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1. 发明授权

US07354698B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US07354698B2
公开(公告)日：2008-04-08
申请号：US11030326
申请日：2005-01-07
申请人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Jacobus Hermanus Maria Neijzen , Emile Verstegen
发明人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko , Jacobus Hermanus Maria Neijzen , Emile Verstegen
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.
摘要翻译：公开了一种压印方法，其包括在辐射下以可流动状态在基板上照射可光固化的可印刷介质以引发介质的固化，在照射之后，使介质与模板接触以在介质中形成印记，介质基本上固化，使得介质处于基本不可流动的状态，同时介质与模板接触，并且当介质处于基本上不可流动的状态时将模板与介质分离。

2. 发明授权

US07399978B2 Method and device for irradiating spots on a layer 有权
标题翻译：用于在层上照射斑点的方法和装置
公开(公告)号：US07399978B2
公开(公告)日：2008-07-15
申请号：US10539351
申请日：2003-11-20
申请人： Helmar Van Santen , Jacobus Hermanus Maria Neijzen
发明人： Helmar Van Santen , Jacobus Hermanus Maria Neijzen
IPC分类号： G21G5/00 , G03B27/52 , G03B27/42 , G03C5/00
CPC分类号： G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the optical element nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening through a total projected cross-sectional passage area in a plane parallel to the layer. The outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction perpendicular to the layer, the total cross-sectional area has a centre in the portion of the interspace through which the radiation irradiates the spot.
摘要翻译：为了照射层，辐射束被引导并聚焦到层上的斑点，引起层相对于光学元件的相对运动，使得相继地照射该层的不同部分和在该层的表面之间的间隙保持最靠近层的光学元件。此外，辐射照射到层上的斑点的间隙的至少一部分保持充满液体，液体经由供应管道供给，并通过总投影横截面通过面积流出流出开口在与平面平行的平面上。流出开口或多个流出开口定位成使得从垂直于该层的方向看，总横截面积在该空间部分中的中心，辐射辐射穿过该点。

3. 发明授权

US07514699B2 Method and device for irradiating spots on a layer 有权
标题翻译：用于在层上照射斑点的方法和装置
公开(公告)号：US07514699B2
公开(公告)日：2009-04-07
申请号：US10539313
申请日：2003-11-20
申请人： Jacobus Hermanus Maria Neijzen , Helmar Van Santen
发明人： Jacobus Hermanus Maria Neijzen , Helmar Van Santen
IPC分类号： G21G5/00 , G03B27/52 , G03B27/42 , G03C5/00
CPC分类号： G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.
摘要翻译：为了照射层，辐射束被引导并聚焦到层上的斑点，引起层相对于透镜的相对运动，使得相继地照射该层的不同部分和透镜表面之间的间隙最靠近层保持。此外，辐射照射到层上的斑点的间隙的至少一部分保持充满液体，液体经由供应导管供给。至少一部分液体填充了辐射照射到该点的凹槽。

4. 再颁专利

USRE46433E1 Method and device for irradiating spots on a layer 有权
公开(公告)号：USRE46433E1
公开(公告)日：2017-06-13
申请号：US13079969
申请日：2011-04-05
申请人： Jacobus Hermanus Maria Neijzen , Helmar Van Santen
发明人： Jacobus Hermanus Maria Neijzen , Helmar Van Santen
IPC分类号： G01G5/00 , G03B27/52 , G03B27/42 , G03C5/00 , B82Y10/00 , G03F7/20 , G11B7/122 , G11B7/26 , G11B7/1374
CPC分类号： G03F7/70341 , G11B7/122 , G11B7/1374 , G11B7/261
摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.

