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1. 发明授权

US08027018B2 Method and device for producing exposed structures 失效
标题翻译：用于生产暴露结构的方法和装置
公开(公告)号：US08027018B2
公开(公告)日：2011-09-27
申请号：US11071074
申请日：2005-03-02
申请人： Hans Opower , Stefan Scharl , Dirk Leinenbach
发明人： Hans Opower , Stefan Scharl , Dirk Leinenbach
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70525 , G03F7/704 , G03F7/70425
摘要： In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carried out, can be read out while sets of data of an additional macroline are being stored.
摘要翻译：为了改进通过曝光单元在多个部件上产生暴露结构的方法，使基板部件和曝光单元相对于彼此移动，其中在至少一些部件上产生相同的结构，以这样的方式，其尽可能有效地进行操作，建议通过在分别设置在多个大环内酯内的组分的区域中暴露基质成分来产生每个相同的结构，每一个大环内酯包含在彼此相邻的多个线中，在沿着曝光路径的单次通过期间，由该曝光路径覆盖的所有部件将曝光单元暴露在多个麦克风的同一宏线的区域中，曝光单元具有多个光源和具有控制存储器的控制，其中已经存储有用于宏线的数据组在whic的区域中 h曝光正在执行，可以在存储附加宏线的数据集的同时读出。

2. 发明申请

US20050282087A1 Method and device for producing exposed structures 失效
标题翻译：用于生产暴露结构的方法和装置
公开(公告)号：US20050282087A1
公开(公告)日：2005-12-22
申请号：US11071074
申请日：2005-03-02
申请人： Hans Opower , Stefan Scharl , Dirk Leinenbach
发明人： Hans Opower , Stefan Scharl , Dirk Leinenbach
IPC分类号： G03F7/20 , G03C5/00
CPC分类号： G03F7/70525 , G03F7/704 , G03F7/70425
摘要： In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carried out, can be read out while sets of data of an additional macroline are being stored.
摘要翻译：为了改进通过曝光单元在多个部件上产生暴露结构的方法，使基板部件和曝光单元相对于彼此移动，其中在至少一些部件上产生相同的结构，以这样的方式，其尽可能有效地进行操作，建议通过在分别设置在多个大环内酯内的组分的区域中暴露基质成分来产生每个相同的结构，每一个大环内酯包含在彼此相邻的多个线中，在沿着曝光路径的单次通过期间，由该曝光路径覆盖的所有部件将曝光单元暴露在多个麦克风的同一宏线的区域中，曝光单元具有多个光源和具有控制存储器的控制，其中已经存储有用于宏线的数据组在whic的区域中 h曝光正在执行，可以在存储附加宏线的数据集的同时读出。

3. 发明授权

US07019818B2 Apparatus for exposing substrate materials 失效
标题翻译：用于曝光基材的装置
公开(公告)号：US07019818B2
公开(公告)日：2006-03-28
申请号：US10941308
申请日：2004-09-14
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70383 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70766
摘要： The invention relates to a device for exposing substrate materials comprising: at least one optical exposure device, at least one substrate platform; a device for generating a relative displacement between the exposure device and the substrate platform in two transversal directions, whereby the relative displacement in a primary direction occurs with a greater dynamic response than in a secondary direction; at least one primary drive for generating the relative displacement in the primary direction; and at least one secondary drive for generating the relative displacement in the secondary direction. The aim of the invention is to position the substrate platform with the greatest possible accuarcy and the greatest possible dynamic response. To achieve this, the device comprises two substrate platforms that move substantially in opposition to one another in the primary direction.
摘要翻译：本发明涉及一种用于曝光衬底材料的装置，包括：至少一个光学曝光装置，至少一个衬底平台; 用于在两个横向上产生曝光装置和基板平台之间的相对位移的装置，由此在主方向上的相对位移以比在次方向上更大的动态响应发生; 用于产生主要方向上的相对位移的至少一个主驱动器; 以及用于产生次要方向上的相对位移的至少一个次级驱动器。本发明的目的是以最大可能的准确度和尽可能最大的动态响应来定位衬底平台。为了实现这一点，该装置包括在主要方向上基本上彼此相对移动的两个基板平台。

