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1. 发明专利

JPH09120154A POLARIZING MASK AND ITS PRODUCTION AS WELL AS PATTERN EXPOSURE METHOD AND PATTERN PROJECTION ALIGNER USING THE SAME 失效
公开(公告)号：JPH09120154A
公开(公告)日：1997-05-06
申请号：JP27738795
申请日：1995-10-25
申请人： HITACHI LTD
发明人： FUKUDA KENICHIRO , OSHIDA YOSHITADA
IPC分类号： G02B5/30 , G03F1/32 , G03F1/68 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To embody the resolution equiv. to or higher than the resolution of the conventional phase shift method without the formation of such patterns of which the design is infeasible. SOLUTION: A halftone phase shifter 204 is arranged on the outer or inner side of a fine pattern group which is formed on a mask and has a polarization characteristic. This mask is irradiated with annular band-shaped illumination light in such a manner that the polarization direction is made rotationally symmetrical with respect to the optical axis on the pupil of the projecting optical system of this illumination light, by which the phase shifter is exposed with the transmitted light. The mask is otherwise irradiated with the annular band-shaped illumination light in non-polarization state and the transmitted light is passed through an analyzer which is arranged on the pupil and is rotationally symmetrical in the polarization direction, by which the phase shifter is exposed.

2. 发明专利

JPH07176476A METHOD AND APPARATUS FOR EXPOSING PATTERN, MASK USED THEREFOR AND SEMICONDUCTOR INTEGRATED CIRCUIT FORMED BY USING THE SAME 失效
公开(公告)号：JPH07176476A
公开(公告)日：1995-07-14
申请号：JP25499394
申请日：1994-10-20
申请人： HITACHI LTD
发明人： OSHIDA YOSHITADA , FUKUDA KENICHIRO , NAKAYAMA YASUHIKO , YOSHIDA MINORU , WATANABE MASAHIRO
IPC分类号： G03F1/26 , G03F1/68 , G03F7/20 , H01L21/027 , G03F1/08
摘要： PURPOSE:To realize a resolution equivalent to a phase shifting method or more without generating a pattern impossible to design by using a pattern depending polarization mask for applying polarization characteristics responsive to a direction of the pattern on the mask to an illumination light passed through the pattern. CONSTITUTION:B0 B90, B180, B270 of partial lights of an illumination light respectively have linear polarizations, and emit a ring bandlike band like an illumination light 11 on a pupil of a reducing lens 31 of a projecting optical system when there is no mask 2. Patterns 11, 12, 13, 14 directed in directions (x) and (y) are, for example, formed on the mask 2 by lithography, and polarization characteristics responsive to the directions of the patterns are applied to a light emitted to and passed through the patterns. Thus, the pattern having much excellent resolution as compared with conventional resolution pattern can be exposed by using a projecting optical system of a conventional exposure apparatus as it is.

3. 发明专利

JPH07167614A ALIGNMENT METHOD AND APPARATUS 失效
公开(公告)号：JPH07167614A
公开(公告)日：1995-07-04
申请号：JP31470293
申请日：1993-12-15
申请人： HITACHI LTD
发明人： FUKUDA KENICHIRO , YOSHITAKE YASUHIRO , OSHIDA YOSHITADA
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/68
摘要： PURPOSE:To accurately measure the detection error of the central position of the image generated in every processes by coolating with a simulated curve the relative intensity difference + or -1st order diffracted light which is measured in every manufacturing processes for mass-production of wafer. CONSTITUTION:A light emitted from a laser 5 is made incident on the center of an incident iris 13 through a beam slitter 10a to shutter 18, etc., and is cast on an alignment mark 2b. The + or - diffracted light generating through iradiation is selectively passed through a space filter 15, and the center position of a mark 2b image is precisely inspected by a linear image sensor 17. However, when the irregularity of resist coating occurs, the waveform becomes asymmetrical due to the multiple interference of the resist 2a, generating any detection difference. Therefore, a plus or minus 1st order diffracted light intensity is detected 19a and the + or - 1st order diffracted light intensity is regulated according to the ratio of the detected 19b irradiation light intensity thereto, so that the relative intensity difference So may be obtained. The intensity difference So is substituted to the simulated curve which has already been obtained by a control processing circuit 20, together with respective process data, thereby finding out a detection error epsilon0.

