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1. 发明申请

WO2006052576A2 ENCAPSULATED WAFER PROCESSING DEVICE AND PROCESS FOR MAKING THEREOF 审中-公开
标题翻译：封装的加工设备及其制造方法
公开(公告)号：WO2006052576A2
公开(公告)日：2006-05-18
申请号：PCT/US2005/039593
申请日：2005-11-02
申请人： GENERAL ELECTRIC COMPANY , SCHAEPKENS, Marc , TOGAWA, Takayuki
发明人： SCHAEPKENS, Marc , TOGAWA, Takayuki
CPC分类号： H01L21/6833 , H01L21/67103 , H01L21/67109 , H01L21/6831
摘要： A wafer processing device for use in semiconductor wafer processing applications as an Electro-Static Chuck (ESC) comprising a graphite substrate ans at least one electrode pattern, wherein the grooves in the electrode pattern are filled with insulating or semiconducting material selected from a group consisting of B, A1, Si, Ga, refractory hard metals, transition metals, and rare earth metals, or complexes and / or combinations thereof, forming a substantially planar surface. The substantially planar surface is then coated with at least a semiconducting layer comprising at least one of a nitride, carbide, carbonitride or oxynitride of elements selected from a group consisting of B, A, Si, Ga, refractory hard metals, transition metals, and rare earth metals, or complexes and / or combinations thereof.
摘要翻译：一种用于半导体晶片处理应用的晶片处理装置，包括石墨基板和至少一个电极图案，其中电极图案中的凹槽填充有绝缘或半导体材料，绝缘或半导体材料选自 B，A1，Si，Ga，难熔硬金属，过渡金属和稀土金属，或其复合物和/或其组合，形成基本平坦的表面。然后用至少一个半导体层涂覆基本上平坦的表面，该半导体层包括选自由B，A，Si，Ga，耐火硬金属，过渡金属和过渡金属组成的组中的元素的氮化物，碳化物，碳氮化物或氮氧化物中的至少一种稀土金属或其配合物和/或其组合。

2. 发明申请

WO2008103186A1 METHODS AND DEVICES FOR COATING AN INTERIOR SURFACE OF A PLASTIC CONTAINER 审中-公开
标题翻译：用于涂覆塑料容器内部表面的方法和装置
公开(公告)号：WO2008103186A1
公开(公告)日：2008-08-28
申请号：PCT/US2007/073062
申请日：2007-07-09
申请人： GENERAL ELECTRIC COMPANY , YAN, Min , ERLAT, Ahmet, Gun , SCHAEPKENS, Marc , KIM, Tae, Won , MCCONNELEE, Paul, Alan , PELLOW, Matthew, Aaron
发明人： YAN, Min , ERLAT, Ahmet, Gun , SCHAEPKENS, Marc , KIM, Tae, Won , MCCONNELEE, Paul, Alan , PELLOW, Matthew, Aaron
IPC分类号： C23C16/04 , C23C16/453 , C23C16/455
CPC分类号： C23C16/045 , B05D1/60 , B05D7/02 , B05D7/227 , C23C16/45578 , C23C16/507
摘要： Methods and devices for coating an interior surface of a container using ICPECVD are provided. In one embodiment, a method of coating an interior surface of a container comprises: depositing a barrier film on the interior surface of the container using inductively coupled plasma-enhanced chemical-vapor deposition.
摘要翻译：提供了使用ICPECVD涂覆容器内表面的方法和装置。在一个实施例中，涂覆容器的内表面的方法包括：使用电感耦合等离子体增强化学气相沉积将阻挡膜沉积在容器的内表面上。

3. 发明申请

WO2006091405A3 HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION APPARATUS 审中-公开
公开(公告)号：WO2006091405A3
公开(公告)日：2006-08-31
申请号：PCT/US2006/004906
申请日：2006-02-13
申请人： GENERAL ELECTRIC COMPANY , LAKSHMIPATHY, Muralidharan , SARIGIANNIS, Demetrius , HUBBARD, Patricia , SCHAEPKENS, Marc , PANT, Atul
发明人： LAKSHMIPATHY, Muralidharan , SARIGIANNIS, Demetrius , HUBBARD, Patricia , SCHAEPKENS, Marc , PANT, Atul
IPC分类号： C23C16/455
摘要： Embodiments for an apparatus and method for depositing one or more layers onto a substrate (5) or a freestanding shape inside a reaction chamber operating at a temperature of at least 7000C and 100 torr are provided. The apparatus is provided with means for defining a volume space (400) in the reaction chamber for pre-reacting the reactant feeds forming at least a reaction precursor in a gaseous form, separated from a deposition zone (100) for depositing a coating layer of uniform thickness on the substrate from the reacted precursor. In one embodiment, the means for defining the two different zones comprises a distribution medium. In another embodiment, the means comprises a plurality of reactant feed jets or injectors. In another embodiment, the apparatus is provided with a feeding system having injection means spatially spaced apart for tailoring the distribution of a plurality of gas-phase species, yielding a deposit that is substantially uniform in thickness and chemical composition along the substrate surface. In one embodiment, the apparatus further comprises a sacrificial substrate that further helps achieving thickness and chemical uniformity on the substrate.

