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1. 发明授权

US06768125B2 Maskless particle-beam system for exposing a pattern on a substrate 有权
标题翻译：用于在衬底上露出图案的无掩模粒子束系统
公开(公告)号：US06768125B2
公开(公告)日：2004-07-27
申请号：US10337903
申请日：2003-01-08
申请人： Elmar Platzgummer , Hans Loeschner , Gerhard Stengl , Herbert Vonach , Alfred Chalupka , Gertraud Lammer , Herbert Buschbeck , Robert Nowak , Till Windischbauer
发明人： Elmar Platzgummer , Hans Loeschner , Gerhard Stengl , Herbert Vonach , Alfred Chalupka , Gertraud Lammer , Herbert Buschbeck , Robert Nowak , Till Windischbauer
IPC分类号： H01J3706
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3174
摘要： A device (102) for defining a pattern, for use in a particle-beam exposure apparatus (100), said device adapted to be irradiated with a beam (lb,pb) of electrically charged particles and let pass the beam only through a plurality of apertures, comprises an aperture array means (203) and a blanking means (202). The aperture array means (203) has a plurality of apertures (21,230) of identical shape defining the shape of beamlets (bm). The blanking means (202) serves to switch off the passage of selected beamlets; it has a plurality of openings (220), each corresponding to a respective aperture (230) of the aperture array means (203) and being provided with a deflection means (221) controllable to deflect particles radiated through the opening off their path (p1) to an absorbing surface within said exposure apparatus (100). The apertures (21) are arranged on the blanking and aperture array means (202,203) within a pattern definition field (pf) being composed of a plurality of staggered lines (p1) of apertures. Each of the lines (p1) comprises alternately first segments (sf) which are free of apertures and second segments (af) which each comprise a number of apertures spaced apart by a row offset (pm), said row offset being a multiple of the width (w) of apertures, the length (A) of said first segments (sf) being greater than the row offset. In front of the blanking means (202) as seen in the direction of the particle beam, a cover means (201) is provided having a plurality of openings (210), each corresponding to a respective opening (230) of the blanking means and having a width (w1) which is smaller than the width (w2) of the openings (220) of the blanking array means.
摘要翻译：一种用于限定用于粒子束曝光设备（100）的图案的设备（102），所述设备适于用带电粒子的光束（lb，pb）照射，并且仅使光束通过多个的孔径包括孔径阵列装置（203）和消隐装置（202）。孔径阵列装置（203）具有限定子束（bm）形状的相同形状的多个孔（21,230）。消隐装置（202）用于切断所选子束的通过; 它具有多个开口（220），每个开口对应于孔阵列装置（203）的相应孔径（230），并且设置有偏转装置（221），该偏转装置可控制，以使通过开口辐射的颗粒偏离其路径（p1 ）到所述曝光装置（100）内的吸收表面。孔（21）布置在由多个交错的孔（p1）组成的图案定义区域（pf）内的消隐和孔径阵列装置（202,203）上。线（p1）中的每一个交替地包括没有孔的第一段（sf）和第二段（af），每个段包括通过行偏移（pm）间隔开的多个孔，所述行偏移是孔的宽度（w），所述第一段（sf）的长度（A）大于行偏移。在沿着该粒子束的方向观察的消隐装置（202）的前面，提供具有多个开口（210）的盖装置（201），每个开口对应于消隐装置的相应开口（230）具有比消隐阵列装置的开口（220）的宽度（w2）小的宽度（w1）。

2. 发明申请

US20050201246A1 Particle-optical projection system 审中-公开
标题翻译：粒子投影系统
公开(公告)号：US20050201246A1
公开(公告)日：2005-09-15
申请号：US11080578
申请日：2005-03-15
申请人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
发明人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01L21/027 , G03F7/20 , G11B7/09 , H01J37/02 , H01J37/147 , H01J37/15 , H01J37/20 , H01J37/21 , H01J37/304 , H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J2237/024 , H01J2237/10 , H01J2237/216 , H01J2237/30455
摘要： In a particle-optical projection system (32) a pattern (B) is imaged onto a target (tp) by means of energetic electrically charged particles. The pattern is represented in a patterned beam (pb) of said charged particles emerging from the object plane through at least one cross-over (c); it is imaged into an image (S) with a given size and distortion. To compensate for the Z-deviation of the image (S) position from the actual positioning of the target (tp) (Z denotes an axial coordinate substantially parallel to the optical axis cx), without changing the size of the image (S), the system comprises a position detection means (ZD) for measuring the Z-position of several locations of the target (tp), a control means (33) for calculating modifications (cr) of selected lens parameters of the final particle-optical lens (L2) and controlling said lens parameters according to said modifications.
摘要翻译：在粒子光学投影系统（32）中，通过能量带电粒子将图案（B）成像到目标（tp）上。所述图案通过至少一个交叉（c）从所述物体平面出射的所述带电粒子的图案化束（pb）中表示; 它被成像为具有给定大小和失真的图像（S）。为了补偿图像（S）位置与目标的实际定位（tp）（Z表示基本上平行于光轴cx的轴向坐标）的Z偏差，而不改变图像（S）的尺寸，该系统包括用于测量目标（tp）的若干位置的Z位置的位置检测装置（ZD），用于计算最终粒子光学透镜的选定透镜参数的修改（cr）的控制装置（33） L 2），并根据所述修改来控制所述透镜参数。

