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1. 发明申请

US20060226004A1 MACHINE FOR COATING A SUBSTRATE, AND MODULE 有权
标题翻译：用于涂覆基板和模块的机器
公开(公告)号：US20060226004A1
公开(公告)日：2006-10-12
申请号：US11279047
申请日：2006-04-07
申请人： HANS BUCHBERGER , ANDREAS GEISS , JORG KREMPEL-HESSE , DIETER HAAS
发明人： HANS BUCHBERGER , ANDREAS GEISS , JORG KREMPEL-HESSE , DIETER HAAS
IPC分类号： C23C14/00
CPC分类号： C23C14/56 , H01J37/32431 , H01J37/32458
摘要： A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second support 4 that is arranged removably at the first support 3. Whereas the first support 3 bears the cathodes, the second support 4 is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers 3 and 4 can be removed laterally from the chamber section 2 to such an extent that areas 11a, 11b accessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.
摘要翻译：用于涂覆用于生产显示屏的透明基板的机器包括具有模块化设计的涂布室。每个模块1具有腔室部分2，可移除地布置在腔室部分2中或在腔室部分2中的第一支撑件3，以及可拆卸地布置在第一支撑件3处的第二支撑件4。而第一支撑件3具有阴极，第二支撑件4形成为盖，在该盖处布置有用于在涂覆室中产生真空的泵。载体3和4可以从腔室部分2侧向移除到可以在模块部件之间形成人员可接近的区域11a，11b。以这种方式，机器的组件容易接近，例如用于维护目的。可以在阴极和室内同时进行工作。

2. 发明授权

US06077407A Sputtering cathode based on the magnetron principle 有权
标题翻译：基于磁控管原理的溅射阴极
公开(公告)号：US06077407A
公开(公告)日：2000-06-20
申请号：US301459
申请日：1999-04-29
申请人： Michael Liehr , Jorg Krempel-Hesse , Rolf Adam
发明人： Michael Liehr , Jorg Krempel-Hesse , Rolf Adam
IPC分类号： C23C14/35 , H01J37/34
CPC分类号： C04B30/02 , H01J37/3408 , C04B2111/54
摘要： A sputtering cathode based on the magnetron principle, with a target of the material to be sputtered having a minimum of one component, with a magnetic system located beneath the target and having magnetic sources of different polarization which form a minimum of one self-enclosed tunnel of arcuate magnetic lines of force, having the poles of the sources facing away from the target connected to each other via a magnetic yoke made of a material of low retentivity, the bodies forming the sources of the magnetic fields being right prisms, and preferably right parallelepipeds, the base edges of which run parallel to the target plane, with the magnetic lines of force of the sources running at inclined angles relative to the base surfaces of the bodies.
摘要翻译：基于磁控管原理的溅射阴极，具有至少一个组分的溅射材料的靶材具有位于靶材下方的磁系统，并具有不同极化的磁源，其形成至少一个自封闭隧道通过由低保持性材料制成的磁轭将源极的极背向与目标物相连的弧形磁力线，形成磁场源的体是正确的棱镜，最好是右平行六面体，其基部边缘平行于目标平面延伸，源极的磁力线相对于主体的基面以倾斜的角度运行。

3. 发明申请

US20060108217A1 Cooled backing plate for a sputtering target, and sputtering target comprising a plurality of backing plates 审中-公开
标题翻译：用于溅射靶的冷却背板，以及包括多个背板的溅射靶
公开(公告)号：US20060108217A1
公开(公告)日：2006-05-25
申请号：US11068538
申请日：2005-02-28
申请人： Jorg Krempel-Hesse , Andreas Jischke , Uwe Schussler , Hans Wolf
发明人： Jorg Krempel-Hesse , Andreas Jischke , Uwe Schussler , Hans Wolf
IPC分类号： C23C14/00
CPC分类号： C23C14/3407
摘要： Claimed is a sputtering target system comprising a plurality of backing plates (2, 3, 4) to be individually cooled. Each backing plate (2, 3, 4) is provided on its back side with a meandering groove (5) that is closed off by a sealing plate. The sealing plate (9) is welded around its circumference to the backing plate (2), and at the same time is welded to at least one ridge (7), located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate (3) not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate (20).
摘要翻译：所要求的是一种溅射靶系统，包括要单独冷却的多个背板（2,3,4）。每个背板（2,3,4）在其后侧设置有由密封板封闭的曲折槽（5）。密封板（9）围绕其圆周焊接到背板（2）上，并且同时被焊接到至少一个与框架一定距离的脊（7），所述脊（7）将两个凹槽部分与一个另一个。这样焊接到背板（3）的密封板不仅封闭凹槽以形成冷却通道，而且还用于加强相对平坦的背板（20）。

