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1. 发明授权

US07941767B2 Photomask management method and photomask wash limit generating method 有权
标题翻译：光掩模管理方法和光掩模清洗极限生成方法
公开(公告)号：US07941767B2
公开(公告)日：2011-05-10
申请号：US12112688
申请日：2008-04-30
申请人： Hidefumi Mukai , Shinji Yamaguchi , Yukiyasu Arisawa , Toshiya Kotani
发明人： Hidefumi Mukai , Shinji Yamaguchi , Yukiyasu Arisawa , Toshiya Kotani
IPC分类号： G06F17/50 , G06F19/00 , G01B7/00 , G06K9/00
CPC分类号： G03F1/82 , G03F1/86
摘要： A photomask is washed and at least one physical amount of transmittance and phase difference of the photomask, dimension of a pattern, height of the pattern and a sidewall shape of the pattern is measured. After this, the two-dimensional shape of a borderline pattern previously determined for the photomask is measured. Lithography tolerance is derived by performing a lithography simulation for the measured two-dimensional shape by use of the measured physical amount. Then, whether the photomask can be used or not is determined based on the derived lithography tolerance.
摘要翻译：洗涤光掩模，并且测量光掩模的透光率和相位差的至少一个物理量，图案的尺寸，图案的高度和图案的侧壁形状。之后，测量先前为光掩模确定的边界图案的二维形状。通过使用测量的物理量对所测量的二维形状进行光刻模拟，导出光刻容限。然后，是否可以使用光掩模是基于导出的平版印刷公差来确定的。

2. 发明申请

US20080320434A1 PHOTOMASK MANAGEMENT METHOD AND PHOTOMASK WASH LIMIT GENERATING METHOD 有权
标题翻译：光电管理方法和照相机限流发生方法
公开(公告)号：US20080320434A1
公开(公告)日：2008-12-25
申请号：US12112688
申请日：2008-04-30
申请人： Hidefumi MUKAI , Shinji Yamaguchi , Yukiyasu Arisawa , Toshiya Kotani
发明人： Hidefumi MUKAI , Shinji Yamaguchi , Yukiyasu Arisawa , Toshiya Kotani
IPC分类号： G06F17/50 , G01B7/00
CPC分类号： G03F1/82 , G03F1/86
摘要： A photomask is washed and at least one physical amount of transmittance and phase difference of the photomask, dimension of a pattern, height of the pattern and a sidewall shape of the pattern is measured. After this, the two-dimensional shape of a borderline pattern previously determined for the photomask is measured. Lithography tolerance is derived by performing a lithography simulation for the measured two-dimensional shape by use of the measured physical amount. Then, whether the photomask can be used or not is determined based on the derived lithography tolerance.
摘要翻译：洗涤光掩模，并且测量光掩模的透光率和相位差的至少一个物理量，图案的尺寸，图案的高度和图案的侧壁形状。之后，测量先前为光掩模确定的边界图案的二维形状。通过使用测量的物理量对所测量的二维形状进行光刻模拟，导出光刻容限。然后，是否可以使用光掩模是基于导出的平版印刷公差来确定的。

3. 发明申请

US20050025351A1 Method for inspecting a defect in a photomask, method for manufacturing a semiconductor device and method for producing a photomask 失效
标题翻译：用于检查光掩模中的缺陷的方法，用于制造半导体器件的方法和用于制造光掩模的方法
公开(公告)号：US20050025351A1
公开(公告)日：2005-02-03
申请号：US10878384
申请日：2004-06-29
申请人： Toshiya Kotani , Suigen Kyoh , Shinji Yamaguchi , Soichi Inoue
发明人： Toshiya Kotani , Suigen Kyoh , Shinji Yamaguchi , Soichi Inoue
IPC分类号： G03F1/20 , G03F1/84 , G03F1/86 , G06K9/00 , G06T7/00 , H01L21/027
CPC分类号： G03F1/84 , G06T7/001 , G06T2207/30148
摘要： There is disclosed a method for inspecting a defect in a photomask which is produced by using a graphic data, that matches mask data or is produced by subjecting mask data to correction of a process conversion difference relating to at least a line width. The method includes the following steps. Inspection data is produced by correcting a pattern of mask data so as to substantially match a planar shape of a pattern of a photomask to be produced by using the graphic data. A pattern of a produced photomask is compared with a pattern of the inspection data. Portions where planar shapes of the pattern of the inspection data and the pattern of the produced photomask do not match are extracted. A defect is distinguished from the portions where the planer shapes do not match.
摘要翻译：公开了一种用于检查光掩模中的缺陷的方法，其通过使用匹配掩模数据的图形数据或通过对掩模数据进行校正至少与线宽相关的处理转换差来产生。该方法包括以下步骤。通过校正掩模数据的图案以便通过使用图形数据基本上匹配要产生的光掩模的图案的平面形状来产生检查数据。将生成的光掩模的图案与检查数据的图案进行比较。提取检查数据的图案的平面形状和所生成的光掩模的图案不匹配的部分。缺陷与刨床形状不匹配的部分不同。

