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1. 发明专利

JP2002352629A POLYVINYL CHLORIDE RESIN COMPOSITION-COVERED ELECTRIC WIRE/CABLE 失效
公开(公告)号：JP2002352629A
公开(公告)日：2002-12-06
申请号：JP2001160047
申请日：2001-05-29
申请人： HITACHI CABLE , TOKYO ELECTRON LTD , TAISEI CORP
发明人： WATANABE KIYOSHI , ITO HIROYUKI , SAITO MISAKO , HAYASHI TERUYUKI , HIRAYAMA NAOYA , KOBAYASHI SADAO , WAKAYAMA YOSHIHIDE
IPC分类号： C08K3/26 , C08K5/098 , C08K5/12 , C08L27/06 , C08L101/00 , H01B3/44 , H01B7/02
摘要： PROBLEM TO BE SOLVED: To provide polyvinyl chloride resin composition-covered electric wire/ cable suitable for use inside a clean room especially for manufacturing a semiconductor or a liquid crystal device by suppressing generation of AMCs(Airborne Molecular Contaminations). SOLUTION: This polyvinyl chloride family resin composition covered electric wire/cable has a covered layer comprising a polyvinyl chloride family resin composition containing polyvinyl chloride family resin and one kind or two kinds or more compounds selected from calcium soap, zinc soap, and hydrotalcite, and not containing both of a lead compound and β-diketone of melting point 100 deg.C or less.

2. 发明公开

EP1391896A4 ELECTRIC WIRE COATED WITH POLYVINYL CHLORIDE RESIN COMPOSITION AND CABLE 审中-公开
标题翻译：电导体电缆用的涂层选自聚氯乙烯树脂
公开(公告)号：EP1391896A4
公开(公告)日：2005-03-16
申请号：EP02726476
申请日：2002-05-23
申请人： TOKYO ELECTRON LTD , TAISEI CORP
发明人： WATANABE KIYOSHI , ITO HIROYUKI , SAITO MISAKO , HAYASHI TERUYUKI , HIRAYAMA NAOYA , KOBAYASHI SADAO , WAKAYAMA YOSHIHIDE
IPC分类号： C08K3/26 , C08K5/098 , C08K5/12 , C08L27/06 , C08L101/00 , H01B3/44 , H01B7/02
CPC分类号： H01B3/443 , C08K5/098 , C08L27/06
摘要： An electric wire coated with a polyvinyl chloride resin composition and a cable which are inhibited from generating AMCs (airborne molecular contaminants) and are especially suitable for use in clean rooms for producing semiconductors, liquid-crystal devices, and the like therein. The electric wire has a coating layer made of a polyvinyl chloride resin composition comprising a polyvinyl chloride resin and at least one compound selected among calcium soaps, zinc soaps, and hydrotalcite and containing neither a lead compound nor a ß-diketone compound having a melting point of 100°C or lower.

3. 发明公开

KR20200134157A 감압 건조 장치 审中-公开
公开(公告)号：KR20200134157A
公开(公告)日：2020-12-01
申请号：KR20200057747
申请日：2020-05-14
申请人： TOKYO ELECTRON LTD
发明人： OIKAWA JUNJI , HAYASHI TERUYUKI , NARUMOTO YOSUKE
IPC分类号： H01L21/67 , F26B21/00
摘要： 비점이서로상이한복수의용매를포함하는용액의건조시간을기판의면내에서균일하게한다. 기판상의용액을감압하에서건조시키는감압건조장치에있어서, 상기용액은서로비점이상이한복수의용매를포함하며, 상기감압건조장치는상기기판을수용하는용기를가지며, 상기용기내에, 상기기판이탑재되는탑재대와, 상기탑재대에탑재된상기기판으로부터기화한상기용액중의용매를일시적으로포집하는용매포집부와, 상기용매포집부를상하방향으로이동시키는이동기구를가지며, 상기용기는상기탑재대의주변에있어서의상기탑재대보다하측에, 상기용기의내부를배기하는배기장치에접속되는배기구가마련되며, 상기용매포집부는, 평면에서본, 상기탑재대에탑재된상기기판보다외측에마련되어있으며, 상기기판보다외측에있어서상기이동기구에의해상하방향으로이동된다.