4. 发明申请

WO2005096345A1 APPARATUS AND METHOD FOR PLASMA TREATING AN ARTICLE 审中-公开
标题翻译：用于等离子处理物品的装置和方法
公开(公告)号：WO2005096345A1
公开(公告)日：2005-10-13
申请号：PCT/US2004/006234
申请日：2004-03-01
申请人： GENERAL ELECTRIC COMPANY , SCHAEPKENS, Marc , IACOVANGELO, Charles, Dominic , JOHNSON, James, Neil , MORRISON, William, Arthur
发明人： SCHAEPKENS, Marc , IACOVANGELO, Charles, Dominic , JOHNSON, James, Neil , MORRISON, William, Arthur
IPC分类号： H01J37/32
CPC分类号： H01J37/32357 , H01J37/32055
摘要： The invention provides a plasma source (102) in which a gap (110) (i.e. cathode-to-anode distance) is adjustable in real time to a desired distance in response to selected conditions within a plasma chamber (104). At least one sensor (116) monitors and detects any change in such conditions within the plasma chamber (104). An apparatus (100) comprising at least one plasma source (102) generates at least one plasma that is stable and adjustable in real time. In one embodiment, the apparatus (100) includes multiple plasma sources (102) that can either be “tuned in real time to generate plasmas that are similar to each or, conversely, “detuned” to generate dissimilar plasmas. The apparatus (100) may be used to provide plasma treatment - such as, but not limited to, coating, etching and activation - for an article (160). Methods of providing such plasmas and treating an article (160) using such plasmas are also disclosed.
摘要翻译：本发明提供等离子体源（102），其中响应于等离子体室（104）内的选定条件，间隙（110）（即阴极至阳极距离）可实时调节到所需距离。至少一个传感器（116）监测和检测等离子体室（104）内的这种状况的任何变化。包括至少一个等离子体源（102）的装置（100）产生稳定且可实时调节的至少一个等离子体。在一个实施例中，装置（100）包括多个等离子体源（102），其可以“实时调谐”以产生类似于每个等离子体或相反地“失谐”以产生不相似的等离子体。也可以用于为制品（160）提供等离子体处理，例如但不限于涂层，蚀刻和激活。提供这种等离子体并使用这种等离子体处理制品（160）的方法也被公开。

5. 发明申请

WO2007089218A2 HIGH INTEGRITY PROTECTIVE COATING 审中-公开
标题翻译：高完整性保护涂料
公开(公告)号：WO2007089218A2
公开(公告)日：2007-08-09
申请号：PCT/US2005/041660
申请日：2005-11-15
申请人： GENERAL ELECTRIC COMPANY , KIM, Tae, Won , YAN, Min , HELLER, Christian, Maria, Anton , SCHAEPKENS, Marc , GORCZYCA, Thomas, Bert , MCCONNELEE, Paul, Alan , ERLAT, Ahmet, Gun
发明人： KIM, Tae, Won , YAN, Min , HELLER, Christian, Maria, Anton , SCHAEPKENS, Marc , GORCZYCA, Thomas, Bert , MCCONNELEE, Paul, Alan , ERLAT, Ahmet, Gun
CPC分类号： H01L51/5256
摘要： A composite article with at least one high integrity protective coating, the high integrity protective coating having at least one planarizing layer and at least one organic-inorganic composition barrier coating layer. A method for depositing a high integrity protective coating.
摘要翻译：具有至少一个高完整性保护涂层的复合制品，所述高完整性保护涂层具有至少一个平坦化层和至少一个有机 - 无机组合物阻挡涂层。一种用于沉积高完整性保护涂层的方法。