4. 发明授权

US07499582B2 Method for inspecting a defect in a photomask, method for manufacturing a semiconductor device and method for producing a photomask 失效
标题翻译：用于检查光掩模中的缺陷的方法，用于制造半导体器件的方法和用于制造光掩模的方法
公开(公告)号：US07499582B2
公开(公告)日：2009-03-03
申请号：US10878384
申请日：2004-06-29
申请人： Toshiya Kotani , Suigen Kyoh , Shinji Yamaguchi , Soichi Inoue
发明人： Toshiya Kotani , Suigen Kyoh , Shinji Yamaguchi , Soichi Inoue
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G06T7/001 , G06T2207/30148
摘要： There is disclosed a method for inspecting a defect in a photomask which is produced by using a graphic data, that matches mask data or is produced by subjecting mask data to correction of a process conversion difference relating to at least a line width. The method includes the following steps. Inspection data is produced by correcting a pattern of mask data so as to substantially match a planar shape of a pattern of a photomask to be produced by using the graphic data. A pattern of a produced photomask is compared with a pattern of the inspection data. Portions where planar shapes of the pattern of the inspection data and the pattern of the produced photomask do not match are extracted. A defect is distinguished from the portions where the planer shapes do not match.
摘要翻译：公开了一种用于检查光掩模中的缺陷的方法，其通过使用匹配掩模数据的图形数据或通过对掩模数据进行校正至少与线宽相关的处理转换差来产生。该方法包括以下步骤。通过校正掩模数据的图案以便通过使用图形数据基本上匹配要产生的光掩模的图案的平面形状来产生检查数据。将生成的光掩模的图案与检查数据的图案进行比较。提取检查数据的图案的平面形状和所生成的光掩模的图案不匹配的部分。缺陷与刨床形状不匹配的部分不同。

5. 发明授权

US09537065B2 Light-emitting device with reflective resin 有权
标题翻译：具有反光树脂的发光装置
公开(公告)号：US09537065B2
公开(公告)日：2017-01-03
申请号：US14236930
申请日：2012-05-31
申请人： Yoshiki Sota , Masayuki Ohta , Kazuo Tamaki , Shinji Yamaguchi , Shin Itoh , Tomoshi Kimura , Masaki Tatsumi
发明人： Yoshiki Sota , Masayuki Ohta , Kazuo Tamaki , Shinji Yamaguchi , Shin Itoh , Tomoshi Kimura , Masaki Tatsumi
IPC分类号： H01L33/54 , H01L33/60 , H01L33/62 , H01L33/50 , H01L27/15 , H01L23/498 , H01L23/00
CPC分类号： H01L33/507 , H01L23/49861 , H01L24/32 , H01L24/48 , H01L24/73 , H01L24/83 , H01L24/85 , H01L27/156 , H01L33/60 , H01L33/62 , H01L2224/32245 , H01L2224/48091 , H01L2224/48247 , H01L2224/48257 , H01L2224/48465 , H01L2224/73265 , H01L2224/83012 , H01L2224/83439 , H01L2224/85012 , H01L2224/85439 , H01L2224/92247 , H01L2924/00014 , H01L2924/12041 , H01L2924/181 , H01L2224/45099 , H01L2924/00012 , H01L2924/3512 , H01L2924/00
摘要： Improves light extraction efficiency. A light emitting device 1 using a white resin molding package 5 integrally molded with lead frames 3, 4 constituting an electrode corresponding to one or a plurality of light emitting element 2 and white resin, wherein an area in a plane view of a white resin surface on a reflective surface that is level with amounting surface of the light emitting element 2 is configured to be larger than total area in a plane view occupied by surfaces of the lead frames 3, 4 and the light emitting element. Further, a step section is formed on the surfaces of lead frames 3, 4, white resin is filled in the step section, and the area of white resin surface on a reflective surface where the light emitting element 2 is mounted is increased.
摘要翻译：提高光提取效率。一种使用与构成对应于一个或多个发光元件2的电极的引线框架3,4一体模制的白色树脂成型封装5和白色树脂的发光器件1，其中白色树脂表面的平面图中的面积在与发光元件2的表面平齐的反射面上，在由引线框3,4和发光元件的表面占据的平面图中，大于总面积。此外，在引线框架3,4的表面上形成台阶部，在台阶部填充有白色树脂，并且增加了安装有发光元件2的反射面上的白色树脂表面的面积。

