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1. 发明申请

US20110097631A1 ORGANIC/INORGANIC COMPOSITE COMPRISING THREE-DIMENSIONAL CARBON NANOTUBE NETWORKS, METHOD FOR PREPARING THE ORGANIC/INORGANIC COMPOSITE AND ELECTRONIC DEVICE USING THE ORGANIC/INORGANIC COMPOSITE 有权
标题翻译：包含三维碳纳米管网络的有机/无机复合材料，使用有机/无机复合材料制备有机/无机复合材料和电子器件的方法
公开(公告)号：US20110097631A1
公开(公告)日：2011-04-28
申请号：US12999489
申请日：2009-06-15
申请人： Haiwon Lee , Tae-Jae Lee , Jung-Eun Seo
发明人： Haiwon Lee , Tae-Jae Lee , Jung-Eun Seo
IPC分类号： H01M8/02 , B32B3/10 , B32B3/30 , H01L31/02 , H01L31/04 , H01L21/04 , H01L29/66 , B82Y99/00 , B82Y40/00
CPC分类号： H01J1/304 , B01J21/185 , B01J23/881 , B01J35/002 , B01J37/0201 , B01J37/0207 , B01J37/08 , B01J37/16 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C01B32/162 , C01B32/174 , C01B2202/08 , H01G9/20 , H01J31/127 , H01J2201/30469 , H01J2329/0455 , H01L51/0048 , Y02E10/549 , Y10T428/24331 , Y10T428/24479
摘要： An organic/inorganic composite is provided. The organic/inorganic composite comprises a silicon (Si) substrate formed with nanorods or nanoholes and three-dimensional networks of carbon nanotubes (CNTs) grown horizontally in parallel and suspended between the adjacent nanorods or inside the nanoholes. In the organic/inorganic composite, metal catalysts can be uniformly formed on the nanorods or inside the nanoholes, irrespective of the height of the nanorods or the depth of the nanoholes and the shape and aspect ratio of the nanorods or nanoholes. In addition, the carbon nanotubes grow in a three-dimensional network structure directly over the entire surface of the nanorods or the whole inner surface of the nanoholes and are directly connected to the base electrodes. With this configuration, the three-dimensional carbon nanotube networks are highly dense per unit volume, and the organic/inorganic composite is highly electrically conductive and has a large surface area. Therefore, the use of the organic/inorganic composite enables the fabrication of an electronic device with greatly improved efficiency. Further provided are a method for preparing the organic/inorganic composite and an electronic device fabricated using the organic/inorganic composite.
摘要翻译：提供有机/无机复合材料。有机/无机复合材料包括由纳米棒或纳米孔形成的硅（Si）衬底和平行水平并且悬浮在相邻纳米棒之间或纳米孔内的碳纳米管（CNT）的三维网络。在有机/无机复合材料中，不管纳米棒的高度或纳米孔的深度以及纳米棒或纳米孔的形状和长宽比如何，金属催化剂可以均匀地形成在纳米棒上或纳米孔内。此外，碳纳米管直接在纳米棒的整个表面或纳米孔的整个内表面上生长在三维网络结构中，并且直接连接到基极。利用这种结构，三维碳纳米管网络每单位体积高密度，有机/无机复合材料具有高导电性并具有大的表面积。因此，通过使用有机/无机复合体，能够大幅提高效率的电子设备的制造。还提供了制备有机/无机复合材料的方法和使用有机/无机复合材料制造的电子器件。

