专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07361911B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07361911B2
公开(公告)日：2008-04-22
申请号：US11007579
申请日：2004-12-09
申请人： Johannes Hubertus Josephina Moors , Robertus Nicodemus Jacobus Van Ballegoij , Vadim Yevgenyevich Banine , Gert-Jan Heerens , Frederik Theodorus Elisabeth Heuts , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Hendrik Antony Johannes Neerhof
发明人： Johannes Hubertus Josephina Moors , Robertus Nicodemus Jacobus Van Ballegoij , Vadim Yevgenyevich Banine , Gert-Jan Heerens , Frederik Theodorus Elisabeth Heuts , Johannes Henricus Wilhelmus Jacobs , Paulus Martinus Maria Liebregts , Hendrik Antony Johannes Neerhof
IPC分类号： B21D53/84
CPC分类号： G03F7/70916 , G03F7/70883 , G03F7/70908
摘要： A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.
摘要翻译：一种器件制造方法包括将图案化的辐射束投射通过光学隔室和通道，其在光学隔室和衬底隔室之间提供开放的连接到衬底上，保持电离冲洗气体在通道中的压力高于在衬底隔室和在光电隔室中，在用电离冲洗气体从衬底发射的颗粒中突出，截留颗粒时，使用耦合到与至少一个隔室，并且在通道的壁与出口和/或泵的转子之间建立电势差，使得泵的出口和/或转子吸引来自于冲洗气体的带正电荷的离子渠道。

2. 发明授权

US07375353B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07375353B2
公开(公告)日：2008-05-20
申请号：US11224303
申请日：2005-09-13
申请人： Hendrik Antony Johannes Neerhof , Hako Botma , Marius Ravensbergen
发明人： Hendrik Antony Johannes Neerhof , Hako Botma , Marius Ravensbergen
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device is provided to adjust the members in such a manner as to control the attenuation of the patterned radiation beam projected onto a target portion of a substrate across the cross-section of the patterned radiation beam. The attenuation control device includes a detector configured to provide an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the detector after attenuation by the member.
摘要翻译：公开了一种衰减调节装置，其包括多个构件，所述多个构件构造成在照射光刻设备中的图案形成装置的辐射束中浇铸半圆形。此外，提供衰减控制装置以调节构件以控制在图案化的辐射束的横截面上投射到基板的目标部分上的图案化的辐射束的衰减。所述衰减控制装置包括检测器，其被配置为根据检测到由所述构件衰减后到达所述检测器的辐射束的检测来提供指示每个构件的位置的输出。

3. 发明授权

US07187433B2 Electrostatic clamp assembly for a lithographic apparatus 有权
标题翻译：用于光刻设备的静电夹具组件
公开(公告)号：US07187433B2
公开(公告)日：2007-03-06
申请号：US11099650
申请日：2005-04-06
申请人： Joost Jeroen Ottens , Hendrik Antony Johannes Neerhof , Koen Jacobus Johannes Maria Zaal , Marco Le Kluse
发明人： Joost Jeroen Ottens , Hendrik Antony Johannes Neerhof , Koen Jacobus Johannes Maria Zaal , Marco Le Kluse
IPC分类号： G03B27/58 , G03B27/62 , G03B27/42
CPC分类号： H01L21/6831 , G03F7/707 , G03F7/70708
摘要： An electrostatic clamp assembly for a lithographic apparatus is provided. The clamp assembly includes an electrostatic clamp structured to clamp an article against an article support structure during projection of a beam of radiation, and a controller structured to control at least one of the clamp and a backfill gas pressure to release the article from the article support structure by use of the backfill gas pressure.
摘要翻译：提供了一种用于光刻设备的静电夹持组件。夹具组件包括静电夹具，其被构造成在辐射束投影期间将制品夹紧在物品支撑结构上;以及控制器，其被构造成控制夹具和回填气体压力中的至少一个以将物品从物品支撑件结构通过使用回填气压力。

4. 发明申请

US20130070218A1 SYSTEM FOR REMOVING CONTAMINANT PARTICLES, LITHOGRAPHIC APPARATUS, METHOD FOR REMOVING CONTAMINANT PARTICLES AND METHOD FOR MANUFACTURING A DEVICE 审中-公开
标题翻译：用于除去污染物颗粒的系统，光刻设备，去除污染物颗粒的方法和制造设备的方法
公开(公告)号：US20130070218A1
公开(公告)日：2013-03-21
申请号：US13580364
申请日：2011-03-03
申请人： Vladimir Vitalevich Ivanov , Pavel Stanislavovich Antsiferov , Yurii Victorovitch Sidelnikov , Luigi Scaccabarozzi , Hendrik Antony Johannes Neerhof , Andrei Mikhailovich Yakunin , Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Richard Joseph Bruls
发明人： Vladimir Vitalevich Ivanov , Pavel Stanislavovich Antsiferov , Yurii Victorovitch Sidelnikov , Luigi Scaccabarozzi , Hendrik Antony Johannes Neerhof , Andrei Mikhailovich Yakunin , Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Richard Joseph Bruls
IPC分类号： G03B27/52 , C23F1/08
CPC分类号： G03F7/70916
摘要： A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.
摘要翻译：提供了一种用于从EUV辐射束的路径去除污染物颗粒的系统，其中至少第一AC电压被提供给EUV辐射束的路径的相对侧上的一对电极，作为第一级作为电压状态的第二阶段，向电极提供直流电压。

