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    • 1. 发明授权
    • Positive-working photosensitive recording materials
    • 正性感光记录材料
    • US4579806A
    • 1986-04-01
    • US645768
    • 1984-08-30
    • Hans SchuppAlbert ElzerKlaus-Peter JaeckelReinhold J. Leyrer
    • Hans SchuppAlbert ElzerKlaus-Peter JaeckelReinhold J. Leyrer
    • G03C1/72G03F7/004G03F7/039G03F7/38G03C1/495G03C5/16
    • G03F7/38G03F7/0045G03F7/039
    • A curable photosensitive mixture which is suitable as a positive-working recording material contains (a) one or more polymers which have a molecular weight of >500, contain not less than 5% by weight, based on the molecular weight of the polymer, of aromatic and/or heteroaromatic o-nitrocarbinol ester groups and also contain two or more further reactive functional groups which are available for reaction with a thermal crosslinking agent, (b) one or more compounds which effect crosslinking and are capable of reacting with the further reactive functional groups of the polymer (a) under the action of heat, at temperatures substantially above room temperature, and (c) a filler, with or without (d) other conventional additives and/or assistants. The photosensitive mixture is particularly useful as a positive-working recording material for optical information fixing, principally for the production of thermally stable relief images or resist images and, particularly advantageously, of soldering masks.
    • 适合作为正性记录材料的可固化光敏混合物包含(a)一种或多种分子量为> 500的聚合物,基于聚合物的分子量不少于5重量% 芳族和/或杂芳族邻硝基甲醇酯基团,并且还含有两个或更多个可用于与热交联剂反应的反应性官能团,(b)一种或多种影响交联并且能够与另外的反应性反应的化合物 聚合物(a)的官能团在高温作用下,在高于室温的温度下,和(c)填料,有或没有(d)其它常规添加剂和/或助剂。 感光性混合物特别可用作用于光学信息固定的正性记录材料,主要用于制造热稳定浮雕图像或抗蚀剂图像,特别有利地是制造焊接掩模。
    • 2. 发明授权
    • Photosensitive element for producing printing plates or resist images
    • 用于生产印版或抗蚀剂图像的感光元件
    • US4842987A
    • 1989-06-27
    • US62162
    • 1987-06-15
    • Albert ElzerAxel SannerHans SchuppErich Beck
    • Albert ElzerAxel SannerHans SchuppErich Beck
    • C08F2/48G03F7/033
    • G03F7/033Y10S430/117
    • A photosensitive recording element which is suitable for the production of printing plates or resist images possesses a photopolymerizable recording layer which is applied to a dimensionally stable base, can be developed in an aqueous alkaline medium and contains, as a polymeric binder, one or more film-forming copolymers which are insoluble in water but soluble or dispersible in aqueous alkaline solutions and consist of from 10 to 50% by weight of one or more N-vinylamides, preferably N-vinylcaprolactam and/or N-vinylpyrrolidone, from 5 to 30% by weight of acrylic acid and/or methacrylic acid, from 30 to 80% by weight of one or more comonomers from the group consisting of the vinyl aromatics and (meth)acrylates of monoalkanols and from 0.2 to 5% by weight of an olefinically unsaturated compound which contains basic nitrogen atoms and has a pK.sub.a >4.
    • 适用于制造印版或抗蚀剂图像的光敏记录元件具有应用于尺寸稳定的基底的可光聚合记录层,可以在碱性介质水溶液中显影,并且作为聚合物粘合剂含有一个或多个膜 不溶于水但可溶于或分散于碱性水溶液中的共混物,其组成为10至50重量%的一种或多种N-乙烯基酰胺,优选N-乙烯基己内酰胺和/或N-乙烯基吡咯烷酮,5-30% 的丙烯酸和/或甲基丙烯酸,30至80重量%的一种或多种共聚单体,其由乙烯基芳族化合物和单链烷醇的(甲基)丙烯酸酯和0.2-5重量%的烯属不饱和 含有碱性氮原子并具有pKa> 4的化合物。
    • 3. 发明授权
    • Dry film resist containing two or more photosensitive strata
    • 含有两层以上感光层的干膜抗蚀剂
    • US4596759A
    • 1986-06-24
    • US669213
    • 1984-11-07
    • Hans SchuppAlbert Elzer
    • Hans SchuppAlbert Elzer
    • G03F7/26G03C1/72G03C5/00G03F7/039G03F7/095H05K3/00H05K3/34G03C1/76
    • G03F7/095H05K3/0073H05K3/3452
    • In the production of imagewise structured resist layers, for example for the manufacture of printed circuits, electronic components, soldering masks, etc., by application, onto a substrate, of a positive-working resist layer (R) which can be rendered soluble by exposure to actinic light, imagewise exposure of the resist layer (R) to actinic light and removal of the exposed parts of the layer by washing out with a developer, the photosensitive resist layer (R) used, in particular in the form of a dry film resist, consists of two or more strata (S) which posses different basic solubilities, at least the upper stratum (U) being photosensitive and the lower stratum (LS) having a higher basic solubility in the developer than has the upper stratum (U).