4. 发明申请

US20090134019A1 COOLED BACKING PLATE FOR A SPUTTERING TARGET, AND SPUTTERING TARGET COMPRISING A PLURALITY OF BACKING PLATES 有权
标题翻译：用于喷射目标的冷却背板和包含多个背板的飞溅目标
公开(公告)号：US20090134019A1
公开(公告)日：2009-05-28
申请号：US12323287
申请日：2008-11-25
申请人： Jorg KREMPEL-HESSE , Andreas JISCHKE , Uwe SCHUSSLER , Hans WOLF
发明人： Jorg KREMPEL-HESSE , Andreas JISCHKE , Uwe SCHUSSLER , Hans WOLF
IPC分类号： C23C14/34
CPC分类号： C23C14/3407
摘要： Claimed is a sputtering target system comprising a plurality of backing plates to be individually cooled. Each backing plate is provided on its back side with a meandering groove that is closed off by a sealing plate. The sealing plate is welded around its circumference to the backing plate and at the same time is welded to at least one ridge located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate.
摘要翻译：所要求的是一种溅射靶系统，其包括要单独冷却的多个背板。每个背板在其背侧设置有由密封板封闭的曲折槽。密封板围绕其圆周焊接到背板上，并且同时被焊接到位于与框架相距一定距离的至少一个脊部，其将两个凹槽部分彼此分开。这样焊接到背板上的密封板不仅封闭了凹槽以形成冷却通道，而且还用于加固相对平坦的背板。

5. 发明申请

US20050178660A1 Sputter arrangement with a magnetron and a target 审中-公开
标题翻译：磁控管和目标的溅射装置
公开(公告)号：US20050178660A1
公开(公告)日：2005-08-18
申请号：US10797925
申请日：2004-03-10
申请人： Andreas Lopp , Andreas Jischke , Michael Geisler , Herbert Pfeiffer , Jorg Krempel-Hesse
发明人： Andreas Lopp , Andreas Jischke , Michael Geisler , Herbert Pfeiffer , Jorg Krempel-Hesse
IPC分类号： C23C14/35 , H01J37/34 , H01L21/285
CPC分类号： H01J37/3408 , C23C14/35 , H01J37/3452
摘要： The invention relates to a sputter arrangement with a magnetron and a target, with the magnetron and the target being movable relative to one another. The magnetron comprises a magnet system, which forms a quasi-rectangular plasma tube, whose two longitudinal sides have a distance C from one another. If target and magnet system are moved relative to one another by a path corresponding approximately to the distance C, the magnet system is laid out such that the width at the end of the plasma tube is smaller or equal to the diameter of the plasma tube. However, if the path of the relative movement is less than C, the magnet system is laid out such that the width d of the ends of the plasma tube is less or equal to twice the diameter of the plasma tube.
摘要翻译：本发明涉及一种具有磁控管和靶的溅射装置，其中磁控管和靶可相对于彼此移动。磁控管包括形成准矩形等离子体管的磁体系统，其两个纵向边彼此具有距离C. 如果目标和磁体系统通过相当于距离C的路径相对移动，则磁体系统布置成等离子体管末端的宽度小于或等于等离子体管的直径。然而，如果相对运动的路径小于C，则磁体系统布置成等离子体管的端部的宽度d小于等于等离子体管的直径的两倍。

6. 发明授权

US07575662B2 Method for operating a sputter cathode with a target 有权
标题翻译：用靶操作溅射阴极的方法
公开(公告)号：US07575662B2
公开(公告)日：2009-08-18
申请号：US11170640
申请日：2005-06-29
申请人： Stefan Bangert , Wolfgang Buschbeck , Markus Hanika , Karl-Albert Keim , Michael Konig , Jorg Krempel-Hesse , Andreas Lopp , Harald Rost , Jurgen Schroeder , Tobias Stolley
发明人： Stefan Bangert , Wolfgang Buschbeck , Markus Hanika , Karl-Albert Keim , Michael Konig , Jorg Krempel-Hesse , Andreas Lopp , Harald Rost , Jurgen Schroeder , Tobias Stolley
IPC分类号： C23C14/35
CPC分类号： H01J37/3405 , C23C14/352 , H01J37/3455
摘要： The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.
摘要翻译：本发明涉及一种用于操作磁控溅射阴极的方法，特别是管阴极或形成阵列的多个管阴极。在这样的阴极中，目标通过磁场，由此感应电流流过靶，使磁场发生变形。这导致衬底的不均匀涂覆。通过使磁场和目标之间的相对运动交替地反转其方向，可以补偿磁场失真的影响。这样可以使待涂覆的基底上的涂层更均匀。