4. 发明专利

JPH11204592A MANUFACTURE OF SEMICONDUCTOR DEVICE AND THE SEMICONDUCTOR DEVICE MANUFACTURED THEREBY 失效
公开(公告)号：JPH11204592A
公开(公告)日：1999-07-30
申请号：JP364198
申请日：1998-01-12
申请人： HITACHI LTD
发明人： FUKUDA KENICHIRO , OSHIMA YOSHIMASA , NISHIYAMA HIDETOSHI , NOGUCHI MINORU
IPC分类号： H01L21/66
摘要： PROBLEM TO BE SOLVED: To automatically and accurately detect a process, in which a large number of foreign substances resulting in defective probe inspection and a large number of the defectives of appearance faults are generated, at an early stage by obtaining and displaying the rate of capture of foreign substances of an inspection device during current monitoring to another inspection device. SOLUTION: The converted data of an inspection device A1, an inspection apparatus B2 and an inspection apparatus C3 and the inspection data of an inspection apparatus during current monitor are compared by a comparison calculation processing section 47. Consequently, the rate of capture of the inspection apparatus during the current monitor to another inspection apparatus (the number of defectives detected by the inspection device during monitor at present/the number of defectives detected by another inspection device) can be calculated. The rate of capture and the inspection data of another inspection device are displayed simultaneously, on a data display section 5 together with the inspection data of the inspection device during the current monitor. As a result, since the overall inclination of the rate of capture can comprehended, a change with time of the inspection performance of the inspection device during monitor can be determined. Accordingly, the calibration of the performance of the inspection device during monitor becomes accurate.

5. 发明专利

JPH06310401A METHOD AND APPARATUS FOR MEASUREMENT OF MINUTE DISPLACEMENT 失效
公开(公告)号：JPH06310401A
公开(公告)日：1994-11-04
申请号：JP9271593
申请日：1993-04-20
申请人： HITACHI LTD
发明人： FUKUDA KENICHIRO , OSHIDA YOSHITADA
IPC分类号： G01B11/00 , G03F7/22 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To measure a minute displacement of an object accurately by correcting the phase difference by using the ratio of intensity of irradiation beam and intensity of a first-order diffraction beam when the irradiated beam is emitted from the right-left direction. CONSTITUTION:In a method and apparatus for measuring minute displacement of an object by employing a diffraction grating 7 and heterodyne interference, intensities of the first-order diffraction beam and an irradiated beam, at the time when the irradiated beam is emitted from the right-left direction, are detected by beam intensity detectors 93 and 94, and a normalized difference in intensity in case of irradiation from the right-left direction is calculated from the intensity ratio of the first-order diffracted beam and the irradiated beam. The quantity of minute displacement of the diffraction grating 7 can be measured accurately by correcting the phase difference of a reference signal and the measured signal detected by the phase detectors 91 and 92 using the normalized intensity difference.

6. 发明专利

JPH05217838A SUBSTRATE INCLINATION OF DETECTOR 失效
公开(公告)号：JPH05217838A
公开(公告)日：1993-08-27
申请号：JP1744392
申请日：1992-02-03
申请人： HITACHI LTD
发明人： FUKUDA KENICHIRO , SHIBA MASATAKA
IPC分类号： G01B11/14 , G01B11/26 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To detect the inclination of a substrate with high accuracy by providing a substrate inclination detector wherein a linear diffraction grating optical coupler is employed with a temperature compensating function. CONSTITUTION:A temperature change DELTAT of an optical waveguide element 12 is monitored at all times by a controlling and processing circuit 23 through a temperature monitor 21 to find a change in an incident angle into an optical waveguide and then an adjustment is made to the measured value of the inclination. Therefore, an offset quantity of a substrate 3 from the specified inclination angle can be detected very accurately. From the obtained offset quantity, the inclination of the substrate 3 is detected with high sensitivity. Since the correlation between a change in incident angle into the optical waveguide element and a temperature change of the optical waveguide element is used, the inclination of a substrate in a stepper or other devices can be detected easily and very accurately and thereby a productivity is increased.

