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1. 发明专利

JPH06325710A MICROWAVE ION SOURCE AND ION IMPLANTING DEVICE 失效
公开(公告)号：JPH06325710A
公开(公告)日：1994-11-25
申请号：JP11308593
申请日：1993-05-14
申请人： HITACHI LTD
发明人： AMAMIYA KENSUKE , TOKIKUCHI KATSUMI , ITO JUNYA , SAKUMICHI KUNIYUKI
IPC分类号： C23C14/48 , H01J27/18 , H01J37/08 , H01J37/317 , H01L21/265
摘要： PURPOSE:To obtain an ion source to generate a polyvalent ion beam of a large current scope, and an ion implanting device using such an ion source. CONSTITUTION:Inside a discharge chamber 1, a multipole magnetic field produced by a permanent magnet 2 with eight poles, and a mirror magnetic field produced by two coils 3 are formed, and a microwave 5 is led in through a quartz window 4 for vacuum sealing so as to carry out a microwave discharge. A hot filamant 8 is provided in the discharge chamber 1, and electrons can be fed in the plasma produced by the microwave discharge through the hot filamant 8. As a result, a plasma with a high electron density and a high electron temperature can be produced, and a polyvalent ion beam 6 after a mass separation of a large current scope of the figure of 10 mA can be generated. By using such a microwave ion source as an ion implanting device, a high energy ion beam with a desired energy from several hundred keV to several MeV can be implanted to a target.

2. 发明专利

JPH06290725A ION SOURCE APPARATUS AND ION IMPLANTATION APPARATUS WITH ION SOURCE APPARATUS 失效
公开(公告)号：JPH06290725A
公开(公告)日：1994-10-18
申请号：JP7682493
申请日：1993-04-02
申请人： HITACHI LTD
发明人： TOKIKUCHI KATSUMI , AMAMIYA KENSUKE , ITO JUNYA , SAKUMICHI KUNIYUKI
IPC分类号： C23C14/48 , H01J27/02 , H01J27/18 , H01J37/08 , H01J37/317 , H01L21/265
摘要： PURPOSE:To provide an ion source apparatus for high energy ion implantation wherein beam emittance can be controlled independently without affecting a beam current. CONSTITUTION:In an ion source apparatus, plasma from one plasma source 4 is introduced into another plasma chamber 10 whose mirror magnetic field intensity ratio can be changed and an ion beam emitter electrode 6 is installed near a position of the maximum magnetic field intensity in the plasma chamber 10. Consequently, since the emittance of the emitted ion beam from the ion source apparatus can be adjusted independently of operational parameters of the ion source apparatus, an ion source apparatus with low emittance can be provided. By using the apparatus for an ion implantation apparatus, implantation current can be increased. An ion implantation apparatus available for a large current Me V class beam of move than mA is obtained in a wire acceleration energy range.

3. 发明专利

JPH06260132A ION IMPLANTING DEVICE 失效
公开(公告)号：JPH06260132A
公开(公告)日：1994-09-16
申请号：JP4110093
申请日：1993-03-02
申请人： HITACHI LTD
发明人： ITO JUNYA , TOKIKUCHI KATSUMI , AMAMIYA KENSUKE , SAKUMICHI KUNIYUKI
IPC分类号： C23C14/48 , H01J37/317 , H01L21/265
摘要： PURPOSE:To provide an ion implanting device which uses an ion accelerator such as a radio frequency quadripole (RFQ) accelerator, whereby low energy ions below the specified acceleration energy among ions emitted from the ion accelerator are excluded so that only those ions accelerated to the specified energy level are implanted. CONSTITUTION:An ion implanting device comprises an ion source 1, mass separator 2, an RFQ accelerator 3, and implanting chamber 4, and the arrangement further includes a bias electrode 7 for low energy removal located between the accelerator 3 and a body 5 to be ion implanted and a grounding electrode 6 which is to seize the ions likely to run directly against the electrode 7. When the potential of the bias electrode 7 is selected properly, the low energy ions emitted from the accelerator 3 without being accelerated to the specified energy level can be hindered from reaching the body to be ion implanted 5.

