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1. 发明申请

US20060102204A1 Method for removing a residue from a substrate using supercritical carbon dioxide processing 审中-公开
标题翻译：使用超临界二氧化碳处理从底物中除去残余物的方法
公开(公告)号：US20060102204A1
公开(公告)日：2006-05-18
申请号：US10987594
申请日：2004-11-12
申请人： Gunilla Jacobson , Bentley Palmer , Shan Clark , Vijayakumar Ramachandrarao , Subramanyam Iyer , Robert Turkot
发明人： Gunilla Jacobson , Bentley Palmer , Shan Clark , Vijayakumar Ramachandrarao , Subramanyam Iyer , Robert Turkot
IPC分类号： C23G1/00 , B08B3/00
CPC分类号： B08B7/0021 , C23G5/00 , G03F7/427 , H01L21/02063 , H01L21/02101 , H01L21/31133
摘要： A method for cleaning a substrate containing a micro-feature having a residue thereon. The method includes treating the substrate with a supercritical carbon dioxide cleaning solution containing a peroxide to remove the residue from the micro-feature, where the supercritical carbon dioxide cleaning solution is maintained at a temperature between about 35° C. and about 80° C. According an embodiment of the invention, the supercritical carbon dioxide cleaning solution can further contain ozone. According to another embodiment of the invention, the substrate can be pre-treated with an ozone processing environment.
摘要翻译：一种清洗含有残留物的微特征的基材的方法。该方法包括用含有过氧化物的超临界二氧化碳清洗溶液处理底物以从微特征中除去残余物，其中超临界二氧化碳清洗溶液保持在约35℃至约80℃的温度。根据本发明的一个实施方案，超临界二氧化碳清洗溶液可以进一步含有臭氧。根据本发明的另一个实施例，可以用臭氧处理环境预处理衬底。

2. 发明申请

US20060024616A1 Basic quencher/developer solutions for photoresists 失效
标题翻译：用于光致抗蚀剂的基本猝灭剂/显影剂溶液
公开(公告)号：US20060024616A1
公开(公告)日：2006-02-02
申请号：US11143126
申请日：2005-06-01
申请人： Shan Clark , Kim-Khanh Ho , James Clarke , Ernisse Putna , Wang Yueh , Robert Meagley
发明人： Shan Clark , Kim-Khanh Ho , James Clarke , Ernisse Putna , Wang Yueh , Robert Meagley
IPC分类号： G03C5/00
CPC分类号： G03F7/327
摘要： A basic developer/quencher solution formulated to include at least one supercritical fluid or liquid solvent and a base may be used to quench a photo-generated acid within a photoresist as well as develop the photoresist. The supercritical fluid or liquid solvent may be carbon dioxide and the base may be quaternary ammonium salt that has side groups that increase the solubility of the quaternary ammonium salt in carbon dioxide.
摘要翻译：配制成包括至少一种超临界流体或液体溶剂和碱的基本显影剂/猝灭剂溶液可用于淬灭光致抗蚀剂内的光生酸，以及显影光致抗蚀剂。超临界流体或液体溶剂可以是二氧化碳，碱可以是具有增加季铵盐在二氧化碳中的溶解度的侧基的季铵盐。

3. 发明申请

US20050221218A1 Novel anti-reflective coatings 有权
标题翻译：新型抗反射涂层
公开(公告)号：US20050221218A1
公开(公告)日：2005-10-06
申请号：US10815528
申请日：2004-03-31
申请人： Shan Clark , Ernisse Putna , Robert Meagley
发明人： Shan Clark , Ernisse Putna , Robert Meagley
IPC分类号： G03C1/492 , G03F7/09 , G03F7/40
CPC分类号： G03F7/091 , G03F7/40
摘要： Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective material an additive to alter the radiation beam path of the reflected light or electrons. The radiation beam path altering additive may be a reflective material or a refractive material. The inclusion of such a radiation beam bath altering additive may reduce line width roughness and increase critical dimension (CD) control of interconnect lines and vias.
摘要翻译：防反射材料如底部抗反射涂层（BARC）和牺牲光吸收材料（SLAM）可以更有效地通过在抗反射材料中包含添加剂来改变基底的相干光或电子束反射，从而改变反射光或电子的辐射束路径。辐射束路径改变添加剂可以是反射材料或折射材料。包含这种辐射束浴改变添加剂可以减小线宽粗糙度并增加互连线和通孔的临界尺寸（CD）控制。

