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    • 3. 发明授权
    • Band-to-band resonant tunneling transistor
    • 带对带谐振隧道晶体管
    • US5489785A
    • 1996-02-06
    • US209789
    • 1994-03-11
    • Saied N. TehraniJun ShenHerbert GoronkinXiaodong T. Zhu
    • Saied N. TehraniJun ShenHerbert GoronkinXiaodong T. Zhu
    • H01L29/68H01L29/06H01L29/205H01L29/737H01L27/12
    • H01L29/7376B82Y10/00
    • A band-to-band resonant tunneling transistor including GaSb and InAs resonant tunneling layers separated by a thin barrier layer and a second InAs layer separated from the GaSb layer by another thin barrier layer. A terminal on the InAs resonant tunneling layer and a terminal on the second InAs layer. Leakage current reduction layers are positioned on the second InAs layer with a bias terminal positioned thereon. The InAs resonant tunneling layer has a plurality of quantized states which are misaligned with the ground state of the GaSb layer in a quiescent state, each of the quantized states of the InAs resonant tunneling layer are movable into alignment with the ground state of the GaSb layer to provide current flow through the transistor with the application of a specific potential to the terminal on the second InAs layer.
    • 包括GaSb和InAs谐振隧道层的带对带谐振隧穿晶体管,其由薄的阻挡层和由另一个薄的阻挡层与GaSb层分离的第二InAs层隔开。 InAs谐振隧穿层上的一个端子和第二个InAs层上的一个端子。 漏电流减少层位于第二InAs层上,偏置端子位于其上。 InAs谐振隧穿层具有与处于静止状态的GaSb层的基态不对准的多个量化状态,InAs谐振隧穿层的每个量子化状态可移动地与GaSb层的基态对准 以通过向第二InAs层上的端子施加特定电位来提供流过晶体管的电流。
    • 9. 发明授权
    • Bipolar doped semiconductor structure and method for making
    • 双极掺杂半导体结构及其制造方法
    • US5326985A
    • 1994-07-05
    • US951994
    • 1992-09-28
    • Herbert GoronkinJun ShenSaied N. Tehrani
    • Herbert GoronkinJun ShenSaied N. Tehrani
    • H01L29/778H01L29/161H01L29/205
    • H01L29/7783
    • A semiconductor structure that provides both N-type and P-type doping from a single dopant source is provided. A first doping region (13) comprising a first material composition includes holes and electrons in a doping energy level (E.sub.D)- A first undoped spacer region (12) comprising the first material composition covers the doping region (13). An undoped channel (11,14) comprising a second material composition covers the first spacer region (12) and a second undoped spacer region (12) comprising the first material composition covers the undoped channel (11,14). The first material composition has a wider bandgap than the second material composition and the doping energy level (E.sub.D) is selected to provide electrons to the undoped channel (11,14) when the second material composition has a conduction band minimum less than the doping energy level (E.sub.D) and to provide holes to the first undoped channel (11,14) when the second material composition has a valence band maximum greater than the doping energy level (E.sub.D).
    • 提供了从单个掺杂剂源提供N型和P型掺杂的半导体结构。 包括第一材料组合物的第一掺杂区域(13)包括掺杂能级(ED)的空穴和电子 - 包含第一材料组合物的第一未掺杂间隔区域(12)覆盖掺杂区域(13)。 包括第二材料组合物的未掺杂通道(11,14)覆盖第一间隔区域(12),并且包括第一材料组合物的第二未掺杂间隔区域(12)覆盖未掺杂沟道(11,14)。 第一材料组合物具有比第二材料组成更宽的带隙,并且当第二材料组合物具有小于掺杂能量的导带最小值时,选择掺杂能级(ED)以向未掺杂沟道(11,14)提供电子 (ED),并且当第二材料组合物具有大于掺杂能级(ED)的价带最大值时,向第一未掺杂通道(11,14)提供孔。