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1. 发明申请

WO03072502A2 PREPARATION OF MIXED-HALOGEN HALO-SILANES 审中-公开
标题翻译：混合的卤代甲硅烷的制备
公开(公告)号：WO03072502A2
公开(公告)日：2003-09-04
申请号：PCT/US0306101
申请日：2003-02-27
申请人： HONEYWELL INT INC
发明人： ASIRVATHAM EDWARD , CZARNECKI JEFF , LULY MATTHEW H , MULLAN LAWRENCE F , THENAPPAN ALAGAPPAN
IPC分类号： C01B33/107 , C07F7/12
CPC分类号： C01B33/107 , C07F7/123
摘要： The preparation of halosilanes having mixed-halogen substituents is described comprising providing an aryl-halo-silane having one more first halogens and one or more aryl groups, and substituting one or more of said aryl groups of said aryl-halo-silane with a second halogen having an atomic number greater than that of said first halogen.
摘要翻译：描述了具有混合卤素取代基的卤代硅烷的制备，其包括提供具有一个以上第一卤素和一个或多个芳基的芳基卤代硅烷，并用第二个取代基代替所述芳基卤代硅烷的所述芳基中的一个或多个原子序数大于所述第一卤素的原子数的卤素。

2. 发明申请

WO2007064376A2 ORGANOMETALLIC PRECURSORS AND RELATED INTERMEDIATES FOR DEPOSITION PROCESSES, THEIR PRODUCTION AND METHODS OF USE 审中-公开
标题翻译：有机质前体及相关中间体沉积工艺及其生产及使用方法
公开(公告)号：WO2007064376A2
公开(公告)日：2007-06-07
申请号：PCT/US2006033207
申请日：2006-08-25
申请人： HONEYWELL INT INC , THENAPPAN ALAGAPPAN , LI CHIEN-WEI , NALEWAJEK DAVID , CHENEY MARTIN , LAO JINGYU , EISENBRAUN ERIC , LI MIN , BERLINER NATHANIEL , RITALA MIKKO , LESKELA MARKKU , KUKLI KAUPO
发明人： THENAPPAN ALAGAPPAN , LI CHIEN-WEI , NALEWAJEK DAVID , CHENEY MARTIN , LAO JINGYU , EISENBRAUN ERIC , LI MIN , BERLINER NATHANIEL , RITALA MIKKO , LESKELA MARKKU , KUKLI KAUPO
IPC分类号： C07F15/00 , C23C16/18
CPC分类号： C07F17/02 , C23C16/18
摘要： Vapor deposition precursors that can deposit conformal thin ruthenium films on substrates with a very high growth rate, low resistivity and low levels of carbon, oxygen and nitrogen impurities have been provided. The precursors described herein include a compound having the formula CMC', wherein M comprises a metal or a metalloid; C comprises a substituted or unsubstituted acyclic alkene, cycloalkene or cycloalkene-like ring structure; and C' comprises a substituted or unsubstituted acyclic alkene, cycloalkene or cycloalkene-like ring structure; wherein at least one of C and C' further and individually is substituted with a ligand represented by the formula CH(X)R 1 , wherein X is a N, P, or S-substituted functional group or hydroxyl, and R 1 is hydrogen or a hydrocarbon. Methods of production of the vapor deposition precursors and the resulting films, and uses and end uses of the vapor deposition precursors and resulting films are also described.
摘要翻译：已经提供了可以在非常高的生长速率，低电阻率和低水平的碳，氧和氮杂质的基底上沉积保形薄钌薄膜的气相沉积前体。本文所述的前体包括具有式CMC'的化合物，其中M包含金属或准金属; C包括取代或未取代的无环烯烃，环烯烃或环烯烃环结构; 和C'包括取代或未取代的无环烯烃，环烯烃或环烯烃环结构; 其中C和C'中的至少一个进一步和单独地被式CH（X）R 1表示的配体取代，其中X是N，P或S-取代的官能团或羟基和R 1是氢或烃。还描述了气相沉积前体和所得膜的生产方法，以及气相沉积前体和所得膜的用途和最终用途。