6. 发明申请

WO2005104266A1 ORGANIC ELECTRONIC PACKAGES HAVING HERMETICALLY SEALED EDGES AND METHODS OF MANUFACTURING SUCH PACKAGES 审中-公开
标题翻译：具有密封密封边缘的有机电子包装及其制造方法
公开(公告)号：WO2005104266A1
公开(公告)日：2005-11-03
申请号：PCT/US2005/006602
申请日：2005-03-01
申请人： GENERAL ELECTRIC COMPANY , SCHAEPKENS, Marc , DUGGAL, Anil , HELLER, Christian, M.
发明人： SCHAEPKENS, Marc , DUGGAL, Anil , HELLER, Christian, M.
IPC分类号： H01L51/40
CPC分类号： H01L51/5246 , H01L51/0097 , H01L51/5256 , H01L51/5259 , H01L2251/5338 , Y02E10/549 , Y02P70/521 , Y10T428/31504
摘要： Organic electronic packages having sealed edges. More specifically, packages having organic electronic devices are provided. A number of sealing mechanisms are provided to hermetically seal the edges of the package to completely protect the organic electronic device from external elements. A sealant may be implemented to completely surround the organic electronic device. Alternatively, edge wraps may be provided to completely surround the organic electronic device.
摘要翻译：具有密封边缘的有机电子封装。更具体地，提供了具有有机电子器件的封装。提供了许多密封机构以气密地密封包装的边缘以完全保护有机电子装置免受外部元件的影响。可以实现密封剂以完全环绕有机电子器件。或者，可以提供边缘包裹以完全围绕有机电子设备。

7. 发明申请

WO2007117294A2 SYSTEMS AND METHODS FOR DEPOSITION OF GRADED MATERIALS ON CONTINUOUSLY FED OBJECTS 审中-公开
标题翻译：分级材料对连续FED物体沉积的系统和方法
公开(公告)号：WO2007117294A2
公开(公告)日：2007-10-18
申请号：PCT/US2006/047919
申请日：2006-12-14
申请人： GENERAL ELECTRIC COMPANY , KIM, Tae, Won , DUGGAL, Anil, Raj , MCCONNELEE, Paul, Alan , RUMSEY, Michael, Anthony , SCHAEPKENS, Marc , WIRTH, Reinhold, Franz , YAN, Min , ERLAT, Ahmet, Gun , FEIST, Thomas, Paul
发明人： KIM, Tae, Won , DUGGAL, Anil, Raj , MCCONNELEE, Paul, Alan , RUMSEY, Michael, Anthony , SCHAEPKENS, Marc , WIRTH, Reinhold, Franz , YAN, Min , ERLAT, Ahmet, Gun , FEIST, Thomas, Paul
IPC分类号： C23C14/56 , C23C16/54
CPC分类号： C23C16/45591 , C23C16/30 , C23C16/545 , H01J37/3277 , H01J2237/3325 , H01L51/5253 , H01L51/56 , H01L2251/5338 , H01L2251/5346
摘要： Embodiments of the invention include a deposition machine that allows for continuous deposition of an object or substrate with a coating having a graded composition. The deposition machine includes a deposition chamber separated into a plurality of chamber areas by a baffle having an opening. The opening allows for migration of deposition material from one chamber area to another, allowing for a graded composition coating to be deposited on the object or substrate. Other embodiments include a system for forming an electronic device and a system and method for forming a graded composition on an object.
摘要翻译：本发明的实施例包括一种沉积机器，其允许用具有渐变组成的涂层连续沉积物体或基底。沉积机包括通过具有开口的挡板分离成多个室区域的沉积室。该开口允许沉积材料从一个室区域迁移到另一个室区域，允许将渐变的组合物涂层沉积在物体或衬底上。其他实施例包括用于形成电子装置的系统和用于在物体上形成分级组合物的系统和方法。