2. 发明授权

US09177745B2 Organic/inorganic composite comprising three-dimensional carbon nanotube networks, method for preparing the organic/inorganic composite and electronic device using the organic/inorganic composite 有权
标题翻译：包含三维碳纳米管网络的有机/无机复合材料，有机/无机复合材料的制备方法和使用有机/无机复合材料的电子器件
公开(公告)号：US09177745B2
公开(公告)日：2015-11-03
申请号：US12999489
申请日：2009-06-15
申请人： Haiwon Lee , Tae-Jae Lee , Jung-Eun Seo
发明人： Haiwon Lee , Tae-Jae Lee , Jung-Eun Seo
IPC分类号： H01J1/304 , B01J21/18 , B01J23/881 , B01J35/00 , B01J37/02 , B01J37/08 , B01J37/16 , B82Y10/00 , B82Y30/00 , C01B31/02 , H01G9/20 , H01J31/12 , H01L51/00 , B82Y40/00
CPC分类号： H01J1/304 , B01J21/185 , B01J23/881 , B01J35/002 , B01J37/0201 , B01J37/0207 , B01J37/08 , B01J37/16 , B82Y10/00 , B82Y30/00 , B82Y40/00 , C01B32/162 , C01B32/174 , C01B2202/08 , H01G9/20 , H01J31/127 , H01J2201/30469 , H01J2329/0455 , H01L51/0048 , Y02E10/549 , Y10T428/24331 , Y10T428/24479
摘要： An organic/inorganic composite is provided. The organic/inorganic composite comprises a silicon (Si) substrate formed with nanorods or nanoholes and three-dimensional networks of carbon nanotubes (CNTs) grown horizontally in parallel and suspended between the adjacent nanorods or inside the nanoholes. In the organic/inorganic composite, metal catalysts can be uniformly formed on the nanorods or inside the nanoholes, irrespective of the height of the nanorods or the depth of the nanoholes and the shape and aspect ratio of the nanorods or nanoholes. In addition, the carbon nanotubes grow in a three-dimensional network structure directly over the entire surface of the nanorods or the whole inner surface of the nanoholes and are directly connected to the base electrodes. With this configuration, the three-dimensional carbon nanotube networks are highly dense per unit volume, and the organic/inorganic composite is highly electrically conductive and has a large surface area. Therefore, the use of the organic/inorganic composite enables the fabrication of an electronic device with greatly improved efficiency. Further provided are a method for preparing the organic/inorganic composite and an electronic device fabricated using the organic/inorganic composite.
摘要翻译：提供有机/无机复合材料。有机/无机复合材料包括由纳米棒或纳米孔形成的硅（Si）衬底和平行水平并且悬浮在相邻纳米棒之间或纳米孔内的碳纳米管（CNT）的三维网络。在有机/无机复合材料中，不管纳米棒的高度或纳米孔的深度以及纳米棒或纳米孔的形状和长宽比如何，金属催化剂可以均匀地形成在纳米棒上或纳米孔内。此外，碳纳米管直接在纳米棒的整个表面或纳米孔的整个内表面上生长在三维网络结构中，并且直接连接到基极。利用这种结构，三维碳纳米管网络每单位体积高密度，有机/无机复合材料具有高导电性并具有大的表面积。因此，通过使用有机/无机复合体，能够大幅提高效率的电子设备的制造。还提供了制备有机/无机复合材料的方法和使用有机/无机复合材料制造的电子器件。

3. 发明授权

US08481663B2 Resist copolymers containing photoacid generators for lithographic applications and its method of preparation 有权
标题翻译：含有光刻产生剂的抗蚀剂共聚物及其制备方法
公开(公告)号：US08481663B2
公开(公告)日：2013-07-09
申请号：US12312231
申请日：2009-02-11
申请人： Haiwon Lee , Meehye Jeong , Ashok D. Sagar
发明人： Haiwon Lee , Meehye Jeong , Ashok D. Sagar
IPC分类号： C08F12/30
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/38 , C08F2220/325 , G03F7/0382
摘要： Disclosed is a copolymer suitable for use as a resist for atomic force microscope (AFM) lithography or e-beam lithography. The copolymer contains fluoroalkylsulfonium salts as photoacid generators. The copolymer has high solubility in organic solvents and high coating ability. In addition, the copolymer can be patterned with high sensitivity and resolution by lithography. Further disclosed is a method of preparation for the copolymer.
摘要翻译：公开了适合用作原子力显微镜（AFM）光刻或电子束光刻的抗蚀剂的共聚物。该共聚物含有氟烷基锍盐作为光酸产生剂。该共聚物在有机溶剂中的溶解度高，涂布能力强。此外，通过光刻可以以高灵敏度和分辨率对共聚物进行图案化。另外公开了共聚物的制备方法。