3. 发明申请

WO2007005088A3 VAPORIZABLE METALORGANIC COMPOUNDS FOR DEPOSITION OF METALS AND METAL-CONTAINING THIN FILMS 审中-公开
标题翻译：用于金属沉积和含金属薄膜的可蒸发金属化合物
公开(公告)号：WO2007005088A3
公开(公告)日：2007-05-18
申请号：PCT/US2006014752
申请日：2006-04-17
申请人： HONEYWELL INT INC , THENAPPAN ALAGAPPAN , LAO JINGYU , NAIR HARIDASAN K , DEVI ANJANA , BHAKTA RAGHUNANDAN , MILANOV ANDRIAN
发明人： THENAPPAN ALAGAPPAN , LAO JINGYU , NAIR HARIDASAN K , DEVI ANJANA , BHAKTA RAGHUNANDAN , MILANOV ANDRIAN
IPC分类号： C07F7/00 , C07F9/00 , C23C16/00 , H01L21/00
CPC分类号： C23C16/45553 , C07F7/006 , C07F9/005 , C23C16/405
摘要： A new class of metalorganic vaporizable compounds with mixed ligands is described herein, along with their use for the deposition of thin films of metals and metal- containing oxides, nitrides, oxynitrides, silicates, suicides, metal containing materials, and combinations thereof. . The metalorganic vaporizable compounds comprise amides in combination with malonates and guanidinates as donor-functionalized bidentate chelating ligands. The use of a metalorganic vaporizable compounds with mixed ligands to deposit and modify thin films of Hf, Zr, Ti, Ta, Al, Sn, Zn, Ca, Mg, Ga, In, Tl, Sc, Bi, Rh, Ir, La, Pr, Eu, Gd, Ba, Sr, and other lanthanide metal oxides, nitrides, oxynitrides, silicates, suicides, and composites, and further use of metalorganic vaporizable compounds with mixed ligands to deposit thin films of Ru, Cu, Co, Ag, Au, Pd, Pt, Ni, Fe, Mn, Cr, V, Nb, Pb, W, Si, Ge and Mo metals, metal oxides, nitrides, oxynitrides, silicates, suicides and combinations thereof are also described herein. A process for the preparation of metalorganic vaporizable compounds comprising amides in combination with donor-functionalized bidentate chelating ligands as a mixed ligand system is described herein. In addition, the use of metalorganic vaporizable compounds in various vapor phase deposition processes such as metal organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD) of metals and metal-containing oxide thin films is described herein.
摘要翻译：本文描述了一类新的具有混合配体的金属有机气化化合物，以及它们用于沉积金属和含金属氧化物，氮化物，氮氧化物，硅酸盐，硅化物，含金属材料及其组合的薄膜的用途。。金属有机可汽化化合物包含与丙二酸盐和胍盐组合的酰胺作为供体官能化的二齿螯合配体。使用具有混合配体的金属有机可汽化化合物沉积和修饰Hf，Zr，Ti，Ta，Al，Sn，Zn，Ca，Mg，Ga，In，Tl，Sc，Bi，Rh，Ir，La中的薄膜，Pr，Eu，Gd，Ba，Sr和其他镧系元素金属氧化物，氮化物，氮氧化物，硅酸盐，硅化物和复合材料，并进一步使用具有混合配体的金属有机可汽化化合物沉积Ru，Cu，Co，Ag 本文还描述了Au，Pd，Pt，Ni，Fe，Mn，Cr，V，Nb，Pb，W，Si，Ge和Mo金属，金属氧化物，氮化物，氮氧化物，硅酸盐，硅化物及其组合。本文描述了一种制备包含与供体官能化的二齿螯合配体作为混合配体体系的酰胺的金属有机可汽化化合物的方法。另外，本文描述了在金属有机化学气相沉积（MOCVD）和金属和含金属的氧化物薄膜的原子层沉积（ALD）的各种气相沉积工艺中使用金属有机可汽化化合物。

4. 发明公开

EP2791192A4 PROCESS, PROPERTIES, AND APPLICATIONS OF GRAFT COPOLYMERS 有权转让
标题翻译：过程，特点和接枝共聚物中的应用
公开(公告)号：EP2791192A4
公开(公告)日：2015-07-08
申请号：EP12858659
申请日：2012-12-14
申请人： HONEYWELL INT INC
发明人： THENAPPAN ALAGAPPAN , RAINAL ERIC , AMEDURI BRUNO , BOSCHET FREDERIC , AJELLAL NOUREDDINE , LOPEZ GERALD
IPC分类号： C08F259/00 , C08F259/02 , C08F259/08 , C08J5/18 , C08L27/00
CPC分类号： C08F214/24 , C08F259/00 , C08J5/18 , C08J2327/12
摘要： Fluorinated macromonomers, a PCTFE-g-poly(M) graft copolymer, and moisture barrier films and articles formed therefrom are provided. The PCTFE-g-poly(M) graft copolymers have a PCTFE backbone component and a plurality of pendant groups attached to the PCTFE backbone component.

