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1. 发明专利

DE102016209442A1 Zusatzstromversorgungssystem und Betriebsverfahren dafür 未知
公开(公告)号：DE102016209442A1
公开(公告)日：2016-12-01
申请号：DE102016209442
申请日：2016-05-31
申请人： HITACHI LTD
发明人： MURAOKA KAZUFUMI , KAWAMOTO TAKEHIRO , YAMAGUCHI SATOSHI , KOGURE HIROSHI
IPC分类号： B60L3/00
摘要： Ein Zusatzstromversorgungssystem enthält mehrere Zusatzstromversorgungen 31, 32, die einen Umsetzer 4 zum Umsetzen einer von einer Oberleitung 1 empfangenen Leistung in eine Wechselstromleistung, ferner eine Fahrzeugverbindungsanschlussdose 111–113 zum Verbinden einer Ausgangsleitung, wenn die Ausgangsleitung 91–95 von der Zusatzstromversorgung 31, 32 die Fahrzeuge verbindet, und einen elektromagnetischen Kontaktgeber 122, der zwischen den Ausgangsleitungen 91–95 vorgesehen ist, enthalten. Die Zusatzstromversorgung 31, 32 enthält eine Steuervorrichtung 8 zum Steuern des Umsetzers 4 und des elektromagnetischen Kontaktgebers 122. Die Steuervorrichtung 8 öffnet den elektromagnetischen Kontaktgeber 122, wenn sie einen Abweichungszustand einer Zustandsmenge entsprechend einem Eingang oder einem Ausgang des Umsetzers 4 so häufig wie oder häufiger als eine vorgegebene Anzahl von Wiederholungen innerhalb einer vorgegebenen Zeit detektiert.

2. 发明专利

DE102016209442B4 Zusatzstromversorgungssystem und Betriebsverfahren dafür 未知
公开(公告)号：DE102016209442B4
公开(公告)日：2022-08-04
申请号：DE102016209442
申请日：2016-05-31
申请人： HITACHI LTD
发明人： MURAOKA KAZUFUMI , KAWAMOTO TAKEHIRO , YAMAGUCHI SATOSHI , KOGURE HIROSHI
IPC分类号： B60L3/00 , B60L1/00
摘要： Zusatzstromversorgungssystem, das Folgendes umfasst:mehrere Zusatzstromversorgungen (31, 32), die konfiguriert sind, einen Umsetzer (4) zum Umsetzen einer von einer Oberleitung (1) empfangenen Leistung in eine Wechselstromleistung zu enthalten; undeinen elektromagnetischen Kontaktgeber (122), der konfiguriert ist, zwischen Ausgangsleitungen (91 - 95) der Zusatzstromversorgungen (31, 32) vorgesehen zu sein, wobeidie Zusatzstromversorgung (31, 32) eine Steuervorrichtung (8) zum Steuern des Umsetzers (4) und des elektromagnetischen Kontaktgebers (122) enthält, dadurch gekennzeichnet, dasseine Fahrzeugverbindungsanschlussdose (111 - 113), die konfiguriert ist, die Ausgangsleitung (91 - 95) zu verbinden, wenn die Ausgangsleitung (91 - 95) von der Zusatzstromversorgung (31, 32) Fahrzeuge verbindet; unddie Steuervorrichtung (8) den elektromagnetischen Kontaktgeber (122) öffnet, wenn sie einen Abweichungszustand einer Zustandsmenge entsprechend einem Eingang oder einem Ausgang des Umsetzers (4) so häufig wie oder häufiger als die vorgegebene Anzahl der Wiederholungen innerhalb einer vorgegebenen Zeit detektiert.

