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    • 1. 发明授权
    • Semiconductor laser and light-sensing device using the same
    • 半导体激光器和光传感器件使用相同
    • US5623509A
    • 1997-04-22
    • US395886
    • 1995-02-28
    • Hideaki IwanoOsamu YokoyamaHiroaki Nomura
    • Hideaki IwanoOsamu YokoyamaHiroaki Nomura
    • H01S3/00H01S5/00H01S5/028H01S5/20H01S5/343H01S3/19
    • B82Y20/00H01S3/005H01S5/20H01S5/34313H01S2301/18H01S5/005H01S5/02H01S5/028H01S5/2004H01S5/3432
    • A semiconductor laser comprises AlGaAs-type semiconductor layers deposited on a substrate and a current constriction layer having at least one stripe-shaped current injection region. This semiconductor layers comprise: a first cladding layer of the first conductivity type, a first optical waveguide layer of the first conductivity type formed on the first cladding layer, an active layer formed on the first optical waveguide layer and having a quantum-well structure, a second optical waveguide layer of a second conductivity type formed on the active layer, a second cladding layer of the second conductivity type formed on the second optical waveguide layer, and a contact layer formed on the second cladding layer. The active layer has flatness of such a degree that roughness with respect to a reference surface within a unit area of 1 mm.times.1 mm is no more than .+-.0.1 .mu.m, the width of the current injection region of the current constriction layer is between 100 .mu.m to 250 .mu.m, and the resonator length is between 500 .mu.m to 1,000 .mu.m.
    • 半导体激光器包括沉积在基板上的AlGaAs型半导体层和具有至少一个条形电流注入区域的电流收缩层。 该半导体层包括:第一导电类型的第一包层,形成在第一包层上的第一导电类型的第一光波导层,形成在第一光波导层上并具有量子阱结构的有源层, 形成在有源层上的第二导电类型的第二光波导层,形成在第二光波导层上的第二导电类型的第二覆层,以及形成在第二覆层上的接触层。 有源层具有平坦度,使得在1mm×1mm的单位面积内相对于基准面的粗糙度不大于+/-0.1μm,电流收缩层的电流注入区域的宽度在 100〜250μm,谐振器长度在500〜1000μm之间。
    • 4. 发明授权
    • Method of making surface emission type semiconductor laser
    • 制造表面发射型半导体激光器的方法
    • US5587335A
    • 1996-12-24
    • US501660
    • 1995-07-12
    • Katsumi MoriTatsuya AsakaHideaki IwanoTakayuki Kondo
    • Katsumi MoriTatsuya AsakaHideaki IwanoTakayuki Kondo
    • H01L33/00H01S5/183H01S5/42H01L21/20
    • H01S5/18369H01L33/0062H01S5/423H01S2301/166H01S2301/18H01S5/18308H01S5/18338H01S5/18341H01S5/18394H01S5/2211H01S5/2224H01S5/4068
    • In order to manufacture a surface emission type semiconductor laser, a plurality of semiconductor layers including a multilayered semiconductor mirror, a cladding layer, an active layer and other layers are sequentially formed on a substrate through the organic metal vapor growth method. A photoresist mask is then formed on the semiconductor layers. At least the cladding layer in the semiconductor layers is anisotropically etched by the use of the photoresist mask. At least one column-like portion is thus formed to have sidewalls extending perpendicular to the substrate and to guide the light in a direction perpendicular to the substrate. Thereafter, a buried layer including a single layer formed therein at an area covering at least the sidewalls of the column-like portion is formed around the column-like portion. A multilayered dielectric mirror is deposited in the column-like portion on the light exit end thereof. The multilayered dielectric mirror is disposed at the light exit port of a light exit side electrode. To increase the reflectivity below the light exit side electrode, a multilayered semiconductor mirror may be formed in the column-like portion at a position nearer the light exit side than the cladding layer.
