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1. 发明授权

US06326632B1 Particle-optical imaging system for lithography purposes 有权
标题翻译：用于光刻目的的粒子光学成像系统
公开(公告)号：US06326632B1
公开(公告)日：2001-12-04
申请号：US09417633
申请日：1999-10-13
申请人： Herbert Buschbeck , Alfred Chalupka , Gertraud Lammer , Hans Loeschner , Gerhard Stengl
发明人： Herbert Buschbeck , Alfred Chalupka , Gertraud Lammer , Hans Loeschner , Gerhard Stengl
IPC分类号： G21K108
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/20 , H01J37/12 , H01J37/3174 , H01J2237/04924
摘要： In a particle-optical imaging lithography system, an illuminating system comprising a particle source and a first electrostatic lens arrangement produces a particle beam which penetrates a mask foil provided with an orifice structure positioned in the particle beam path. This structure is imaged on a substrate plane by a projection system comprising a second electrostatic lens arrangement. The first and second lens arrangements each comprise, on their respective sides facing the mask holding device, at least one pre- and post-mask electrode, respectively. By applying different electrostatic potentials to the pre- and post-mask electrodes and to the mask foil, the mask foil and the pre-mask electrode form a grid lens with negative refracting power, and the mask foil and the post-mask electrode also form a grid lens with negative refracting power.
摘要翻译：在粒子光学成像光刻系统中，包括粒子源和第一静电透镜装置的照明系统产生穿透设置有位于粒子束路径中的孔结构的掩模箔的粒子束。该结构通过包括第二静电透镜装置的投影系统在基板平面上成像。第一和第二透镜装置在其面对掩模保持装置的相应侧面上分别包括至少一个前和后掩模电极。通过对前后掩模电极和掩模箔施加不同的静电电位，掩模箔和预掩模电极形成具有负折射力的网格透镜，并且掩模箔和后掩模电极也形成具有负折射力的网格透镜。

2. 发明申请

US20050201246A1 Particle-optical projection system 审中-公开
标题翻译：粒子投影系统
公开(公告)号：US20050201246A1
公开(公告)日：2005-09-15
申请号：US11080578
申请日：2005-03-15
申请人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
发明人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01L21/027 , G03F7/20 , G11B7/09 , H01J37/02 , H01J37/147 , H01J37/15 , H01J37/20 , H01J37/21 , H01J37/304 , H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J2237/024 , H01J2237/10 , H01J2237/216 , H01J2237/30455
摘要： In a particle-optical projection system (32) a pattern (B) is imaged onto a target (tp) by means of energetic electrically charged particles. The pattern is represented in a patterned beam (pb) of said charged particles emerging from the object plane through at least one cross-over (c); it is imaged into an image (S) with a given size and distortion. To compensate for the Z-deviation of the image (S) position from the actual positioning of the target (tp) (Z denotes an axial coordinate substantially parallel to the optical axis cx), without changing the size of the image (S), the system comprises a position detection means (ZD) for measuring the Z-position of several locations of the target (tp), a control means (33) for calculating modifications (cr) of selected lens parameters of the final particle-optical lens (L2) and controlling said lens parameters according to said modifications.
摘要翻译：在粒子光学投影系统（32）中，通过能量带电粒子将图案（B）成像到目标（tp）上。所述图案通过至少一个交叉（c）从所述物体平面出射的所述带电粒子的图案化束（pb）中表示; 它被成像为具有给定大小和失真的图像（S）。为了补偿图像（S）位置与目标的实际定位（tp）（Z表示基本上平行于光轴cx的轴向坐标）的Z偏差，而不改变图像（S）的尺寸，该系统包括用于测量目标（tp）的若干位置的Z位置的位置检测装置（ZD），用于计算最终粒子光学透镜的选定透镜参数的修改（cr）的控制装置（33） L 2），并根据所述修改来控制所述透镜参数。

