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1. 发明申请

US20070070315A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20070070315A1
公开(公告)日：2007-03-29
申请号：US11454129
申请日：2006-06-16
申请人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
发明人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
摘要翻译：使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。

2. 发明申请

US20060033898A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060033898A1
公开(公告)日：2006-02-16
申请号：US11205325
申请日：2005-08-17
申请人： Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
发明人： Theodorus Cadee , Johannes Jacobs , Nicolaas Kate , Erik Loopstra , Aschwin Lodewijk Vermeer , Jeroen Maria Mertens , Christianus De Mol , Marcel Hubertus Muitjens , Antonius Van Der Net , Joost Ottens , Johannes Quaedackers , Maria Reuhman-Huisken , Marco Stavenga , Patricius Tinnemans , Martinus Verhagen , Jacobus Johannus Hendricus Verspay , Frederik De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Smeets , Bart Schoondermark , Franciscus Janssen , Michel Riepen
IPC分类号： G03B27/42
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译：公开了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件以控制和/或补偿来自基底的液体的蒸发。

3. 发明申请

US20060087630A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060087630A1
公开(公告)日：2006-04-27
申请号：US11212921
申请日：2005-08-29
申请人： Nicolaas Kemper , Henrikus Cox , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Nicolaas Kate , Martinus Hendrikus Leenders , Jeroen Mertens , Frits Meulen , Joost Ottens , Franciscus Maria Teunissen , Jan-Gerard Toorn , Martinus Verhagen , Marco Polizzi , Edwin Augustinus Van Gompel , Johannes Smeulers , Stefan Belfroid
发明人： Nicolaas Kemper , Henrikus Cox , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Nicolaas Kate , Martinus Hendrikus Leenders , Jeroen Mertens , Frits Meulen , Joost Ottens , Franciscus Maria Teunissen , Jan-Gerard Toorn , Martinus Verhagen , Marco Polizzi , Edwin Augustinus Van Gompel , Johannes Smeulers , Stefan Belfroid
IPC分类号： G03B27/52
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

4. 发明申请

US20060192929A1 Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid 有权
标题翻译：平版印刷设备，装置制造方法以及用于对液体进行排气的装置
公开(公告)号：US20060192929A1
公开(公告)日：2006-08-31
申请号：US11067492
申请日：2005-02-28
申请人： Martinus Verhagen , Roelof De Graaf , Johannes Jacobs , Franciscus Maria Teunissen , Jurgen Benischek
发明人： Martinus Verhagen , Roelof De Graaf , Johannes Jacobs , Franciscus Maria Teunissen , Jurgen Benischek
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithographic apparatus is disclosed that has a semi-permeable membrane, a liquid inlet adapted to supply liquid to a first side of the membrane, and a gas inlet adapted to supply to a second side of the membrane either: (a) a vapor of the liquid, or (b) a gas which dissociates when dissolved in the liquid.
摘要翻译：公开了一种光刻设备，其具有半透膜，适于向膜的第一侧供应液体的液体入口，以及适于向膜的第二侧供应气体入口的气体入口：（a）液体，或（b）当溶解在液体中时解离的气体。

5. 发明申请

US20060187427A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060187427A1
公开(公告)日：2006-08-24
申请号：US11062763
申请日：2005-02-22
申请人： Marco Stavenga , Martinus Verhagen , Johannes Jacobs , Hans Jansen
发明人： Marco Stavenga , Martinus Verhagen , Johannes Jacobs , Hans Jansen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/709
摘要： Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.
摘要翻译：公开了各种类型的压力调节装置，以减少光刻设备的液体供应系统中的压力梯度，液体供应系统具有液体限制结构，其被配置为至少部分地限制液体在投影系统和基板台之间的液体光刻设备高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。压力梯度可以通过例如在一个或多个阀门中使用缓慢的切换，绕过或通过一个或多个阀门的泄放流量来减少，而不是或者除了切换阀门之外将液体转移到排水管，用于防止冲击波的压力调节器或限流器，以及用于补偿压力波动的缓冲体积/阻尼器。