5. 发明授权

US07605979B2 Device for directing radiation to a layer, apparatus with such device and method using such apparatus 失效
标题翻译：用于将辐射引导到层的装置，具有这种装置的装置和使用这种装置的方法
公开(公告)号：US07605979B2
公开(公告)日：2009-10-20
申请号：US11911559
申请日：2006-04-13
申请人： Jacobus Hermanus Maria Neijzen , Helmar Van Santen
发明人： Jacobus Hermanus Maria Neijzen , Helmar Van Santen
IPC分类号： G02B27/10 , G02B27/14
CPC分类号： G11B7/261 , G03F7/70383 , G03F7/70583
摘要： A device for directing radiation to a layer (1) is described. The device includes a first optical element (L1) for focusing a first radiation beam (B1) originating from a first radiation source (S1) onto said layer, a second optical element (L2) for focusing a second radiation beam (B2) originating from a second radiation source (S2) onto said layer. The wavelengths of the radiation from said first and said second radiation source are different from each other. The first and second optical element are jointly movable with respect to said radiation sources, wherein the focal points of the two radiation beams at least substantially coincide with various movements of the first optical element and the second optical element with respect to the radiation sources. The second optical element (L2) has an aperture (A2) which allows optically undisturbed passage of the first radiation beam (B1). In this way a compact and light configuration of L1 and L2 is achieved as well as an improved radiation beam quality. Further an apparatus comprising such a device and a method using such an apparatus are disclosed.
摘要翻译：描述了用于将辐射引导到层（1）的装置。该装置包括用于将源自第一辐射源（S1）的第一辐射束（B1）聚焦到所述层上的第一光学元件（L1），用于聚焦源自第二辐射源第二辐射源（S2）到所述层上。来自所述第一和第二辐射源的辐射的波长彼此不同。第一和第二光学元件可相对于所述辐射源共同移动，其中两个辐射束的焦点至少基本上与第一光学元件和第二光学元件相对于辐射源的各种运动重合。第二光学元件（L2）具有孔（A2），其允许第一辐射束（B1）的光学上不受干扰地通过。以这种方式实现L1和L2的紧凑且轻的配置以及改进的辐射束质量。此外，公开了一种包括这种装置的装置和使用这种装置的方法。

6. 发明授权

US07642297B2 Non-leaching adhesive system and its use in a liquid immersion objective 有权
标题翻译：非浸出粘合剂系统及其在液体浸入物中的应用
公开(公告)号：US07642297B2
公开(公告)日：2010-01-05
申请号：US10568837
申请日：2004-08-05
申请人： Emile Johannes Karel Verstegen , Johan George Kloosterboer , Hendrik Roelof Stapert , Jacobus Hermanus Maria Neijzen , Helmar Van Santen
发明人： Emile Johannes Karel Verstegen , Johan George Kloosterboer , Hendrik Roelof Stapert , Jacobus Hermanus Maria Neijzen , Helmar Van Santen
IPC分类号： C08F2/46 , C09J4/02
CPC分类号： C09J135/02
摘要： A non-leaching adhesive system and its use in a liquid immersion objective for immersion-writing of masters for optical discs are disclosed. The adhesive system comprises at least one monomer, selected from among the group of acrylate and methacrylate monomers, allylic monomers, norbornene monomers, hybrid monomers thereof, containing chemically different polymeriazble groups, and multifunctional thiol monomers, provided that said thiol is used in combination with at least one of said non-thiol monomers; and a polymerization initiator. At least one of said monomers, not being a thiol, is provided with at least two functional polymerizable groups to obtain a crosslinked polymer network. The polymerization initiator is preferably an initiator that can be activated both thermally and with UV radiation. The adhesive system may further contain a reactive diluent. Further the use of the present adhesive system in mounting a liquid immersion objective is disclosed.
摘要翻译：公开了一种非浸出粘合剂系统及其在用于浸入式写入光盘的液浸物镜中的用途。粘合剂体系包含至少一种选自丙烯酸酯和甲基丙烯酸酯单体的单体，烯丙基单体，降冰片烯单体，含有化学上不同的聚合物基团的杂化单体和多官能硫醇单体，条件是所述硫醇与所述非硫醇单体中的至少一种; 和聚合引发剂。至少一种所述单体（不是硫醇）具有至少两个官能的可聚合基团以获得交联的聚合物网络。聚合引发剂优选是能够以热辐射和UV辐射活化的引发剂。粘合剂体系还可以含有反应性稀释剂。此外，公开了本发明的粘合剂系统在安装液浸物镜中的用途。