4. 发明授权

US06596830B2 Silicon-containing polymer and bilayer resist composition based thereon 失效
标题翻译：含硅聚合物和双层抗蚀剂组合物
公开(公告)号：US06596830B2
公开(公告)日：2003-07-22
申请号：US10144110
申请日：2002-05-10
申请人： Haiwon Lee , Sung Soo Kim
发明人： Haiwon Lee , Sung Soo Kim
IPC分类号： C08F3402
CPC分类号： C08F230/08 , G03F7/0045 , G03F7/0758
摘要： Polymeric compounds for use in a chemically amplified resist are represented by the following chemical formulas 1 and 2: wherein R1 and R2, which may be identical or different, are each selected from the group consisting of —H and —CH3; R3 and R4, which may be identical or different, are each selected from the group consisting of —H, —CH3 and —CH2CH3; and 0.1≦m≦0.9 and 0.1≦n≦0.9, with the equation of m+n=1. wherein R3, R4, and R5, which may be identical or different, are each selected from the group consisting of —H and —CH3; R6 and R7, which may be identical or different, are each selected from the group consisting of —H, —CH3 and —CH2CH3; R8 is —CH3 or —CH2CH2OH; and 0.1≦p≦0.9, 0.05≦q≦0.8, and 0.05≦r≦0.5, with the equation of p+q+r=1.
摘要翻译：用于化学放大抗蚀剂的聚合化合物由以下化学式1和2表示：其中可以相同或不同的R 1和R 2各自选自-H和-CH 3; R 3和R 4可以相同或不同，各自选自-H，-CH 3和-CH 2 CH 3; 并且0.1 <= m <= 0.9且0.1 <= n <= 0.9，其中m + n = 1的方程式，其中可以相同或不同的R 3，R 4和R 5各自选自 -H和-CH 3; R 6和R 7可以相同或不同，各自选自-H，-CH 3和-CH 2 CH 3; R8是-CH3或-CH2CH2OH; 和0.1 <= p <= 0.9,0.05 <= q <= 0.8和0.05 <= r <= 0.5，其中p + q + r = 1。

5. 发明申请

US20070203312A1 Novel Monomer Substituted Photoacid Generator Of Fluoroalkylsulfon And A Polymer Thereof 有权
标题翻译：氟烷基磺酸的新型单体取代光生酸剂及其聚合物
公开(公告)号：US20070203312A1
公开(公告)日：2007-08-30
申请号：US11632358
申请日：2006-02-16
申请人： Haiwon Lee , Heeyoung Oh , Hyunjin Yoon , Yongil Kim
发明人： Haiwon Lee , Heeyoung Oh , Hyunjin Yoon , Yongil Kim
IPC分类号： C08F228/02
CPC分类号： G03F7/0045 , C07C309/06 , C07C381/12 , C08F220/14 , C08F220/38 , G03F7/0392
摘要： The present invention relates to a novel compound with a fluoroalkylsulfonium photoacid generating group and novel copolymers having superior solubility in organic solvents, which is prepared from radical polymerization of the novel compound with methacrylate monomers.
摘要翻译：本发明涉及一种具有氟烷基锍光酸产生基团的新化合物和在有机溶剂中具有优异溶解性的新型共聚物，其由新化合物与甲基丙烯酸酯单体的自由基聚合制备。

6. 发明授权

US07891016B2 Automatic landing method and apparatus for scanning probe microscope using the same 有权
标题翻译：扫描探针显微镜的自动着陆方法及装置
公开(公告)号：US07891016B2
公开(公告)日：2011-02-15
申请号：US12225404
申请日：2008-05-29
申请人： Haiwon Lee , Chung Choo Chung , Cheolsu Han
发明人： Haiwon Lee , Chung Choo Chung , Cheolsu Han
IPC分类号： G01Q10/06 , G01Q20/04 , G01B11/08 , G01B9/02
CPC分类号： G01Q10/065 , G01Q10/06 , G01Q20/02
摘要： Disclosed herein are an automatic landing method for a scanning probe microscope and an automatic landing apparatus using the same. The method comprises irradiating light to a cantilever using a light source; collecting interference fringes generated by the light being diffracted from the edge of the cantilever and then being incident to a surface of the sample; driving the tip in the sample direction until the pattern of the interference fringes reaches a predetermined pattern region (first driving); and driving the tip in the sample direction after the interference fringe pattern reached the predetermined pattern region (second driving). The method in accordance with the present invention is very effective particularly for samples having a large surface area, because it enables automatic landing of a tip according to recognition and selection of an optimal time point for individual landing steps, irrespective of adverse changes in landing conditions, such as surface irregularities of samples. Further, the present invention enables a very inexpensive and effective application of a scanning probe microscope (SPM), because it is possible to achieve rapid and reliable driving of a tip to within an approximate distance of a sample.
摘要翻译：这里公开了扫描探针显微镜和使用该自动着陆装置的自动着陆装置的自动着陆方法。该方法包括使用光源将光照射到悬臂; 收集由悬臂的边缘衍射的光然后入射到样品的表面产生的干涉条纹; 在样品方向上驱动尖端，直到干涉条纹的图案到达预定图案区域（第一驱动）; 并且在干涉条纹图案到达预定图案区域（第二驱动）之后沿样品方向驱动尖端。根据本发明的方法对于具有大的表面积的样品是非常有效的，因为它可以根据识别和选择各个着陆步骤的最佳时间点而自动着地，而不管着陆条件的不利变化如何，如样品的表面不规则。此外，本发明能够实现扫描探针显微镜（SPM）的非常便宜和有效的应用，因为可以实现将尖端快速可靠地驱动到样品的近似距离内。

