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    • 10. 发明专利
    • Semiconductor integrated circuit device
    • SG157794G
    • 1995-03-17
    • SG157794
    • 1994-10-27
    • HITACHI LTD
    • SATO KATSUYUKIYANAGISAWA KAZUMASA
    • G11C11/407G11C5/14G11C11/4074G11C5/00G11C11/24
    • In an MOS integrated circuit device, the level of the back-bias voltage (-Vbb) which is generated by a built-in back-bias generation circuit (Vbb-G) and is supplied to a semiconductor substrate is changed by undesirable leakage current flowing through the semiconductor substrate. The leakage current is not constant but becomes relatively small when a main circuit formed on the semiconductor substrate such as a dynamic RAM is not operative, and relatively great when such a circuit is operative. To reduce the change of the back-bias voltage resulting from the change of the leakage current, the back-bias voltage generation circuit (Vbb-G) has an output capacity of a plurality of levels. The output capacity is increased in response to an operation control signal of the main circuit. The level change of the back-bias voltage generation circuit (Vbb-G) can further be reduced by providing a level detection circuit (VLD) for detecting the level change and a feedback circuit for controlling the back-bias voltage generation circuit in accordance with the output of the level detection circuit (VLD)