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1. 发明授权

US08027018B2 Method and device for producing exposed structures 失效
标题翻译：用于生产暴露结构的方法和装置
公开(公告)号：US08027018B2
公开(公告)日：2011-09-27
申请号：US11071074
申请日：2005-03-02
申请人： Hans Opower , Stefan Scharl , Dirk Leinenbach
发明人： Hans Opower , Stefan Scharl , Dirk Leinenbach
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70525 , G03F7/704 , G03F7/70425
摘要： In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carried out, can be read out while sets of data of an additional macroline are being stored.
摘要翻译：为了改进通过曝光单元在多个部件上产生暴露结构的方法，使基板部件和曝光单元相对于彼此移动，其中在至少一些部件上产生相同的结构，以这样的方式，其尽可能有效地进行操作，建议通过在分别设置在多个大环内酯内的组分的区域中暴露基质成分来产生每个相同的结构，每一个大环内酯包含在彼此相邻的多个线中，在沿着曝光路径的单次通过期间，由该曝光路径覆盖的所有部件将曝光单元暴露在多个麦克风的同一宏线的区域中，曝光单元具有多个光源和具有控制存储器的控制，其中已经存储有用于宏线的数据组在whic的区域中 h曝光正在执行，可以在存储附加宏线的数据集的同时读出。

2. 发明申请

US20050282087A1 Method and device for producing exposed structures 失效
标题翻译：用于生产暴露结构的方法和装置
公开(公告)号：US20050282087A1
公开(公告)日：2005-12-22
申请号：US11071074
申请日：2005-03-02
申请人： Hans Opower , Stefan Scharl , Dirk Leinenbach
发明人： Hans Opower , Stefan Scharl , Dirk Leinenbach
IPC分类号： G03F7/20 , G03C5/00
CPC分类号： G03F7/70525 , G03F7/704 , G03F7/70425
摘要： In order to improve a method for producing exposed structures on a plurality of components by means of an exposure unit, with which substrate member and the exposure unit are moved relative to one another, wherein identical structures are produced on at least some of the components, in such a manner that this operates as efficiently as possible it is suggested that each of the identical structures be produced by way of exposure of the substrate member in the area of the component respectively provided within a plurality of macrolines, that each of the macrolines comprise a plurality of lines lying next to one another, that during a single pass along a path of exposure all the components covered by this path of exposure be exposed with the exposure unit in the area of the same macroline of the plurality of macrolines, that the exposure unit have a plurality of light sources and a control with a control memory, with which sets of data already stored for the macroline, in the area of which exposure is being carried out, can be read out while sets of data of an additional macroline are being stored.
摘要翻译：为了改进通过曝光单元在多个部件上产生暴露结构的方法，使基板部件和曝光单元相对于彼此移动，其中在至少一些部件上产生相同的结构，以这样的方式，其尽可能有效地进行操作，建议通过在分别设置在多个大环内酯内的组分的区域中暴露基质成分来产生每个相同的结构，每一个大环内酯包含在彼此相邻的多个线中，在沿着曝光路径的单次通过期间，由该曝光路径覆盖的所有部件将曝光单元暴露在多个麦克风的同一宏线的区域中，曝光单元具有多个光源和具有控制存储器的控制，其中已经存储有用于宏线的数据组在whic的区域中 h曝光正在执行，可以在存储附加宏线的数据集的同时读出。

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