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1. 发明申请

US20120325149A1 GAS DISTRIBUTION SYSTEM 有权
标题翻译：气体分配系统
公开(公告)号：US20120325149A1
公开(公告)日：2012-12-27
申请号：US13528906
申请日：2012-06-21
申请人： HANH D. NGUYEN , MAJEED A. FOAD , DIETER HAAS , KARL J. ARMSTRONG , XIAOXIONG YUAN
发明人： HANH D. NGUYEN , MAJEED A. FOAD , DIETER HAAS , KARL J. ARMSTRONG , XIAOXIONG YUAN
IPC分类号： C23C16/455 , F17D1/00
CPC分类号： C23C16/455 , C23C16/45565 , F17D1/00 , Y10T137/8593
摘要： In some embodiments, a gas distribution system may include a body disposed within a through hole formed in a process chamber body, the body comprising an opening, wherein an outer surface of the body is disposed a first distance from an inner surface of the through hole to form a first gap; a flange disposed proximate a first end of the body, the flange having an outer dimension greater than an inner dimension of the through hole; a showerhead disposed proximate a second end of the body opposite the first end and extending outwardly from the body to overlap a portion of the process chamber body, the showerhead configured to allow a flow of gas to an inner volume of the process chamber, wherein an outer surface of the showerhead is disposed a second distance from an inner surface of the process chamber body to form a second gap.
摘要翻译：在一些实施例中，气体分配系统可以包括设置在形成在处理室主体中的通孔内的主体，主体包括开口，其中主体的外表面设置在距通孔内表面的第一距离处形成第一个差距; 靠近所述主体的第一端设置的凸缘，所述凸缘具有大于所述通孔的内部尺寸的外部尺寸; 淋浴头，其设置在所述主体的与所述第一端相对的第二端附近并且从所述主体向外延伸以与所述处理室主体的一部分重叠，所述喷头构造成允许气体流动到所述处理室的内部容积，其中，淋浴喷头的外表面与处理室主体的内表面设置成第二距离，以形成第二间隙。

2. 发明申请

US20060226004A1 MACHINE FOR COATING A SUBSTRATE, AND MODULE 有权
标题翻译：用于涂覆基板和模块的机器
公开(公告)号：US20060226004A1
公开(公告)日：2006-10-12
申请号：US11279047
申请日：2006-04-07
申请人： HANS BUCHBERGER , ANDREAS GEISS , JORG KREMPEL-HESSE , DIETER HAAS
发明人： HANS BUCHBERGER , ANDREAS GEISS , JORG KREMPEL-HESSE , DIETER HAAS
IPC分类号： C23C14/00
CPC分类号： C23C14/56 , H01J37/32431 , H01J37/32458
摘要： A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second support 4 that is arranged removably at the first support 3. Whereas the first support 3 bears the cathodes, the second support 4 is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers 3 and 4 can be removed laterally from the chamber section 2 to such an extent that areas 11a, 11b accessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.
摘要翻译：用于涂覆用于生产显示屏的透明基板的机器包括具有模块化设计的涂布室。每个模块1具有腔室部分2，可移除地布置在腔室部分2中或在腔室部分2中的第一支撑件3，以及可拆卸地布置在第一支撑件3处的第二支撑件4。而第一支撑件3具有阴极，第二支撑件4形成为盖，在该盖处布置有用于在涂覆室中产生真空的泵。载体3和4可以从腔室部分2侧向移除到可以在模块部件之间形成人员可接近的区域11a，11b。以这种方式，机器的组件容易接近，例如用于维护目的。可以在阴极和室内同时进行工作。

3. 发明授权

US3148954A Turbine blade construction 失效
标题翻译：涡轮叶片施工
公开(公告)号：US3148954A
公开(公告)日：1964-09-15
申请号：US3583560
申请日：1960-06-13
申请人： IRENE HAAS , RENATE HAAS , DIETER HAAS , DETLEV HAAS
发明人： IRENE HAAS , RENATE HAAS , DIETER HAAS , DETLEV HAAS
IPC分类号： F01D5/28
CPC分类号： F01D5/28 , Y10S428/925 , Y10T428/12653 , Y10T428/12986

