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1. 发明授权

US07514186B2 System for electrically connecting a mask to earth, a mask 失效
标题翻译：用于将面罩与地面电连接的系统，面罩
公开(公告)号：US07514186B2
公开(公告)日：2009-04-07
申请号：US11167560
申请日：2005-06-28
申请人： Hendricus Johannes Maria Meijer , Uwe Mickan , Marco Le Kluse
发明人： Hendricus Johannes Maria Meijer , Uwe Mickan , Marco Le Kluse
IPC分类号： G03F1/00
CPC分类号： G03F7/70941 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/38 , G03F1/40 , G03F7/707 , G03F7/70708 , G21K2201/06
摘要： A reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle. The reticle is suitable for use with a lithography apparatus whereby the reticle pattern is imaged using extreme ultra violet radiation. One or more conducting pins, held at zero potential, may be pressed against the conductive coating for electrically grounding the reticle either during patterning the reticle by electron beam writing or during use in the lithographic apparatus. The areas coated with the metal-based compounds are wear resistant which reduces the occurrence of particles due to damage caused by mechanical contact between the conducting pins and the conductive coating.
摘要翻译：掩模版包括设置有用于将掩模版电接地的导电金属基复合涂层的区域。掩模版适用于光刻设备，由此使用极紫外辐射对掩模版图案进行成像。保持在零电位的一个或多个导电引脚可以被压靠在导电涂层上，以在通过电子束写入或在光刻设备中的使用期间在掩模版图案化期间将掩模版电接地。涂覆有金属基化合物的区域是耐磨的，其减少由于导电引脚和导电涂层之间的机械接触而引起的损伤的发生。

2. 发明申请

US20110126406A1 Lithographic Apparatus and Method of Manufacturing an Electrostatic Clamp for a Lithographic Apparatus 有权
标题翻译：平版印刷设备和制造用于平版印刷设备的静电夹具的方法
公开(公告)号：US20110126406A1
公开(公告)日：2011-06-02
申请号：US13020399
申请日：2011-02-03
申请人： Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
发明人： Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
IPC分类号： H01B13/00
CPC分类号： H01L21/6831 , G03F7/70708 , Y10T29/49117
摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
摘要翻译：本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

3. 发明授权

US08476167B2 Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus 有权
标题翻译：用于光刻设备的静电夹具的平版印刷设备和方法
公开(公告)号：US08476167B2
公开(公告)日：2013-07-02
申请号：US13020399
申请日：2011-02-03
申请人： Hubert Adriaan Van Mierlo , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
发明人： Hubert Adriaan Van Mierlo , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
IPC分类号： H01L21/311
CPC分类号： H01L21/6831 , G03F7/70708 , Y10T29/49117
摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
摘要翻译：本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

4. 发明授权

US07528935B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US07528935B2
公开(公告)日：2009-05-05
申请号：US11312654
申请日：2005-12-21
申请人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
发明人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
IPC分类号： G03B27/58 , G03B27/62 , H01T23/00
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.
摘要翻译：公开了一种光刻投影装置。该装置包括用于调节辐射束的照明器和物品保持器。物品保持器包括多个突出部，其布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品。这些突起通常在第一距离处等距离间隔开。物品保持器还包括用于将物品夹持到保持器的一对电极。电极设置在突起上方或下方的基本上相同的平面中，并且通过间隙彼此间隔开。位于间隙的相对侧上的多个突起内的相邻突起被间隔开大于第一距离的第二距离。

5. 发明授权

US07960074B2 Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus 有权
标题翻译：产生光刻图案形成装置的方法，计算机程序，图案形成装置，确定基板上或附近的目标图像的位置的方法，测量装置和光刻装置
公开(公告)号：US07960074B2
公开(公告)日：2011-06-14
申请号：US11345629
申请日：2006-02-02
申请人： Uwe Mickan , Hendricus Johannes Maria Meijer
发明人： Uwe Mickan , Hendricus Johannes Maria Meijer
IPC分类号： G03F1/00 , G06F17/50
CPC分类号： G03F7/70433 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70283 , G03F7/70666 , G03F9/7003 , G03F9/7076 , G03F9/7088
摘要： A method of generating a photolithography patterning device for transferring a pattern formed in the patterning device onto a substrate utilizing a lithographic projection apparatus includes defining features within the pattern formed in the device, wherein the features have dimensions and orientations chosen to create a desired image on the substrate during pattern transfer; and adjusting the dimensions of the features to compensate the desired image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A measurement device for determining the position of a target image on or proximate a substrate in a lithographic projection apparatus, wherein the target image is formed by features on a patterning device, includes a detector configured to measure the position of the target image on or proximate the substrate, wherein the detector compensates the measured position of the target image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features of the patterning device during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A lithographic apparatus includes a measurement device.
摘要翻译：使用光刻投影装置产生用于将形成在图案形成装置中的图案转印到基板上的光刻图案形成装置的方法包括限定在所述装置中形成的图案内的特征，其中所述特征具有选择的尺寸和取向以在图案转印时的基板; 并且调整特征的尺寸以补偿在图案转印期间由辐射对特征的有效阴影角度引入的位移和尺寸误差所需的图像，或者与图案转印期间的曝光缝隙内的特征位置相关。一种测量装置，用于在光刻投影设备中确定目标图像在基板上或其附近的位置，其中所述目标图像由图案形成装置上的特征形成，所述测量装置包括检测器，所述检测器被配置为测量所述目标图像在或近似的位置所述基板，其中所述检测器补偿所述目标图像的测量位置，并且通过所述辐射的有效阴影角度在所述图案转印期间对所述图案形成装置的特征引入的尺寸误差或与所述曝光缝隙内的所述特征的位置相关联在图案转移期间。光刻设备包括测量装置。

6. 发明授权

US08208123B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US08208123B2
公开(公告)日：2012-06-26
申请号：US10927531
申请日：2004-08-27
申请人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Tammo Utterdijk
发明人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Matthew Lipson , Tammo Utterdijk
IPC分类号： G03B27/54
CPC分类号： G03F7/70966 , G03F7/70341 , G03F7/70958 , G03F7/70983 , Y10S430/162
摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

7. 发明申请

US20140071420A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20140071420A1
公开(公告)日：2014-03-13
申请号：US13903885
申请日：2013-05-28
申请人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
发明人： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
摘要翻译：公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。还公开了CaF2的双组分最终光学元件。

8. 发明授权

US09152058B2 Lithographic apparatus and device manufacturing method involving a member and a fluid opening 有权
标题翻译：涉及构件和流体开口的平版印刷设备和设备制造方法
公开(公告)号：US09152058B2
公开(公告)日：2015-10-06
申请号：US13194136
申请日：2011-07-29
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolensnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolensnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.
摘要翻译：一种曝光装置，包括可移动工作台，构件，可移动地与工作台分离并且位于工作台的顶表面上，以提供与桌子中或工作台上的物体的顶表面基本共面的表面;投影系统被配置为将辐射束投射到基板的辐射敏感目标部分上，以及液体供应系统，其配置成向投影系统和物体之间的空间提供液体。

9. 发明授权

US08472002B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US08472002B2
公开(公告)日：2013-06-25
申请号：US12698938
申请日：2010-02-02
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

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