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1. 发明专利

JP2013170227A Photopolymerizable composition 审中-公开
标题翻译：光聚合组合物
公开(公告)号：JP2013170227A
公开(公告)日：2013-09-02
申请号：JP2012035193
申请日：2012-02-21
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ITO TAKAYUKI , KODAMA KUNIHIKO , ENOMOTO YUICHIRO , TARUYA SHINJI
IPC分类号： C08F20/10 , B29C59/02 , C08F2/50 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a curable composition for imprinting having excellent patternability.SOLUTION: There are provided a photocurable composition comprising (A) a polymerizable compound and (B) a photopolymerization initiator expressed by general formula (I) provided that the zinc content and aluminum content of the composition are
摘要翻译：解决方案：提供一种光固化性组合物，其包含（A）可聚合化合物和（B）由通式（I）表示的光聚合引发剂，其中锌含量组成的铝含量各<5ppb; 以及图案形成方法，包括通过将光固化性组合物涂布在基材上形成图案形成层的步骤，在图案形成层的表面上粘合模具的步骤，以及照射图案形成层与光。

2. 发明专利

JP2012020954A Method for producing vinyl ether compound 有权
标题翻译：生产乙烯基醚化合物的方法
公开(公告)号：JP2012020954A
公开(公告)日：2012-02-02
申请号：JP2010159146
申请日：2010-07-13
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： INAZAKI TAKESHI , ITO TAKAYUKI , TSUCHIMURA TOMOTAKA
IPC分类号： C07C41/24 , C07C43/16 , C07C43/162 , C07C43/166 , C07C43/168 , C07C253/30 , C07C255/54
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a vinyl ether compound, by which the high purity vinyl ether compound can be produced at a low cost with a general reaction apparatus without a special or expensive precious metal catalyst and a reactive gas.SOLUTION: The method for producing the vinyl ether compound comprises a process (A) of reacting a compound represented by formula (1) with a compound represented by formula (2) to obtain a compound represented by formula (3), and a process (B) of reacting the compound represented by formula (3) with a compound represented by formula (4) or formula (5) to obtain the vinyl ether compound represented by formula (6).
摘要翻译：要解决的问题：提供一种乙烯基醚化合物的制备方法，通过使用无特殊或昂贵的贵金属催化剂的一般反应装置，可以以低成本制备高纯度乙烯基醚化合物和反应性加油站。解决方案：制备乙烯基醚化合物的方法包括使由式（1）表示的化合物与式（2）表示的化合物反应得到式（3）表示的化合物的方法（A），和使由式（3）表示的化合物与式（4）或式（5）表示的化合物反应得到由式（6）表示的乙烯基醚化合物的方法（B）。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2011242546A Actinic ray-sensitive or radiation-sensitive resin composition for exposure by x-ray, electron beam or euv light and resist film and pattern forming method using the composition 有权
标题翻译：用于通过X射线，电子束或EUV光和电阻膜曝光的丙烯酸敏感或辐射敏感性树脂组合物和使用该组合物的图案形成方法
公开(公告)号：JP2011242546A
公开(公告)日：2011-12-01
申请号：JP2010113617
申请日：2010-05-17
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TSUBAKI HIDEAKI , HIRANO SHUJI , KAWABATA KENJI , TSUCHIMURA TOMOTAKA , ITO TAKAYUKI
IPC分类号： G03F7/039 , C08F212/14 , C08F220/10 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition for exposure by x-ray, electron beam or EUV light that is excellent in pattern collapse margin and bridge margin with no residue of a resist composition on a substrate and excellent in resistance to scattered (flare) light, and a resist film and a pattern forming method using the composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition for exposure by x-ray, electron beam or EUV light comprises: (a) a compound that generates an acid expressed by the general formula (I) below by irradiation with actinic rays or radiation; and (b) a resin which contains (meth) acrylic acid ester structure unit having an aryl group in a side chain and exhibits increased solubility in an alkali developer by the action of an acid.
摘要翻译：要解决的问题：为了提供通过X射线，电子束或EUV光曝光的光化射线敏感或辐射敏感性树脂组合物，其具有优异的图案凹陷边缘和桥边缘，没有抗蚀剂组合物的残留物在基板上，耐散射（辉光）光的优异性以及使用该组合物的抗蚀剂膜和图案形成方法。解决方案：用于通过X射线，电子束或EUV光曝光的光化射线敏感或辐射敏感性树脂组合物包括：（a）通过照射产生由以下通式（I）表示的酸的化合物与光化射线或辐射; 和（b）含有侧链上具有芳基的（甲基）丙烯酸酯结构单元并通过酸作用而在碱性显影剂中表现出增加的溶解性的树脂。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2011053622A Actinic ray-sensitive or radiation-sensitive composition and pattern forming method using the same 有权
标题翻译：化学敏感性或辐射敏感性组合物和使用其的图案形成方法
公开(公告)号：JP2011053622A
公开(公告)日：2011-03-17
申请号：JP2009204998
申请日：2009-09-04
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ITO TAKAYUKI , TSUCHIMURA TOMOTAKA , KAWABATA KENJI
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive composition excellent in resolution, line edge roughness and etching resistance, and excellent in sensitivity and a pattern profile; and to provide a pattern forming method using the composition.
SOLUTION: The actinic ray-sensitive or radiation-sensitive composition comprises: a low molecular weight compound (1) having a molecular weight of 500 to 5,000 containing an acid-decomposable group (G) that is decomposed by an action of an acid to accelerate the dissolution in an alkali developing solution; and a compound (2) capable of generating an acid of 305 Å
3 or more in volume upon irradiation with actinic rays or radiation.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供分辨率，线边缘粗糙度和耐蚀刻性优异的光敏感或辐射敏感性组合物，并且灵敏度和图案轮廓优异; 并提供使用该组合物的图案形成方法。光敏射线敏感性组合物包含：分子量为500〜5000的低分子量化合物（1），其含有酸分解基团（G），其通过酸加速在碱性显影液中的溶解; 以及能够在用光化射线或辐射照射时能够产生体积为305埃/秒以上的酸的化合物（2）。版权所有（C）2011，JPO＆INPIT