    • 为了制造表面发射型半导体激光器,通过有机金属蒸气生长法在衬底上依次形成包括多层半导体镜,包层,有源层等的多个半导体层。 然后在半导体层上形成光致抗蚀剂掩模。 至少通过使用光致抗蚀剂掩模对半导体层中的包覆层进行各向异性蚀刻。 因此,至少一个柱状部分形成为具有垂直于衬底延伸的侧壁并且在垂直于衬底的方向上引导光。 此后,在柱状部分周围形成包括在至少覆盖柱状部分的侧壁的区域上形成的单层的埋层。 在其出射端的柱状部分中沉积多层电介质镜。 多层电介质反射镜设置在光出射侧电极的光出射口。 为了增加光出射侧电极之下的反射率,可以在比包层更靠近光出射侧的位置的柱状部分中形成多层半导体镜。
    • 7. 发明授权
    • Method of anisotropic dry etching of thin film semiconductors
    • 薄膜半导体的各向异性干蚀刻方法
    • US5194119A
    • 1993-03-16
    • US485058
    • 1990-02-22
    • Hideaki IwanoTetsuya Seki
    • Hideaki IwanoTetsuya Seki
    • H01L21/465H01L21/467
    • H01L21/465H01L21/467
    • A microwave ECR plasma etching method and apparatus employs a combination reactive gas medium supplied to a microwave excitation ECR plasma chamber coupled to a treatment chamber containing a Group II-VI sample to be etched. A reactive gas plasma is formed containing reactive species in the plasma chamber and the Group II-VI sample is irradiated with a beam of reactive species formed from the reactive gas plasma. The reactive gas medium is selected from the group consisting of a hydrogen halogenate, a mixture of a halogen gas and an inert gas, a mixture of a halogen gas and hydrogen gas, a mixture of a halogen gas, an inert gas and hydrogen gas, and a mixture of a halogen gas and nitrogen gas.
    • 微波ECR等离子体蚀刻方法和装置采用提供给微波激发ECR等离子体室的组合反应气体介质,该等离子体室与含有要蚀刻的II-VI族样品的处理室相连。 在等离子体室中形成含有反应性物质的反应气体等离子体,并且使用由反应性气体等离子体形成的反应物质束照射II-VI族样品。 反应性气体介质选自卤化氢,卤素气体和惰性气体的混合物,卤素气体和氢气的混合物,卤素气体,惰性气体和氢气的混合物, 以及卤素气体和氮气的混合物。
    • 10. 发明授权
    • Electrophotographic sensitive member with amorphous Si barrier layer
    • 具有非晶Si阻挡层的电子照相敏感元件
    • US4675264A
    • 1987-06-23
    • US885923
    • 1986-07-15
    • Takao KawamuraHideaki IwanoNaooki MiyamotoYasuo Nishiguchi
    • Takao KawamuraHideaki IwanoNaooki MiyamotoYasuo Nishiguchi
    • G03G5/082G03G5/14
    • G03G5/08242
    • The invention relates to improvements in an electrophotographic sensitive member having a photoconductive layer formed with amorphous silicon produced by glow discharge decomposition or sputtering. An electrophotographic sensitive member is formed by laminating an amorphous silicon barrier layer and an amorphous photoconductive layer successively on an electrically conductive substrate, the first mentioned layer containing an impurity of Group IIIa of Periodic Table of Elements, or nitrogen and impurity of Group IIIa of same Table, and also containing oxygen within a range of 0.1 to 20.0 atomic % at the point of the layer and in a progressively decreasing pattern throughout the rest thereof. Constructed as such, the photosensitive member has an increased photosensitivity to near-infrared beams, a large charge-holding capability, and low-rate dark attenuation characteristics. In addition, it is less expensive to manufacture.
    • 本发明涉及具有由辉光放电分解或溅射产生的非晶硅形成的光电导层的电子照相敏感元件的改进。 通过在导电性基板上依次层叠非晶硅阻隔层和非晶质光电导层而形成电子照相感光体,所述第一层含有元素周期表IIIa族的杂质,或含有相同的IIIa族的氮和杂质 表中,并且在该层的点处还含有0.1至20.0原子%范围内的氧,并且在其余部分中以逐渐递减的图案含有氧。 因此,感光构件对近红外光束具有增加的光敏性,大的电荷保持能力和低速率暗衰减特性。 此外,制造成本较低。