5. 发明申请

US20110126406A1 Lithographic Apparatus and Method of Manufacturing an Electrostatic Clamp for a Lithographic Apparatus 有权
标题翻译：平版印刷设备和制造用于平版印刷设备的静电夹具的方法
公开(公告)号：US20110126406A1
公开(公告)日：2011-06-02
申请号：US13020399
申请日：2011-02-03
申请人： Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
发明人： Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
IPC分类号： H01B13/00
CPC分类号： H01L21/6831 , G03F7/70708 , Y10T29/49117
摘要： The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
摘要翻译：本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。

6. 发明授权

US07119346B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07119346B2
公开(公告)日：2006-10-10
申请号：US10986181
申请日：2004-11-12
申请人： Hendrik Antony Johannes Neerhof , Gert-Jan Heerens
发明人： Hendrik Antony Johannes Neerhof , Gert-Jan Heerens
IPC分类号： A61N5/00
CPC分类号： G03F7/70858 , G03F7/70916 , G03F7/7095 , G03F7/70983
摘要： A lithographic apparatus is provided. The apparatus includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a high voltage conductor in a part of the apparatus that is evacuated or at a low pressure during normal use of the apparatus. The conductor is coated by an isolation layer having a conductivity that is high enough to prevent charge build-up on the outside thereof during use of the apparatus, and low enough to limit peak current flow during a breakdown.
摘要翻译：提供光刻设备。该装置包括用于调节辐射束的照明系统和用于支撑图案形成装置的支撑件。图案形成装置用于使辐射束在其横截面上具有图案。该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及在正常使用期间被抽空或处于低压的装置的一部分中的高压导体的装置。导体由具有足够高的导电性的隔离层涂覆，以防止在使用该装置期间其外部的电荷积聚，并且足够低以限制击穿期间的峰值电流流动。

7. 发明申请

US20060097201A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20060097201A1
公开(公告)日：2006-05-11
申请号：US10970733
申请日：2004-10-22
申请人： Hendrik Antony Johannes Neerhof , Johannes Hubertus Josephina Moors , Joost Jeroen Ottens , Marco Kluse
发明人： Hendrik Antony Johannes Neerhof , Johannes Hubertus Josephina Moors , Joost Jeroen Ottens , Marco Kluse
IPC分类号： G01J3/10
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressure for clamping the article against the article support, and a bias voltage circuit for biasing at least one electrode of the multipolar clamp, such that the occurrence of ridges that appear due to static charges on the article may be circumvented.
摘要翻译：公开了一种光刻设备。该装置包括布置成提供辐射束的照明系统，被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件;多极夹具，其构造成提供用于将物品夹持在物品支撑件以及用于偏置多极夹具的至少一个电极的偏置电压电路，使得可能避免由于在制品上的静电产生而出现的脊的发生。

8. 发明申请

US20110222040A1 RADIATION SOURCE APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF GENERATING AND DELIVERING RADIATION AND METHOD FOR MANUFACTURING A DEVICE 有权
标题翻译：辐射源设备，光刻设备，产生和传送辐射的方法以及用于制造设备的方法
公开(公告)号：US20110222040A1
公开(公告)日：2011-09-15
申请号：US13046303
申请日：2011-03-11
申请人： Jens Arno STEINHOFF , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Erik Roelof LOOPSTRA , Hendrik Antony Johannes NEERHOF , Adrianus Johannes Maria VAN DIJK , Andrei Mikhailovich YAKUNIN , Luigi SCACCABAROZZI
发明人： Jens Arno STEINHOFF , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Erik Roelof LOOPSTRA , Hendrik Antony Johannes NEERHOF , Adrianus Johannes Maria VAN DIJK , Andrei Mikhailovich YAKUNIN , Luigi SCACCABAROZZI
IPC分类号： G03B27/54 , G21K5/00 , G01J3/10
CPC分类号： G03F7/70916 , H05G2/003
摘要： A contaminant trap is used in an EUV radiation source apparatus. An EUV radiation beam is generated and focused through a low pressure gaseous atmosphere into a virtual source point. The EUV radiation creates a plasma in the low pressure hydrogen atmosphere through which it passes. A contaminant trap including electrodes is located in or around radiation beam as it approaches the virtual source point. A DC biasing source is connected to the electrodes to create an electric field oriented to deflect out of the beam path contaminant particles that have been negatively charged by the plasma. Additional RF electrodes and/or an ionizer enhance the plasma to increase the charging of the particles. The deflecting electrodes can be operated with RF bias for a short time, to ensure dissipation of the enhanced plasma.
摘要翻译：在EUV辐射源装置中使用污染物阱。产生EUV辐射束并通过低压气体气氛聚焦成虚拟源点。 EUV辐射在其通过的低压氢气氛中产生等离子体。当辐射束接近虚拟源点时，包括电极的污染物陷阱位于辐射束内或周围。 DC偏置源连接到电极以产生电场，该电场被定向以偏离由等离子体带负电的光束路径污染物颗粒。附加的RF电极和/或电离器增强等离子体以增加颗粒的充电。偏转电极可以用RF偏压短时间操作，以确保增强等离子体的耗散。