7. 发明申请

US20060254905A1 Method for operating a sputter cathode with a target 有权
公开(公告)号：US20060254905A1
公开(公告)日：2006-11-16
申请号：US11170640
申请日：2005-06-29
申请人： Stefan Bangert , Wolfgang Buschbeck , Markus Hanika , Karl-Albert Keim , Michael Konig , Jorg Krempel-Hesse , Andreas Lopp , Harald Rost , Jurgen Schroeder , Tobias Stolley
发明人： Stefan Bangert , Wolfgang Buschbeck , Markus Hanika , Karl-Albert Keim , Michael Konig , Jorg Krempel-Hesse , Andreas Lopp , Harald Rost , Jurgen Schroeder , Tobias Stolley
IPC分类号： C23C14/00
CPC分类号： H01J37/3405 , C23C14/352 , H01J37/3455
摘要： The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array. In such cathodes a target passes through a magnetic field, whereby induction currents flow in the target which distort the magnetic field. This results in the nonuniform coating of a substrate. By having the relative movement between magnetic field and target alternately reverse its direction, the effect of the magnetic field distortion can be compensated. This yields greater uniformity of the coating on a substrate to be coated.

8. 发明申请

US20060118412A1 Magnetron sputter cathode 有权
标题翻译：磁控溅射阴极
公开(公告)号：US20060118412A1
公开(公告)日：2006-06-08
申请号：US11284439
申请日：2005-11-21
申请人： Jorg Krempel-Hesse , Andreas Jischke , Uwe Schussler , Hans Wolf
发明人： Jorg Krempel-Hesse , Andreas Jischke , Uwe Schussler , Hans Wolf
IPC分类号： C23C14/00
CPC分类号： H01J37/3497 , C23C14/3407 , H01J37/3408
摘要： To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier (2) is disposed the sputter target (4) with a backing plate (3), which maintains a gap (14) from the carrier (2). The backing plate (3) is developed as a cooling plate. In it are located cooling means channels (15), which, via an inlet (16) through the carrier (2), are supplied with cooling fluid, which can flow out again via an outlet (17) through the carrier (2). On the atmospheric side is located a magnet configuration (5).
摘要翻译：为了能够实现相对宽的磁控溅射阴极，提出在载体（2）的真空侧上设置带有背板（3）的溅射靶（4），其将间隙（14）从载体（2）。背板（3）显影为冷却板。在其中设置有冷却装置通道（15），其通过载体（2）的入口（16）被供应冷却流体，冷却流体可以经由出口（17）再次通过载体（2）流出。在大气一侧设有磁铁配置（5）。

9. 发明授权

US6139706A Sputter cathode 有权
标题翻译：溅射阴极
公开(公告)号：US6139706A
公开(公告)日：2000-10-31
申请号：US207413
申请日：1998-12-08
申请人： Rolf Adam , Jorg Krempel-Hesse , Martin Bahr
发明人： Rolf Adam , Jorg Krempel-Hesse , Martin Bahr
IPC分类号： C23C14/34 , C23C14/35 , H01J37/34
CPC分类号： H01J37/3408
摘要： In a sputter cathode with a plate-shaped target (8) and with a trough-shaped yoke (3), arranged behind the target (8), with middle web (5) and with magnets (7, 7', . . . ) for producing a closed tunnel of field lines (15, 15', . . . ) curved in an arc in front of the target surface as well as with three sheet-metal blanks (9, 10, 11) consisting of one layer of a compound plate e.g. of an aluminum/iron compound plate, which blanks are placed into the plane between the target (8) and the front surfaces (12, 13) of the trough edge of the yoke (3), which front surfaces face the target (8), all sheet-metal blanks (9, 10, 11) of magnetically conductive material together form gaps (a, a') extending approximately parallel to the front surfaces (12, 13), which gaps (a, a') are filled out between the sheet-metal blanks (9, 10, 11) by the other layer (21) of the compound plate.
摘要翻译：在具有板状靶（8）和槽状轭（3）的溅射阴极中，布置在靶（8）的后面，具有中间腹板（5）和磁体（7,7'，...）。），用于产生在靶表面前方弧形弯曲的场线（15,15'，...）的封闭隧道，以及由三层金属板坯（9,10,11）构成的三层金属板坯复合板例如的铝/铁复合板，其中坯料被放置在靶（8）和轭（3）的槽边缘的前表面（12,13）之间的平面中，该前表面面向靶（8）导电材料的所有金属板坯（9,10,11）一起形成大致平行于前表面（12,13）延伸的间隙（a，a'），该间隙（a，a'）被填充在复合板的另一层（21）之间的金属片坯料（9,10,11）之间。

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