6. 发明申请

US20060186057A1 Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method 有权
标题翻译：流体过滤法，流体过滤器，光刻设备和器件制造方法
公开(公告)号：US20060186057A1
公开(公告)日：2006-08-24
申请号：US11062764
申请日：2005-02-22
申请人： Martinus Verhagen , Roelof De Graaf , Johannes Henricus Jacobs , Hans Jansen , Marco Stavenga , Jacobus Johannus Leonardus Verspay
发明人： Martinus Verhagen , Roelof De Graaf , Johannes Henricus Jacobs , Hans Jansen , Marco Stavenga , Jacobus Johannus Leonardus Verspay
IPC分类号： B01D37/00
CPC分类号： B01D37/04 , Y10S210/90
摘要： A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.
摘要翻译：描述了用于过滤流体以获得具有已知纯度的流体的方法。流体用过滤系统过滤，并且在过滤系统的最终过滤阶段的上游，测量流体的纯度。通过过滤系统过滤的流体的纯度通过用最终过滤阶段的过滤行为校正测量的纯度来确定。在一个实施例中，流体包括用作光刻设备中的浸没液体的超纯水。

7. 发明申请

US20060232754A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060232754A1
公开(公告)日：2006-10-19
申请号：US11437745
申请日：2006-05-22
申请人： Nicolas Lallemant , Martinus Verhagen , Marcel Beckers , Ronald Stultiens , Pascal Smits , Wladimir Fransiscus Hertog , David Van Der Plas , Stephan Koelink , Henk Krus
发明人： Nicolas Lallemant , Martinus Verhagen , Marcel Beckers , Ronald Stultiens , Pascal Smits , Wladimir Fransiscus Hertog , David Van Der Plas , Stephan Koelink , Henk Krus
IPC分类号： G03B27/52
CPC分类号： G03F7/70933
摘要： A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.

8. 发明申请

US20050254025A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050254025A1
公开(公告)日：2005-11-17
申请号：US10876760
申请日：2004-06-28
申请人： Nicolas Lallemant , Martinus Verhagen , Marcel Beckers , Ronald Stultiens , Pascal Smits , Wladimir Fransiscus Hertog , David Theodorus Van Der Plas , Stephan Koelink , Henk Krus
发明人： Nicolas Lallemant , Martinus Verhagen , Marcel Beckers , Ronald Stultiens , Pascal Smits , Wladimir Fransiscus Hertog , David Theodorus Van Der Plas , Stephan Koelink , Henk Krus
IPC分类号： G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70933
摘要： A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.
摘要翻译：公开了一种光刻设备。该装置包括用于调节辐射束的照明器，以及用于支撑用于根据期望图案对辐射束进行图案化的图案形成装置的第一支撑件。该装置还包括用于支撑基板的第二支撑件，用于将图案化的光束投影到基板的目标部分上的投影系统，以及用于产生经调节的气流的至少一个气体发生器。气体发生器包括用于将气流引导到通常位于投影系统的下表面下方的下部体积并且在下表面和基底之间的体积的引导元件。引导元件将气流大致向下的方向引导，然后在大致平行于下表面的方向上引导。

9. 发明申请

US20050035307A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20050035307A1
公开(公告)日：2005-02-17
申请号：US10902259
申请日：2004-07-30
申请人： Martinus Verhagen
发明人： Martinus Verhagen
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70808 , G03F7/70883 , G03F7/70933 , G03F7/70975
摘要： A lithographic projection apparatus includes a beam path for a beam of radiation, a projection system, a support structure for supporting a patterning device and a substrate holder for holding a substrate. The beam path includes a radiation system for providing the beam of radiation, and the projection system projects the beam of radiation patterned by the patterning device onto a target portion on the substrate. At least one chamber that includes at least part of the beam path. A purge gas supply subsystem is coupled to the chamber for supplying a flow of purge gas to the chamber, and a control unit is arranged to switch the purge gas supply subsystem between at least two different modes of operation. The control unit controls the purge gas supply subsystem to supply mutually different respective non-zero flow rates of the purge gas to the chamber in the different modes of operation.
摘要翻译：光刻投影装置包括用于辐射束的光束路径，投影系统，用于支撑图案形成装置的支撑结构和用于保持基板的基板保持器。光束路径包括用于提供辐射束的辐射系统，并且投影系统将由图案形成装置图案化的辐射束投射到基板上的目标部分上。至少一个腔室，其包括至少一部分光束路径。净化气体供应子系统耦合到室，用于向室提供净化气体流，并且控制单元布置成在至少两种不同操作模式之间切换净化气体供应子系统。控制单元控制净化气体供应子系统，以在不同的操作模式中将净化气体相应的非零流率提供给室。

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