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    • 1. 发明授权
    • Systems configured to inspect a specimen
    • 配置为检查样本的系统
    • US07535563B1
    • 2009-05-19
    • US11464567
    • 2006-08-15
    • Grace Hsiu-Ling ChenTao-Yi FuJamie SullivanShing LeeGreg Kirk
    • Grace Hsiu-Ling ChenTao-Yi FuJamie SullivanShing LeeGreg Kirk
    • G01N21/00
    • G01N21/4788G01N21/9501G01N21/95623G02B26/0841
    • Systems configured to inspect a specimen are provided. One system includes an illumination subsystem configured to illuminate a two-dimensional field of view on the specimen. The system also includes a collection subsystem configured to collect light scattered from the specimen. In addition, the system includes an array of micro-mirrors configured to reflect a two-dimensional pattern of light diffracted from periodic structures on the specimen out of the optical path of the system without reflecting light across an entire dimension of the array out of the optical path. The system further includes a detection subsystem configured to generate output responsive to light reflected by the array into the optical path. The output can be used to detect defects on the specimen. In one embodiment, the system includes an optical element configured to increase the uniformity of the wavefront of the light reflected by the array into the optical path.
    • 提供了配置为检查样本的系统。 一个系统包括被配置为照亮样本上的二维视场的照明子系统。 该系统还包括收集子系统,其被配置为收集从样本散射的光。 另外,该系统包括微镜阵列,微阵列阵列被配置成将来自系统的光路上的样品上的周期性结构衍射的光的二维图案反射出来,而不会反射穿过该阵列的整个尺寸的光 光路。 该系统还包括检测子系统,该检测子系统被配置为响应于由阵列反射到光路中的光产生输出。 输出可用于检测样品上的缺陷。 在一个实施例中,该系统包括被配置为增加由阵列反射到光路中的光的波前的均匀性的光学元件。
    • 2. 发明授权
    • Systems and methods for measurement of a specimen with vacuum ultraviolet light
    • 用真空紫外光测量样品的系统和方法
    • US07764376B2
    • 2010-07-27
    • US12506019
    • 2009-07-20
    • John FieldenGary JanikShing Lee
    • John FieldenGary JanikShing Lee
    • G01J4/00
    • G03F7/70933G03F7/70916
    • Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.
    • 提供了用于测量样本的各种系统。 一个系统包括设置在净化环境中的第一光学子系统。 净化的环境可以由差动清洗子系统提供。 第一个光学子系统使用真空紫外线进行测量。 该系统还包括第二光学子系统,其被布置在非净化环境中。 第二光学子系统使用非真空紫外光进行测量。 另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。 该系统还包括净化子系统,该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。 清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。 一些系统还包括清洁子系统,被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。
    • 3. 发明授权
    • Systems and methods for measurement of a specimen with vacuum ultraviolet light
    • 用真空紫外光测量样品的系统和方法
    • US07623239B2
    • 2009-11-24
    • US12103320
    • 2008-04-15
    • John FieldenGary JanikShing Lee
    • John FieldenGary JanikShing Lee
    • G01J4/00
    • G01J3/10G01J3/0286G01J3/36G01N21/211G01N2021/213
    • Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
    • 提供了用于测量样本的各种系统。 一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。 该系统还包括清洗子系统,其被配置为在测量期间保持围绕光学子系统的净化环境。 另一种系统包括清洁子系统,其构造成在测量之前从试样中去除污染物。 在一个实施例中,清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。 该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。 光学子系统设置在净化的环境中。 在一些实施例中,系统可以包括差分清洗子系统,其被配置为提供用于光学子系统的净化环境。
    • 4. 发明授权
    • Spectroscopic multi angle ellipsometry
    • 光谱多角椭偏仪
    • US07489399B1
    • 2009-02-10
    • US10923325
    • 2004-08-20
    • Shing Lee
    • Shing Lee
    • G01J4/00
    • G01N21/211G01B11/0641G01N2021/213
    • An ellipsometer having a light source for generating a probe beam along a probe beam path. A polarizing beam splitter passes the probe beam along the probe beam path, at least in part, as the probe beam passes through the beam splitter in a first direction, and diverts the probe beam along a detection path, at least in part, as the probe beam passes through the beam splitter in a second direction that is substantially opposite of the first direction. A compensator variably retards at least portions of the probe beam along at least one axis of the compensator, thereby changing an orientation of the light passing through the compensator. Optics focus the probe beam on a spot on a substrate. A concave mirror receives the probe beam from the spot on the substrate as it travels along the probe beam path in the first direction, and sends the probe beam back along the probe beam path in the second direction. A detector receives the probe beam along the detection path. Preferably, all of the elements of the ellipsometer that are disposed along the probe beam path are fixed and do not rotate relative to the probe beam during measurement operations.