4. 发明专利

JP2000176434A WASTE WATER TREATMENT DEVICE AND METHOD 失效
公开(公告)号：JP2000176434A
公开(公告)日：2000-06-27
申请号：JP35253398
申请日：1998-12-11
申请人： TOKYO ELECTRON LTD , TAISEI CORP , KURITA WATER IND LTD
发明人： KOMATSU HARUHIKO , SHINODA TOMOYUKI , HAYASHI TERUYUKI , KANEKO KIMIHITO , MURATA KOHEI , KAWAHARA MASATO , KUNUGI TOMOHIKO
IPC分类号： C02F1/00 , G01N33/18
摘要： PROBLEM TO BE SOLVED: To reduce the burden of a waste water treatment and to lower the waste water treatment cost by separating the waste water from a production device to the one whose impurity concentration is higher than a reference value or the other whose impurity concentration is lower than the reference value, discharging the waste water higher in the impurity concentration after a specified waste water treatment, recovering the waste water lower in the impurity concentration, and reutilize it. SOLUTION: The waste water is stored in a waste water receiving tank 20. In the waste water of higher impurity concentration separated with a retaining tank 21, the waste water, for example, having >0.5 ppm TOC concentration obtained by a total organic carbon(TOC) meter is allowed to flow to a waste water tank 23 through a line 22. Next, it is treated with a waste water treatment unit 24, and is further treated with a waste water treatment unit 25 to be discharged to a river, or the like. The waste water having

5. 发明公开

KR20180008309A 액적 토출 장치 및 토출 검사 방법 审中-公开
标题翻译：液滴喷射装置及喷射检测方法
公开(公告)号：KR20180008309A
公开(公告)日：2018-01-24
申请号：KR20170088760
申请日：2017-07-13
申请人： TOKYO ELECTRON LTD
发明人： KONTA YUU , HAYASHI TERUYUKI , OSHIMA KIYOMI
IPC分类号： B05C11/00 , B05C5/02 , B05C11/10 , G01N35/00
摘要： 본발명은, 워크에액적을토출하는액적토출장치에서, 기능액의종류마다조정을하지않고, 검사용의매체에착탄된기능액적의촬상결과에근거하여적절히토출상태를조정할수 있도록한다. 액적토출장치(1)는, 워크에기능액의액적을토출하는노즐헤드(24)와, 해당노즐헤드(24)로부터의검사토출을, 검사필름(52)의발액성을가지는표면에서받는토출검사유닛(50)과, 검사필름(52)의표면에검사토출된액적을촬상하는토출검사카메라(31)와, 검사필름(52)의발액성을가지는표면을제전하는제전유닛(80)을구비하고, 액적의검사토출전에, 제전유닛(80)에의해, 검사필름(52)의표면을제전한다.
摘要翻译：本发明，在用于喷射液滴到工件上，而无需进行用于成像沉积在测试介质上的敌人功能液的结果的基础上，每种类型的功能液的调整的液体排放设备可以被调整到适当的喷射状态。液滴喷射装置1设有喷嘴头（24），用于喷射的功能液的工作的液滴，喷出检查单元，用于接收所述喷嘴头24 robuteoui测试放电，具有测试膜中的表面52 uibal液体（31），用于拾取检查并排出到检查膜（52）的表面上的液滴;以及排出单元（80），用于排出检查膜（52）的表面，在液滴的测试放电之前，检测膜52的表面由排出单元80排出。

