓图中的最佳区域内的条件来进行抗蚀涂层其中膜厚度均匀性（在有效区域内）可以足够高以达到期望的规定。

3. 发明授权

US08293326B2 Spin-coating method, determination method for spin-coating condition and mask blank 有权
标题翻译：旋涂法，旋涂条件和掩模毛坯的测定方法
公开(公告)号：US08293326B2
公开(公告)日：2012-10-23
申请号：US11676692
申请日：2007-02-20
申请人： Hideo Kobayashi , Takao Higuchi
发明人： Hideo Kobayashi , Takao Higuchi
IPC分类号： B05D3/12
CPC分类号： G03F7/162 , G03F7/091
摘要： A spin-coating method according to the present invention includes a uniforming step of rotating a substrate at a predetermined main rotation speed for a predetermined main rotation time so as to primarily make a resist film thickness uniform, and a subsequent drying step of rotating the substrate at a predetermined drying rotation speed for a predetermined drying rotation time so as to primarily dry the uniform resist film. In the present invention, a contour map, for example, of film thickness uniformity within an effective region (critical area) shown in FIG. 3A is determined (generated), and resist-coating is performed by selecting a condition within the optimum region in this contour map in which the film thickness uniformity (within an effective region) can be the maximum, or within the region in which the film thickness uniformity (within an effective region) can be high enough for a desirably specified.
摘要翻译：根据本发明的旋涂方法包括以预定的主旋转时间以预定的主旋转速度旋转基板以使主要使抗蚀剂膜厚度均匀的均匀步骤，以及随后的干燥步骤，使基板以预定的干燥旋转速度以预定的干燥旋转时间，以便主要干燥均匀的抗蚀剂膜。在本发明中，例如图3所示的有效区域（临界区域）内的膜厚均匀性的等高线图。通过选择在该轮廓图中的最佳区域内的条件（其中有效区域内的膜厚均匀性可以是最大值），或者在膜的均匀度（有效区域内）可以是膜的最大区域内，厚度均匀性（在有效区域内）可以足够高以达到期望的规定。

4. 发明授权

US07674561B2 Mask blanks and method of producing the same 有权
标题翻译：面膜毛坯及其制造方法
公开(公告)号：US07674561B2
公开(公告)日：2010-03-09
申请号：US10951696
申请日：2004-09-29
申请人： Hideo Kobayashi , Takao Higuchi
发明人： Hideo Kobayashi , Takao Higuchi
IPC分类号： G03F1/00 , B05D3/12
CPC分类号： G03F7/162 , G03F1/50
摘要： A method of producing a mask blank has a resist film forming (resist coating) process of dispensing a resist solution containing a resist material and a solvent onto a square-like substrate, and rotating the substrate to spread the dispensed resist solution over the substrate and to dry the resist solution on the substrate, thereby forming a resist film on the substrate. While the substrate is rotated in the resist film forming (resist coating) process, an exhausting member performs an exhausting operation to cause an airflow along an upper surface of the substrate from the center of the substrate towards an outer peripheral portion of the substrate so that a puddle of the resist solution formed at a peripheral end portion of the substrate is prevented from being moved towards the center of the substrate by the rotation of the substrate.
摘要翻译：制造掩模坯料的方法具有将包含抗蚀剂材料和溶剂的抗蚀剂溶液分配到方形基板上的抗蚀剂膜形成（抗蚀剂涂布）方法，并且旋转基板以将分配的抗蚀剂溶液铺展在基板上，将基板上的抗蚀剂溶液干燥，从而在基板上形成抗蚀剂膜。当基板在抗蚀剂膜形成（抗蚀涂层）工艺中旋转时，排气部件进行排气操作，以使基板的上表面的气流从基板的中心朝向基板的外周部分，从而通过基板的旋转，防止形成在基板的周边端部处的抗蚀剂溶液的水槽朝向基板的中心移动。

5. 发明申请

US20050069787A1 Mask blanks and method of producing the same 有权
标题翻译：面膜毛坯及其制造方法
公开(公告)号：US20050069787A1
公开(公告)日：2005-03-31
申请号：US10951696
申请日：2004-09-29
申请人： Hideo Kobayashi , Takao Higuchi
发明人： Hideo Kobayashi , Takao Higuchi
IPC分类号： H01L21/027 , B05D1/40 , B05D3/00 , B05D3/02 , B05D3/12 , G03F1/50 , G03F1/68 , G03F7/004 , G03F7/16 , G03F9/00
CPC分类号： G03F7/162 , G03F1/50
摘要： A method of producing a mask blank has a resist film forming (resist coating) process of dispensing a resist solution containing a resist material and a solvent onto a square-like substrate, and rotating the substrate to spread the dispensed resist solution over the substrate and to dry the resist solution on the substrate, thereby forming a resist film on the substrate. While the substrate is rotated in the resist film forming (resist coating) process, an exhausting member performs an exhausting operation to cause an airflow along an upper surface of the substrate from the center of the substrate towards an outer peripheral portion of the substrate so that a puddle of the resist solution formed at a peripheral end portion of the substrate is prevented from being moved towards the center of the substrate by the rotation of the substrate.
摘要翻译：制造掩模坯料的方法具有将包含抗蚀剂材料和溶剂的抗蚀剂溶液分配到方形基板上的抗蚀剂膜形成（抗蚀剂涂布）方法，并且旋转基板以将分配的抗蚀剂溶液铺展在基板上，将基板上的抗蚀剂溶液干燥，从而在基板上形成抗蚀剂膜。当基板在抗蚀剂膜形成（抗蚀涂层）工艺中旋转时，排气部件进行排气操作，以使基板的上表面的气流从基板的中心朝向基板的外周部分，从而通过基板的旋转，防止形成在基板的周边端部处的抗蚀剂溶液的水槽朝向基板的中心移动。