7. 发明授权

US07534844B2 Monomer substituted photoacid generator of fluoroalkylsulfon and a polymer thereof 有权
标题翻译：氟烷基磺酸的单体取代的光酸产生剂及其聚合物
公开(公告)号：US07534844B2
公开(公告)日：2009-05-19
申请号：US11632358
申请日：2006-02-16
申请人： Haiwon Lee , Heeyoung Oh , Hyunjin Yoon , Yongil Kim
发明人： Haiwon Lee , Heeyoung Oh , Hyunjin Yoon , Yongil Kim
IPC分类号： C08F12/30
CPC分类号： G03F7/0045 , C07C309/06 , C07C381/12 , C08F220/14 , C08F220/38 , G03F7/0392
摘要： The present invention relates to a novel compound with a fluoroalkylsulfonium photoacid generating group and novel copolymers having superior solubility in organic solvents, which is prepared from radical polymerization of the novel compound with methacrylate monomers.
摘要翻译：本发明涉及一种具有氟烷基锍光酸产生基团的新化合物和在有机溶剂中具有优异溶解性的新型共聚物，其由新化合物与甲基丙烯酸酯单体的自由基聚合制备。

8. 发明申请

US20110098433A1 RESIST COPOLYMERS CONTAINING PHOTOACID GENERATORS FOR LITHOGRAPHIC APPLICATIONS AND ITS METHOD OF PREPARATION 有权
标题翻译：包含用于光刻应用的光敏发生器的抗性共聚物及其制备方法
公开(公告)号：US20110098433A1
公开(公告)日：2011-04-28
申请号：US12312231
申请日：2009-02-11
申请人： Haiwon Lee , Meehye Jeong , Ashok D. Sagar
发明人： Haiwon Lee , Meehye Jeong , Ashok D. Sagar
IPC分类号： C08F214/18
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/38 , C08F2220/325 , G03F7/0382
摘要： Disclosed is a copolymer suitable for use as a resist for atomic force microscope (AFM) lithography or e-beam lithography. The copolymer contains fluoroalkylsulfonium salts as photoacid generators. The copolymer has high solubility in organic solvents and high coating ability. In addition, the copolymer can be patterned with high sensitivity and resolution by lithography. Further disclosed is a method of preparation for the copolymer.
摘要翻译：公开了适合用作原子力显微镜（AFM）光刻或电子束光刻的抗蚀剂的共聚物。该共聚物含有氟烷基锍盐作为光酸产生剂。该共聚物在有机溶剂中的溶解度高，涂布能力强。此外，通过光刻可以以高灵敏度和分辨率对共聚物进行图案化。另外公开了共聚物的制备方法。