3. 发明授权

US07388217B2 Particle-optical projection system 有权
标题翻译：粒子投影系统
公开(公告)号：US07388217B2
公开(公告)日：2008-06-17
申请号：US11700468
申请日：2007-01-31
申请人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
发明人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01J37/302 , H01L21/027
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J2237/024 , H01J2237/10 , H01J2237/216 , H01J2237/30455
摘要： In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.
摘要翻译：在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

4. 发明申请

US20070125956A1 Particle-optical projection system 有权
标题翻译：粒子投影系统
公开(公告)号：US20070125956A1
公开(公告)日：2007-06-07
申请号：US11700468
申请日：2007-01-31
申请人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
发明人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01J3/14 , G21K1/08
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J2237/024 , H01J2237/10 , H01J2237/216 , H01J2237/30455
摘要： In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.
摘要翻译：在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

5. 发明授权

US06326632B1 Particle-optical imaging system for lithography purposes 有权
标题翻译：用于光刻目的的粒子光学成像系统
公开(公告)号：US06326632B1
公开(公告)日：2001-12-04
申请号：US09417633
申请日：1999-10-13
申请人： Herbert Buschbeck , Alfred Chalupka , Gertraud Lammer , Hans Loeschner , Gerhard Stengl
发明人： Herbert Buschbeck , Alfred Chalupka , Gertraud Lammer , Hans Loeschner , Gerhard Stengl
IPC分类号： G21K108
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/20 , H01J37/12 , H01J37/3174 , H01J2237/04924
摘要： In a particle-optical imaging lithography system, an illuminating system comprising a particle source and a first electrostatic lens arrangement produces a particle beam which penetrates a mask foil provided with an orifice structure positioned in the particle beam path. This structure is imaged on a substrate plane by a projection system comprising a second electrostatic lens arrangement. The first and second lens arrangements each comprise, on their respective sides facing the mask holding device, at least one pre- and post-mask electrode, respectively. By applying different electrostatic potentials to the pre- and post-mask electrodes and to the mask foil, the mask foil and the pre-mask electrode form a grid lens with negative refracting power, and the mask foil and the post-mask electrode also form a grid lens with negative refracting power.
摘要翻译：在粒子光学成像光刻系统中，包括粒子源和第一静电透镜装置的照明系统产生穿透设置有位于粒子束路径中的孔结构的掩模箔的粒子束。该结构通过包括第二静电透镜装置的投影系统在基板平面上成像。第一和第二透镜装置在其面对掩模保持装置的相应侧面上分别包括至少一个前和后掩模电极。通过对前后掩模电极和掩模箔施加不同的静电电位，掩模箔和预掩模电极形成具有负折射力的网格透镜，并且掩模箔和后掩模电极也形成具有负折射力的网格透镜。