3. 发明专利

JP2006004212A Program for making computer execute estimation method of damage by flood disaster and information presentation method 审中-公开
标题翻译：用于制作计算机执行程序的破坏方法和灾害信息呈现方法
公开(公告)号：JP2006004212A
公开(公告)日：2006-01-05
申请号：JP2004180435
申请日：2004-06-18
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI SATOSHI , MURO HIROAKI , EGI MASASHI , NAONO TAKESHI
IPC分类号： G06Q10/00 , G06Q50/00 , G06Q50/10
CPC分类号： Y02A10/46
摘要： PROBLEM TO BE SOLVED: To estimate a probability distribution of flood disaster, calculate a risk index, and display them in an easy-to-understand way in order to evaluate articles damaged by flood disaster and the risk of a financial article such as an insurance securing the damage by flood disaster. SOLUTION: A trial number setting process 101 makes a user set a trial number. A scenario generation process 101 generates a description for a condition necessary for hydraulic analysis. A process 103 repeats processes 104 and 105 for all scenarios. A hydraulic analysis process 104 performs hydraulic analysis. A damage amount calculation process 105 calculates the damage amounts of articles from the result of hydraulic analysis. A damage amount probability distribution calculation process 106 calculates a probability distribution of damage amount from the damage amounts calculated for each scenario and for each article. The program comprises these functions. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了估计洪灾的概率分布，计算风险指数，并以易于理解的方式显示，以评估受洪灾灾害损害的物品和财务文章的风险作为确保洪水灾害造成的损失的保险。
解决方案：试用号码设定处理101使用户设定试用号码。方案生成处理101生成用于水力分析所需的条件的说明。过程103针对所有场景重复进程104和105。液压分析过程104进行水力分析。损伤量计算处理105根据水力分析结果计算物品的损伤量。损伤量概率分布计算处理106根据针对每个场景和每个物品计算的损伤量计算损伤量的概率分布。该程序包括这些功能。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2002340810A INSPECTION POINT EXTRACTION METHOD AND ITS DEVICE 失效
公开(公告)号：JP2002340810A
公开(公告)日：2002-11-27
申请号：JP2001147193
申请日：2001-05-17
申请人： HITACHI LTD
发明人： KITAHASHI KATSUHIRO , HONDA TOSHIFUMI , OZAWA YASUHIKO , YAMAGUCHI SATOSHI
IPC分类号： G01B11/30 , G01N21/956 , G01N23/225 , G01R31/302 , G06T1/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an inspection point extraction method and its device for discriminating accurately the pattern state on points to be inspected, and extracting only inspection points enabling high-speed inspection by utilizing the discrimination result. SOLUTION: This inspection point extraction method and its device is characterized by discriminating necessity of a reference point image corresponding to an image to be inspected at the point to be inspected by using design layout data beforehand, and selecting the inspection points by extracting only the inspection points not requiring acquisition of the image on the reference point, in an abnormal part image collecting device for acquiring inspection point information on an inspection object from an abnormal part inspection device beforehand, and collecting the image for inspecting the abnormal part in detail by using the inspection point information.

5. 发明专利

JPH08298091A SCANNING ELECTRON MICROSCOPE 失效
公开(公告)号：JPH08298091A
公开(公告)日：1996-11-12
申请号：JP10189795
申请日：1995-04-26
申请人： HITACHI LTD
发明人： YAMAGUCHI SATOSHI
IPC分类号： H01J37/22 , H01J37/28
摘要： PURPOSE: To select the optimum pattern by detecting a pattern in the optimum threshold value found on registering and evaluating a reference pattern. CONSTITUTION: The similarity of a reference pattern itself is found with an electro-optical system for scanning electron beams on a sample 5, an image memory 11 for memorizing an image obtained by scanning, and an image processing device which detects the position on the image of the reference pattern and finds the similarity of similar patterns, and a threshold value is found with the value of patterns with high similarity, and when the pattern is detected, the pattern having the similarity higher than this threshold value is detected. By selecting the optimum pattern threshold value or by deciding the optimum threshold value, detecting time in pattern detection is shortened. Automatic measurement of various patterns on an actual device is made possible, automatic measurement and a throughput in a semiconductor manufacture line are increased.

6. 发明专利

JP2013250129A Insolation prediction system and program 审中-公开
标题翻译：绝对预测系统和程序
公开(公告)号：JP2013250129A
公开(公告)日：2013-12-12
申请号：JP2012124489
申请日：2012-05-31
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI SATOSHI
IPC分类号： G01W1/12
摘要： PROBLEM TO BE SOLVED: To predict a wide range of insolation in high accuracy at a low cost.SOLUTION: An insolation prediction system for predicting an insolation of an object point includes: an image creation device 11 that is provided at a first point and outputs an image obtained by capturing a periphery of the sun; an insolation measuring instrument 12 that is installed at a second point different from the first point and measures and outputs the insolation; and an insolation prediction device 20 that acquires from the image creation device 11, the image obtained by capturing the periphery of the sun, acquires an insolation value from the image measuring instrument 12, predicts an insolation at a third point different from the second point a prescribed time thereafter, and outputs a value of the predicted insolation.
摘要翻译：要解决的问题：以低成本高精度地预测宽范围的日照。解决方案：用于预测物点的日照的日照预测系统包括：图像创建装置11，被设置在第一点并输出通过捕获太阳的周边获得的图像; 日照测量仪器12，安装在不同于第一点的第二点上，测量和输出日照; 以及日照预测装置20，其从图像生成装置11获取通过拍摄太阳的周边而获得的图像，从图像测量装置12获取日照值，预测在与第二点a不同的第三点处的日照然后输出预测的日照值。