4. 发明授权

US07275817B2 Formation of novel ink jet filter printhead using transferable photopatterned filter layer 有权
标题翻译：使用可转移的光图案过滤层形成新型喷墨过滤器打印头
公开(公告)号：US07275817B2
公开(公告)日：2007-10-02
申请号：US11134662
申请日：2005-05-20
申请人： Shan Clark , Gary Kneezel , Ram Narang , Bidan Zhang , Almon Fisher
发明人： Shan Clark , Gary Kneezel , Ram Narang , Bidan Zhang , Almon Fisher
IPC分类号： B41J2/175
CPC分类号： B41J2/17563 , B41J2/16 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635 , B41J2/1645
摘要： Disclosed is a process for forming a channel wafer for a novel ink jet printhead, having an ink particle-filter layer over the ink-inlet surface thereof. The process includes the steps of applying a thin coating of a heat-curable, photopatternable polymer composition to an intermediate substrate having a release surface and drying the coating to form a semi-solid adhesive layer. The layer and supporting substrate are pressed against the ink-inlet surface of a channel wafer with an optional adhesive layer to bond the layer to the ink inlet surface. The substrate is separated to transfer the contacting area of the semi-solid layer to the ink-inlet surface as a laminate, and the semi-solid layer is exposed through a filter-forming mask and ink particle-filter openings are developed therethrough, either before or after transfer of the semi-solid adhesive layer from the intermediate substrate to the ink-inlet surface of the channel wafer, and the filter layer is cured.
摘要翻译：公开了一种用于形成用于新型喷墨打印头的通道晶片的方法，在其墨入口表面上具有墨颗粒过滤层。该方法包括以下步骤：将具有可热固化的可光化图案化的聚合物组合物的薄涂层施加到具有剥离表面的中间基材上，并干燥该涂层以形成半固体粘合剂层。层和支撑衬底用可选的粘合剂层压在通道晶片的墨入口表面上，以将层粘合到墨入口表面。分离衬底以将半固体层的接触面积作为层压体转移到油墨入口表面，并且半固体层通过过滤器形成掩模暴露，并且墨水颗粒过滤器开口通过其开展，或者在将半固体粘合剂层从中间基材转移到通道晶片的墨入口表面之前或之后，并且过滤层被固化。

5. 发明授权

US07101030B2 Formation of novel ink jet filter printhead using transferable photopatterned filter layer 有权
标题翻译：使用可转移的光图案过滤层形成新型喷墨过滤器打印头
公开(公告)号：US07101030B2
公开(公告)日：2006-09-05
申请号：US10442569
申请日：2003-05-21
申请人： Shan Clark , Gary Kneezel , Ram Narang , Bidan Zhang , Almon Fisher
发明人： Shan Clark , Gary Kneezel , Ram Narang , Bidan Zhang , Almon Fisher
IPC分类号： B41J2/175
CPC分类号： B41J2/17563 , B41J2/16 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635 , B41J2/1645
摘要： Disclosed is a process for forming a channel wafer for a novel ink jet printhead, having an ink particle-filter layer over the ink-inlet surface thereof. The process comprises the steps of applying a thin coating of a heat-curable, photopatternable polymer composition to an intermediate substrate having a release surface and drying the coating to form a semi-solid adhesive layer. The layer and supporting substrate are pressed against the ink-inlet surface of a channel wafer with an optional adhesive layer to bond the layer to the ink inlet surface. The substrate is separated to transfer the contacting area of the semi-solid layer to the ink-inlet surface as a laminate, and the semi-solid layer is exposed through a filter-forming mask and ink particle-filter openings are developed therethrough, either before or after transfer of the semi-solid adhesive layer from the intermediate substrate to the ink-inlet surface of the channel wafer, and the filter layer is cured.
摘要翻译：公开了一种用于形成用于新型喷墨打印头的通道晶片的方法，在其墨入口表面上具有墨颗粒过滤层。该方法包括以下步骤：将具有可热固化的可光化图案化的聚合物组合物的薄涂层施加到具有剥离表面的中间基材上并干燥该涂层以形成半固体粘合剂层。层和支撑衬底用可选的粘合剂层压在通道晶片的墨入口表面上，以将层粘合到墨入口表面。分离衬底以将半固体层的接触面积作为层压体转移到油墨入口表面，并且半固体层通过过滤器形成掩模暴露，并且墨水颗粒过滤器开口通过其开展，或者在将半固体粘合剂层从中间基材转移到通道晶片的墨入口表面之前或之后，并且过滤层被固化。