4. 发明授权

US08248581B2 Exposure system 失效
标题翻译：曝光系统
公开(公告)号：US08248581B2
公开(公告)日：2012-08-21
申请号：US12229501
申请日：2008-08-21
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/54
CPC分类号： G03F7/70791 , G03F7/70383 , G03F7/704
摘要： In the case of an exposure system for substrate bodies which carry a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier which carries the substrate body and has a substrate carrier surface, and an exposure device with an optics unit, the optics unit and the machine frame being movable relative to one another in a first direction and in a second direction, so that the photosensitive coating can be exposed by this relative movement in the first direction and in the second direction, in order to improve said system in such a way that a compact configuration is possible, despite in this case a substrate body with a very large extent in the first and the second direction, it is proposed that the exposure device has a guide cross-member for at least one guide carriage of the exposure device, the guide carriage carrying the optics unit, in that the guide carriage is guided on the guide cross-member to be movable in the first direction, and in that the guide cross-member is arranged on the machine frame to be movable in the second direction.
摘要翻译：在用于在基板表面上承载感光涂层的基板体的曝光系统的情况下，包括机架，承载基板主体并具有基板载体表面的基板载体以及具有光学单元的曝光装置，光学单元和机架可以在第一方向和第二方向上相对于彼此移动，使得感光涂层可以通过在第一方向和第二方向上的这种相对运动而暴露，以便改进所述系统尽管在这种情况下，尽管在第一和第二方向上具有很大程度的衬底主体，但是提出了紧凑的构造，即，曝光装置具有用于至少一个导向架的导向横向构件承载光学单元的导向架，其特征在于，导向架在引导横向构件上被引导以在第一方向上可移动，并且在该t 他的引导横向构件布置在机架上可沿第二方向移动。

5. 发明授权

US07652750B2 Lithography exposure device having a plurality of radiation sources 失效
标题翻译：具有多个辐射源的平版印刷曝光装置
公开(公告)号：US07652750B2
公开(公告)日：2010-01-26
申请号：US11392970
申请日：2006-03-28
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/52
CPC分类号： G03F7/7005 , G03F7/70383 , G03F7/704
摘要： A lithography exposure device is provided which includes a mounting device for the layer sensitive to light, an exposure unit with several laser radiation sources, an optical focusing means associated with the laser radiation sources, a movement unit for generating a relative movement between the optical focusing means and the mounting device, and a control for controlling intensity and position of exposure spots so that exposed structures which are as precisely structured as possible can be produced. A laser radiation field propagating in the direction of the light-sensitive layer generates each of the exposure spots from respective focal points and has a power density which leads in the conversion area in the light-sensitive layer to formation of a channel penetrating the light-sensitive layer with an index of refraction increased in relation to its surroundings by the Kerr effect and which guides the laser radiation field in a spatially limited manner.
摘要翻译：提供了一种光刻曝光装置，其包括用于对光敏感的层的安装装置，具有若干激光辐射源的曝光单元，与激光辐射源相关联的光学聚焦装置，用于在光学聚焦之间产生相对运动的移动单元装置和安装装置，以及用于控制曝光点的强度和位置的控制，使得可以产生尽可能精确构造的暴露结构。在感光层的方向上传播的激光辐射场从各个焦点产生每个曝光点，并且具有在感光层的转换区域中引起的功率密度，从而形成穿透光敏层的通道，具有折射率的敏感层相对于其周围环境通过克尔效应增加，并以空间有限的方式引导激光辐射场。

