会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • High speed acid copper plating
    • 高速酸性镀铜
    • US06676823B1
    • 2004-01-13
    • US10100708
    • 2002-03-18
    • George Bokisa
    • George Bokisa
    • C25D338
    • C25D3/38
    • One aspect of the invention relates to an aqueous copper plating bath containing sulfuric acid with a specific ratio to at least one supplemental acid selected from the group consisting of fluoboric acid, alkane sulfonic acids, and alkanol sulfonic acids; a copper salt; chloride ions; and at least one sulfate bath brightener. Another aspect of the invention relates to aqueous copper plating bath containing fluoboric acid and/or an alkane sulfonic acid but no sulfuric acid, copper sulfate, chloride ions, and at least one sulfate bath brightener. Yet another aspect of the invention relates to methods of plating copper from the aforementioned copper plating baths. Still yet another aspect of the invention relates to methods of plating copper at high speed using relatively high current densities.
    • 本发明的一个方面涉及含有与至少一种选自氟硼酸,链烷磺酸和链烷醇磺酸的至少一种补充酸的硫酸的含水铜电镀液; 铜盐; 氯离子; 和至少一种硫酸盐浴增白剂。 本发明的另一方面涉及含有氟硼酸和/或烷烃磺酸但不含硫酸,硫酸铜,氯离子和至少一种硫酸盐浴增白剂的含水铜电镀浴。 本发明的另一方面涉及从上述镀铜浴镀铜的方法。 本发明的另一方面涉及使用相对高的电流密度高速镀铜的方法。