5. 发明专利

JP2011053364A Active light-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权
标题翻译：主动感光或辐射敏感性树脂组合物和使用其的图案形成方法
公开(公告)号：JP2011053364A
公开(公告)日：2011-03-17
申请号：JP2009200912
申请日：2009-08-31
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： TAKAHASHI HIDETOMO , HIRANO SHUJI , ITO TAKAYUKI , TSUBAKI HIDEAKI
IPC分类号： G03F7/039 , C08F212/02 , C08F220/10 , C08F220/54 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide an active light-sensitive or radiation-sensitive resin composition that simultaneously satisfies sensitivity, resolution, a pattern form, line edge roughness, resist temporal stability, and dry etching resistance, especially in lithography using electron beam, X-ray, or EUV light as a source of exposure light; and also to provide a pattern forming method using the same.
SOLUTION: The active light-sensitive or radiation-sensitive resin composition contains a resin (P) including: a repeating unit (A) which generates an acid when decomposed by application of active light or radiation and which includes an acid dissociation group; and a repeating unit (B) having at least an aromatic ring group.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供同时满足灵敏度，分辨率，图案形式，线边缘粗糙度，抗蚀剂时间稳定性和耐干蚀刻性的主动感光或辐射敏感性树脂组合物，特别是在使用电子的光刻中光束，X射线或EUV光作为曝光光源; 并且还提供使用该图案形成方法的图案形成方法。主要的感光或辐射敏感性树脂组合物含有树脂（P），其包括：通过施加活性光或辐射分解时产生酸的重复单元（A），其包括酸解离基 ; 和至少具有芳香环基的重复单元（B）。版权所有（C）2011，JPO＆INPIT