    • 在通过施加到衬底上的用于制造印刷电路,电子部件,焊接掩模等的成像结构抗蚀剂层的正性抗蚀剂层(R)的制造中,所述正性抗蚀剂层可以通过 暴露于光化性光,通过用显影剂洗出来将抗蚀剂层(R)成像曝光于光化光并除去该层的暴露部分,所使用的光致抗蚀剂层(R),特别是干燥形式 膜抗蚀剂由具有不同碱性溶解度的两层或更多层(S)组成,至少上层(U)是光敏层,下层(LS)在显影剂中具有比上层更高的碱溶性(U )。
    • 4. 发明授权
    • (Meth)acrylate copolymers and their use in nonlinear optics and for the
production of Langmuir-Blodgett
    • (METH)丙烯酸酯共聚物及其在非线性光学和生产LANGMUIR-BLODGETT中的应用
    • US5204178A
    • 1993-04-20
    • US784427
    • 1991-11-12
    • Ulrike LichtHarald FuchsDirk FunhoffWolfgang SchreppHans Schupp
    • Ulrike LichtHarald FuchsDirk FunhoffWolfgang SchreppHans Schupp
    • C08F220/36B05D1/20C08F20/34C08F20/52C08F220/34C08F220/60G02F1/35G02F1/355G02F1/361
    • C08F220/34B05D1/202B82Y20/00B82Y30/00B82Y40/00G02F1/3618Y10T428/261Y10T428/31504
    • Novel (meth)acrylate copolymers which contain, as polymerized units,A) one or more (meth)acrylates and/or (meth)acrylamides having second order nonlinear optical properties and of the general formula I ##STR1## where R is hydrogen or methyl, X is a flexible spacer, which may or may not be present, Y is a divalent group having electron donor activity and Z is a noncentrosymmetric radical containing an easily polarizable conjugated .pi.-electron system and one or more electron acceptor groups, andB) one or more (meth)acrylates of alkanols where the alkyl radical is of 10 to 30 carbon atomsin a molar ratio of (A) to (B) of from 1:0.5 to 1:5 are very suitable as nonlinear optical materials for nonlinear optical arrangements and for the production of Langmuir-Blodgett films. The novel (meth)acrylate copolymers which contain terminal nitro, trifluoromethyl, cyano or fulven-6-yl groups as electron acceptors and have molar ratios A to B differing from those mentioned above are also suitable for intended uses outside nonlinear optics.
    • PCT No.PCT / EP90 / 00866 Sec。 371日期1991年11月12日 102(e)1991年11月12日日期PCT提交1990年5月30日PCT公布。 公开号WO90 / 15087 日期:1990年12月13日。新型(甲基)丙烯酸酯共聚物,其含有作为聚合单元的A)一种或多种具有二阶非线性光学性质的(甲基)丙烯酸酯和/或(甲基)丙烯酰胺和通式I (I)其中R是氢或甲基,X是可以存在或可以不存在的柔性间隔物,Y是具有电子给体活性的二价基团,Z是含有容易极化的共轭π电子体系的非中心对称基团, 一种或多种电子受体基团,和B)一种或多种(A)至(B)摩尔比为1:0.5至1:1的烷基的碳原子数为10〜30的烷醇的(甲基) 5非常适合用于非线性光学布置的非线性光学材料和用于生产Langmuir-Blodgett膜。 含有末端硝基,三氟甲基,氰基或富二烯-6-基作为电子受体并且具有与上述不同的摩尔比A至B的新型(甲基)丙烯酸酯共聚物也适用于非线性光学外部的预期用途。