5. 发明公开

EP3052536A4 SYNTHESIS OF CHLOROTRIFLUOROETHYLENE-BASED BLOCK COPOLYMERS BY IODINE TRANSFER POLYMERIZATION 有权
标题翻译：合成二氯乙烯苯乙烯嵌段共聚物去离子水
公开(公告)号：EP3052536A4
公开(公告)日：2017-05-17
申请号：EP14848121
申请日：2014-09-12
申请人： HONEYWELL INT INC , CENTRE NAT RECH SCIENT
发明人： THENAPPAN ALAGAPPAN , AMADURI BRUNO , LOPEZ GERALD
IPC分类号： C08F293/00 , C08F2/38 , C08F214/24
CPC分类号： C08F214/242 , C08F2/38 , C08F214/24 , C08F293/005 , C08F2438/00
摘要： Methods for the synthesis of CTFE-based block copolymers through iodine transfer polymerization are disclosed. In an exemplary embodiment, a method includes reacting a fluoromonomer “M” with a chain transfer agent of the formula X—Y or Y—X—Y, wherein X represents a C1-C3 hydrocarbon, a C1-C6 hydrofluorocarbon, C1-C6 hydrochlorofluorocarbon, or C1-C6 fluorocarbon and Y represents iodine or bromine, in the presence of a radical initiator, to form a macro-initiator of the formula: X-poly(M)-Y or Y-poly(M)-X-poly(M)-Y, wherein poly(M) represents a polymer of the fluoromonomer. The method further includes reacting the macro-initiator with chlorotrifluoroethylene (CTFE) in the presence of a radical initiator to form a diblock or a triblock CTFE-based block copolymer of the formula: X-poly(M)-block-poly(CTFE) or PCTFE-block-poly(M)-X-poly(M)-block-PCTFE.
摘要翻译：公开了通过碘转移聚合合成CTFE基嵌段共聚物的方法。在一个示例性实施方案中，一种方法包括使含氟单体“M”与式X-Y或Y-X-Y的链转移剂反应，其中X表示C1-C3烃，C1-C6氢氟烃，C1-C6 氯代氟代烃或C1-C6碳氟化合物，Y代表碘或溴，在自由基引发剂的存在下形成下式的大分子引发剂：X-聚（M）-Y或Y-聚（M）-X- 聚（M）-Y，其中聚（M）表示所述含氟单体的聚合物。该方法还包括在自由基引发剂存在下使大分子引发剂与氯三氟乙烯（CTFE）反应以形成下式的二嵌段或三嵌段CTFE基嵌段共聚物：X-聚（M） - 嵌段 - 聚（CTFE）或PCTFE-嵌段 - 聚（M）-X-聚（M） - 嵌段-PCPFE。

6. 发明公开

EP3189086A4 METHODS FOR SYNTHESIZING STABILIZED POLYMERS OF CHLOROTRIFLUOROETHYLENE AND PRODUCTS MANUFACTURED USING SUCH POLYMERS 有权
公开(公告)号：EP3189086A4
公开(公告)日：2018-04-18
申请号：EP15839036
申请日：2015-08-25
申请人： HONEYWELL INT INC
发明人： THENAPPAN ALAGAPPAN , RAINAL ERIC
IPC分类号： C08F14/24 , C08F114/24 , C08F214/24 , C08J5/00 , C08L27/00
CPC分类号： C08K5/19 , C08F14/24 , C08F2/16
摘要： Methods for synthesizing stabilized polymers of chlorotrifluoroethylene and products manufactured using such polymers are disclosed herein. In one exemplary embodiment, a method for synthesizing chlorotrifluoroethylene (CTFE)-based polymers includes reacting, in the presence of an initiator and in a reaction medium at a pH of about 1.5 to about 2.5, one or more monomers comprising CTFE and after an amount of polymerization reaction time has passed, adding a neutralizing agent to the reaction medium to increase the pH of the reaction medium to within a range of about 1.8 to about 6.0.

7. 发明公开

EP2956496A4 FLUOROPOLYMERS CONTAINING A COPOLYMERIZED FLUOROMONOMER AND A FUNCTIONAL HYDROCARBON COMONOMER AND ARTICLES MADE FROM SUCH FLUOROPOLYMERS 有权
标题翻译：具有共聚含氟单体和官能共聚单体烃和这些聚合物FLUOR ARTICLES含氟聚合物
公开(公告)号：EP2956496A4
公开(公告)日：2016-10-12
申请号：EP14751752
申请日：2014-02-14
申请人： HONEYWELL INT INC , CENTRE NAT RECH SCIENT
发明人： THENAPPAN ALAGAPPAN , AMEDURI BRUNO , LOPEZ GERALD , RAINAL ERIC , AJELLAL NOUREDDINE , MARTIN GARY
IPC分类号： C08J5/18 , B32B27/08 , B32B27/32 , C08F214/18 , C08J7/04 , C09D127/12
CPC分类号： C09D127/12 , B32B27/08 , B32B27/304 , B32B27/308 , B32B27/322 , B32B27/36 , B32B2307/412 , B32B2307/714 , B32B2307/7265 , B32B2439/00 , B32B2439/80 , B32B2581/00 , B32B2597/00 , C08J5/18 , C08J7/047 , C08J2327/06 , C08J2327/12 , C08J2367/02 , C08J2379/08 , C08J2427/04 , C08J2427/12 , Y10T428/31507 , Y10T428/31544
摘要： Disclosed is a copolymer film that includes a first comonomer including a chlorofluoro olefin and a second comonomer that is selected from the group consisting of itaconic acid, 2,3-dihydropyran, D-glucal, glycerine carbonate vinyl ether, 2-hydroxypropyl acrylate, maleic anhydride, vinylidene chloride, and mixtures thereof.