4. 发明专利

JPH04196032A MICROWAVE ION SOURCE FOR GENERATING MASS ION 失效
公开(公告)号：JPH04196032A
公开(公告)日：1992-07-15
申请号：JP32289990
申请日：1990-11-28
申请人： HITACHI LTD
发明人： TOKIKUCHI KATSUMI , GOTO SUMITAKA , AMAMIYA KENSUKE , HAKAMATA YOSHIMI , SAKUMICHI KUNIYUKI
IPC分类号： H01J27/16 , H01J27/18 , H01J37/08
摘要： PURPOSE:To efficiently generate a mass ion consisting of mutually connected two or more equal atoms by arranging permanent magnets so as to alternately place their polarities on the periphery of a tapered structural plasma chamber, and mounting the gas introducing pipe of the plasma chamber in the vicinity of a microwave introducing side. CONSTITUTION:A plasma chamber 8 is formed into a tapered tape formed by arranging permanent magnets 9 on its peripheral part further by additionally providing a coil 2 for generating a magnetic field in the axial direction. A gas introducing port (for instance, inflow of H2 gas) is provided in the vicinity of a microwave introducing window 5. Accordingly, ions are efficiently absorbed in plasma due to an axial directional magnetic field applied by the coil 2, so that a large amount of H2 ion is produced in the vicinity of the microwave introducing window and the ions in the plasma are diffused to a tapered part of high plasma enclosing effect. By the time outlet these ions reach slits of drawn out electrodes 3, they make collision reaction with a neutral H2 gas molecules simultaneously flowing in diffused state. Thus the mass ion can be sufficiently generated, by efficiently performing ion molecular reaction.

5. 发明专利

JPH03245498A ION BEAM DECELERATION DEVICE 失效
公开(公告)号：JPH03245498A
公开(公告)日：1991-11-01
申请号：JP3822890
申请日：1990-02-21
申请人： HITACHI LTD
发明人： TOKIKUCHI KATSUMI , KAWANAMI YOSHIMI , HAKAMATA YOSHIMI , AMAMIYA KENSUKE , SAKUMICHI KUNIYUKI
IPC分类号： G01N27/62 , G01N22/00 , H01J37/317 , H01J49/12 , H01J49/42 , H05H9/00
摘要： PURPOSE:To realize a large current of ion beams at less than 100eV by applying a high-frequency voltage to quadrupole electrodes which have a specific waving pitch, and at the same time, leading in the ion beams in a specific direction. CONSTITUTION:A specific ion passing through a mass spectrograph 4 is decelerated by high-frequency quadrupole electrodes 1b and 1b' (1a and 1a'). The quadrupole electrodes are formed in a waving pitch making in a rough pitch at the incident side of beam along the axial direction, and in a minute pitch at the output side. The beams flow in the axial direction of the quadrupole electrodes. As a result, the beams are decelerated reversely to the acceleration, and radiated by maintaining the potential of a sample 8 at the earthing potential. The ion beams are injected when the high-frequency power of the quadrupole electrodes is in a specific phase scope. The energy of the decelerated beams can be regulated freely by converting the frequency of the high-frequency voltage applied to the quadrupole electrodes.