6. 发明公开

KR20200132705A 감압 건조 장치 및 용매 포집 부재의 제조 방법 审中-公开
公开(公告)号：KR20200132705A
公开(公告)日：2020-11-25
申请号：KR20200054496
申请日：2020-05-07
申请人： TOKYO ELECTRON LTD
发明人： OIKAWA JUNJI , HAYASHI TERUYUKI
IPC分类号： H01L21/67 , F26B7/00
摘要： 대형의기판에있어서도용매의건조상태를면내에서균일하게하는것이가능한감압건조장치를제공한다. 기판상의용액을감압하에서건조시키는감압건조장치에있어서, 상기기판을수용하는용기와, 상기용기내에마련되며, 상기기판이탑재되는탑재대와, 상기탑재대에탑재된상기기판과대향하도록상기용기내에마련되며, 상기기판으로부터기화한상기용액중의용매를일시적으로포집하는용매포집부재를구비하고, 상기용매포집부재는, 복수의개구를갖는평판형상으로형성된, 용매포집분할부재를복수가지며, 상기복수의용매포집분할부재각각의평면에서본 측단끼리를접합시켜서이루어진다.

7. 发明公开

KR20180021647A 액적 토출 장치 및 액적 토출 조건 보정 방법 审中-公开
标题翻译：液滴喷射装置及液滴喷射状态校正方法
公开(公告)号：KR20180021647A
公开(公告)日：2018-03-05
申请号：KR20170104557
申请日：2017-08-18
申请人： TOKYO ELECTRON LTD
发明人： HAYASHI TERUYUKI , OSHIMA KIYOMI , SHIMAMURA AKINORI
IPC分类号： H01L21/67 , H01L23/544
摘要： 검사토출된기능액의액적의라인센서에의한촬상결과에근거하여, 기능액의액적의토출조건을적절히보정한다. 액적토출장치(1)는, 워크(W)가탑재된워크스테이지(40)를액적토출노즐에대하여주 주사방향으로이동시키고, 워크(W) 상에액적토출노즐로부터기능액의액적을토출하여묘화하는것으로서, 라인을구비하고, 워크(W)에소정크기의마크가미리형성되며, 액적토출노즐로부터액적을워크스테이지(40) 상의워크(W)에검사토출하고, 워크(W) 상의검사토출된액적및 상기마크의촬상을라인센서(31)에의해실행하고, 촬상된마크의주 주사방향에따른길이에근거하여, 상기액적의촬상결과를보정하고, 상기보정한액적의촬상결과에근거하여, 액적토출노즐로부터의토출조건을보정한다.
摘要翻译：基于检测到的功能液体的液滴的线传感器的成像结果适当地校正功能液体的液滴排出状况。液滴喷射装置1使安装有工件W的工件台40在主扫描方向上移动到液滴喷嘴，并将液滴从液滴喷嘴喷出到工件W上并且，液滴从液滴喷出喷嘴向工件台40上的工件W喷出，进行工件W的检查，通过线传感器31执行喷射液滴和标记图像，并基于沿着捕获标记的主扫描方向的长度校正液滴的成像结果，校正来自液滴喷嘴的喷射状态。