6. 发明授权

US5874739A Arrangement for shadow-casting lithography 失效
标题翻译：阴影铸造光刻的安排
公开(公告)号：US5874739A
公开(公告)日：1999-02-23
申请号：US914070
申请日：1997-08-18
申请人： Herbert Buschbeck , Alfred Chalupka , Hans Loeschner , Gerhard Stengl , Herbert Vonach
发明人： Herbert Buschbeck , Alfred Chalupka , Hans Loeschner , Gerhard Stengl , Herbert Vonach
IPC分类号： G03F7/20 , H01J37/12 , H01J37/305 , H01L21/027 , H01J37/317
CPC分类号： H01J37/12 , G03F7/2047 , H01J2237/04924 , H01J2237/3175
摘要： An arrangement for shadow-casting lithography by focusing electrically charged particles for the purpose of imaging structures of a mask on a substrate disposed immediately to the rear thereof, comprising a particle source (2) and an extraction system (3) which produces a divergent particle beam issuing from a substantially point-shaped virtual source, and comprising a lens (6) for focusing the divergent particle beam which comprises an electrode arrangement (6a, 6b, 6c, 6d, 6e, 6f, 6g, 6h) which includes at least one electrostatic collector lens (6a to 6f in conjunction with an electrostatic diverging lens (6g, 6h) in order to be able to compensate lens errors of the collector lens in a purposeful manner with respect to lens errors of the diverging lens and to render possible a predeterminable change in the imaging scale. The diverging lens is preferably disposed in the beam direction at a distance to the rear of the collector lens in immediate proximity of the mask in order to be able to use the mask as a grating for the diverging lens.
摘要翻译：一种用于通过聚焦带电粒子的方法，用于通过聚焦带电粒子的方法将掩模的结构成像在立即设置在其后面的基底上，包括产生发散粒子的粒子源（2）和提取系统（3）并且包括用于聚焦发散粒子束的透镜（6），所述透镜（6）包括至少包括至少包括电极装置（6a，6b，6c，6d，6e，6f，6g，6h）一个静电收集透镜（6a至6f与静电发散透镜（6g，6h）结合），以便能够针对发散透镜的透镜误差以有目的的方式补偿收集透镜的透镜误差，并使其成为可能成像刻度的可预先确定的变化，发散透镜优选地设置在光束方向上，在与掩模紧密接近的集光透镜的后方一定距离处，以便被遮蔽 e使用掩模作为发散透镜的光栅。

7. 发明授权

US08049189B2 Charged particle system 有权
标题翻译：带电粒子系统
公开(公告)号：US08049189B2
公开(公告)日：2011-11-01
申请号：US12090636
申请日：2006-10-20
申请人： Herbert Buschbeck , Elmar Platzgummer , Gerhard Stengl , Herbert Vonach
发明人： Herbert Buschbeck , Elmar Platzgummer , Gerhard Stengl , Herbert Vonach
IPC分类号： G21K1/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/147 , H01J37/21 , H01J2237/0492 , H01J2237/24578
摘要： A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece (411) having a radial inner end (411′), and an inner pole piece (412) having a lowermost end (412′) disposed closest to the radial inner end of the outer pole piece, a gap being formed by those; a focusing electrostatic lens (450) having at least a first electrode (451) and a second electrode (450) disposed in a region of the gap; and a controller (C) configured to control a focusing power of the first electrostatic lens based on a signal indicative of a distance of a surface of a substrate from a portion of the first magnetic lens disposed closest to the substrate.
摘要翻译：带电粒子系统包括用于产生带电粒子束的粒子源和粒子光学投影系统。粒子光学投影系统包括聚焦第一磁性透镜（403），其包括具有径向内端（411'）的外极片（411）和设置有最下端（412'）的内极片（412）最靠近外极片的径向内端的间隙由它们形成; 具有至少设置在所述间隙的区域中的第一电极（451）和第二电极（450）的聚焦静电透镜（450）以及控制器（C），被配置为基于表示基板的表面距离最靠近基板设置的第一磁性透镜的部分的距离的信号来控制第一静电透镜的聚焦能力。

8. 发明申请

US20080210887A1 Charged Particle System 有权
标题翻译：带电粒子系统
公开(公告)号：US20080210887A1
公开(公告)日：2008-09-04
申请号：US12090636
申请日：2006-10-20
申请人： Herbert Buschbeck , Elmar Platzgummer , Gerhard Stengl , Herbert Vonach
发明人： Herbert Buschbeck , Elmar Platzgummer , Gerhard Stengl , Herbert Vonach
IPC分类号： H01J37/147 , H01J37/21 , H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/147 , H01J37/21 , H01J2237/0492 , H01J2237/24578
摘要： A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece (411) having a radial inner end (411′), and an inner pole piece (412) having a lowermost end (412′) disposed closest to the radial inner end of the outer pole piece, a gap being formed by those; a focusing electrostatic lens (450) having at least a first electrode (451) and a second electrode (450) disposed in a region of the gap; and a controller (C) configured to control a focusing power of the first electrostatic lens based on a signal indicative of a distance of a surface of a substrate from a portion of the first magnetic lens disposed closest to the substrate.
摘要翻译：带电粒子系统包括用于产生带电粒子束的粒子源和粒子光学投影系统。粒子光学投影系统包括聚焦第一磁性透镜（403），其包括具有径向内端（411'）的外极片（411）和设置有最下端（412'）的内极片（412）最靠近外极片的径向内端的间隙由它们形成; 具有至少设置在所述间隙的区域中的第一电极（451）和第二电极（450）的聚焦静电透镜（450）以及控制器（C），被配置为基于表示基板的表面距离最靠近基板设置的第一磁性透镜的部分的距离的信号来控制第一静电透镜的聚焦能力。

