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    • 4. 发明申请
    • ORGANIC/INORGANIC THIN FILM DEPOSITION DEVICE AND DEPOSITION METHOD
    • US20080138517A1
    • 2008-06-12
    • US11950606
    • 2007-12-05
    • Seong Deok AHNSeung Youl KANGChul Am KIMJi Young OHIn Kyu YOUGi Heon KIMKyu Ha BAEKKyung Soo SUH
    • Seong Deok AHNSeung Youl KANGChul Am KIMJi Young OHIn Kyu YOUGi Heon KIMKyu Ha BAEKKyung Soo SUH
    • C23C16/455
    • C23C16/45523B05D1/60C23C16/4408
    • Provided are a device for depositing an organic/inorganic thin film and a deposition method thereof. The method includes: i) heating a source vessel containing an organic material and an inorganic material to generate at least one deposition gas phase of the organic and inorganic materials; ii) transferring one of the deposition gas phases of the organic and inorganic materials to a process chamber through a transfer path maintaining a constant temperature so as to prevent the generated deposition gas phases of the organic/inorganic materials from being condensed; iii) distributing one of the deposition gas phases of the organic and inorganic materials transferred to the process chamber onto a substrate disposed in the process chamber to adsorb one of the organic and inorganic materials on the substrate; iv) purging the process chamber using a diluted gas and a transfer gas after one of the organic and inorganic materials is adsorbed on the substrate; v) heating an activating agent source vessel containing an activation heat initiator capable of activating a monomer of one of the deposition gas phases of the organic and inorganic materials to generate a heat initiator gas phase; vi) transferring the heat initiator gas phase to the process chamber through a transfer path maintaining a constant temperature so as to prevent the heat initiator gas phase from being condensed; vii) distributing the heat initiator gas phase transferred to the process chamber onto the organic or inorganic material monomer deposited on the substrate through the process chamber maintaining a constant temperature so as to prevent the heat initiator gas phase from being condensed in a shower head, and forming an organic/inorganic thin film; and viii) exhausting the heat initiator gas phase remaining after the organic/inorganic thin film is deposited on the substrate from the process chamber, and purging the process chamber using the diluted gas and the transfer gas. Therefore, according to the method of depositing the organic/inorganic thin film in a time-division manner, the thickness of the thin film can be accurately adjusted and the deposition can be uniformly performed when the thin film is deposited on a large-scale substrate.