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1. 发明授权

US07684125B2 Diaphragm changing device 有权
标题翻译：隔膜更换装置
公开(公告)号：US07684125B2
公开(公告)日：2010-03-23
申请号：US10595583
申请日：2003-12-18
申请人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bum Patrick Kwan , Michael Muehlbeyer
发明人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bum Patrick Kwan , Michael Muehlbeyer
IPC分类号： G02B9/00
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。

2. 发明申请

US20100134777A1 DIAPHRAGM CHANGING DEVICE 有权
标题翻译：膜片改变装置
公开(公告)号：US20100134777A1
公开(公告)日：2010-06-03
申请号：US12700351
申请日：2010-02-04
申请人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
发明人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
IPC分类号： G03B27/72 , G02B26/02 , G02B17/06
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。

3. 发明申请

US20120075611A1 DIAPHRAGM CHANGING DEVICE 审中-公开
标题翻译：膜片改变装置
公开(公告)号：US20120075611A1
公开(公告)日：2012-03-29
申请号：US13307550
申请日：2011-11-30
申请人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
发明人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。

4. 发明授权

US08089707B2 Diaphragm changing device 有权
标题翻译：隔膜更换装置
公开(公告)号：US08089707B2
公开(公告)日：2012-01-03
申请号：US12700351
申请日：2010-02-04
申请人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Patrick Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muehlbeyer
发明人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Patrick Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muehlbeyer
IPC分类号： G02B9/00
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。

5. 发明申请

US20070053076A1 Diaphragm changing device 有权
标题翻译：隔膜更换装置
公开(公告)号：US20070053076A1
公开(公告)日：2007-03-08
申请号：US10595583
申请日：2003-12-18
申请人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muhlbeyer
发明人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muhlbeyer
IPC分类号： G02B9/00
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入到光束路径2中。

6. 发明授权

US08009343B2 Optical imaging device having at least one system diaphragm 有权
标题翻译：具有至少一个系统隔膜的光学成像装置
公开(公告)号：US08009343B2
公开(公告)日：2011-08-30
申请号：US10566196
申请日：2004-07-02
申请人： Bernhard Gellrich , Thomas Bischoff , Hermann Bieg , Martin Huber , Francois Henzelin , Gerhard Szekely , Uy-Liem Nguyen , Martin E. Humphries
发明人： Bernhard Gellrich , Thomas Bischoff , Hermann Bieg , Martin Huber , Francois Henzelin , Gerhard Szekely , Uy-Liem Nguyen , Martin E. Humphries
IPC分类号： G02B27/72
CPC分类号： G03F7/70091 , G02B5/005 , G03F7/7025
摘要： An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.
摘要翻译：具有至少一个系统隔膜的光学成像装置（PL），特别是用于半导体光刻的物镜。系统隔膜包括可旋转地安装的多个移动板。板具有球形曲率。

7. 发明申请

US20090021820A1 Optical Imaging Device Having At Least One System Diaphragm 有权
标题翻译：具有至少一个系统隔膜的光学成像装置
公开(公告)号：US20090021820A1
公开(公告)日：2009-01-22
申请号：US10566196
申请日：2004-07-02
申请人： Bernhard Gellrich , Thomas Bischoff , Hermann Bieg , Martin Huber , Francois Henzelin , Gerhard Szekely , Uy-Liem Nguyen , Martin E. Humphries
发明人： Bernhard Gellrich , Thomas Bischoff , Hermann Bieg , Martin Huber , Francois Henzelin , Gerhard Szekely , Uy-Liem Nguyen , Martin E. Humphries
IPC分类号： G02B26/02
CPC分类号： G03F7/70091 , G02B5/005 , G03F7/7025
摘要： An optical imaging device (PL), in particular an objective for semiconductor lithography, is provided with at least one system diaphragm. The system diaphragm comprises a multiplicity of mobile plates, which are rotatably mounted. The plates have a spherical curvature.
摘要翻译：具有至少一个系统隔膜的光学成像装置（PL），特别是用于半导体光刻的物镜。系统隔膜包括可旋转地安装的多个移动板。板具有球形曲率。

8. 发明授权

US06445510B1 Optical imaging device, in particular lens system, with at least one system diaphragm 有权
标题翻译：光学成像装置，特别是透镜系统，具有至少一个系统隔膜
公开(公告)号：US06445510B1
公开(公告)日：2002-09-03
申请号：US09678715
申请日：2000-10-04
申请人： Karlheinz Schuster , Thomas Bischoff , Bernhard Gellrich , Michael Muehlbeyer , Guenter Maul
发明人： Karlheinz Schuster , Thomas Bischoff , Bernhard Gellrich , Michael Muehlbeyer , Guenter Maul
IPC分类号： G02B900
CPC分类号： G03F7/7025 , G02B5/005
摘要： An optical imaging device, in particular a lens system, has a system diaphragm (1). An aperture of the system diaphragm (1) is adjustable in its opening diameter (D). The axial position of the aperture of the system diaphragm (1) with respect to the optical axis (4) of the system diaphragm (1) is fixed in dependence on the opening diameter (D) of the system diaphragm (1).
摘要翻译：光学成像装置，特别是透镜系统，具有系统隔膜（1）。系统隔膜（1）的孔径可以在其开口直径（D）上调节。系统隔膜（1）的孔径相对于系统隔膜（1）的光轴（4）的轴向位置根据系统隔膜（1）的开口直径（D）固定。

