会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Method of making surface emission type semiconductor laser
    • 制造表面发射型半导体激光器的方法
    • US5587335A
    • 1996-12-24
    • US501660
    • 1995-07-12
    • Katsumi MoriTatsuya AsakaHideaki IwanoTakayuki Kondo
    • Katsumi MoriTatsuya AsakaHideaki IwanoTakayuki Kondo
    • H01L33/00H01S5/183H01S5/42H01L21/20
    • H01S5/18369H01L33/0062H01S5/423H01S2301/166H01S2301/18H01S5/18308H01S5/18338H01S5/18341H01S5/18394H01S5/2211H01S5/2224H01S5/4068
    • In order to manufacture a surface emission type semiconductor laser, a plurality of semiconductor layers including a multilayered semiconductor mirror, a cladding layer, an active layer and other layers are sequentially formed on a substrate through the organic metal vapor growth method. A photoresist mask is then formed on the semiconductor layers. At least the cladding layer in the semiconductor layers is anisotropically etched by the use of the photoresist mask. At least one column-like portion is thus formed to have sidewalls extending perpendicular to the substrate and to guide the light in a direction perpendicular to the substrate. Thereafter, a buried layer including a single layer formed therein at an area covering at least the sidewalls of the column-like portion is formed around the column-like portion. A multilayered dielectric mirror is deposited in the column-like portion on the light exit end thereof. The multilayered dielectric mirror is disposed at the light exit port of a light exit side electrode. To increase the reflectivity below the light exit side electrode, a multilayered semiconductor mirror may be formed in the column-like portion at a position nearer the light exit side than the cladding layer.
    • 为了制造表面发射型半导体激光器,通过有机金属蒸气生长法在衬底上依次形成包括多层半导体镜,包层,有源层等的多个半导体层。 然后在半导体层上形成光致抗蚀剂掩模。 至少通过使用光致抗蚀剂掩模对半导体层中的包覆层进行各向异性蚀刻。 因此,至少一个柱状部分形成为具有垂直于衬底延伸的侧壁并且在垂直于衬底的方向上引导光。 此后,在柱状部分周围形成包括在至少覆盖柱状部分的侧壁的区域上形成的单层的埋层。 在其出射端的柱状部分中沉积多层电介质镜。 多层电介质反射镜设置在光出射侧电极的光出射口。 为了增加光出射侧电极之下的反射率,可以在比包层更靠近光出射侧的位置的柱状部分中形成多层半导体镜。
    • 6. 发明授权
    • Surface emission type semiconductor laser
    • 表面发射型半导体激光器
    • US5404369A
    • 1995-04-04
    • US228491
    • 1994-04-15
    • Katsumi MoriTatsuya AsakaHideaki IwanoTakayuki Kondo
    • Katsumi MoriTatsuya AsakaHideaki IwanoTakayuki Kondo
    • H01L33/00H01S5/183H01S5/42H01S3/19
    • H01S5/18369H01L33/0062H01S5/423H01S5/18308H01S5/18341H01S5/1835H01S5/18355H01S5/18394H01S5/2211H01S5/2224H01S5/4068
    • A surface emission type semiconductor laser includes a plurality of semiconductor layers defining at least one resonator in a direction perpendicular to the semiconductor substrate of the laser, the layers including at least a cladding layer in the semiconductor layers being formed into at least one column-like portion extending in a direction perpendicular to the semiconductor substrate, and a II-VI group compound semiconductor epitaxial layer buried around the column-like portions. "Lattice mismatch ratio" between the II-VI group compound semiconductor epitaxial layer and the column-like portions is no more than 0.2%, or more preferably no more than 0.16%. The II-VI group compound semiconductor layer is formed from an adduct consisting of II group organometallic compound and VI group organometallic compound and a VI group hydride by the use of a chemical vapor deposition. If a plurality of column-like portions are to be formed by a separation groove, these column-like portions are separated from one another, the II-VI group compound semiconductor epitaxial layer being buried in the separation groove.
