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1. 发明申请

US20090244509A1 OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS 有权
标题翻译：光学系统具有可交换的可操作的校正装置，用于减少图像抖动
公开(公告)号：US20090244509A1
公开(公告)日：2009-10-01
申请号：US12409961
申请日：2009-03-24
申请人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
发明人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
IPC分类号： G03B27/54
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
摘要翻译：本发明涉及一种光学系统，例如用于半导体光刻的投影曝光装置，包括用于减小图像像差的可操作的校正装置。在一些实施例中，系统包括被配置为减少图像像差的至少一个操纵器。操纵器可以包括至少一个可由至少一个致动器操纵的光学元件。操纵器可以与致动器一起以可变的方式形成。

2. 发明授权

US08542346B2 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations 有权
标题翻译：光学系统，具有可更换的可操作的校正装置，用于减少图像像差
公开(公告)号：US08542346B2
公开(公告)日：2013-09-24
申请号：US12409961
申请日：2009-03-24
申请人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
发明人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
IPC分类号： G03B27/52
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
摘要翻译：本发明涉及一种光学系统，例如用于半导体光刻的投影曝光装置，包括用于减小图像像差的可操作的校正装置。在一些实施例中，系统包括被配置为减少图像像差的至少一个操纵器。操纵器可以包括至少一个可由至少一个致动器操纵的光学元件。操纵器可以与致动器一起以可变的方式形成。

3. 发明申请

US20100195070A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD AND OPTICAL CORRECTION PLATE 有权
标题翻译：投影曝光法，投影曝光法和光学校正板投影目标
公开(公告)号：US20100195070A1
公开(公告)日：2010-08-05
申请号：US12698242
申请日：2010-02-02
申请人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
发明人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
IPC分类号： G03B27/68 , G02B9/00 , B32B3/00
CPC分类号： G03F7/70983 , G03F1/62 , G03F7/70308 , Y10T428/24612
摘要： A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.
摘要翻译：公开了一种投影物镜。投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带波长λ。多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线，以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。

4. 发明授权

US08325322B2 Optical correction device 有权
标题翻译：光学校正装置
公开(公告)号：US08325322B2
公开(公告)日：2012-12-04
申请号：US12700122
申请日：2010-02-04
申请人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
发明人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
IPC分类号： G03B27/68 , G03B27/52
CPC分类号： G02B7/008 , G02B7/1815 , G02B26/06 , G02B27/0025 , G03F7/70191 , G03F7/70308 , G03F7/70825 , G03F7/70891
摘要： The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
摘要翻译：本发明涉及具有用于影响光学校正装置中的温度分布的热致动器的光学校正装置。光学校正装置由至少两个部分元件构成，这些部分元素关于其传送热量的能力而不同。此外，本公开涉及影响光学元件中的温度分布的方法。

5. 发明申请

US20100201958A1 OPTICAL CORRECTION DEVICE 有权
标题翻译：光学校正装置
公开(公告)号：US20100201958A1
公开(公告)日：2010-08-12
申请号：US12700122
申请日：2010-02-04
申请人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
发明人： Markus Hauf , Ulrich Schoenhoff , Payam Tayebati , Michael Thier , Tilmann Heil , Ole Fluegge , Arif Kazi , Alexander Sauerhoefer , Gerhard Focht , Jochen Weber , Toralf Gruner , Aksel Goehnermeier , Dirk Hellweg
IPC分类号： G03B27/52 , G02B7/02
CPC分类号： G02B7/008 , G02B7/1815 , G02B26/06 , G02B27/0025 , G03F7/70191 , G03F7/70308 , G03F7/70825 , G03F7/70891
摘要： The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
摘要翻译：本发明涉及具有用于影响光学校正装置中的温度分布的热致动器的光学校正装置。光学校正装置由至少两个部分元件构成，这些部分元素关于其传送热量的能力而不同。此外，本公开涉及影响光学元件中的温度分布的方法。

6. 发明授权

US08228483B2 Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate 有权
标题翻译：微光刻投影目标，投影曝光装置，投影曝光法和光学校正板
公开(公告)号：US08228483B2
公开(公告)日：2012-07-24
申请号：US12698242
申请日：2010-02-02
申请人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
发明人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
IPC分类号： G03B27/68
CPC分类号： G03F7/70983 , G03F1/62 , G03F7/70308 , Y10T428/24612
摘要： A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.
摘要翻译：公开了一种投影物镜。投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带波长λ。多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线，以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。