4. 发明申请

US20120289078A1 WIRE HOLDER AND TERMINAL CONNECTOR FOR HOT WIRE CHEMICAL VAPOR DEPOSITION CHAMBER 有权
标题翻译：热线化学气相沉积室用线架和端子连接器
公开(公告)号：US20120289078A1
公开(公告)日：2012-11-15
申请号：US13454317
申请日：2012-04-24
申请人： PRAVIN NARWANKAR , VICTOR PUSHPARAJ , DIETER HAAS
发明人： PRAVIN NARWANKAR , VICTOR PUSHPARAJ , DIETER HAAS
IPC分类号： H01R4/28
CPC分类号： C23C16/52 , C23C16/44
摘要： Apparatus for supporting the wires in a hot wire chemical vapor deposition (HWCVD) system are provided herein. In some embodiments, a terminal connector for a hot wire chemical vapor deposition (HWCVD) system may include a base; a wire clamp moveably disposed with relation to the base along an axis; a reflector shield extending from the wire clamp in a first direction along the axis; and a tensioner coupled to the base and wire clamp to bias the wire clamp in a second direction opposite the first direction.
摘要翻译：本文提供了用于在热线化学气相沉积（HWCVD）系统中支撑电线的装置。在一些实施例中，用于热线化学气相沉积（HWCVD）系统的终端连接器可以包括基座; 线夹，其相对于所述基部沿着轴线可移动地设置; 沿着所述轴线沿着第一方向从所述线夹延伸的反射器护罩; 以及张紧器，其联接到所述基座和线夹，以在与所述第一方向相反的第二方向偏置所述线夹。

5. 发明申请

US20110104848A1 HOT WIRE CHEMICAL VAPOR DEPOSITION (CVD) INLINE COATING TOOL 有权
标题翻译：热线化学气相沉积（CVD）在线涂装工具
公开(公告)号：US20110104848A1
公开(公告)日：2011-05-05
申请号：US12873299
申请日：2010-08-31
申请人： DIETER HAAS , PRAVIN K. NARWANKAR , RANDHIR P.S. THAKUR
发明人： DIETER HAAS , PRAVIN K. NARWANKAR , RANDHIR P.S. THAKUR
IPC分类号： H01L31/18 , H01L21/465 , C23C16/50
CPC分类号： C23C16/24 , C23C16/54 , H01L21/02532 , H01L21/0262
摘要： Methods and apparatus for hot wire chemical vapor deposition (HWCVD) are provided herein. In some embodiments, an inline HWCVD tool may include a linear conveyor for moving a substrate through the linear process tool; and a multiplicity of HWCVD sources, the multiplicity of HWCVD sources being positioned parallel to and spaced apart from the linear conveyor and configured to deposit material on the surface of the substrate as the substrate moves along the linear conveyor; wherein the substrate is coated by the multiplicity of HWCVD sources without breaking vacuum. In some embodiments, methods of coating substrates may include depositing a first material from an HWCVD source on a substrate moving through a first deposition chamber; moving the substrate from the first deposition chamber to a second deposition chamber; and depositing a second material from a second HWCVD source on the substrate moving through the second deposition chamber.
摘要翻译：本文提供了热线化学气相沉积（HWCVD）的方法和装置。在一些实施例中，在线HWCVD工具可以包括用于通过线性处理工具移动衬底的线性输送机; 和多个HWCVD源，多个HWCVD源被定位成与线性传送器平行并与其间隔开，并且被配置为当衬底沿着线性传送器移动时将材料沉积在衬底的表面上; 其中所述基底被多个HWCVD源涂覆而不破坏真空。在一些实施例中，涂覆基底的方法可以包括在移动通过第一沉积室的基底上沉积来自HWCVD源的第一材料; 将衬底从第一沉积室移动到第二沉积室; 以及将第二材料从第二HWCVD源沉积在移动通过第二沉积室的衬底上。

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