8. 发明专利

DE60028091D1 未知
公开(公告)号：DE60028091D1
公开(公告)日：2006-06-22
申请号：DE60028091
申请日：2000-12-28
申请人： TOKYO ELECTRON LTD
发明人： MARUMO YOSHINORI , SUZUKI KANAME , HAYASHI TERUYUKI , TANAHASHI TAKASHI
IPC分类号： C30B35/00 , G01N27/62 , C03B20/00 , C03C15/00 , C30B31/10 , G01N1/32 , G01N1/34 , G01N1/40 , G01N19/06 , G01N21/31 , G01N21/73
摘要： Quartz member such as a quartz tube for semiconductor manufacturing equipment capable of heat treating a substrate to be treated without causing contamination, a manufacturing method of such quartz member, thermal treatment equipment furnished with such quartz member, and an analysis method of metal in quartz member are provided. A quartz specimen is immersed in hydrofluoric acid to expose a layer to be analyzed located at a prescribed depth. On an exposed surface, a decomposition liquid such as hydrofluoric acid or nitric acid is dripped to decompose only an extremely thin layer to be analyzed, followed by recovering of the decomposition liquid. The decomposition liquid is quantitatively analyzed by use of atomic absorption spectroscopy (AAS) or the like to measure an amount of metal contained in the decomposition liquid. From a difference of thicknesses before and after the decomposition and an area of dripped decomposition liquid, a volume of a decomposed layer to be analyzed is obtained. From this and the amount of metal contained in the decomposition liquid, a concentration of metal contained in the layer to be analyzed, in addition a diffusion coefficient of a layer to be analyzed is calculated. With thus obtained diffusion coefficient as an index, quartz material in which metal diffuses with difficulty is sorted out. With thus sorted quartz material, a quartz member used for semiconductor manufacturing equipment such as a quartz tube is manufactured.

9. 发明专利

DE112009003614T5 Substratbearbeitungssystem 未知
公开(公告)号：DE112009003614T5
公开(公告)日：2013-01-24
申请号：DE112009003614
申请日：2009-11-11
申请人： TOKYO ELECTRON LTD
发明人： KAWAKAMI SATORU , HAYASHI TERUYUKI , ONO YUJI , MATSUBAYASHI SHINJI , TOBE YASUHIRO , NISHIMURA MASARU , YAGI YASUSHI , SHIMO FUMIO
IPC分类号： B65G49/06 , H01L21/677 , H01L51/50 , H05B33/10
摘要： [Probleme] Es wird ein Substratbearbeitungssystem mit hoher Wartungsfähigkeit durch Verbreitern eines Spalts zwischen verschiedenen Bearbeitungsgeräten, die mit Seitenflächen von Übergabemodulen verbunden sind, und das in der Lage ist, eine ausreichende Produktivität zu erreichen, indem eine Verschlechterung des Durchsatzes vermieden wird, geschaffen. [Mittel zum Lösen der Probleme] Das Substratbearbeitungssystem zur Herstellung einer organischen EL-Vorrichtung durch Ausbilden einer Mehrzahl von Schichten, einschließlich z. B. einer organischen Schicht, auf einem Substrat umfasst mindestens ein Übergabemodul, das so konfiguriert ist, dass es entleerbar ist, und entlang eines geraden Übergabeweges angeordnet ist. Innerhalb des Übergabemoduls sind eine Mehrzahl von Lade/Entlade-Bereichen zum Laden/Entladen des Substrats in Bezug auf ein Bearbeitungsgerät und mindestens ein Lagerbereich, der zwischen den Lade/Entlade-Bereichen angeordnet ist, abwechselnd entlang des Übergabeweges in Reihe angeordnet, und das Bearbeitungsgerät ist mit einer Seitenfläche des Übergabemoduls in einer Position, die jedem der Lade/Entlade-Bereiche gegenüberliegt, verbunden.

10. 发明公开

EP1693662A4 INSPECTION METHOD AND INSPECTION ASSISTING DEVICE OF QUARTZ PRODUCT IN SEMICONDUCTOR PROCESSING SYSTEM 审中-公开
标题翻译：在半导体加工系统检验程序和检验支持装置石英制品
公开(公告)号：EP1693662A4
公开(公告)日：2011-12-21
申请号：EP04787657
申请日：2004-09-06
申请人： TOKYO ELECTRON LTD
发明人： OIKAWA MASAYUKI , ANBAI KATSUHIKO , TAKAHASHI NOBUHIRO , HAYASHI TERUYUKI
IPC分类号： G01N1/32 , G01N27/62 , G01N1/28 , H01L21/00 , H01L21/67 , H01L21/673
CPC分类号： H01L21/67303 , G01N1/32 , H01L21/67288 , H01L21/67326

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