    • 表面发射型半导体激光器包括在与激光器的半导体衬底垂直的方向上限定至少一个谐振器的多个半导体层,所述至少一层半导体层中的包层被形成为至少一个柱状 在垂直于半导体衬底的方向上延伸的部分,以及围绕柱状部分埋设的II-VI族化合物半导体外延层。 II-VI族化合物半导体外延层和柱状部分之间的“晶格失配比”不超过0.2%,更优选不大于0.16%。 II-VI族化合物半导体层通过使用化学气相沉积由II族有机金属化合物和VI族有机金属化合物和VI族氢化物组成的加合物形成。 如果由分离槽形成多个柱状部分,则这些柱状部分彼此分离,将II-VI族化合物半导体外延层埋入分离槽中。
    • 7. 发明授权
    • Surface emitting semiconductor laser and method of manufacture
    • 表面发射半导体激光器及其制造方法
    • US5375133A
    • 1994-12-20
    • US206104
    • 1994-03-03
    • Katsumi MoriTatsuya AsakaHideaki Iwano
    • Katsumi MoriTatsuya AsakaHideaki Iwano
    • H01S5/028H01S5/183H01S5/22H01S3/19H01L21/00
    • H01S5/18308H01S5/0281H01S5/18369H01S2304/04H01S5/18341H01S5/2068H01S5/2211H01S5/2224H01S5/4068H01S5/423
    • A surface emitting semiconductor laser is provided with at least reflection mirrors on the substrate side composed of a first layer that is made of a Group III-V compound semiconductor and a second layer that is made of a Group III-V compound semiconductor with an energy bandgap that is larger than that of the first layer. The first and second layers are alternately stacked. The semiconductor laser is also composed of a distributive reflection multiple layer mirror that has an interface region between first and second layers having a carrier concentration that is higher than that of other regions. As a result, the multiple layer band structure of the distributive reflection mirror has been improved, current easily flows vertically through the multiple layers and the element resistance is low. In addition, a simple and reliable method is employed to fabricate the distributive reflection mirror because the doping concentration is controlled through dopant gas flow control or is controlled through light exposure.
    • 表面发射半导体激光器在基板侧至少设置反射镜,该反射镜由由III-V族化合物半导体制成的第一层和由具有能量的III-V族化合物半导体制成的第二层 带隙大于第一层的带隙。 第一层和第二层交替堆叠。 半导体激光器还由分布式反射多层反射镜构成,其具有第一和第二层之间的界面区域,其载流子浓度高于其它区域的载流子浓度。 结果,分布式反射镜的多层带结构得到改善,电流容易沿着多层垂直流动,元件电阻低。 另外,采用简单可靠的方法制造分布式反射镜,因为掺杂浓度通过掺杂剂气体流量控制来控制或通过曝光来控制。
    • 9. 发明授权
    • Surface emitting semiconductor laser and its manufacturing process
    • 表面发射半导体激光器及其制造工艺
    • US5625637A
    • 1997-04-29
    • US359964
    • 1994-12-19
    • Katsumi MoriTatsuya AsakaHideaki Iwano
    • Katsumi MoriTatsuya AsakaHideaki Iwano
    • H01S5/028H01S5/183H01S5/22H01S3/19
    • H01S5/18369H01S2304/04H01S5/18308H01S5/18341H01S5/2211H01S5/2224
    • A surface emitting semiconductor laser, with a resonator cavity transverse to the planar extent of the deposited layers, is provided with a first reflection mirror on the substrate side composed of alternating layers comprising a first layer that is made of a Group III-V compound semiconductor and a second layer that is made of a Group III-V compound semiconductor with an energy bandgap that is larger than that of the first layer. A second reflection mirror is provided at the opposite end of the cavity adjacent to a column like resonator portion. At least the first reflection mirror comprises a distributive Bragg reflection (DBR) multiple layer mirror that has an interface region between first and second layers having a carrier concentration that is higher than that of other regions. The column like resonator portion is surrounded by a buried layer which may consist of two layers, the first layer functioning as barrier layer and the second layer functioning as a flattening layer. The first layer may be comprised of a silicon compound and the second layer may be comprised of SOG or a resin compound. The multiple layer band structure of the DBR mirror is improved, current easily flows vertically through the multiple layers and the element resistance is low. In addition, a simple and reliable method is employed to fabricate the DBR mirror and the dual buried layer, respectively, because the doping concentration is controlled through dopant gas flow control or is controlled through light and can be easily accomplished without using comparatively high temperature processing.