7. 发明授权

US08081295B2 Projection exposure method and projection exposure system therefor 有权
标题翻译：投影曝光方法和投影曝光系统
公开(公告)号：US08081295B2
公开(公告)日：2011-12-20
申请号：US11817903
申请日：2005-07-14
申请人： Aksel Goehnermeier
发明人： Aksel Goehnermeier
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/701 , G03F7/70141 , G03F7/70425 , G03F7/70433
摘要： In the case of a projection exposure method for exposing a radiation-sensitive substrate, arranged in the region of an image surface of a projection objective, with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective, a mask is arranged in the region of the object surface of the projection objective, the mask having a first pattern area with a first subpattern, and at least one second pattern area, arranged laterally offset from the first pattern area, with a second subpattern. The mask is scanned by relative movement between the mask and the illumination field of the illumination system in such a way that initially the first subpattern and thereafter the second subpattern is irradiated with the illumination radiation of the illumination field. The first subpattern is irradiated during a first illumination time interval with a first angular distribution, adapted to the first subpattern, of the illumination radiation. Thereafter, the second subpattern is irradiated during the second illumination time interval with a second angular distribution, adapted to the second subpattern, of the illumination radiation, said second angular distribution differing from the first angular distribution.
摘要翻译：在投影曝光方法的情况下，用于曝光放射敏感性基板，布置在投影物镜的图像表面的区域中，其中至少一个掩模图案布置在该物体表面的区域中投影物镜，掩模布置在投影物镜的物体表面的区域中，掩模具有第一图案区域和第一子图案，以及至少一个第二图案区域，其布置在与第一图案区域横向偏移的位置，第二个子模式。通过掩模和照明系统的照明场之间的相对运动来扫描掩模，使得最初第一子图案和其后的第二子图案被照射场的照明辐射照射。在第一照明时间间隔内照射第一子图案，其具有适于第一子图案的照明辐射的第一角度分布。此后，第二子图案在第二照明时间间隔期间以适合于第二子图案的照明辐射的第二角度分布被照射，所述第二角度分布与第一角度分布不同。

8. 发明授权

US07847921B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US07847921B2
公开(公告)日：2010-12-07
申请号：US12177715
申请日：2008-07-22
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

9. 发明申请

US20090073412A1 OFF-AXIS OBJECTIVES WITH ROTATABLE OPTICAL ELEMENT 有权
标题翻译：具有可旋转光学元件的偏轴目标
公开(公告)号：US20090073412A1
公开(公告)日：2009-03-19
申请号：US12206550
申请日：2008-09-08
申请人： Alexandra PAZIDIS , Aksel Goehnermeier
发明人： Alexandra PAZIDIS , Aksel Goehnermeier
IPC分类号： G03B27/54
CPC分类号： G03F7/70916 , G03F7/70308 , G03F7/70983
摘要： An objective and a method for operating an objective, in particular a projection objective or an illumination objective for microlithography for imaging a reticle onto a wafer, with a plurality of optical elements that are arranged along a ray path, wherein at least one optical element of a first kind (1) is provided, which is irradiated only partially by a ray bundle, wherein the one or more optical element(s) of the first kind are rotatably mounted or positionable about the optical axis or an axis parallel thereto, wherein, for each optical element of the first kind at least two mounting positions are provided, and wherein the rotation angle between the two mounting positions is defined by the surface (7) irradiated by the ray bundle such that, in the various mounting positions, the surfaces irradiated by the ray path do not overlap.
摘要翻译：一种用于操作物镜的目的和方法，特别是具有沿着光线路径布置的多个光学元件的用于将光罩成像到晶片上的微光刻的投影物镜或照明物镜，其中至少一个光学元件提供第一种（1），其仅部分地被射线束照射，其中第一类的一个或多个光学元件围绕光轴或平行于其的轴线可旋转地安装或定位，其中，对于第一种的每个光学元件，提供至少两个安装位置，并且其中两个安装位置之间的旋转角度被由射线束照射的表面（7）限定，使得在各种安装位置，表面由射线路径照射不重叠。

10. 发明申请

US20090073398A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20090073398A1
公开(公告)日：2009-03-19
申请号：US12210514
申请日：2008-09-15
申请人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
发明人： Michael Totzeck , Aksel Goehnermeier , Wolfgang Singer , Helmut Beierl , Heiko Feldmann , Hans-Juergen Mann , Jochen Hetzler
IPC分类号： G03B27/52 , G03B27/72
CPC分类号： G03F7/70308 , G03F7/70216 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
摘要翻译：本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。微光刻投影曝光装置包括照明系统和投影物镜。照明系统可以照亮布置在投影物镜的物平面中的掩模。掩模可以具有待成像的结构。该方法可以包括用光照射照明系统的光瞳平面。该方法还可以包括在投影物镜的平面中修改通过该平面的光的相位，幅度和/或极化。可以以相互不同的方式对至少两个衍射级进行修改。与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

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