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1. 发明申请

US20070066204A1 Load port 审中-公开
标题翻译：加载端口
公开(公告)号：US20070066204A1
公开(公告)日：2007-03-22
申请号：US11405421
申请日：2006-04-18
申请人： Hidenobu Tanimura , Minoru Soraoka , Shinji Yokoyama , Noriyoshi Toyoda
发明人： Hidenobu Tanimura , Minoru Soraoka , Shinji Yokoyama , Noriyoshi Toyoda
IPC分类号： B08B15/02
CPC分类号： H01L21/67775 , H01L21/67017 , H01L21/67772
摘要： A load port is provided with a table and a plate. The table is arranged on a side of a front wall of an atmospheric transfer unit for transferring a piece of material under processing and is adapted to mount on it a container with the piece of material received in the same. The plate serves to isolate an interior of the atmospheric transfer unit from an exterior of the atmospheric transfer unit. The load port includes an exhaust duct arranged on a rear side of the plate and a fan arranged in a lower extremity of the exhaust duct. By the exhaust duct and the fan, an internal atmosphere of the atmospheric transfer unit can be exhausted into the atmosphere.
摘要翻译：装载端口设有工作台和板。工作台布置在大气传送单元的前壁的一侧，用于传送正在加工的一块材料，并且适于在其上安装容纳该材料的容器。该板用于将大气传送单元的内部与大气传送单元的外部隔离。负载端口包括布置在板的后侧的排气管和布置在排气管的下端的风扇。通过排风管和风扇，大气转移单元的内部气氛可以排放到大气中。

2. 发明授权

US08460467B2 Vacuum processing apparatus 有权
标题翻译：真空加工设备
公开(公告)号：US08460467B2
公开(公告)日：2013-06-11
申请号：US13177076
申请日：2011-07-06
申请人： Akitaka Makino , Youji Takahashi , Minoru Soraoka , Hideki Kihara , Susumu Tauchi
发明人： Akitaka Makino , Youji Takahashi , Minoru Soraoka , Hideki Kihara , Susumu Tauchi
IPC分类号： C23F1/00 , C23C16/00 , H01L21/677
CPC分类号： H01L21/6719 , H01L21/67017 , Y10S414/135 , Y10S414/139
摘要： A vacuum processing apparatus includes a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas, and a mass flow controller unit interposed between two of the processing chambers for supplying gas to the chambers.
摘要翻译：一种真空处理装置，包括设置在其中心的转印单元，多个处理室，每个处理室具有用于支撑待处理物体的处理台，并使用气体进行处理;以及质量流量控制单元，用于向腔室供应气体的处理室。

3. 发明授权

US06752580B2 Vacuum processing apparatus and semiconductor manufacturing line using the same 有权
标题翻译：真空处理装置和使用其的半导体制造线
公开(公告)号：US06752580B2
公开(公告)日：2004-06-22
申请号：US09956140
申请日：2001-09-20
申请人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
发明人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
IPC分类号： B65G1133
CPC分类号： H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/67727 , H01L21/67778 , Y10S134/902 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14 , Y10T70/5801 , Y10T70/5805
摘要： A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing to the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed larger than the width of the vacuum processing block, and the plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.
摘要翻译：真空处理装置由盒式磁带和真空处理块构成。盒式磁带具有用于安装包含样品和大气传送装置的多个盒的盒式台。真空处理块具有用于对样品进行真空处理的多个处理室和用于转移样品的真空转印装置。磁带盒和真空处理块的平面图都是近似矩形的，并且盒体的宽度被设计成大于真空处理块的宽度，真空处理装置的平面图形成为 L形或T形。

4. 发明授权

US06752579B2 Vacuum processing apparatus and semiconductor manufacturing line using the same 有权
公开(公告)号：US06752579B2
公开(公告)日：2004-06-22
申请号：US09956135
申请日：2001-09-20
申请人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
发明人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
IPC分类号： C23C1600
CPC分类号： H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/67727 , H01L21/67778 , Y10S134/902 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14 , Y10T70/5801 , Y10T70/5805
摘要： A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing to the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed larger than the width of the vacuum processing block, and the plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.

5. 发明授权

US06519504B1 Vacuum processing apparatus and semiconductor manufacturing line using the same 有权
公开(公告)号：US06519504B1
公开(公告)日：2003-02-11
申请号：US09487499
申请日：2000-01-19
申请人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
发明人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
IPC分类号： G06F700
CPC分类号： H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/67727 , H01L21/67778 , Y10S134/902 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14 , Y10T70/5801 , Y10T70/5805
摘要： A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing to the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed larger than the width of the vacuum processing block, and the plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.

6. 发明授权

US06962472B2 Vacuum processing apparatus and semiconductor manufacturing line using the same 失效
标题翻译：真空处理装置和使用其的半导体制造线
公开(公告)号：US06962472B2
公开(公告)日：2005-11-08
申请号：US09956136
申请日：2001-09-20
申请人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
发明人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
IPC分类号： H01L21/302 , B65G49/07 , H01L21/00 , H01L21/02 , H01L21/203 , H01L21/205 , H01L21/3065 , H01L21/677
CPC分类号： H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/67727 , H01L21/67778 , Y10S134/902 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14 , Y10T70/5801 , Y10T70/5805
摘要： A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing to the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed larger than the width of the vacuum processing block, and the plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.
摘要翻译：真空处理装置由盒式磁带和真空处理块构成。盒式磁带具有用于安装包含样品和大气传送装置的多个盒的盒式台。真空处理块具有用于对样品进行真空处理的多个处理室和用于转移样品的真空转印装置。磁带盒和真空处理块的平面图都是近似矩形的，并且盒体的宽度被设计成大于真空处理块的宽度，真空处理装置的平面图形成为 L形或T形。

7. 发明授权

US06672819B1 Vacuum processing apparatus and semiconductor manufacturing line using the same 有权
公开(公告)号：US06672819B1
公开(公告)日：2004-01-06
申请号：US09704614
申请日：2000-11-03
申请人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
发明人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
IPC分类号： B65G4907
CPC分类号： H01L21/67161 , H01L21/6719 , H01L21/67196 , H01L21/67727 , H01L21/67778 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing to the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed larger than the width of the vacuum processing block, and the plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.