8. 发明公开

EP2898147A4 CHLOROFLUOROPOLYMER COATED SUBSTRATES AND METHODS FOR PRODUCING THE SAME 审中-公开
标题翻译：氯含氟聚合物涂覆基片及其制备方法
公开(公告)号：EP2898147A4
公开(公告)日：2016-05-04
申请号：EP13839104
申请日：2013-09-12
申请人： HONEYWELL INT INC
发明人： RAINAL ERIC , KERKAR AWDHOOT VASANT , THENAPPAN ALAGAPPAN
IPC分类号： D21H19/52 , D21H19/10 , D21H19/20 , D21H19/24 , D21H19/48 , D21H21/16
CPC分类号： D21H19/12 , D21H19/10 , D21H19/20 , D21H21/16 , Y10T428/3154

9. 发明专利

ES2725804T3 Proceso, propiedades y aplicaciones de copolímeros de injerto 未知
公开(公告)号：ES2725804T3
公开(公告)日：2019-09-27
申请号：ES12858659
申请日：2012-12-14
申请人： HONEYWELL INT INC
发明人： THENAPPAN ALAGAPPAN , RAINAL ERIC , AMEDURI BRUNO , BOSCHET FREDERIC , AJELLAL NOUREDDINE , LOPEZ GERALD
IPC分类号： C08F259/00 , C08F259/02 , C08F259/08 , C08J5/18 , C08L27/00
摘要： Un proceso para la síntesis de copolímeros de injerto PCTFE-(poli-clorotrifluoroetileno)-g-poli(M), comprendiendo el procedimiento: a) proporcionar una molécula que tiene la fórmula: X-[C(A)2C(B)(B')]n-Q[CY=C(Z)(Z')] o [C(A)2=C(B)]n-Q[C(Y)(10 Y')-C(Z)(Z')]-X', en las que A es H o F; B y B' son H, F o Cl, y no son necesariamente iguales; X y X' son Br, Cl o I (y no son necesariamente iguales); Y e Y' son F, Br, Cl o I (y no son necesariamente iguales); y en la que Z y Z' son F, Br, Cl o I (y no son necesariamente iguales); Q es opcional y es oxígeno (O) o azufre (S); y n es al menos 1; y b) hacer reaccionar la molécula X-[C(A)2C(B)(B')]n-Q[CY=C(Z)(Z')] o [C(A)2=C(B)]n-Q[C(Y)(Y')-C(Z)(Z')]-X' con un monómero CTFE en presencia de un iniciador por radicales libres, formando así el monómero CTFE para dar un componente de esqueleto del copolímero de injerto poli-CTFE que tiene uno o más componentes monoméricos colgantes X'-[C(A)2C(B)(B')]n- o -[C(Y)(Y')-C(Z)(Z')]-X' unidos al mismo.

10. 发明专利

CA2884590C CHLOROFLUOROPOLYMER COATED SUBSTRATES FOR PACKAGING MATERIALS 未知
公开(公告)号：CA2884590C
公开(公告)日：2021-08-24
申请号：CA2884590
申请日：2013-09-12
申请人： HONEYWELL INT INC
发明人： RAINAL ERIC , KERKAR AWDHOOT VASANT , THENAPPAN ALAGAPPAN
IPC分类号： D21H19/24
摘要： Disclosed is a coated substrate, which includes a substrate comprising a cellulosic fiber material and a copolymer coated in a thin film on at least one surface of the substrate. The copolymer has at least two comonomer units of the formula: CX2CYA, wherein each X is independently selected from the group consisting of H, C1 and F; Y is selected from the group consisting of H, C1, F, O(CZ2)nCZ3, (CZ2)nCZ3, (OCZ2CZ2)nCZ3 and (O(CZ2)n)nCZ3, wherein each n is independently from about 1 to about 12 and each Z is independently selected from the group consisting of H, Cl and F; and A is selected from the group consisting of H, Cl and F; provided that for at least one comonomer unit, at least one of A, Y, and either X or any Z is C1.

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