6. 发明授权

US5452160A Mode switching transmitting mechanism for a tape player 失效
标题翻译：磁带播放机的模式切换发送机制
公开(公告)号：US5452160A
公开(公告)日：1995-09-19
申请号：US124209
申请日：1993-09-21
申请人： Ichiro Sakuma , Chang-Jong Oh , Ken Yakame , Takao Higuchi
发明人： Ichiro Sakuma , Chang-Jong Oh , Ken Yakame , Takao Higuchi
IPC分类号： G11B15/29 , G11B15/44 , G11B5/54 , G11B15/00
CPC分类号： G11B15/442 , G11B15/29
摘要： A mode switching transmitting mechanism for a tape player according to the present invention, in which a play mode and a fast forward/fast rewinding mode is switched by sliding a transmitting gear engaged with a driving gear in a direction of an axial line, makes it possible to construct a small and thin switching mechanism. According to the present invention a first gear having a greater diameter on the driving side and a first gear having a smaller diameter have a common shaft. A second gear having a greater diameter on the driven side and a second gear having a smaller diameter are supported slidably on a shaft on a pivoting arm side and held, energized towards one direction of an axial line by a spring. In order to realize the play mode, a lever is pushed. Then an operating lever is forwarded and a wedge portion thereof is engaged with a conical plateau portion formed in a wedge portion of the gear having a greater diameter. In this way the second gear having a greater diameter and the second gear having a smaller diameter are slid against a force of a spring to form a transmission path to the reel gear.
摘要翻译：根据本发明的用于磁带播放器的模式切换传输机构，其中通过在轴线方向上滑动与驱动齿轮接合的传动齿轮来切换播放模式和快进/快退信息模式，使其成为可能构建一个小而薄的切换机制。根据本发明，驱动侧具有较大直径的第一齿轮和具有较小直径的第一齿轮具有公共轴。在从动侧具有较大直径的第二齿轮和具有较小直径的第二齿轮可滑动地支撑在枢转臂侧的轴上，并且通过弹簧保持朝向轴线的一个方向被致动。为了实现播放模式，推杆。然后一个操作杆前进，其楔形部分与形成在具有较大直径的齿轮的楔形部分中的锥形平台部分啮合。以这种方式，具有较大直径的第二齿轮和具有较小直径的第二齿轮克服弹簧的力而滑动以形成到卷轴齿轮的传动路径。

7. 发明授权

US5878016A Disk changer 失效
标题翻译：磁盘更换器
公开(公告)号：US5878016A
公开(公告)日：1999-03-02
申请号：US792525
申请日：1997-01-31
申请人： Nobuyuki Kubokawa , Takao Higuchi , Ichiro Sakuma
发明人： Nobuyuki Kubokawa , Takao Higuchi , Ichiro Sakuma
IPC分类号： G11B17/22 , G11B17/04
CPC分类号： G11B17/22
摘要： A disk changer includes a plurality of carriages having a disk on each carriage, a tray accommodating the plurality of carriages, the tray being reciprocated between a disk take-out position and a disk accommodating position, a recording and reproducing unit for driving a disk at a disk driving position for recording data thereon and reproducing data therefrom, a disk setting mechanism for displacing the disk when the disk is at a driving position from a disk loading level to a disk non-loading level and vice versa, a carriage lifting mechanism for vertically moving the carriage, which is at the disk accommodating position, between the lowermost level thereof and a level above the lowermost level, and for vertically moving the carriage between the non-loading level and a level above the non-loading level, and a carriage moving mechanism for moving the carriage to a space formed at one of the disk accommodating position and the disk driving position in association with an operation of the carriage lifting mechanism.
摘要翻译：磁盘更换器包括：在每个托架上具有盘的多个托架，容纳多个托架的托盘，托盘在盘取出位置和盘容纳位置之间往复运动，用于驱动盘的记录和再现单元用于在其上记录数据并从其再现数据的盘驱动位置，当盘处于从盘装载水平到盘非加载水平的驱动位置时使盘移位的盘设置机构，反之亦然;用于将位于盘容纳位置的滑架垂直移动在其最低水平面和最低水平面之间的水平面上，并且用于在非负载水平和高于非负载水平的水平面之间垂直移动滑架，以及滑架移动机构，用于将托架移动到形成在盘容纳位置和盘驱动位置中的一个处的空间，与t的操作相关联他的提升机构。

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