8. 发明申请

WO2004070718A1 LIMITED PLAY OPTICAL MEDIA DEVICE WITH BARRIER LAYERS 审中-公开
标题翻译：有限公司播放具有障碍层的光学媒体设备
公开(公告)号：WO2004070718A1
公开(公告)日：2004-08-19
申请号：PCT/US2004/001726
申请日：2004-01-22
申请人： GENERAL ELECTRIC COMPANY , OLSON, Daniel, Robert , WISNUDEL, Marc, Brian , SCHAEPKENS, Marc , THOMPSON, Robert, Franklin
发明人： OLSON, Daniel, Robert , WISNUDEL, Marc, Brian , SCHAEPKENS, Marc , THOMPSON, Robert, Franklin
IPC分类号： G11B7/24
CPC分类号： G11B7/252 , G11B7/241 , G11B7/2534 , G11B7/2542 , G11B7/2585 , G11B23/282 , G11B2007/25708 , G11B2007/2571 , G11B2007/25711 , G11B2007/25713 , G11B2007/25715 , Y10S430/146
摘要： The present disclosure relates to a limited play optical storage media and a method for limiting access to data thereon. This storage media includes a first substrate (15); a reflective layer (7); a data storage layer (9) disposed between said first substrate (15) and said reflective layer (7); a reactive layer (21) comprising at least one reactive material disposed on said at least one reflective layer (7); an optically transparent second substrate (11) disposed between the reactive layer (7) and a laser incident surface of the optical storage media; and an oxygen permeable barrier layer (13) disposed between the reactive layer (21) and a laser incident surface of the optical storage media, said reactive layer (21) having an initial percent reflectivity of about 50% or greater and a percent reflectivity of about 45% or less after exposure to oxygen.
摘要翻译：本公开涉及有限播放光存储介质和用于限制对其上的数据的访问的方法。该存储介质包括第一衬底（15）; 反射层（7）; 设置在所述第一基板（15）和所述反射层（7）之间的数据存储层（9）。包括设置在所述至少一个反射层（7）上的至少一个反应性材料的反应层（21）; 设置在反应层（7）和光学存储介质的激光入射表面之间的光学透明的第二衬底（11）以及设置在所述反应层（21）和所述光学存储介质的激光入射表面之间的透氧阻挡层（13），所述反应层（21）具有约50％或更大的初始百分比反射率和百分比反射率暴露于氧气后约45％或更少。

9. 发明申请

WO2004061155A1 HIGH RATE DEPOSITION OF TITANIUM DIOXIDE 审中-公开
标题翻译：二氧化钛的高速沉积
公开(公告)号：WO2004061155A1
公开(公告)日：2004-07-22
申请号：PCT/US2003/038492
申请日：2003-12-04
申请人： GENERAL ELECTRIC COMPANY (a New York Corporation) , IACOVANGELO, Charles , GILLETTE, Gregory, Ronald , SCHAEPKENS, Marc
发明人： IACOVANGELO, Charles , GILLETTE, Gregory, Ronald , SCHAEPKENS, Marc
IPC分类号： C23C16/40
CPC分类号： C23C16/513 , C23C16/405 , Y10T428/265 , Y10T428/31507 , Y10T428/31855
摘要： There is provided a structure. The structure comprises a substrate (12), and a titanium oxide layer (14) disposed over the substrate (12). There is also provided a method of forming a titanium oxide coating (14) on a substrate (12). The method includes generating a plasma; providing a first reactant, comprising titanium, and a second reactant, comprising oxygen, into the plasma stream extending to the substrate (12); and forming the titanium oxide coating (14) on the substrate (12).
摘要翻译：提供了一个结构。该结构包括衬底（12）和设置在衬底（12）上方的氧化钛层（14）。还提供了在衬底（12）上形成氧化钛涂层（14）的方法。该方法包括产生等离子体; 将包含钛的第一反应物和包含氧的第二反应物提供到延伸到所述衬底（12）的等离子体流中; 以及在所述基底（12）上形成所述氧化钛涂层（14）。

10. 发明申请

WO2004051325A1 HIGH INDEX OF REFRACTION COATED LIGHT MANAGEMENT FILMS 审中-公开
标题翻译：高折射涂层灯管理膜
公开(公告)号：WO2004051325A1
公开(公告)日：2004-06-17
申请号：PCT/US2003/037116
申请日：2003-11-20
申请人： GENERAL ELECTRIC COMPANY , CHISHOLM, Bret , OLCZAK, Eugene , SCHAEPKENS, Marc , COYLE, Dennis
发明人： CHISHOLM, Bret , OLCZAK, Eugene , SCHAEPKENS, Marc , COYLE, Dennis
IPC分类号： G02B5/20
CPC分类号： G02B6/0053 , G02B1/111 , G02B5/20 , G02B5/287 , G02B5/3041 , G02F1/13362
摘要： There is provided an optical structure. The optical structure includes a light source (14). The optical structure also includes an organic light management film (16) having an index of refraction of less than 1.7 disposed above the light source, and a transparent inorganic film (18) having an index of refraction of greater than 1.7 disposed adjacent the organic light management film (16). A optical device is also provided including the organic light management film (16) and the transparent inorganic film (18). A method of forming the optical structure is also provided. The method includes depositing the transparent inorganic film (18) under vacuum.
摘要翻译：提供了一种光学结构。光学结构包括光源（14）。该光学结构还包括在光源上方具有小于1.7的折射率的有机光管理膜（16），以及邻近有机光的折射率大于1.7的透明无机膜（18）管理电影（16）。还提供了包括有机光管理膜（16）和透明无机膜（18）的光学装置。还提供了一种形成光学结构的方法。该方法包括在真空下沉积透明无机膜（18）。

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