    • 具有用于沿探测光束路径产生探测光束的光源的椭偏仪。 至少部分地,当探测光束沿着第一方向通过分束器时,偏振分束器沿着探测光束路径传递探测光束,并且至少部分地沿着检测路径转移探测光束,如 探测光束在与第一方向基本相反的第二方向上穿过分束器。 补偿器沿着补偿器的至少一个轴可变地延伸探测光束的至少一部分,从而改变通过补偿器的光的取向。 光学元件将探头光束聚焦在基板上的一个点上。 当在第一方向上沿着探测光束路径行进时,凹面镜从基底上的斑点接收探测光束,并沿第二方向沿着探测光束路径发送探测光束。 检测器沿检测路径接收探测光束。 优选地,沿着探测光束路径设置的椭偏仪的所有元件在测量操作期间是固定的并且不相对于探测光束旋转。
    • 6. 发明授权
    • In-situ end point detection for semiconductor wafer polishing
    • 用于半导体晶片抛光的原位终点检测
    • US06514775B2
    • 2003-02-04
    • US10008935
    • 2001-11-09
    • Haiguang ChenShing Lee
    • Haiguang ChenShing Lee
    • H01L2100
    • B24B37/013B24B49/12
    • The present invention relates to in-situ techniques for determining process end points in semiconductor wafer polishing processes. Generally, the technique involves utilizing a scanning inspection machine having multiple pair of lasers and sensors located at different angles for detecting signals caused to emanate from an inspected specimen. The detection techniques determine the end points by differentiating between various material properties within a wafer. An accompanying algorithm is used to obtain an end point detection curve that represents a composite representation of the signals obtained from each of the detectors of the inspection machine. This end point detection curve is then used to determine the process end point. Note that computation of the algorithm is performed during the polishing process so that the process end point can be determined without interruptions that diminish process throughputs.
    • 本发明涉及用于确定半导体晶片抛光工艺中的工艺终点的现场技术。 通常,该技术涉及利用具有多对激光器和位于不同角度的传感器的扫描检查机,以检测从检查样品发出的信号。 检测技术通过区分晶片内的各种材料特性来确定端点。 使用伴随的算法来获得终点检测曲线,其表示从检查机的每个检测器获得的信号的复合表示。 然后使用该终点检测曲线来确定过程终点。 请注意,在抛光过程中执行算法的计算,以便可以确定过程终点而不会导致过程吞吐量降低的中断。
    • 8. 发明授权
    • Energy assisted magnetic recording head having laser integrated mounted to slider
    • 具有激光一体化的能量辅助磁记录头安装到滑块
    • US08441896B2
    • 2013-05-14
    • US12824080
    • 2010-06-25
    • Lei WangShing LeeWentao Yan
    • Lei WangShing LeeWentao Yan
    • G11B11/00
    • G11B5/127G11B5/02G11B5/105G11B5/314G11B5/6088G11B2005/0021
    • A method and system for providing energy assisted magnetic recording (EAMR) heads are described. The method and system include providing a substrate, at least one EAMR transducer, an overcoat layer and at least one laser. The substrate has a leading edge and a substrate trailing edge. The EAMR transducer(s) reside in a device layer and on the substrate trailing edge. The overcoat layer includes a plurality of contacts. The device layer is between the overcoat layer and the substrate trailing edge. The laser(s) provide energy to the EAMR transducer. The overcoat layer is between the substrate trailing edge and the laser(s). The laser(s) are electrically coupled to at least a first portion of the contacts. The contacts provide thermal connection through the overcoat layer and the device layer. At least a second portion of the contacts is electrically insulated from the substrate.
    • 描述了一种用于提供能量辅助磁记录(EAMR)头的方法和系统。 该方法和系统包括提供衬底,至少一个EAMR换能器,外涂层和至少一个激光器。 衬底具有前缘和衬底后缘。 EAMR传感器位于器件层和衬底后缘。 外涂层包括多个触点。 器件层位于覆盖层和衬底后缘之间。 激光器向EAMR传感器提供能量。 外涂层位于基板后缘和激光之间。 激光器电耦合到触点的至少第一部分。 触点提供通过外涂层和器件层的热连接。 触点的至少第二部分与基板电绝缘。
    • 9. 发明授权
    • EAMR head having improved optical coupling efficiency
    • EAMR头具有改善的光耦合效率
    • US08325569B1
    • 2012-12-04
    • US13169720
    • 2011-06-27
    • Zhong ShiZhongyan WangShing LeeHongxing Yuan
    • Zhong ShiZhongyan WangShing LeeHongxing Yuan
    • G11B11/00
    • G11B5/6088G11B5/314G11B2005/0021
    • A method and system provide an EAMR transducer having an air-bearing surface (ABS) that resides near a media during use. The EAMR transducer includes a write pole, coil(s), a near field transducer (NFT), a waveguide, and a reflective grating. The write pole writes to a region of the media. The coil(s) energize the write pole. The NFT is proximate to the ABS and focuses the energy onto the media. The waveguide is configured to direct the energy from the laser toward the NFT at an incident angle with respect to the ABS. A first portion of the energy reflects off of the ABS at a reflected angle. The reflective grating receives the first portion of the energy at the reflected angle from the ABS and reflects a second portion of the energy toward the ABS. The NFT resides between at least part of the waveguide and the reflective grating.
    • 一种方法和系统提供具有在使用期间驻留在介质附近的空气轴承表面(ABS)的EAMR换能器。 EAMR传感器包括写极,线圈,近场换能器(NFT),波导和反射光栅。 写入磁极写入媒体的一个区域。 线圈使写入极点通电。 NFT靠近ABS,将能量聚焦在媒体上。 波导被配置为以相对于ABS的入射角将来自激光器的能量引向NFT。 能量的第一部分以反射角反射离开ABS。 反射光栅从ABS接收以反射角度的能量的第一部分,并将能量的第二部分反射向ABS。 NFT位于波导和反射光栅的至少一部分之间。