7. 发明专利

JPH0645242A RESIST COATING METHOD AND APPARATUS 失效
公开(公告)号：JPH0645242A
公开(公告)日：1994-02-18
申请号：JP19806792
申请日：1992-07-24
申请人： HITACHI LTD
发明人： FUKUDA KENICHIRO , OSHIDA YOSHITADA
IPC分类号： B05B13/02 , G03F7/16 , H01L21/027
摘要： PURPOSE:To reduce unevenness in resist coating and realize high-speed coating with regard to a resist coating method and its apparatus used in a manufacturing step for a semiconductor device like an LSI. CONSTITUTION:When a command is provided from a CPU unit 1, a resist 5 is sprayed through a spraying part 17 onto a wafer 6 that is put on a conveyor 8. The conveyor 8 is driven by a conveyor control unit 7 and the CPU unit 1. A film thickness of the resist 5 on the wafer 6 is measured by a resist film thickness detecting unit 9, and the data is fed back to the spraying part 17 and the conveyor control unit 7 so that the film thickness of the resist 5 is kept constant in an optimizing step. Consequently, unevenness in resist coating is reduced. Also, a yield in wafer manufacturing is improved, and a high-quality wafer is produced, and thereby highly accurate alignment in a stepper and the like can be realized.

8. 发明专利

JPH03211587A LIQUID CRYSTAL DISPLAY UNIT 失效
公开(公告)号：JPH03211587A
公开(公告)日：1991-09-17
申请号：JP616590
申请日：1990-01-17
申请人： HITACHI LTD
发明人： FUKUDA KENICHIRO , GOTO MASAAKI
IPC分类号： G02F1/1333 , G09F9/00 , H04N5/64 , H04N5/66
摘要： PURPOSE:To facilitate the maintenance and inspection of a liquid crystal panel and back light unit by mounting the liquid crystal panel on the surface of a case having an aperture in a liquid crystal display part and the back light unit to the rear of the case, and mounting a circuit board to a metallic cover, then fitting and fixing the cover to a metallic case. CONSTITUTION:The liquid crystal panel 1, the metallic case 4 screwed with the back light unit 2 and the metallic cover 5 screwed with the circuit board 3 and fitted and fixed, by which this liquid crystal unit can be operated. The surface of the metallic case 4 is provided with a hole for mounting the liquid crystal panel 1 and a hole for mounting the back light unit 2. The liquid crystal panel 1 is directly removable by removing screws from the surface of the metallic case 4. The back light unit 2 can be directly removed from the rear of the metallic case 4 by removing the fitting of the metallic cover 5. The maintenance and inspection of the liquid crystal panel 1 and the back light unit 2 are facilitated in this way.

9. 发明专利

JPH10229110A MANUFACTURE OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURED BY THE SAME 失效
公开(公告)号：JPH10229110A
公开(公告)日：1998-08-25
申请号：JP3165497
申请日：1997-02-17
申请人： HITACHI LTD
发明人： FUKUDA KENICHIRO , NOGUCHI MINORU , NISHIYAMA HIDETOSHI , OSHIMA YOSHIMASA
IPC分类号： G01R31/26 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method by which a semiconductor device can be manufactured at a high yield by recognizing a semiconductor device treating process in which a large number of failures occurs. SOLUTION: An inspection device group management system 1, comprising inspection devices 15, 25, 35, etc., having different detection systems, is provided on a semiconductor device manufacturing line. Here, the inspection devices 15 and 25 are considered respectively to be a foreign matter inspection device and visual inspection device, and the inspection device 35 is considered to be a simple probe inspection device which performs probe inspections immediately after the inspections, by means of the inspection device 15 or 25. The inspection devices 15, 25, and 35 transfer the inspected results to a data collecting system 2 (inspection device databases 14, 24, and 34).

10. 发明专利

JPH06137814A MINUTE DISPLACEMENT MEASURING METHOD AND ITS DEVICE 失效
公开(公告)号：JPH06137814A
公开(公告)日：1994-05-20
申请号：JP28840092
申请日：1992-10-27
申请人： HITACHI LTD
发明人： FUKUDA KENICHIRO , OSHIDA YOSHITADA
IPC分类号： G01B11/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To measure the minute displacement of a body and its height at the same time in a minute displacement measuring method and its device which measure the minute displacement of the body by means of a diffraction grating. CONSTITUTION:In a minute displacement measuring method and its device which measure the minute displacement of a body by means of a diffraction grating, light having wavelength lambda1 and light having wavelength lambda2 are directly heterodyne-interfered to form a secondary reference signal, which is measured by a photodetector 93 to compute a phase difference between the secondary reference signal and a reference signal measured by a photodetector 92 for simultaneously measuring the minute displacement and height of the diffraction grating 7. Thus, in the case of measuring the minute displacement of the diffraction grating, its height can be measured simultaneously and accurately.

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