3. 发明申请

US20050072933A1 Particle-optic electrostatic lens 有权
标题翻译：粒子静电透镜
公开(公告)号：US20050072933A1
公开(公告)日：2005-04-07
申请号：US10951087
申请日：2004-09-27
申请人： Gerhard Stengl , Herbert Buschbeck , Gertraud Lammer
发明人： Gerhard Stengl , Herbert Buschbeck , Gertraud Lammer
IPC分类号： H01J37/09 , H01J37/12 , H01J37/305 , H01L21/027 , G21K1/08 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J2237/3175
摘要： In a charged-particle beam exposure device, an electrostatic lens (ML) comprises several (at least three) electrodes with rotational symmetry (EFR, EM, EFN) surrounding a particle beam path; the electrodes are arranged coaxially on a common optical axis representing the center of said particle beam path and are fed different electrostatic potentials through electric supplies. At least a subset of the electrodes (EM) form an electrode column realized as a series of electrodes of substantially equal shape arranged in consecutive order along the optical axis, wherein outer portions of said electrodes (EM) of the electrode column have outer portions (OR) of corresponding opposing surfaces (f1, f2) facing toward the next and previous electrodes, respectively. Preferably, the length of the electrode column is at least 4.1 times (3 times) the inner radius (ri1) of said surfaces (f1, f2).
摘要翻译：在带电粒子束曝光装置中，静电透镜（ML）包括围绕粒子束路径的旋转对称（EFR，EM，EFN）的几个（至少三个）电极; 电极同轴地布置在表示所述粒子束路径的中心的公共光轴上，并且通过电源馈送不同的静电电位。电极（EM）的至少一个子集形成电极柱，其实现为沿着光轴以连续顺序布置的基本相等形状的一系列电极，其中电极柱的所述电极（EM）的外部部分具有外部部分 OR）分别面向下一个和前一个电极的对应的相对表面（f1，f2）。优选地，电极柱的长度为所述表面（f1，f2）的内半径（ri1）的至少4.1倍（3倍）。

4. 发明授权

US07388217B2 Particle-optical projection system 有权
标题翻译：粒子投影系统
公开(公告)号：US07388217B2
公开(公告)日：2008-06-17
申请号：US11700468
申请日：2007-01-31
申请人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
发明人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01J37/302 , H01L21/027
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J2237/024 , H01J2237/10 , H01J2237/216 , H01J2237/30455
摘要： In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.
摘要翻译：在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

5. 发明授权

US07199373B2 Particle-optic electrostatic lens 有权
标题翻译：粒子静电透镜
公开(公告)号：US07199373B2
公开(公告)日：2007-04-03
申请号：US10951087
申请日：2004-09-27
申请人： Gerhard Stengl , Herbert Buschbeck , Gertraud Lammer
发明人： Gerhard Stengl , Herbert Buschbeck , Gertraud Lammer
IPC分类号： G21K1/08 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J2237/3175
摘要： In a charged-particle beam exposure device, an electrostatic lens (ML) comprises several (at least three) electrodes with rotational symmetry (EFR, EM, EFN) surrounding a particle beam path; the electrodes are arranged coaxially on a common optical axis representing the center of said particle beam path and are fed different electrostatic potentials through electric supplies. At least a subset of the electrodes (EM) form an electrode column realized as a series of electrodes of substantially equal shape arranged in consecutive order along the optical axis, wherein outer portions of said electrodes (EM) of the electrode column have outer portions (OR) of corresponding opposing surfaces (f1, f2) facing toward the next and previous electrodes, respectively. Preferably, the length of the electrode column is at least 4.1 times (3 times) the inner radius (ri1) of said surfaces (f1, f2).
摘要翻译：在带电粒子束曝光装置中，静电透镜（ML）包括围绕粒子束路径的旋转对称（EFR，EM，EFN）的几个（至少三个）电极; 电极同轴地布置在表示所述粒子束路径的中心的公共光轴上，并且通过电源馈送不同的静电电位。电极（EM）的至少一个子集形成电极柱，其实现为沿着光轴以连续顺序布置的基本相同形状的一系列电极，其中电极柱的所述电极（EM）的外部部分具有外部部分 OR）分别面向下一个和前一个电极的对应的相对表面（f 1，f 2）。优选地，电极柱的长度为所述表面（f 1，f 2）的内半径（ri 1）的至少4.1倍（3倍）。

