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    • 6. 发明授权
    • Automatic analyzer
    • 自动分析仪
    • US07955557B2
    • 2011-06-07
    • US10681212
    • 2003-10-09
    • Shigenori WatariHajime KatouKatsuhiro KambaraHiroyasu UchidaTakeshi Shibuya
    • Shigenori WatariHajime KatouKatsuhiro KambaraHiroyasu UchidaTakeshi Shibuya
    • G01N15/06B06B1/00
    • G01N35/025B01F11/0283G01N2035/00554Y10T436/11
    • Multiple piezoelectric elements 35 are arranged in a row along the top of liquid level in the reaction vessel 11. An ultrasonic reflecting material 38 is installed on the bottom of the portion of the heat insulating bath 12 where heat insulating medium 13 is stored. A lateral ultrasonic wave 9b is generated on the lower side is generated by actuation of the piezoelectric element 35. Wave 9b is reflected by the ultrasonic reflecting material 38. As a lower ultrasonic wave 8 advances along the wall surface of the reaction vessel, it collides with the specimen liquid level, thereby causing a portion of the liquid level closer to the piezoelectric element 35 to be raised. When the lateral ultrasonic wave 9a is applied to this portion, it reaches the inclined portion of the raised liquid level of the specimen. Swirling flow by agitation 36 is produced by the acoustic radiation pressure of the ultrasonic wave. The specimen and reagent are mixed and agitated by this swirling flow.
    • 多个压电元件35沿着反应容器11中的液面顶部排列成一排。超声波反射材料38安装在隔热介质13的储存部分的绝热槽12的底部。 通过致动压电元件35产生下侧产生横向超声波9b。波形9b被超声波反射材料38反射。随着下部超声波8沿着反应容器的壁表面前进,它碰撞 与试样液位一致,从而使液面的一部分更靠近压电元件35升高。 当横向超声波9a被施加到该部分时,其到达样本的升高的液面的倾斜部分。 通过搅拌36产生的流动通过超声波的声辐射压力产生。 样品和试剂通过这种旋流混合和搅拌。
    • 7. 发明授权
    • Automatic analyzer
    • 自动分析仪
    • US06737021B2
    • 2004-05-18
    • US09789625
    • 2001-02-22
    • Shigenori WatariHajime KatouKatsuhiro KambaraHiroyasu UchidaTakeshi Shibuya
    • Shigenori WatariHajime KatouKatsuhiro KambaraHiroyasu UchidaTakeshi Shibuya
    • B32B500
    • G01N35/025B01F11/0283G01N2035/00554Y10T436/11
    • Multiple piezoelectric elements 35 are arranged in a row along the top of liquid level in a reaction vessel 11. An ultrasonic reflecting material 38 is installed on the bottom of the portion of the heat insulating bath 12 where heat insulating medium 13 is stored. A lateral ultrasonic wave 9b is generated on the lower side by actuation of the piezoelectric element 35. Wave 9b is reflected by the ultrasonic reflecting material 38. As lower ultrasonic wave 8 advances along the wall surface of the reaction vessel, it collides with the specimen liquid, thereby causing a portion of the liquid level closer to the piezoelectric element 35 to be raised. When lateral ultrasonic wave 9a is applied to this portion, it reaches the inclined portion of the raised liquid level of the specimen. Swirling flow by agitation 36 is produced by acoustic radiation pressure of the ultrasonic wave. The specimen and reagent are mixed and agitated by this swirling flow.
    • 多个压电元件35沿着反应容器11中的液面顶部排列成一排。超声波反射材料38安装在绝热槽12的存储绝热介质13的部分的底部。 通过压电元件35的驱动,在下侧产生横向超声波9b。波形9b被超声波反射材料38反射。随着低超声波8沿着反应容器的壁表面前进,它与样品 液体,从而使更靠近压电元件35的液面的一部分升高。 当横向超声波9a被施加到该部分时,其到达样本的升高的液面的倾斜部分。 通过搅拌36产生的旋流由超声波的声辐射压力产生。 样品和试剂通过这种旋流混合和搅拌。
    • 10. 发明授权
    • Automatic analysis apparatus
    • 自动分析仪
    • US06773672B2
    • 2004-08-10
    • US09814683
    • 2001-03-15
    • Masaaki OdakuraShigenori WatariYoichiro Suzuki
    • Masaaki OdakuraShigenori WatariYoichiro Suzuki
    • G01N2101
    • B01F11/0283G01N21/251G01N21/253G01N35/025G01N2021/0367G01N2035/00554Y10T436/112499Y10T436/25
    • In order to provide an automatic analyzer which ensures accurate absorbance measurement even when ultrasonic wave intensity for agitation of the sample and reagent or the like becomes excessive, multiple reaction vessels 8 are placed as follows: As viewed from the top of the reaction disk 15, the reaction disk 15 is divided into four parts, and the side wall of the reaction vessel 8 does not intersect with two light beams 20 which intersect with each other at right angles. Herein multiple reaction vessels 8 are located at an inclined position approximately at an angle of about 45 deg. This layout allows the reaction vessel 8 to have the surface exposed to ultrasonic wave 22 intersecting to the applied ultrasonic wave appropriately at right angles, and absorbance measuring surface 21 intersecting to the applied measurement wave appropriately at right angles. It is possible to configure that the surface exposed to ultrasonic wave 22 and absorbance measuring surface 21 are different surfaces to ensure that this absorbance measuring surface 21 is not be exposed to ultrasonic wave.
    • 为了提供一种自动分析仪,即使当用于搅动样品和试剂等的超声波强度过大时也能确保精确的吸光度测定,如下设置多个反应容器8.从反应盘15的顶部看, 反作用盘15被分成四部分,反应容器8的侧壁与两个彼此以直角相交的光束20不相交。 本文中,多个反应容器8位于大约45度的角度的倾斜位置。 该布局允许反应容器8使表面暴露于与所施加的超声波相交的超声波22,该超声波适当地成直角,并且吸光度测量表面21与所施加的测量波适当地相交。 可以配置暴露于超声波22和吸光度测量表面21的表面是不同的表面,以确保该吸光度测量表面21不被暴露于超声波。