6. 发明申请

US20060183348A1 Layered films formed by controlled phase segregation 有权
标题翻译：通过控制相分离形成的层状膜
公开(公告)号：US20060183348A1
公开(公告)日：2006-08-17
申请号：US11060843
申请日：2005-02-17
申请人： Robert Meagley , Michael Leeson , Michael Goodner , Bob Leet , Michael McSwiney , Shan Clark
发明人： Robert Meagley , Michael Leeson , Michael Goodner , Bob Leet , Michael McSwiney , Shan Clark
IPC分类号： H01L21/31
CPC分类号： H01L21/76808 , G03F7/091 , H01L21/0276 , H01L21/31144 , H01L21/76822 , H01L21/76829 , H01L21/76834 , H01L21/76835
摘要： Multiple-layer films in integrated circuit processing may be formed by the phase segregation of a single composition formed above a semiconductor substrate. The composition is then induced to phase segregate into at least a first continuous phase and a second continuous phase. The composition may be formed of two or more components that phase segregate into different continuous layers. The composition may also be a single component that breaks down upon activation into two or more components that phase segregate into different continuous layers. Phase segregation may be used to form, for example, a sacrificial light absorbing material (SLAM) and a developer resistant skin, a dielectric layer and a hard mask, a photoresist and an anti-reflective coating (ARC), a stress buffer coating and a protective layer on a substrate package, and light interference layers.
摘要翻译：集成电路处理中的多层膜可以通过在半导体衬底上形成的单一组合物的相分离来形成。然后将组合物诱导相分离成至少第一连续相和第二连续相。组合物可以由相分离成不同连续层的两种或多种组分形成。组合物还可以是单一组分，其在活化时分解成两个或多个相分离成不同连续层的组分。相分离可用于形成例如牺牲光吸收材料（SLAM）和显影剂抗性皮肤，介电层和硬掩模，光致抗蚀剂和抗反射涂层（ARC），应力缓冲涂层和衬底封装上的保护层，以及光干涉层。

7. 发明授权

US06982022B2 Formation of photopatterned ink jet nozzle plates by transfer methods 失效
标题翻译：通过转印方法形成光图案喷墨喷嘴板
公开(公告)号：US06982022B2
公开(公告)日：2006-01-03
申请号：US10442543
申请日：2003-05-21
申请人： Shan Clark , Gary Kneezel , Ram Narang , Bidan Zhang , Almon Fisher
发明人： Shan Clark , Gary Kneezel , Ram Narang , Bidan Zhang , Almon Fisher
IPC分类号： B32B31/00 , B41J2/16 , G03C5/00
CPC分类号： B41J2/1631 , B41J2/1433 , B41J2/162 , B41J2/1645
摘要： Disclosed is a process for forming a novel ink jet printhead which comprises: (a) providing a lower substrate in which one surface thereof has an array of drop generating elements and addressing electrodes formed thereon; (b) depositing onto the release surface of an intermediate film support a photopatternable layer comprising a precursor polymer which is a phenolic novolac resin having glycidyl ether functional groups; (c) prebaking the photopatternable layer to dry, semi-solid condition; (d) laminating the dry, semi-solid layer to the surface of the lower substrate under heat and pressure and separating it from the release surface of the intermediate film support; (e) exposing the photopatternable layer to actinic radiation in an imagewise pattern corresponding to ink nozzles and developing to form a nozzle plate section, and (f) removing the precursor polymer from the unexposed areas, thereby forming ink nozzle recesses which are aligned to communicate with the drop generating elements and terminal ends of the electrodes of the lower substrate laminated thereto. Step (e) may be carried out either before or after step (d).
摘要翻译：公开了一种用于形成新颖的喷墨打印头的方法，其包括：（a）提供下基板，其中一个表面具有形成在其上的液滴产生元件阵列和寻址电极; （b）在中间膜的释放表面上沉积载体，该光可图案化层包括具有缩水甘油醚官能团的酚醛清漆树脂的前体聚合物; （c）将光图案层预烘烤成干燥，半固态; （d）在加热和加压下将干燥半固体层层压到下基板的表面，并将其从中间膜载体的释放表面分离; （e）以与油墨喷嘴相对应的成像图案将光图案层暴露于光化辐射并显影以形成喷嘴板部分，以及（f）从未曝光区域移除前体聚合物，由此形成对齐以连通的墨喷嘴凹部其中下层发生元件和下基板的电极的末端层压在其上。步骤（e）可以在步骤（d）之前或之后进行。