6. 发明授权

US06768125B2 Maskless particle-beam system for exposing a pattern on a substrate 有权
标题翻译：用于在衬底上露出图案的无掩模粒子束系统
公开(公告)号：US06768125B2
公开(公告)日：2004-07-27
申请号：US10337903
申请日：2003-01-08
申请人： Elmar Platzgummer , Hans Loeschner , Gerhard Stengl , Herbert Vonach , Alfred Chalupka , Gertraud Lammer , Herbert Buschbeck , Robert Nowak , Till Windischbauer
发明人： Elmar Platzgummer , Hans Loeschner , Gerhard Stengl , Herbert Vonach , Alfred Chalupka , Gertraud Lammer , Herbert Buschbeck , Robert Nowak , Till Windischbauer
IPC分类号： H01J3706
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3174
摘要： A device (102) for defining a pattern, for use in a particle-beam exposure apparatus (100), said device adapted to be irradiated with a beam (lb,pb) of electrically charged particles and let pass the beam only through a plurality of apertures, comprises an aperture array means (203) and a blanking means (202). The aperture array means (203) has a plurality of apertures (21,230) of identical shape defining the shape of beamlets (bm). The blanking means (202) serves to switch off the passage of selected beamlets; it has a plurality of openings (220), each corresponding to a respective aperture (230) of the aperture array means (203) and being provided with a deflection means (221) controllable to deflect particles radiated through the opening off their path (p1) to an absorbing surface within said exposure apparatus (100). The apertures (21) are arranged on the blanking and aperture array means (202,203) within a pattern definition field (pf) being composed of a plurality of staggered lines (p1) of apertures. Each of the lines (p1) comprises alternately first segments (sf) which are free of apertures and second segments (af) which each comprise a number of apertures spaced apart by a row offset (pm), said row offset being a multiple of the width (w) of apertures, the length (A) of said first segments (sf) being greater than the row offset. In front of the blanking means (202) as seen in the direction of the particle beam, a cover means (201) is provided having a plurality of openings (210), each corresponding to a respective opening (230) of the blanking means and having a width (w1) which is smaller than the width (w2) of the openings (220) of the blanking array means.
摘要翻译：一种用于限定用于粒子束曝光设备（100）的图案的设备（102），所述设备适于用带电粒子的光束（lb，pb）照射，并且仅使光束通过多个的孔径包括孔径阵列装置（203）和消隐装置（202）。孔径阵列装置（203）具有限定子束（bm）形状的相同形状的多个孔（21,230）。消隐装置（202）用于切断所选子束的通过; 它具有多个开口（220），每个开口对应于孔阵列装置（203）的相应孔径（230），并且设置有偏转装置（221），该偏转装置可控制，以使通过开口辐射的颗粒偏离其路径（p1 ）到所述曝光装置（100）内的吸收表面。孔（21）布置在由多个交错的孔（p1）组成的图案定义区域（pf）内的消隐和孔径阵列装置（202,203）上。线（p1）中的每一个交替地包括没有孔的第一段（sf）和第二段（af），每个段包括通过行偏移（pm）间隔开的多个孔，所述行偏移是孔的宽度（w），所述第一段（sf）的长度（A）大于行偏移。在沿着该粒子束的方向观察的消隐装置（202）的前面，提供具有多个开口（210）的盖装置（201），每个开口对应于消隐装置的相应开口（230）具有比消隐阵列装置的开口（220）的宽度（w2）小的宽度（w1）。

7. 发明申请

US20070125956A1 Particle-optical projection system 有权
标题翻译：粒子投影系统
公开(公告)号：US20070125956A1
公开(公告)日：2007-06-07
申请号：US11700468
申请日：2007-01-31
申请人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
发明人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01J3/14 , G21K1/08
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J2237/024 , H01J2237/10 , H01J2237/216 , H01J2237/30455
摘要： In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.
摘要翻译：在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

8. 发明授权

US5317161A Ion source 失效
标题翻译：离子源
公开(公告)号：US5317161A
公开(公告)日：1994-05-31
申请号：US888661
申请日：1992-05-21
申请人： Alfred Chalupka , Gertraud Lammer , Gerhard Stengl , Peter Wolf , Johannes Fegerl
发明人： Alfred Chalupka , Gertraud Lammer , Gerhard Stengl , Peter Wolf , Johannes Fegerl
IPC分类号： G03F7/20 , H01J27/02 , H01J27/10 , H01J37/08 , H01J37/12 , H01L21/027
CPC分类号： H01J27/10 , H01J37/08 , H01J37/12
摘要： In addition to the three electrodes of a unipotential lens following a plasma chamber, an ion source for ion beam lithography or ion beam semiconductor or the like has a fourth electrode which is at the same potential as the second electrode and at a potential lower than the potential of the first and third electrodes The result is improved resolution.
摘要翻译：除了等离子体室之后的单能透镜的三个电极之外，用于离子束光刻或离子束半导体等的离子源具有与第二电极处于相同电位并且具有比第二电极低的电位的第四电极第一和第三电极的电位结果是提高了分辨率。