7. 发明专利

JP2009016361A Charged particle beam device 有权
标题翻译：充电颗粒光束装置
公开(公告)号：JP2009016361A
公开(公告)日：2009-01-22
申请号：JP2008269293
申请日：2008-10-20
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI SATOSHI , OZAWA YASUHIKO , TAKANE ATSUSHI , SATO MITSUGI
IPC分类号： H01J37/04 , H01J37/147 , H01J37/153 , H01J37/22 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam device and an adjusting method of the charged particle beam device, in and by which an optical axis can easily be adjusted even if a condition of a charged particle beam is changed.
SOLUTION: In the charged particle beam device provided with a charged particle beam source, an optical element for adjusting the charged particle beam emitted from the charged particle beam source, and an alignment deflecting unit for making an axis adjustment against the optical element, there are also provided a means for detecting centers of gravity of patterns of two images which are obtained when a condition of the optical element is changed, a means for detecting a deviation of centers of gravity of the above two patterns, and a means for calculating a deflection amount of the alignment deflection unit based on the deviation of the centers of gravity of the two patterns.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供带电粒子束装置和带电粒子束装置的调整方法，即使改变带电粒子束的条件，光轴也可容易地被调节。解决方案：在具有带电粒子束源的带电粒子束装置中，用于调节从带电粒子束源发射的带电粒子束的光学元件和用于对光学元件进行轴线调整的对准偏转单元还提供了一种用于检测当光学元件的状况改变时获得的两个图像的图案的重心的装置，用于检测上述两种图案的重心偏差的装置，以及用于基于两个图案的重心的偏差来计算对准偏转单元的偏转量。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2007012624A Pattern matching method and apparatus 有权
标题翻译：图案匹配方法和装置
公开(公告)号：JP2007012624A
公开(公告)日：2007-01-18
申请号：JP2006188798
申请日：2006-07-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI SATOSHI , IIIZUMI TAKASHI , KOMURO OSAMU , MOROKUMA HIDETOSHI , MAEDA TATSUYA , ARIMA JUNTARO , OZAWA YASUHIKO
IPC分类号： H01J37/22 , G01N23/225
摘要： PROBLEM TO BE SOLVED: To make a scanning electron microscope operate with high precision at high speed by reducing a process for inspection alignment, inputting work or the like.
SOLUTION: The scanning electron microscope having a function specifying a desired position based on a pattern registered beforehand, comprises a means for setting information about the type of the pattern, spaces between a plurality of parts forming the pattern and the size of parts forming the pattern, and a means for forming a pattern image formed of a plurality of the parts based on information acquired by the setting means.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：通过减少检查对准，输入工作等的处理，使扫描电子显微镜以高精度高速运行。解决方案：具有基于预先登记的图案指定期望位置的功能的扫描电子显微镜包括用于设置关于图案的类型的信息的装置，形成图案的多个部件与部件的尺寸之间的间隔形成图案，以及用于基于由设置装置获取的信息形成由多个部分形成的图案图像的装置。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2003059441A Scanning electron microscope 审中-公开
标题翻译：扫描电子显微镜
公开(公告)号：JP2003059441A
公开(公告)日：2003-02-28
申请号：JP2002151105
申请日：2002-05-24
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI SATOSHI , KOMURO OSAMU
IPC分类号： G01B15/00 , H01J37/147 , H01J37/22 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To stably detect a pattern observed a little differently from registering time though being the same pattern on design.
SOLUTION: A plurality of patterns in a sample image 30 are respectively registered together with an offset 34 to an objective position 33 in observation power, an observation condition, and the sample image as models 35, 36 and 37. When detecting the patterns, the registered observation power and observation condition are reproduced, a pattern similar to the models is detected from the sample image by using the models 35, 36 or 37, and the objective position in the sample image is detected by using a position and the offset of the detected pattern.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了稳定地检测观察到的图案与注册时间略有不同，尽管在设计上是相同的图案。解决方案：样本图像30中的多个图案分别以观察功率，观察条件和样本图像作为模型35,36和37分别与偏移34一起登记到目标位置33。当检测到图案时，注册观察功率和观察条件被再现，通过使用模型35,36或37从样本图像中检测到与模型相似的模式，并且通过使用位置和位置来检测样本图像中的目标位置检测模式。

10. 发明专利

JP2003022771A Particle beam device 有权
标题翻译：颗粒光束装置
公开(公告)号：JP2003022771A
公开(公告)日：2003-01-24
申请号：JP2001208674
申请日：2001-07-10
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YAMAGUCHI SATOSHI , OZAWA YASUHIKO , TAKANE ATSUSHI , SATO MITSUGI
IPC分类号： H01L21/66 , H01J37/04 , H01J37/147 , H01J37/153 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a particle beam device and an adjusting method of the particle beam equipment, which enable to perform adjustment of a light axis easily, even if the state of the particle beam changes.
SOLUTION: It has an operation means to calculate deflection amount of an alignment deflector which performs axial adjustment to an object lens and the like, memorizes two or more calculating methods for calculating the above deflection amount for this operation means, and has a selection means to choose the calculating method concerned.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：即使粒子束的状态发生变化，也能够容易地进行能够进行光轴的调整的粒子束装置的粒子束装置和调整方法。解决方案：具有计算对物镜等进行轴向调节的对准偏转器的偏转量的操作手段，存储用于计算该操作装置的上述偏转量的两种或多种计算方法，并具有选择装置，选择有关的计算方法。

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