9. 发明申请

US20090293160A1 Automatic Landing Method and Apparatus for Scanning Probe Microscope Using the Same 有权
标题翻译：扫描探针显微镜的自动着陆方法和装置
公开(公告)号：US20090293160A1
公开(公告)日：2009-11-26
申请号：US12225404
申请日：2008-05-29
申请人： Haiwon Lee , Chung Choo Chung , Cheolsu Han
发明人： Haiwon Lee , Chung Choo Chung , Cheolsu Han
IPC分类号： G01N13/10
CPC分类号： G01Q10/065 , G01Q10/06 , G01Q20/02
摘要： Disclosed herein are an automatic landing method for a scanning probe microscope and an automatic landing apparatus using the same. The method comprises irradiating light to a cantilever using a light source; collecting interference fringes generated by the light being diffracted from the edge of the cantilever and then being incident to a surface of the sample; driving the tip in the sample direction until the pattern of the interference fringes reaches a predetermined pattern region (first driving); and driving the tip in the sample direction after the interference fringe pattern reached the predetermined pattern region (second driving). The method in accordance with the present invention is very effective particularly for samples having a large surface area, because it enables automatic landing of a tip according to recognition and selection of an optimal time point for individual landing steps, irrespective of adverse changes in landing conditions, such as surface irregularities of samples. Further, the present invention enables a very inexpensive and effective application of a scanning probe microscope (SPM), because it is possible to achieve rapid and reliable driving of a tip to within an approximate distance of a sample.
摘要翻译：这里公开了扫描探针显微镜和使用该自动着陆装置的自动着陆装置的自动着陆方法。该方法包括使用光源将光照射到悬臂; 收集由悬臂的边缘衍射的光然后入射到样品的表面产生的干涉条纹; 在样品方向上驱动尖端，直到干涉条纹的图案到达预定图案区域（第一驱动）; 并且在干涉条纹图案到达预定图案区域（第二驱动）之后沿样品方向驱动尖端。根据本发明的方法对于具有大的表面积的样品是非常有效的，因为它可以根据识别和选择各个着陆步骤的最佳时间点而自动着地，而不管着陆条件的不利变化如何，如样品的表面不规则。此外，本发明能够实现扫描探针显微镜（SPM）的非常便宜和有效的应用，因为可以实现将尖端快速可靠地驱动到样品的近似距离内。

10. 发明授权

US06774692B2 Apparatus and method for providing square wave to atomic force microscope 有权
标题翻译：用于向原子力显微镜提供方波的装置和方法
公开(公告)号：US06774692B2
公开(公告)日：2004-08-10
申请号：US10124023
申请日：2002-04-17
申请人： Young-hwan Kim , Chung Choo Chung , Haiwon Lee
发明人： Young-hwan Kim , Chung Choo Chung , Haiwon Lee
IPC分类号： H03K3017
CPC分类号： G01Q60/34 , H03K5/02 , H03K5/05 , Y10S977/85
摘要： An apparatus and method for providing an input signal having a desired pulse width and amplitude to atomic force miscoscopes (AFMs) for use in nano-lithography are provided. An input signal providing apparatus for a contact type AFM includes: a pulse width adjusting unit which adjusts the width of a positive pulse of an input square wave to a predetermined pulse width; and an amplitude adjusting unit which adjusts the amplitude of the positive pulse of the square wave to a predetermined voltage. An input signal providing method for the contact type AFM uses the apparatus having this structure. An input signal providing apparatus for a non-contact type AFM further includes a square pulse generating unit which generates a square pulse having a predetermined phase in synchronization with an input resonance signal, and an input signal providing method for the non-contact type AFM further involves generating the square pulse having a predetermined phase in synchronization with the input resonance signal. As a result, more precise nano-lithography can be achieved using an AFM to which the apparatus and method described above are applied.
摘要翻译：提供了一种用于提供具有期望的脉冲宽度和幅度的输入信号的装置和方法，用于在纳米光刻中使用的原子力测量仪（AFM）。用于接触型AFM的输入信号提供装置包括：脉冲宽度调整单元，其将输入方波的正脉冲的宽度调整到预定的脉冲宽度; 以及幅度调整单元，其将所述方波的正脉冲的幅度调整到预定电压。用于接触型AFM的输入信号提供方法使用具有这种结构的装置。用于非接触型AFM的输入信号提供装置还包括平方脉冲产生单元，其产生与输入谐振信号同步的具有预定相位的方波脉冲，以及用于非接触型AFM的输入信号提供方法包括与输入的谐振信号同步地产生具有预定相位的平方脉冲。因此，可以使用应用上述装置和方法的AFM来实现更精确的纳米光刻。

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