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1. 发明申请

US20070114452A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070114452A1
公开(公告)日：2007-05-24
申请号：US11285774
申请日：2005-11-23
申请人： Hans Jansen , Sebastiaan Cornelissen , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Leenders , Jeroen Johannes Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans Jansen , Sebastiaan Cornelissen , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Leenders , Jeroen Johannes Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译：平版印刷设备和设备制造方法在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

2. 发明申请

US20070070315A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20070070315A1
公开(公告)日：2007-03-29
申请号：US11454129
申请日：2006-06-16
申请人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
发明人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
摘要翻译：使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。

3. 发明申请

US20060033898A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060033898A1
公开(公告)日：2006-02-16
申请号：US11205325
申请日：2005-08-17
申请人： Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
发明人： Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
IPC分类号： G03B27/42
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译：公开了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件以控制和/或补偿来自基底的液体的蒸发。

4. 发明申请

US20050036637A1 Automatic adjusting hearing aid 审中-公开
标题翻译：自动调节助听器
公开(公告)号：US20050036637A1
公开(公告)日：2005-02-17
申请号：US10843012
申请日：2004-05-11
申请人： Franciscus Janssen
发明人： Franciscus Janssen
IPC分类号： H04R25/00
CPC分类号： H04R25/70 , H04R25/505 , H04R25/558 , H04R2225/41
摘要： A hearing aid that stores preset signal processing parameters, and performs stepwise adjustment of one or more of the stored signal processing parameters from a starting point of a predetermined range to an end point of the range is provided. Examples of signal processing parameters to be adjusted are high tone amplification, maximum output level and noise suppression threshold value. Examples of trigger signal supplying means include a time clock, the power state of the hearing aid, battery replacement, and a switch. The hearing aid may be arranged for mutual communication with an external unit. The external unit may select the one or more parameters to be adjusted, set the range of the one or more parameters to be adjusted, set a step magnitude to be used in the stepwise adjustment, and set the repeat interval of the successive trigger signals in the time clock. The hearing aid carries out the adjustment autonomously.
摘要翻译：提供了一种助听器，其存储预设信号处理参数，并且从预定范围的起始点到该范围的终点，对所存储的信号处理参数中的一个或多个进行逐步调整。要调整的信号处理参数的示例是高音调放大，最大输出电平和噪声抑制阈值。触发信号提供装置的示例包括时钟，助听器的电源状态，电池更换和开关。助听器可以被布置成与外部单元相互通信。外部单元可以选择要调整的一个或多个参数，设置要调整的一个或多个参数的范围，设置要在逐步调整中使用的步长值，并将连续触发信号的重复间隔设置为时钟。助听器自主进行调整。

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