9. 发明授权

US5742062A Arrangement for masked beam lithography by means of electrically charged particles 失效
标题翻译：通过带电粒子进行掩模光刻的布置
公开(公告)号：US5742062A
公开(公告)日：1998-04-21
申请号：US598081
申请日：1996-02-08
申请人： Gerhard Stengl , Alfred Chalupka , Herbert Vonach , Hans Loeschner
发明人： Gerhard Stengl , Alfred Chalupka , Herbert Vonach , Hans Loeschner
IPC分类号： G21K5/04 , G03F7/20 , H01J37/30 , H01J37/305 , H01J37/317 , H01L21/027 , H01J37/10
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3175 , H01J2237/04735 , H01J2237/04924 , H01J2237/31755 , H01J2237/31788
摘要： An arrangement for masked beam lithography by means of electrically charged particles for the imaging of structures of a mask on a substrate arranged behind it, with a substantially punctiform particle source (Q) and an extraction system (Ex) for a specific type of charged particles which leave the source (Q) in the form of a divergent particle beam, and with an electrode arrangement (B, B', El.sub.1, El.sub.2, E.sub.3, . . . El.sub.n) for concentrating the divergent particle beam into a particle beam which is at least approximately parallel, by means of which an electrostatic acceleration field (E) is generated, the potential (U) of which in the beam direction has a constant gradient at least in parts and perpendicular to the beam direction is substantially constant at least within the beam cross-section. The electrode arrangement can be formed for example by a plurality of coaxial ring electrodes (El.sub.1, El.sub.2, El.sub.3, . . . El.sub.n) which are disposed at intervals behind one another in the beam direction, by a coaxial hollow cylinder which is aligned in the beam direction or a grating with a predetermined constant electrical resistance per unit of length, or by a plurality of longitudinal bars which are aligned in the beam direction, disposed parallel on surface of an imaginary coaxial cylinder with a predetermined constant electrical resistance per unit of length.
摘要翻译：用于通过带电粒子进行掩模束光刻的布置，用于对布置在其后面的基板上的掩模的结构进行成像，具有基本上点状的粒子源（Q）和用于特定类型的带电粒子的提取系统（Ex）其以发散粒子束的形式离开源极（Q），并且具有用于将发散粒子束集中到粒子束中的电极装置（B，B'，El1，El2，E3，...，Eln）至少近似平行，通过该静电加速场产生静电加速度场（E），至少在波束方向的至少部分和垂直于波束方向的波束方向的电位（U）至少在梁横截面。电极布置可以由例如多个同轴环电极（E11，E12，E13 ...，Eln）形成，这两个同轴环电极通过一个同轴的中空圆筒形成，该同轴环形电极沿光束方向彼此间隔设置，光束方向或具有每单位长度的预定恒定电阻的光栅，或通过沿着光束方向对准的多个纵向条，平行于虚拟同轴圆柱体的表面设置，每单位长度具有预定的恒定电阻。

10. 发明授权

US5317161A Ion source 失效
标题翻译：离子源
公开(公告)号：US5317161A
公开(公告)日：1994-05-31
申请号：US888661
申请日：1992-05-21
申请人： Alfred Chalupka , Gertraud Lammer , Gerhard Stengl , Peter Wolf , Johannes Fegerl
发明人： Alfred Chalupka , Gertraud Lammer , Gerhard Stengl , Peter Wolf , Johannes Fegerl
IPC分类号： G03F7/20 , H01J27/02 , H01J27/10 , H01J37/08 , H01J37/12 , H01L21/027
CPC分类号： H01J27/10 , H01J37/08 , H01J37/12
摘要： In addition to the three electrodes of a unipotential lens following a plasma chamber, an ion source for ion beam lithography or ion beam semiconductor or the like has a fourth electrode which is at the same potential as the second electrode and at a potential lower than the potential of the first and third electrodes The result is improved resolution.
摘要翻译：除了等离子体室之后的单能透镜的三个电极之外，用于离子束光刻或离子束半导体等的离子源具有与第二电极处于相同电位并且具有比第二电极低的电位的第四电极第一和第三电极的电位结果是提高了分辨率。

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