9. 发明授权

US09329499B2 Support for a component of an optical device including a locking device 有权
标题翻译：支持包括锁定装置的光学装置的部件
公开(公告)号：US09329499B2
公开(公告)日：2016-05-03
申请号：US12569262
申请日：2009-09-29
申请人： Thomas Bischoff , Joachim Feucht , Jochen Wieland , Stefan Mueller
发明人： Thomas Bischoff , Joachim Feucht , Jochen Wieland , Stefan Mueller
IPC分类号： G03F7/20 , G02B7/02
CPC分类号： G03F7/7015 , G02B7/025 , G03F7/70141 , G03F7/70258 , G03F7/70825
摘要： The disclosure provides an arrangement for an optical device including a component of the optical device and a support structure supporting the component. The support structure includes at least one locking device connected to the component and including a first fixation device and an associated second fixation device. The first fixation device and the second fixation device are adapted to be, in a movable state, movable with respect to each other along a first degree of freedom and a second degree of freedom into a final position. The first fixation device and the second fixation device are further adapted to be, in a locked state, fixed in the final position by at least one locking device contacting the first fixation device and the second fixation device. In the movable state, the first fixation device and the second fixation device are movable, up to the final position, in a manner free from a mutual pre-stress resulting from a restoring force exerted by at least a part of one of the first fixation device and the second fixation device.
摘要翻译：本公开提供了一种用于包括光学装置的部件和支撑部件的支撑结构的光学装置的布置。支撑结构包括连接到部件的至少一个锁定装置，并且包括第一固定装置和相关联的第二固定装置。第一固定装置和第二固定装置适于处于可移动状态，其可以相对于彼此沿着第一自由度和第二自由度移动到最终位置。第一固定装置和第二固定装置进一步适于处于锁定状态，并通过接触第一固定装置和第二固定装置的至少一个锁定装置固定在最终位置。在可动状态下，第一固定装置和第二固定装置可以以不受由第一固定件中的一个的至少一部分施加的恢复力产生的相互预应力的方式移动到最终位置装置和第二固定装置。

10. 发明申请

US20100079737A1 SUPPORT FOR A COMPONENT OF AN OPTICAL DEVICE 有权
标题翻译：支持光学设备的组件
公开(公告)号：US20100079737A1
公开(公告)日：2010-04-01
申请号：US12569262
申请日：2009-09-29
申请人： Thomas Bischoff , Joachim Feucht , Jochen Wieland , Stefan Mueller
发明人： Thomas Bischoff , Joachim Feucht , Jochen Wieland , Stefan Mueller
IPC分类号： G03B27/54 , G03B27/00
CPC分类号： G03F7/7015 , G02B7/025 , G03F7/70141 , G03F7/70258 , G03F7/70825
摘要： The disclosure provides an arrangement for an optical device including a component of the optical device and a support structure supporting the component. The support structure includes at least one locking device connected to the component and including a first fixation device and an associated second fixation device. The first fixation device and the second fixation device are adapted to be, in a movable state, movable with respect to each other along a first degree of freedom and a second degree of freedom into a final position. The first fixation device and the second fixation device are further adapted to be, in a locked state, fixed in the final position by at least one locking device contacting the first fixation device and the second fixation device. In the movable state, the first fixation device and the second fixation device are movable, up to the final position, in a manner free from a mutual pre-stress resulting from a restoring force exerted by at least a part of one of the first fixation device and the second fixation device.
摘要翻译：本公开提供了一种用于包括光学装置的部件和支撑部件的支撑结构的光学装置的布置。支撑结构包括连接到部件的至少一个锁定装置，并且包括第一固定装置和相关联的第二固定装置。第一固定装置和第二固定装置适于处于可移动状态，其可以相对于彼此沿着第一自由度和第二自由度移动到最终位置。第一固定装置和第二固定装置进一步适于处于锁定状态，并通过接触第一固定装置和第二固定装置的至少一个锁定装置固定在最终位置。在可动状态下，第一固定装置和第二固定装置可以以不受由第一固定件中的一个的至少一部分施加的恢复力产生的相互预应力的方式移动到最终位置装置和第二固定装置。

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