9. 发明授权

US07084411B2 Pattern-definition device for maskless particle-beam exposure apparatus 有权
标题翻译：无掩模粒子束曝光装置的图案定义装置
公开(公告)号：US07084411B2
公开(公告)日：2006-08-01
申请号：US10974276
申请日：2004-10-27
申请人： Wolfgang Lammer-Pachlinger , Gertraud Lammer , Alfred Chalupka
发明人： Wolfgang Lammer-Pachlinger , Gertraud Lammer , Alfred Chalupka
IPC分类号： H01J37/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/15 , H01J37/3177 , H01J2237/0453 , H01J2237/31774 , H01J2237/31776
摘要： In a pattern-definition device (102) for use in a particle-beam exposure apparatus, a beam of electrically charged particles is patterned through a plurality of apertures. The device comprises at least one deflector array means having a plurality of openings surrounding the beamlets, wherein for each opening are provided at least two deflecting electrodes to which different electrostatic potentials are appliable, thus correcting the path of the beamlet(s) passing through the respective opening according to a desired path through the device (102). According to a partition of the plurality of apertures into a set of subfields (Aij), the deflecting electrodes belonging to the same subfield (Aij) have common electric supplies. Thus, the electrostatic potentials of the deflecting electrodes belonging to the same subfield (Aij) are constant or linearly interpolated between basic potentials fed at basic points (Pij) of the respective subfield.
摘要翻译：在用于粒子束曝光装置的图案定义装置（102）中，通过多个孔将带电粒子束形成图案。该装置包括至少一个偏转器阵列装置，其具有围绕子束的多个开口，其中对于每个开口设置有至少两个偏转电极，不同的静电电位可施加到该偏转电极，从而校正通过该子束的子束的路径根据通过设备（102）的期望路径的相应开口。根据多个孔的分割成一组子场（Aij），属于同一子场（Aij）的偏转电极具有共同的电源。因此，属于相同子场（Aij）的偏转电极的静电电位在各子场的基点（Pij）馈送的基本电位之间是恒定的或线性内插的。

10. 发明申请

US20050087701A1 Pattern-definition device for maskless particle-beam exposure apparatus 有权
标题翻译：无掩模粒子束曝光装置的图案定义装置
公开(公告)号：US20050087701A1
公开(公告)日：2005-04-28
申请号：US10974276
申请日：2004-10-27
申请人： Wolfgang Lammer-Pachlinger , Gertraud Lammer , Alfred Chalupka
发明人： Wolfgang Lammer-Pachlinger , Gertraud Lammer , Alfred Chalupka
IPC分类号： H01J37/147 , H01J37/305 , H01J37/317 , H01L21/027 , H01J37/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/15 , H01J37/3177 , H01J2237/0453 , H01J2237/31774 , H01J2237/31776
摘要： In a pattern-definition device (102) for use in a particle-beam exposure apparatus, a beam of electrically charged particles is patterned through a plurality of apertures. The device comprises at least one deflector array means having a plurality of openings surrounding the beamlets, wherein for each opening are provided at least two deflecting electrodes to which different electrostatic potentials are appliable, thus correcting the path of the beamlet(s) passing through the respective opening according to a desired path through the device (102). According to a partition of the plurality of apertures into a set of subfields (Aij), the deflecting electrodes belonging to the same subfield (Aij) have common electric supplies. Thus, the electrostatic potentials of the deflecting electrodes belonging to the same subfield (Aij) are constant or linearly interpolated between basic potentials fed at basic points (Pij) of the respective subfield.
摘要翻译：在用于粒子束曝光装置的图案定义装置（102）中，通过多个孔将带电粒子束形成图案。该装置包括至少一个偏转器阵列装置，其具有围绕子束的多个开口，其中对于每个开口设置有至少两个偏转电极，不同的静电电位可施加到该偏转电极，从而校正通过该子束的子束的路径根据通过设备（102）的期望路径的相应开口。根据多个孔的分割成一组子场（Aij），属于同一子场（Aij）的偏转电极具有共同的电源。因此，属于相同子场（Aij）的偏转电极的静电电位在各子场的基点（Pij）馈送的基本电位之间是恒定的或线性内插的。

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