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    • 5. 发明专利
    • SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
    • JPH01154561A
    • 1989-06-16
    • JP31192687
    • 1987-12-11
    • HITACHI LTD
    • KOJIMA KOJIOBA SHINYAMATSUURA TATSUJIAKIMOTO HAJIME
    • H01L29/78H01L29/10
    • PURPOSE:To prevent channel charge from flowing out to one of source and drain electrodes while ensuring high speed operation of an element, by increasing or decreasing a threshold voltage of a field-effect transistor used as a switching element monotonously in a longitudinal direction of the channel. CONSTITUTION:On a p-type semiconductor substrate 9, there are formed highly doped N-type regions 5, 6 which are to be electrodes for transferring charges, and a channel region 7 is formed between the two electrodes. Concentration of the P-type impurities in the channel region 7 is increased monotonously from the electrode 5 towards the electrode 6, so that the bottom of a conduction band is inclined as shown in the diagram showing structure of energy bands. The channel region 7 is controlled by a voltage applied to a gate electrode 1 formed through a gate insulating film 8 on the surface of the region 7. The gate electrode 1 is electrically insulated from drain and source electrodes 2, 3 by an interlayer insulating film 4. During transition of the transistor from ON to OFF, carries left in the channel region under the gate electrode flow towards the electrode 3 according to the inclination of the energy level. Therefore, no channel charge flows out to the electrode 2.