7. 发明申请

US20080186549A1 Device for Directing Radiation to a Layer, Apparatus with Such Device and Method Using Such Apparatus 失效
标题翻译：用于将辐射定向到层的装置，具有这种装置的装置和使用这种装置的方法
公开(公告)号：US20080186549A1
公开(公告)日：2008-08-07
申请号：US11911559
申请日：2006-04-13
申请人： Jacobus Hermanus Maria Neijzen , Helmar Van Santen
发明人： Jacobus Hermanus Maria Neijzen , Helmar Van Santen
IPC分类号： G02B26/08
CPC分类号： G11B7/261 , G03F7/70383 , G03F7/70583
摘要： A device for directing radiation to a layer (1) is described. The device includes a first optical element (L1) for focusing a first radiation beam (B1) originating from a first radiation source (S1) onto said layer, a second optical element (L2) for focusing a second radiation beam (B2) originating from a second radiation source (S2) onto said layer. The wavelengths of the radiation from said first and said second radiation source are different from each other. The first and second optical element are jointly movable with respect to said radiation sources, wherein the focal points of the two radiation beams at least substantially coincide with various movements of the first optical element and the second optical element with respect to the radiation sources. The second optical element (L2) has an aperture (A2) which allows optically undisturbed passage of the first radiation beam (B1). In this way a compact and light configuration of L1 and L2 is achieved as well as an improved radiation beam quality. Further an apparatus comprising such a device and a method using such an apparatus are disclosed.
摘要翻译：描述了用于将辐射引导到层（1）的装置。该装置包括用于将源自第一辐射源（S1）的第一辐射束（B 1）聚焦到所述层上的第一光学元件（L 1），用于聚焦第二辐射束的第二光学元件（L 2） B 2）源自第二辐射源（S 2）到所述层上。来自所述第一和第二辐射源的辐射的波长彼此不同。第一和第二光学元件可相对于所述辐射源共同移动，其中两个辐射束的焦点至少基本上与第一光学元件和第二光学元件相对于辐射源的各种运动重合。第二光学元件（L 2）具有允许第一辐射束（B 1）的光学上不受干扰地通过的孔径（A 2）。以这种方式，实现了L 1和L 2的紧凑和轻型结构以及改进的辐射束质量。此外，公开了一种包括这种装置的装置和使用这种装置的方法。

8. 发明申请

US20120013869A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
公开(公告)号：US20120013869A1
公开(公告)日：2012-01-19
申请号：US13240803
申请日：2011-09-22
申请人： Christiaan Alexander HOOGENDAM , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人： Christiaan Alexander HOOGENDAM , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

9. 发明申请

US20100139862A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20100139862A1
公开(公告)日：2010-06-10
申请号：US12705018
申请日：2010-02-12
申请人： Aleksey Yurievich KOLESNYCHENKO , Helmar Van Santen , Yvonne Kruijt-Stegeman
发明人： Aleksey Yurievich KOLESNYCHENKO , Helmar Van Santen , Yvonne Kruijt-Stegeman
IPC分类号： H01L21/308 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
摘要翻译：公开了一种用于制造用于压印光刻的工作模板的方法，其在一个实施例中包括将工作模板基板上的可压印介质的第一目标区域与主模板接触以在介质中形成第一印记，印记定义工作模板模式的一部分，将主模板与压印介质分离，将介质的第二目标区域与主模板接触以在介质中形成第二压印，第二压印定义工作模板的另一部分模式，并将主模板与压印介质分离。

10. 发明授权

US07490547B2 Imprint lithography 失效
标题翻译：印刷光刻
公开(公告)号：US07490547B2
公开(公告)日：2009-02-17
申请号：US11025605
申请日：2004-12-30
申请人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko
发明人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko
IPC分类号： B41M5/00 , G03G13/26
CPC分类号： G03F7/0002 , B41C1/10 , B82Y10/00 , B82Y40/00
摘要： An imprinting method is provided that, according to an embodiment, involves contacting an imprintable medium on a substrate with a template to define an imprint area in the medium, removing at least some of any imprintable medium present outside the imprint area, and separating the template from the medium.
摘要翻译：提供了一种压印方法，根据一个实施例，该方法包括使基板上的可压印介质与模板接触以在介质中限定压印区域，去除存在于压印区域之外的任何可压印介质的至少一些，以及分离模板从媒介。

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