6. 发明申请

US20060244943A1 Exposure system 失效
标题翻译：曝光系统
公开(公告)号：US20060244943A1
公开(公告)日：2006-11-02
申请号：US11406049
申请日：2006-04-17
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/58
CPC分类号： G03F7/70391 , G03F7/704 , G03F7/70858
摘要： In an exposure system for substrate members which bear a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier bearing the substrate member and an exposure device, wherein the substrate member and the exposure device can be moved relative to one another such that the photosensitive coating can be exposed as a result of this relative movement, it is suggested for an exposure of the photosensitive coating which is as precise as possible that the exposure device have an optics slide which can be moved in the second direction and on which an optical imaging device for the exposure of the substrate member is arranged, and that the exposure device have a light source unit which is arranged on the machine frame separately from the optics slide and has a plurality of light sources, the radiation of which can be coupled into the optical imaging device.
摘要翻译：在用于在基片表面上承载感光涂层的基片部件的曝光系统中，包括机架，承载基片部件的基片载体和曝光装置，其中基片部件和曝光装置可相对于彼此移动，由于这种相对运动，感光涂层可能被曝光，所以建议使感光涂层的曝光尽可能精确，使得曝光装置具有可沿第二方向移动的光学滑块，并且其上布置用于曝光基板构件的光学成像装置，并且曝光装置具有与光学滑块分开布置在机架上的光源单元，并且具有多个光源，其辐射可以是耦合到光学成像装置中。

7. 发明授权

US07705967B2 Exposure system 失效
标题翻译：曝光系统
公开(公告)号：US07705967B2
公开(公告)日：2010-04-27
申请号：US11406049
申请日：2006-04-17
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/54
CPC分类号： G03F7/70391 , G03F7/704 , G03F7/70858
摘要： In an exposure system for substrate members which bear a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier bearing the substrate member and an exposure device, wherein the substrate member and the exposure device can be moved relative to one another such that the photosensitive coating can be exposed as a result of this relative movement, it is suggested for an exposure of the photosensitive coating which is as precise as possible that the exposure device have an optics slide which can be moved in the second direction and on which an optical imaging device for the exposure of the substrate member is arranged, and that the exposure device have a light source unit which is arranged on the machine frame separately from the optics slide and has a plurality of light sources, the radiation of which can be coupled into the optical imaging device.
摘要翻译：在用于在基片表面上承载感光涂层的基片部件的曝光系统中，包括机架，承载基片部件的基片载体和曝光装置，其中基片部件和曝光装置可相对于彼此移动，由于这种相对运动，感光涂层可能被曝光，所以建议使感光涂层的曝光尽可能精确，使得曝光装置具有可沿第二方向移动的光学滑块，并且其上布置用于曝光基板构件的光学成像装置，并且曝光装置具有与光学滑块分开布置在机架上的光源单元，并且具有多个光源，其辐射可以是耦合到光学成像装置中。

8. 发明申请

US20080316454A1 Exposure system 失效
标题翻译：曝光系统
公开(公告)号：US20080316454A1
公开(公告)日：2008-12-25
申请号：US12229501
申请日：2008-08-21
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G03F7/70383 , G03F7/704
摘要： In the case of an exposure system for substrate bodies which carry a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier which carries the substrate body and has a substrate carrier surface, and an exposure device with an optics unit, the optics unit and the machine frame being movable relative to one another in a first direction and in a second direction, so that the photosensitive coating can be exposed by this relative movement in the first direction and in the second direction, in order to improve said system in such a way that a compact configuration is possible, despite in this case a substrate body with a very large extent in the first and the second direction, it is proposed that the exposure device has a guide cross-member for at least one guide carriage of the exposure device, the guide carriage carrying the optics unit, in that the guide carriage is guided on the guide cross-member to be movable in the first direction, and in that the guide cross-member is arranged on the machine frame to be movable in the second direction.
摘要翻译：在用于在基板表面上承载感光涂层的基板体的曝光系统的情况下，包括机架，承载基板主体并具有基板载体表面的基板载体以及具有光学单元的曝光装置，光学单元和机架可以在第一方向和第二方向上相对于彼此移动，使得感光涂层可以通过在第一方向和第二方向上的这种相对运动而暴露，以便改进所述系统尽管在这种情况下，尽管在第一和第二方向上具有很大程度的衬底主体，但是提出了紧凑的构造，即，曝光装置具有用于至少一个导向架的导向横向构件承载光学单元的导向架，其特征在于，导向架在引导横向构件上被引导以在第一方向上可移动，并且在该t 他的引导横向构件布置在机架上可沿第二方向移动。