9. 发明授权

US08013981B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08013981B2
公开(公告)日：2011-09-06
申请号：US11812091
申请日：2007-06-14
申请人： Hendrik Antony Johannes Neerhof , Cornelis Maria Zwaans , Ernst Eduart Vrolijks
发明人： Hendrik Antony Johannes Neerhof , Cornelis Maria Zwaans , Ernst Eduart Vrolijks
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58 , H01L21/683
CPC分类号： G03F7/7085 , G03F7/70716
摘要： A lithographic apparatus includes a movable table constructed and arranged to transport an object to a position in a beam path in a vacuum chamber, a first capacitor electrode and a second capacitor electrode attached to the table, a first inductor assembly coupled to the capacitor electrodes, and configured to apply a voltage between the first capacitor electrode and the second capacitor electrode, and a second inductor assembly mounted at a position that remains fixed when the table is moved. The second inductor assembly is configured to generate a magnetic field. The presence of the object on the table is detected by applying a voltage on the second inductor assembly which will result in a magnetic field which when picked up by the first inductor assembly will create a magnetic field response in the first inductor assembly dependent on the capacitance of the capacitor electrodes.
摘要翻译：光刻设备包括可移动台，其构造和布置成将物体输送到真空室中的光束路径中的位置，附接到台的第一电容器电极和第二电容器电极，耦合到电容器电极的第一电感器组件，并且被配置为在第一电容器电极和第二电容器电极之间施加电压，以及第二电感器组件，其安装在当桌子移动时保持固定的位置。第二电感器组件被配置为产生磁场。通过在第二电感器组件上施加电压来检测物体在桌子上的存在，该电压将导致磁场，该磁场当第一电感器组件拾取时将根据电容产生第一电感器组件中的磁场响应的电容电极。

10. 发明申请

US20080309912A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20080309912A1
公开(公告)日：2008-12-18
申请号：US11812091
申请日：2007-06-14
申请人： Hendrik Antony Johannes Neerhof , Cornelis Maria Zwaans , Ernst Eduart Vrolijks
发明人： Hendrik Antony Johannes Neerhof , Cornelis Maria Zwaans , Ernst Eduart Vrolijks
IPC分类号： G03B27/58
CPC分类号： G03F7/7085 , G03F7/70716
摘要： A lithographic apparatus includes a movable table constructed and arranged to transport an object to a position in a beam path in a vacuum chamber, a first capacitor electrode and a second capacitor electrode attached to the table, a first inductor assembly coupled to the capacitor electrodes, and configured to apply a voltage between the first capacitor electrode and the second capacitor electrode, and a second inductor assembly mounted at a position that remains fixed when the table is moved. The second inductor assembly is configured to generate a magnetic field. The presence of the object on the table is detected by applying a voltage on the second inductor assembly which will result in a magnetic field which when picked up by the first inductor assembly will create a magnetic field response in the first inductor assembly dependent on the capacitance of the capacitor electrodes.
摘要翻译：光刻设备包括可移动台，其构造和布置成将物体输送到真空室中的光束路径中的位置，附接到台的第一电容器电极和第二电容器电极，耦合到电容器电极的第一电感器组件，并且被配置为在第一电容器电极和第二电容器电极之间施加电压，以及第二电感器组件，其安装在当桌子移动时保持固定的位置。第二电感器组件被配置为产生磁场。通过在第二电感器组件上施加电压来检测物体在桌子上的存在，该电压将导致磁场，该磁场当第一电感器组件拾取时将根据电容产生第一电感器组件中的磁场响应的电容电极。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式