6. 发明授权

US09086579B2 Zoom lens system, imaging device and camera 有权
标题翻译：变焦镜头系统，成像设备和相机
公开(公告)号：US09086579B2
公开(公告)日：2015-07-21
申请号：US13337326
申请日：2011-12-27
申请人： Satoshi Kuzuhara , Katsu Yamada , Shinji Yamaguchi , Tsutomu Iwashita
发明人： Satoshi Kuzuhara , Katsu Yamada , Shinji Yamaguchi , Tsutomu Iwashita
IPC分类号： G02B15/177 , G02B27/64
CPC分类号： G02B27/646 , G02B15/177
摘要： A zoom lens system comprising: a first lens unit having negative optical power; a second lens unit having positive optical power; and a third lens unit having positive optical power, wherein the first to third lens units are individually moved along an optical axis to vary magnification in zooming, each lens unit includes at least one lens element that satisfies the conditions: nd≦1.67, vd
摘要翻译：一种变焦透镜系统，包括：具有负光焦度的第一透镜单元; 具有正光焦度的第二透镜单元; 以及具有正光焦度的第三透镜单元，其中所述第一至第三透镜单元沿光轴单独移动以改变变焦倍数，每个透镜单元包括满足以下条件的至少一个透镜元件：nd＆nlE; 1.67，vd < 59和0.000

7. 发明授权

US08743185B2 Stereoscopic imaging optical system, imaging device, and camera 有权
标题翻译：立体成像光学系统，成像装置和相机
公开(公告)号：US08743185B2
公开(公告)日：2014-06-03
申请号：US13287132
申请日：2011-11-02
申请人： Shinji Yamaguchi , Michihiro Yamagata , Keiki Yoshitsugu
发明人： Shinji Yamaguchi , Michihiro Yamagata , Keiki Yoshitsugu
IPC分类号： G02B21/22
CPC分类号： G02B27/2285 , H04N13/239 , H04N13/296
摘要： A stereoscopic imaging optical system having a function to adjust a stereo base, an imaging device that includes the stereoscopic imaging optical system, and a camera that includes the imaging device, are provided. The stereoscopic imaging optical system includes two imaging lens systems arranged in parallel, and two diaphragms arranged in the imaging lens systems, respectively. At least one of the diaphragms is decentered with respect to an optical axis to adjust the stereo base. Further, a condition (1.8≦SBmax/(fT×tan(ωT))≦45, where SBmax is a maximum value of the stereo base, fT is a focal length of the optical system at a telephoto limit, and ωT is a half view angle (°) at the telephoto limit) is satisfied.
摘要翻译：提供了具有调整立体声基座的立体成像光学系统，包括立体成像光学系统的成像装置和包括成像装置的照相机。立体成像光学系统包括并排布置的两个成像透镜系统和分别布置在成像透镜系统中的两个光阑。至少一个隔膜相对于光轴偏心以调节立体声基座。此外，条件（1.8＆nlE; SBmax /（fT×tan（ωT））＆nlE; 45，其中SBmax是立体声基座的最大值，fT是光学系统在远摄极限处的焦距，ωT是满足望远极限的半视角（°）。

