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    • 10. 发明授权
    • Apparatus and method for surface treatment to substrate
    • 用于表面处理至衬底的装置和方法
    • US07771561B2
    • 2010-08-10
    • US11598067
    • 2006-11-13
    • Naoki SuzukiKazuto NishidaKazuyuki Tomita
    • Naoki SuzukiKazuto NishidaKazuyuki Tomita
    • H01L21/00C23C16/00C23C14/00
    • H05K3/26H01J37/32009H01J37/32935H01J37/3299H05K3/323H05K2203/095
    • An apparatus and a method for surface treatment of substrates whereby the quality of substrates can be maintained by preventing excessive plasma treatment of substrates. In carrying out the plasma treatment on a surface of the substrate in a reaction chamber, there are provided an emission spectroscopic analysis device or a mass analyzer, and a controller, so that the energy of ions in plasma is controlled to decrease when, e.g., bromine included in the substrate is detected, and the surface treatment to the substrate is controlled to stop when the removal of impurities of the substrate is detected to end. The bromine once separated from the substrate is prevented from adhering again to the substrate and corroding the substrate. Moreover, ions are prevented from being excessively irradiated to the substrate when the removal of impurities ends, thereby reducing damage to the substrate.
    • 用于表面处理基板的装置和方法,由此通过防止基板的过度等离子体处理可以保持基板的质量。 在反应室中对基板的表面进行等离子体处理时,设置有发光光谱分析装置或质量分析装置以及控制器,使得等离子体中的离子的能量被控制为减少,例如, 检测包含在基板中的溴,并且当检测到去除基板的杂质结束时,控制对基板的表面处理以停止。 与基板分离的溴被防止再次粘附到基板上并腐蚀基板。 此外,当去除杂质结束时,防止离子过度照射到基板,从而减少对基板的损坏。