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    • 6. 发明授权
    • Method for fabricating an infrared-emitting light-emitting diode
    • 制造红外发光二极管的方法
    • US06440765B1
    • 2002-08-27
    • US09246747
    • 1999-02-08
    • Reinhard SedlmeierErnst NirschlNorbert Stath
    • Reinhard SedlmeierErnst NirschlNorbert Stath
    • H01L2100
    • H01L33/30H01L33/0062H01L33/02
    • A method for fabricating an infrared-emitting light-emitting diode in which a layer sequence is applied onto a semiconductor substrate, preferably composed of GaAs. The layer sequence has, proceeding from the semiconductor substrate, a first AlGaAs cover layer, a GaAs and/or AlGaAs containing active layer and a second AlGaAs cover layer. In which case, the first AlGaAs cover layer and the active layer are fabricated by a metal organic vapor phase epitaxy (MOVPE) method and the second AlGaAs cover layer is fabricated by a liquid phase epitaxy (LPE) method. Furthermore, an electrically conductive coupling-out layer having a thickness of at least about 10 &mgr;m is deposited on the second AlGaAs cover layer by the LPE method. The coupling-out layer is optically transparent in the infrared spectral region.
    • 一种制造其中将层序施加到优选由GaAs构成的半导体衬底上的红外发射二极管的方法。 该层序列具有从半导体衬底开始的第一AlGaAs覆盖层,包含GaAs和/或AlGaAs的有源层和第二AlGaAs覆盖层。 在这种情况下,通过金属有机气相外延(MOVPE)方法制造第一AlGaAs覆盖层和有源层,并且通过液相外延(LPE)方法制造第二AlGaAs覆盖层。 此外,通过LPE方法在第二AlGaAs覆盖层上沉积具有至少约10μm厚度的导电耦合出层。 耦合输出层在红外光谱区域是光学透明的。