8. 发明申请

US20050214673A1 Formation of novel ink jet filter printhead using transferable photopatterned filter layer 有权
标题翻译：使用可转移的光图案过滤层形成新型喷墨过滤器打印头
公开(公告)号：US20050214673A1
公开(公告)日：2005-09-29
申请号：US11134662
申请日：2005-05-20
申请人： Shan Clark , Gary Kneezel , Ram Narang , Bidan Zhang , Almon Fisher
发明人： Shan Clark , Gary Kneezel , Ram Narang , Bidan Zhang , Almon Fisher
IPC分类号： B41J2/16 , B41J2/175 , B41J2/05
CPC分类号： B41J2/17563 , B41J2/16 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1635 , B41J2/1645
摘要： Disclosed is a process for forming a channel wafer for a novel ink jet printhead, having an ink particle-filter layer over the ink-inlet surface thereof. The process comprises the steps of applying a thin coating of a heat-curable, photopatternable polymer composition to an intermediate substrate having a release surface and drying the coating to form a semi-solid adhesive layer. The layer and supporting substrate are pressed against the ink-inlet surface of a channel wafer with an optional adhesive layer to bond the layer to the ink inlet surface. The substrate is separated to transfer the contacting area of the semi-solid layer to the ink-inlet surface as a laminate, and the semi-solid layer is exposed through a filter-forming mask and ink particle-filter openings are developed therethrough, either before or after transfer of the semi-solid adhesive layer from the intermediate substrate to the ink-inlet surface of the channel wafer, and the filter layer is cured.
摘要翻译：公开了一种用于形成用于新型喷墨打印头的通道晶片的方法，在其墨入口表面上具有墨颗粒过滤层。该方法包括以下步骤：将具有可热固化的可光化图案化的聚合物组合物的薄涂层施加到具有剥离表面的中间基材上并干燥该涂层以形成半固体粘合剂层。层和支撑衬底用可选的粘合剂层压在通道晶片的墨入口表面上，以将层粘合到墨入口表面。分离衬底以将半固体层的接触面积作为层压体转移到油墨入口表面，并且半固体层通过过滤器形成掩模暴露，并且墨水颗粒过滤器开口通过其开展，或者在将半固体粘合剂层从中间基材转移到通道晶片的墨入口表面之前或之后，并且过滤层被固化。

9. 发明申请

US20090241988A1 PHOTORESIST AND ANTIREFLECTIVE LAYER REMOVAL SOLUTION AND METHOD THEREOF 审中-公开
标题翻译：光电和抗反射层去除解决方案及其方法
公开(公告)号：US20090241988A1
公开(公告)日：2009-10-01
申请号：US12058797
申请日：2008-03-31
申请人： Vijayakumar S. RAMACHANDRARAO , Melanie S. Reyes , Shan Clark , John O'Sullivan
发明人： Vijayakumar S. RAMACHANDRARAO , Melanie S. Reyes , Shan Clark , John O'Sullivan
IPC分类号： G03F7/42 , B08B7/00
CPC分类号： G03F7/425 , G03F7/423 , H01L21/02063 , H01L21/31133
摘要： An aqueous solution composition may include an organic base hydroxide, potassium hydroxide, a compound selected from the group of compounds consisting of 2-mercaptobenzimidazole, 1-Phenyl-1H-tetrazole-5-thiol and 2-MerCaptoBenzoThiazole, hydrogen peroxide and deionized water. A method for removing photoresist and anti-reflective coating from a wafer using such a solution is also disclosed.
摘要翻译：水溶液组合物可以包括有机碱氢氧化物，氢氧化钾，选自由2-巯基苯并咪唑，1-苯基-1H-四唑-5-硫醇和2-巯基苯并噻唑组成的化合物的化合物，过氧化氢和去离子水。还公开了使用这种溶液从晶片去除光致抗蚀剂和抗反射涂层的方法。

10. 发明申请

US20060003271A1 Basic supercritical solutions for quenching and developing photoresists 审中-公开
标题翻译：用于淬火和发展光刻胶的基本超临界解决方案
公开(公告)号：US20060003271A1
公开(公告)日：2006-01-05
申请号：US10883457
申请日：2004-06-30
申请人： Shan Clark , Kim-Khanh Ho , James Clarke , Ernisse Putna , Wang Yueh
发明人： Shan Clark , Kim-Khanh Ho , James Clarke , Ernisse Putna , Wang Yueh
IPC分类号： G03F7/30
CPC分类号： G03F7/327
摘要： A basic supercritical solution formulated to include at least one supercritical fluid and a base may be used to quench a photo-generated acid within a photoresist as well as develop the photoresist. The base may be the supercritical fluid in the basic supercritical solution. A super critical fluid is a state of matter above the critical temperature and pressure (Tc and Pc). A basic supercritical solution formulated to include at least one supercritical fluid has a low viscosity and surface tension and is capable of penetrating narrow features having high aspect ratios and the photoresist material due to the gas-like nature of the supercritical fluid.
摘要翻译：配制成包含至少一种超临界流体和碱的基本超临界溶液可用于淬灭光致抗蚀剂内的光生酸，以及显影光致抗蚀剂。碱可以是基本超临界溶液中的超临界流体。超临界流体是高于临界温度和压力（T T c C和C C）的物质状态。配制成包含至少一种超临界流体的基本超临界溶液具有低粘度和表面张力，并且由于超临界流体的气体性质，能够穿透具有高纵横比的窄特征和光致抗蚀剂材料。

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