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1. 发明授权

US07684125B2 Diaphragm changing device 有权
标题翻译：隔膜更换装置
公开(公告)号：US07684125B2
公开(公告)日：2010-03-23
申请号：US10595583
申请日：2003-12-18
申请人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bum Patrick Kwan , Michael Muehlbeyer
发明人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bum Patrick Kwan , Michael Muehlbeyer
IPC分类号： G02B9/00
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。

2. 发明申请

US20100134777A1 DIAPHRAGM CHANGING DEVICE 有权
标题翻译：膜片改变装置
公开(公告)号：US20100134777A1
公开(公告)日：2010-06-03
申请号：US12700351
申请日：2010-02-04
申请人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
发明人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
IPC分类号： G03B27/72 , G02B26/02 , G02B17/06
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。

3. 发明授权

US08089707B2 Diaphragm changing device 有权
标题翻译：隔膜更换装置
公开(公告)号：US08089707B2
公开(公告)日：2012-01-03
申请号：US12700351
申请日：2010-02-04
申请人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Patrick Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muehlbeyer
发明人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Patrick Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muehlbeyer
IPC分类号： G02B9/00
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。

4. 发明申请

US20120075611A1 DIAPHRAGM CHANGING DEVICE 审中-公开
标题翻译：膜片改变装置
公开(公告)号：US20120075611A1
公开(公告)日：2012-03-29
申请号：US13307550
申请日：2011-11-30
申请人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
发明人： Hermann Bieg , Thomas Bischoff , Uy-Liem Nguyen , Stefan Xalter , Marcus Will , Yim-Bun Patrick Kwan , Michael Muehlbeyer
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入光束路径2。

5. 发明申请

US20070053076A1 Diaphragm changing device 有权
标题翻译：隔膜更换装置
公开(公告)号：US20070053076A1
公开(公告)日：2007-03-08
申请号：US10595583
申请日：2003-12-18
申请人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muhlbeyer
发明人： Hermann Bieg , Marcus Will , Thomas Bischoff , Yim-Bun Kwan , Uy-Liem Nguyen , Stefan Xalter , Michael Muhlbeyer
IPC分类号： G02B9/00
CPC分类号： G03F7/70191 , G02B5/005 , G02B13/143 , G02B17/02 , G03F7/7025 , G03F7/70825 , G21K1/04 , G21K1/067
摘要： The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality of optical elements 3 and a diaphragm device 7 with an adjustable diaphragm opening shape. The diaphragm device has a diaphragm store 7a, 7b with a plurality of different diaphragm openings 6 with fixed shapes in each case, which can be introduced into the beam path 2.
摘要翻译：本发明涉及一种光学成像装置，特别是用于制造半导体元件的EUVL领域的微光刻物镜1，其具有光束路径2，多个光学元件3和具有可调光阑开口形状的光阑装置7。隔膜装置具有隔膜存储器7a，7b，其具有多个不同的隔膜开口6，每个隔膜开口6在每种情况下具有固定的形状，可以将其引入到光束路径2中。

6. 发明授权

US07497720B2 Housing for connection to an electrical line 失效
标题翻译：用于连接到电线的外壳
公开(公告)号：US07497720B2
公开(公告)日：2009-03-03
申请号：US11564103
申请日：2006-11-28
申请人： Hugo Kathan , Thomas Roehm , Marcus Will
发明人： Hugo Kathan , Thomas Roehm , Marcus Will
IPC分类号： H01R4/24
CPC分类号： H01R35/04 , H01R4/2404 , H01R9/2608 , H01R13/516 , H01R13/521 , H01R13/64
摘要： A housing for connection to an electrical line (14), especially a bus line, with at least one first housing part (2a) and one second housing part (2b), with at least one locking system 6 for locking the first housing part (2a) with the second housing part (2b) in a common locking position, whereby a contact device (15) for making electrical contact with the line (14) is assigned to the first housing part (2a) and whereby at least one line bed (16) for guiding the line (14) is formed in the second housing part (2b). The line bed (16) is made—at least partially—in a line bed carrier (17), and the contact device (15) and the line bed carrier (17) can be turned such that the orientation of the line path can be adjusted with respect to the housing (2).
摘要翻译：用于连接到具有至少一个第一壳体部分（2a）和一个第二壳体部分（2b）的电线（14），特别是母线的壳体，具有用于锁定第一壳体部分的至少一个锁定系统6（ 2a），其中第二壳体部分（2b）处于公共锁定位置，由此用于与线（14）电接触的接触装置（15）被分配给第一壳体部分（2a），并且由此至少一个线床在第二壳体部分（2b）中形成用于引导线（14）的导线（16）。线床（16）至少部分地制成在床床载体（17）中，并且接触装置（15）和线床载体（17）可以被转动，使得线路的取向可以是对住房进行调整（2）。

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