6. 发明专利

JPH01243343A MICROWAVE ION SOURCE 失效
公开(公告)号：JPH01243343A
公开(公告)日：1989-09-28
申请号：JP6935488
申请日：1988-03-25
申请人： HITACHI LTD
发明人： AMAMIYA KENSUKE , TOKIKUCHI KATSUMI , SAKUMICHI KUNIYUKI , KOIKE HIDEMI , SEKI TAKAYOSHI
IPC分类号： H01J27/16 , H01J37/08
摘要： PURPOSE:To efficiently and polyvalently ionize the sample gas by a microwave discharge and obtain a high-current polyvalent ion beam by providing a preliminary discharge chamber with the pressure higher than that of a plasma chamber. CONSTITUTION:Microwaves from an oscillator 1 are guided into a plasma chamber 3 via a transmission pipe 2. Within a preliminary discharge chamber 6, a chamber 3 on the valve 11 side is kept vacuum, microwaves permeate the discharge chamber 6 provided in a tube 2. The valve 11 is opened to introduce sample gas 10, the gas pressure in the discharge chamber 6 is made the preset value, when currents are fed through a solenoid coil 4 for the chamber 3 and the solenoid coil 4' for the chamber 6 and the magnetic field is applied, plasma is generated in the chamber 6 and the chamber 8. At this time, the gas pressure in the discharge chamber 6 becomes higher than that in the plasma chamber 3. Permanent magnets 8 provided around the chamber 3 enclose the plasma, polyvalent ions generated in the chamber 3 are extracted as an ion beam 9 from an ion extracting electrode 5.

7. 发明专利

JPS62147643A ION SOURCE DRAW-OUT ELECTRODE SYSTEM 失效
公开(公告)号：JPS62147643A
公开(公告)日：1987-07-01
申请号：JP28772885
申请日：1985-12-23
申请人： HITACHI LTD
发明人： TOKIKUCHI KATSUMI , SAKUMICHI KUNIYUKI , KOIKE HIDEMI , SEKI TAKAYOSHI , OKADA OSAMI , ANDO HIROSHI
IPC分类号： H01J27/16 , H01J37/08 , H01J37/12
摘要： PURPOSE:To provide an ion source draw-out electrode system available for both of high and low energy by using one draw-out electrode constitution. CONSTITUTION:In the case of drawing-out high energy, an acceleration electrode 2 is given 120KV, an intermediate electrode 3'' is given 60KV, a decelerating electrode 4 is given -2KV, the third electrode 5 is given earth potential in order to draw-out a beam. On the other hand, in the case of drawing-out low energy, the acceleration electrode 2 is given 30KV, the intermediate electrode 3'' is given -30KV and the decelerating electrode 4 and the third electrode 5 are given the earth potential. Current value above 30KeV 4mA as a B+ ion beam 6 after passing a mass separator can be stably obtained. In addition thereto, when a radium of curvature (r) is changed with fixed width (d) of a slit, the draw-out per-formance on the side of high energy is improved in general, as the radium of curvature (r) increases. And, as (r) decreases, the draw-out performance on the side of low energy is improved.

8. 发明专利

JPS62140339A MICROWAVE ION SOURCE 失效
公开(公告)号：JPS62140339A
公开(公告)日：1987-06-23
申请号：JP28092785
申请日：1985-12-16
申请人： HITACHI LTD
发明人： KOIKE HIDEMI , SAKUMICHI KUNIYUKI , TOKIKUCHI KATSUMI , SEKI TAKAYOSHI , OKADA OSAMI
IPC分类号： C23C14/48 , H01J27/16 , H01J37/08
摘要： PURPOSE:To make it possible to generate a uniform plasma in spite of expanding the discharge space in Y direction and the extracting width of an ion beam by forming uniform magnetic field distribution in the Y direction with the specific shape of a pole piece. CONSTITUTION:Microwave from a microwave generator 1 is supplied via a coaxial wave guide 2 and a flange 3, and microwave electric field is generated in the radial direction between an internal conductor 4a and an external conductor 4b of a discharge electrode inside a discharge chamber 5. At the same time, the magnetic field is applied around the room 5 by a solenoid coil 8a, a magnetic path 8b and a pole piece 8c etc. A plasma is generated by mutual interaction between the microwave electric field an the magnetic field via the gas introduced into the room 4 from a discharge gas introducing pipe 6, then an ion beam 21 is extracted. The shape of piece 8 is predetermined experimentally so that the magnetic field distribution in the Y direction becomes uniform and an uniform plasma is generated, in spite of expanding the discharge space and the extracting width of the ion beam in the Y direction. Hence a large current uniform ion beam can be extracted and 20cm A class implantation can also be carried out.