    • 具有横向于沉积层的平面范围的谐振腔的表面发射半导体激光器在基板侧上设置有由交替层组成的第一反射镜,该交替层包括由III-V族化合物半导体 以及由具有比第一层的能带隙大的能带隙的III-V族化合物半导体制成的第二层。 第二反射镜设置在与柱状谐振器部分相邻的腔的相对端。 至少第一反射镜包括分布布拉格反射(DBR)多层反射镜,其在第一和第二层之间具有高于其它区域的载流子浓度的界面区域。 柱状谐振器部分被埋入层包围,该掩埋层可以由两层组成,第一层用作阻挡层,第二层用作平坦化层。 第一层可以由硅化合物组成,第二层可以由SOG或树脂化合物构成。 DBR镜的多层带结构得到改善,电流容易垂直流过多层,元件电阻较低。 另外,采用简单可靠的方法来制造DBR镜和双埋层,因为掺杂浓度通过掺杂剂气体流量控制来控制或通过光控制并且可以容易地实现而不使用比较高的温度处理 。
    • 10. 发明授权
    • Surface emission type semiconductor laser
    • 表面发射型半导体激光器
    • US5537666A
    • 1996-07-16
    • US319650
    • 1994-10-07
    • Katsumi MoriTatsuya AsakaHideaki IwanoTakayuki Kondo
    • Katsumi MoriTatsuya AsakaHideaki IwanoTakayuki Kondo
    • H01L33/00H01S5/183H01S5/42H01S3/19
    • H01S5/18369H01L33/0062H01S5/423H01S2301/166H01S2301/18H01S5/18308H01S5/18338H01S5/18341H01S5/18394H01S5/2211H01S5/2224H01S5/4068
    • In order to manufacture a surface emission type semiconductor laser, a plurality of semiconductor layers including a multilayered semiconductor mirror, a cladding layer, an active layer and other layers are sequentially formed on a substrate through the organic metal vapor growth method. A photoresist mask is then formed on the semiconductor layers. At least the cladding layer in the semiconductor layers is anisotropically etched by the use of the photoresist mask. At least one column-like portion is thus formed to have sidewalls extending perpendicular to the substrate and to guide the light in a direction perpendicular to the substrate. Thereafter, a buried layer including a single layer formed therein at an area covering at least the sidewalls of the column-like portion is formed around the column-like portion. A multilayered dielectric mirror is deposited in the column-like portion on the light exit end thereof. The multilayered dielectric mirror is disposed at the light exit port of a light exit side electrode. To increase the reflectivity below the light exit side electrode, a multilayered semiconductor mirror may be formed in the column-like portion at a position nearer the light exit side than the cladding layer.
    • 为了制造表面发射型半导体激光器,通过有机金属蒸气生长法在衬底上依次形成包括多层半导体镜,包层,有源层等的多个半导体层。 然后在半导体层上形成光致抗蚀剂掩模。 至少通过使用光致抗蚀剂掩模对半导体层中的包覆层进行各向异性蚀刻。 因此,至少一个柱状部分形成为具有垂直于衬底延伸的侧壁并且在垂直于衬底的方向上引导光。 此后,在柱状部分周围形成包括在至少覆盖柱状部分的侧壁的区域上形成的单层的埋层。 在其出射端的柱状部分中沉积多层电介质镜。 多层电介质反射镜设置在光出射侧电极的光出射口。 为了增加光出射侧电极之下的反射率,可以在比包层更靠近光出射侧的位置的柱状部分中形成多层半导体镜。