8. 发明授权

US5855726A Vacuum processing apparatus and semiconductor manufacturing line using the same 失效
标题翻译：真空处理装置和使用其的半导体制造线
公开(公告)号：US5855726A
公开(公告)日：1999-01-05
申请号：US677682
申请日：1996-07-08
申请人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
发明人： Minoru Soraoka , Ken Yoshioka , Yoshinao Kawasaki
IPC分类号： H01L21/302 , B65G49/07 , H01L21/00 , H01L21/02 , H01L21/203 , H01L21/205 , H01L21/3065 , H01L21/677 , C23C16/00
CPC分类号： H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/6719 , H01L21/67196 , H01L21/67727 , H01L21/67778 , Y10S134/902 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14 , Y10T70/5801 , Y10T70/5805
摘要： A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing on the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed to be larger than the width of the vacuum processing block, and the overall plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.
摘要翻译：真空处理装置由盒式磁带和真空处理块构成。盒式磁带具有用于安装包含样品和大气传送装置的多个盒的盒式台。真空处理块具有用于对样品进行真空处理的多个处理室和用于转移样品的真空转印装置。盒体和真空处理块的平面图都是近似矩形的，并且盒体的宽度设计成大于真空处理块的宽度，真空处理装置的整个平面图是形成为L形或T形。

9. 发明授权

US4936967A Method of detecting an end point of plasma treatment 失效
标题翻译：检测等离子体处理终点的方法
公开(公告)号：US4936967A
公开(公告)日：1990-06-26
申请号：US368
申请日：1987-01-05
申请人： Shoji Ikuhara , Keiji Tada , Yoshinao Kawasaki , Katsuyoshi Kudo , Minoru Soraoka
发明人： Shoji Ikuhara , Keiji Tada , Yoshinao Kawasaki , Katsuyoshi Kudo , Minoru Soraoka
IPC分类号： H01J37/32
CPC分类号： H01J37/32935
摘要： The present invention relates to a method of and apparatus for detecting an end point of plasma treatment of a specimen. There is included selecting plasma spectrum having a characteristic wavelength from the plasma spectrum generating at the time of reaction in the plasma treatment of a specimen, setting a disregarding time for the plasma treatment end point detection, assuming, at the stage when the disregarding time for treatment end point detection has elapsed, a quantity of the selected plasma spectrum up to the time of said stage based on a quantity of same plasma spectrum at the time of said stage and a variation with the time in the last said quantity of plasma spectrum, and detecting the reaction time end point from the assumed quantity of plasma spectrum and an actual quantity of the same plasma spectrum after the time of said stage thereby making it possible to prevent erroneous detection of the end point of reaction in the plasma treatment and detect accurately the same even when the reaction time of the plasma treatment is short.
摘要翻译：本发明涉及一种用于检测样品的等离子体处理终点的方法和装置。包括从在等离子体处理终点检测中设定无视等待时间的等离子体处理终点检测时，从等离子体处理中检测到的反应时产生的等离子体光谱中选出具有特征波长的等离子体光谱，假设在不考虑时间的情况下，处理终点检测已经过去，基于所述阶段时相同等离子体光谱的量和所述最后所述等离子体光谱中的时间的变化，所选择的等离子体谱的数量直到所述阶段的时间，并且从所述阶段的时间之后的等离子体谱的假定量和相同等离子体光谱的实际量检测反应时间终点，从而可以防止在等离子体处理中的反应结束点的错误检测并准确检测即使当等离子体处理的反应时间短时也是如此。

10. 发明授权

US4453757A Wafer gripping device 失效
标题翻译：晶圆夹持装置
公开(公告)号：US4453757A
公开(公告)日：1984-06-12
申请号：US324121
申请日：1981-11-23
申请人： Minoru Soraoka
发明人： Minoru Soraoka
IPC分类号： H01L21/677 , B25B11/00 , B25J15/02 , B25J15/10 , H01L21/67 , H01L21/68 , H01L21/687 , B25J15/00
CPC分类号： H01L21/68707 , B25J15/02 , H01L21/68 , Y10S414/141
摘要： A wafer gripping device including a mechanism for automatically gripping a wafer by claws for transporting a wafer between an auxiliary vacuum chamber and a vacuum chamber of a semiconductor etching device. The claws for gripping a wafer have a vertical stroke increased when a wafer gripping operation is performed to enable the wafer to be gripped without any damage being caused thereto. The wafer gripping device includes a dust collection preventing member for minimizing dust collection.
摘要翻译：一种晶片夹持装置，包括用于通过爪自动夹持晶片的机构，用于在半导体蚀刻装置的辅助真空室和真空室之间输送晶片。当执行晶片夹紧操作以使得能够夹持晶片而没有对其造成任何损坏时，用于夹紧晶片的爪具有增加的垂直行程。晶片夹持装置包括用于最小化集尘的集尘防止部件。

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