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    • 1. 发明授权
    • Systems configured to inspect a specimen
    • 配置为检查样本的系统
    • US07535563B1
    • 2009-05-19
    • US11464567
    • 2006-08-15
    • Grace Hsiu-Ling ChenTao-Yi FuJamie SullivanShing LeeGreg Kirk
    • Grace Hsiu-Ling ChenTao-Yi FuJamie SullivanShing LeeGreg Kirk
    • G01N21/00
    • G01N21/4788G01N21/9501G01N21/95623G02B26/0841
    • Systems configured to inspect a specimen are provided. One system includes an illumination subsystem configured to illuminate a two-dimensional field of view on the specimen. The system also includes a collection subsystem configured to collect light scattered from the specimen. In addition, the system includes an array of micro-mirrors configured to reflect a two-dimensional pattern of light diffracted from periodic structures on the specimen out of the optical path of the system without reflecting light across an entire dimension of the array out of the optical path. The system further includes a detection subsystem configured to generate output responsive to light reflected by the array into the optical path. The output can be used to detect defects on the specimen. In one embodiment, the system includes an optical element configured to increase the uniformity of the wavefront of the light reflected by the array into the optical path.
    • 提供了配置为检查样本的系统。 一个系统包括被配置为照亮样本上的二维视场的照明子系统。 该系统还包括收集子系统,其被配置为收集从样本散射的光。 另外,该系统包括微镜阵列,微阵列阵列被配置成将来自系统的光路上的样品上的周期性结构衍射的光的二维图案反射出来,而不会反射穿过该阵列的整个尺寸的光 光路。 该系统还包括检测子系统,该检测子系统被配置为响应于由阵列反射到光路中的光产生输出。 输出可用于检测样品上的缺陷。 在一个实施例中,该系统包括被配置为增加由阵列反射到光路中的光的波前的均匀性的光学元件。
    • 2. 发明授权
    • Dark field inspection apparatus and methods
    • 暗场检查仪器和方法
    • US07436503B1
    • 2008-10-14
    • US11009663
    • 2004-12-10
    • Grace Hsiu-Ling ChenTao-Yi FuEvan Mapoles
    • Grace Hsiu-Ling ChenTao-Yi FuEvan Mapoles
    • G01N21/00G02B27/42
    • G01N21/9501G01N2021/9563G02B21/10
    • Accordingly, the present invention provides methods and apparatus for performing a darkfield inspection on a specimen having periodic structures thereon while substantially reducing or eliminating the long range ringing response, which is typically produced by a traditional Fourier filter mask used to eliminate the diffraction caused by the periodic structures. In one embodiment, an apparatus for inspecting a specimen by detecting optical beams scattered from the specimen. The apparatus includes a beam generator for providing and directing an incident beam towards a specimen and an array subtraction device for substantially subtracting a periodic component from an output beam scattered from the specimen in response to the incident beam. The periodic component corresponds to at least one periodic structure on the specimen, and the subtraction is performed so as to substantially reduce or eliminate a ringing response from the output beam. The subtraction is also performed so as to substantially prevent subtracting any actual defect components from the output beam. The apparatus further includes a detector for receiving the output beam and generating an output image or signal based on the output beam.
    • 因此,本发明提供了对具有周期性结构的样本进行暗视场检查的方法和装置,同时基本上减少或消除了远程振铃响应,其通常由传统的傅立叶滤波器掩模产生,用于消除由 周期性结构。 在一个实施例中,一种用于通过检测从样本散射的光束来检查样本的装置。 该装置包括用于向入射光束提供并引导入射光束的光束发生器和用于响应于入射光束从从样本散射的输出光束基本上减去周期分量的阵列减法装置。 周期性分量对应于样本上的至少一个周期性结构,并且执行减法以便显着地减少或消除来自输出光束的振铃响应。 还执行减法,以便基本上防止从输出光束中减去任何实际的缺陷分量。 该装置还包括用于接收输出光束并基于输出光束产生输出图像或信号的检测器。