9. 发明专利

JPS62140332A FIELD EMISSION CATHODE 失效
公开(公告)号：JPS62140332A
公开(公告)日：1987-06-23
申请号：JP28091885
申请日：1985-12-16
申请人： HITACHI LTD
发明人： HOSOKI SHIGEYUKI , SAKUMICHI KUNIYUKI , TAKADA KEIJI , KAGA HIROYASU
IPC分类号： H01J37/073 , H01J1/30 , H01J1/304 , H01J9/02
摘要： PURPOSE:To make no current fluctuation appeared for a long period in the field emission of a cathode, by forming the cathode in such a way that a needle- shaped diamond whose surface is made conductive by a specified method and held sufficient by a specific means. CONSTITUTION:A needle-shaped cathode 8 made of diamond is joined to a filament 9 consisting of inverse V-shaped carbon material with a adhesives of thermosetting resin of phenolic series and is fixed by using the glassy carbon 11 carbonized by heating. Ar ion beam of 100kv is irradiated on this, ion about 1X10 /cm is injected, cathode 8 is annealed to around 500 deg.C and the cathode 8 becomes conductive by the filament 9. Etching rate of the cathode during operation by positive ion is so small in the case of diamond that time course variation of surface condition is little, accordingly cathode 8 operates stably for a long time.

10. 发明专利

JPS6188426A Microwave ion source 失效
标题翻译： MICROWAVE离子源
公开(公告)号：JPS6188426A
公开(公告)日：1986-05-06
申请号：JP20970984
申请日：1984-10-08
申请人： Hitachi Ltd
发明人： TOKIKUCHI KATSUMI , SAKUMICHI KUNIYUKI , KOIKE HIDEMI , OKADA OSAMI
IPC分类号： H01J37/08 , H01J27/08 , H01J27/18
CPC分类号： H01J27/18
摘要： PURPOSE:To enable stable electric discharge to be initiated regardless of the kind of the sample gas by using another electrode for producing spark discharge between said electrode and one of the ridge electrode, the positive voltage electrode and the negative voltage electrode. CONSTITUTION:A microwave ion source is constituted from a magnetron 1, rectangular waveguides 2a and 2b, a ridge electrode 4, a discharge box 5, a lead-out electrode system consisting of a positive voltage electrode 7a, a negative voltage electrode 7b and an earth electrode 7c, a sample gas introduction pipe 6, etc. An electrode 13 for producing spark discharge is coated with a ceramic member 14 and installed in the gas introduction pipe 6. During plasma ignition, voltage from a high-voltage power supply 16 is applied across the electrode 13 and the ridge electrode 14 through a switch 15 to produce spark at the end of the electrode 13. Accordingly, it is possible to make even a hardly dischargable gas such as BF3 gas easily discharge, thereby greatly improving the operation efficiency of the microwave ion source.
摘要翻译：目的：通过使用用于在所述电极和脊电极，正电压电极和负电压电极中的一个之间产生火花放电的另一电极来使得能够开始稳定的放电，而不管样品气体的种类。构成：微波离子源由磁控管1，矩形波导2a和2b，脊电极4，放电箱5，引出电极系统，正电压电极7a，负电压电极7b和接地电极7c，试样气体引入管6等。用于产生火花放电的电极13涂覆有陶瓷构件14并安装在气体导入管6中。在等离子体点火期间，来自高压电源16的电压为通过开关15跨过电极13和脊状电极14施加电极13，从而在电极13的端部产生火花。因此，可以使诸如BF 3气体之类的难以排放的气体容易地排出，从而大大提高了操作效率的微波离子源。

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