8. 发明授权

US08137785B2 Honeycomb structure 有权
标题翻译：蜂窝结构
公开(公告)号：US08137785B2
公开(公告)日：2012-03-20
申请号：US12405682
申请日：2009-03-17
申请人： Shinji Yamaguchi
发明人： Shinji Yamaguchi
IPC分类号： B32B3/12 , B01D39/06 , B01D45/00 , B01D45/12
CPC分类号： F01N3/0222 , B01J35/04 , F01N13/008 , F01N2330/30 , Y02T10/20 , Y10T428/24149
摘要： Provided is a honeycomb structure that is divided by a porous partition wall 3, as well as that is formed of a plurality of cells 5 acting as a through channel of a fluid. An insertion hole 9 in which a sensor can be inserted is formed in an end face of the honeycomb structure, and a breakage prevention means 17 is provided on an inner circumference or in the proximity of the insertion hole. According to this honeycomb structure, it is possible to provide a honeycomb structure or a honeycomb filter in which a temperature, an oxygen concentration and the like of the honeycomb structure can be directly measured; a temperature control of the honeycomb structure, being a base member can be easily made, and various sensors in accordance with applications of OBD measurement, measurement of an oxygen concentration, an NOx concentration and the like can be attached; and further, canning is easy to be conducted, and the durability of various attached sensors can be improved. Especially in the case of the use in a DPF, the present invention can be preferably used without soot leakage.
摘要翻译：提供了由多孔分隔壁3分割的蜂窝结构体，以及由作为流体的通道的多个单元5形成的蜂窝结构体。在蜂窝结构体的端面形成有可插入传感器的插入孔9，并且在内周或插入孔附近设置有防破坏装置17。根据该蜂窝结构体，能够提供能够直接测定蜂窝结构体的温度，氧浓度等的蜂窝结构体或蜂窝过滤器，可以容易地制造作为基材的蜂窝结构体的温度控制，并且可以安装根据OBD测量的应用，氧浓度的测量，NOx浓度等的各种传感器; 此外，容易进行罐装，并且可以提高各种附接的传感器的耐久性。特别是在DPF中使用的情况下，优选使用本发明，而不会发生煤烟泄漏。

9. 发明授权

US08121387B2 Mask pattern verifying method 有权
标题翻译：掩模图案验证方法
公开(公告)号：US08121387B2
公开(公告)日：2012-02-21
申请号：US12052066
申请日：2008-03-20
申请人： Mitsuyo Asano , Shinji Yamaguchi , Satoshi Tanaka , Soichi Inoue , Masamitsu Itoh , Osamu Ikenaga
发明人： Mitsuyo Asano , Shinji Yamaguchi , Satoshi Tanaka , Soichi Inoue , Masamitsu Itoh , Osamu Ikenaga
IPC分类号： G06Q10/00
CPC分类号： G06T7/001 , G03F1/86 , G06T2207/10056 , G06T2207/30148
摘要： A mask pattern verifying method include obtaining first information about a hot spot from design data of a mask pattern, obtaining second information about the mask pattern actually formed on a photo mask, and determining a measuring spot of the mask pattern actually formed on the photo mask, based on the first and second information.
摘要翻译：掩模图案验证方法包括从掩模图案的设计数据获得关于热点的第一信息，获得关于实际形成在光掩模上的掩模图案的第二信息，以及确定实际形成在光掩模上的掩模图案的测量点基于第一和第二信息。

10. 发明授权

US07952812B2 Zoom lens system, imaging device and camera 有权
公开(公告)号：US07952812B2
公开(公告)日：2011-05-31
申请号：US12639725
申请日：2009-12-16
申请人： Takakazu Bito , Keiki Yoshitsugu , Shinji Yamaguchi
发明人： Takakazu Bito , Keiki Yoshitsugu , Shinji Yamaguchi
IPC分类号： G02B15/14 , H04N5/262
CPC分类号： G02B15/173
摘要： An object is to provide: a zoom lens system that has a reduced overall length, a high resolution, and a variable magnification ratio as high as 9 or greater and that is satisfactorily adaptable for wide-angle image taking where the view angle at a wide-angle limit is 70° or greater; an imaging device employing this zoom lens system; and a thin and compact camera. The zoom lens system has a plurality of lens units each consisting of at least one lens element, and, in order from the object side to the image side, comprises a first lens unit having positive optical power, a second lens unit having negative optical power, a third lens unit having positive optical power, a fourth lens unit and a fifth lens unit. In zooming from a wide-angle limit to a telephoto limit at the time of image taking, at least the first lens unit and the second lens unit move in an optical axis direction, while the fourth lens unit and the fifth lens unit are each consists of one lens element. An imaging device and a camera employ this zoom lens system.

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