9. 发明申请

US20060170893A1 Lithography exposure device 失效
标题翻译：光刻曝光装置
公开(公告)号：US20060170893A1
公开(公告)日：2006-08-03
申请号：US11392970
申请日：2006-03-28
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03B27/52
CPC分类号： G03F7/7005 , G03F7/70383 , G03F7/704
摘要： In order to design a lithography exposure device comprising a mounting device for the layer sensitive to light, an exposure unit comprising several laser radiation sources and an optical focusing means associated with the laser radiation sources, a movement unit for generating a relative movement between the optical focusing means and the mounting device and a control for controlling intensity and position of the exposure spots in such a manner that exposed structures which are as precisely structured as possible can be produced, it is suggested that the optical focusing means have an end lens which generates focal points of the laser radiation exiting from each of the laser radiation sources close to the light-sensitive layer, that a laser radiation field propagate in the direction of the light-sensitive layer for generating each of the exposure spots from the respective focal points and have a power density which leads in the conversion area in the light-sensitive layer to the formation of a channel which penetrates the light-sensitive layer with an index of refraction increased in relation to its surroundings due to the Kerr effect and guides the respective laser radiation field in a spatially limited manner.
摘要翻译：为了设计包括用于对光敏感的层的安装装置的光刻曝光装置，包括若干激光辐射源和与激光辐射源相关联的光学聚焦装置的曝光单元，用于在光学器件之间产生相对运动的移动单元聚焦装置和安装装置以及用于控制曝光点的强度和位置的控制，使得可以产生尽可能精确地构造的暴露结构，使得光学聚焦装置具有产生激光辐射从靠近感光层的每个激光辐射源射出的焦点，激光辐射场沿着感光层的方向传播，用于从各个焦点产生每个曝光点，以及具有在感光层的转换区域中导致格式的功率密度由于克尔效应，折射率相对于其周围环境增加的透射感光层的通道的离子以空间有限的方式引导相应的激光辐射场。

10. 发明申请

US20050083509A1 Apparatus for exposing substrate materials 失效
标题翻译：用于曝光基材的装置
公开(公告)号：US20050083509A1
公开(公告)日：2005-04-21
申请号：US10941308
申请日：2004-09-14
申请人： Hans Opower , Stefan Scharl
发明人： Hans Opower , Stefan Scharl
IPC分类号： G03F7/20 , G03B27/58
CPC分类号： G03F7/70383 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70766
摘要： The invention relates to a device for exposing substrate materials comprising: at least one optical exposure device, at least one substrate platform; a device for generating a relative displacement between the exposure device and the substrate platform in two transversal directions, whereby the relative displacement in a primary direction occurs with a greater dynamic response than in a secondary direction; at least one primary drive for generating the relative displacement in the primary direction; and at least one secondary drive for generating the relative displacement in the secondary direction. The aim of the invention is to position the substrate platform with the greatest possible accuarcy and the greatest possible dynamic response. To achieve this, the device comprises two substrate platforms that move substantially in opposition to one another in the primary direction.
摘要翻译：本发明涉及一种用于曝光衬底材料的装置，包括：至少一个光学曝光装置，至少一个衬底平台; 用于在两个横向上产生曝光装置和基板平台之间的相对位移的装置，由此在主方向上的相对位移以比在次方向上更大的动态响应发生; 用于产生主要方向上的相对位移的至少一个主驱动器; 以及用于产生次要方向上的相对位移的至少一个次级驱动器。本发明的目的是以最大可能的准确度和尽可能最大的动态响应来定位衬底平台。为了实现这一点，该装置包括在主要方向上基本上彼此相对移动的两个基板平台。

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