6. 发明专利

JP2010256856A Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern-forming method using the same 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物，耐蚀膜和使用其的图案形成方法
公开(公告)号：JP2010256856A
公开(公告)日：2010-11-11
申请号：JP2010013681
申请日：2010-01-25
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ITO TAKAYUKI , TAKAHASHI HIDETOMO , TSUCHIMURA TOMOTAKA , KATAOKA SHOHEI , INAZAKI TAKESHI
IPC分类号： G03F7/039 , C08F212/14 , C08F220/26 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0045 , G03F7/0048 , G03F7/0392 , G03F7/0397
摘要： PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition satisfying high sensitivity, high resolution, good pattern form, good line edge roughness and reduction of outgassing at the same time in a superfine region, in particular, in electron beam, X-ray or EUV ray lithography, and to provide a resist film and a pattern forming method using the resist film. SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P) having the following repeating units (A)-(C) and a solvent having a boiling temperature of 150°C or lower. A resist film of the composition and a pattern-forming method using the composition are provided. The repeating units are: (A) a repeating unit containing a group for decomposing and forming an acid upon irradiation with ah actinic ray or radiation; (B) a repeating unit containing a group for decomposing and forming a carboxylic acid by the action of an acid; and (C) a repeating unit containing a carbon-carbon unsaturated bond. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提供在超细区域中同时满足高灵敏度，高分辨率，良好图案形式，良好的线边缘粗糙度和减少除气的光化射线敏感或辐射敏感性树脂组合物，特别地，在电子束，X射线或EUV射线光刻中，并提供使用该抗蚀剂膜的抗蚀剂膜和图案形成方法。光敏性或辐射敏感性树脂组合物含有具有以下重复单元（A） - （C）的树脂（P）和沸点为150℃以下的溶剂。提供了组合物的抗蚀剂膜和使用该组合物的图案形成方法。重复单元是：（A）包含用于在用光化学射线或辐射照射时分解和形成酸的基团的重复单元; （B）含有通过酸的分解和形成羧酸的基团的重复单元; 和（C）含有碳 - 碳不饱和键的重复单元。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2009191101A Surface treatment agent composition containing fluorine-containing polyfunctional silicon compound 审中-公开
标题翻译：含有氟聚合物的硅氧烷化合物的表面处理剂组合物
公开(公告)号：JP2009191101A
公开(公告)日：2009-08-27
申请号：JP2008030699
申请日：2008-02-12
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ITO TAKAYUKI
IPC分类号： C09K3/18 , C07F7/18 , C09D183/04 , C09D183/05 , C09D183/08
摘要： PROBLEM TO BE SOLVED: To provide a new fluorine-containing surface treatment agent composition having high substantivity of water repellency and water drop slidable property. SOLUTION: The surface treatment agent composition comprises a compound of formula (I) and a compound of formula (A). When the fluorine-containing surface treatment agent composition is applied to a base material such as glass, metal or plastic and dried, a treated base material having surface properties such as solvent resistance, chemical resistance, water repellency, water sliding property and releasability and high substantivity of these effects can be obtained. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供具有高亲水性的防水性和水滴滑动性的新的含氟表面处理剂组合物。溶液：表面处理剂组合物包含式（I）化合物和式（A）化合物。当将含氟表面处理剂组合物应用于诸如玻璃，金属或塑料的基材并干燥时，具有耐溶剂性，耐化学性，防水性，水滑性和脱模性等表面性能的处理基材可以获得这些效果的直接性。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2008260869A New fluorine-containing ether compound 有权
标题翻译：新的含氟化合物的化合物
公开(公告)号：JP2008260869A
公开(公告)日：2008-10-30
申请号：JP2007105279
申请日：2007-04-12
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ITO TAKAYUKI , SAKUMA TOSHIMITSU
IPC分类号： C08G65/321 , C07D493/10
CPC分类号： C07D493/10 , C08G65/007
摘要： PROBLEM TO BE SOLVED: To provide an ether-based fluorine-containing polymer having high fluorine content.
SOLUTION: The fluorine-containing ether compound having a heightened fluorine content and corresponding to a polymer containing a repeating unit represented by general formula (I) (wherein, Rh
1 is a divalent linking group; Rf
2 is a perfluoroalkylene group; Rf
3 and Rf
4 are each independently a fluorine atom, a perfluoroalkyl group or a perfluoroalkoxy group; and Rf
2 , Rf
3 and Rf
4 may form a ring by binding to each other) is obtained by fluorinating the polymer.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：待解决的问题：提供具有高氟含量的醚基含氟聚合物。解决方案：具有提高的氟含量并相应于含有由通式（I）表示的重复单元的聚合物的含氟醚化合物（其中，Rh 1 是二价连接基团; Rf 2 是全氟亚烷基; Rf 3 和Rf 4 各自独立地为氟原子，全氟烷基或全氟烷氧基; Rf 通过氟化聚合物获得 2 ，Rf 3 和Rf 4 可以通过彼此结合形成环）。版权所有（C）2009，JPO＆INPIT

9. 发明专利

JP2008027890A Solid electrolyte, electrode membrane assembly, and fuel cell 审中-公开
标题翻译：固体电解质，膜电极组件和燃料电池
公开(公告)号：JP2008027890A
公开(公告)日：2008-02-07
申请号：JP2007080973
申请日：2007-03-27
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： KANEKO MASAYUKI , HARADA MASAYUKI , NOMURA KIMIATSU , ITO TAKAYUKI
IPC分类号： H01B1/06 , C08G65/40 , H01M8/02 , H01M8/10
CPC分类号： Y02E60/521
摘要： PROBLEM TO BE SOLVED: To provide a solid electrolyte having high ion conductivity. SOLUTION: The solid electrolyte includes aromatic ring structure and sulfonate group presented by the general formula (1) is attached to the aromatic ring. B 1 and B 2 of the formula (1) represent connecting groups, respectively, at least one of B 1 or B 2 represents a connecting group including a fluorinated alkylene group, X represents a group including a hetero atom, M represents a cation, m1 represents an integer of 1 or larger, m2 represents an integer of 0 or 1, and n1 represents an integer of 1 to 20. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有高离子传导性的固体电解质。解决方案：固体电解质包括芳环结构和由通式（1）表示的磺酸酯基团连接到芳环上。式（1）的B 1 和B 2 分别代表连接组，B 1 或B 2 表示包含氟化亚烷基的连接基团，X表示包含杂原子的基团，M表示阳离子，m1表示1以上的整数，m2表示0或1的整数，n1表示（C）2008，JPO＆INPIT

10. 发明专利

JP2007273319A Polymer electrolyte, membrane electrode junction and fuel cell 审中-公开
标题翻译：聚合物电解质，膜电极结和燃料电池
公开(公告)号：JP2007273319A
公开(公告)日：2007-10-18
申请号：JP2006098697
申请日：2006-03-31
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ITO TAKAYUKI , KANEKO YUJI , KIKUCHI WATARU
IPC分类号： H01M8/02 , C08G65/40 , H01B1/06 , H01M4/86 , H01M4/88 , H01M8/10
CPC分类号： H01M8/1032 , C08J5/2256 , C08J2371/12 , C08J2381/06 , H01M8/1004 , H01M8/1025 , H01M8/1027 , H01M2300/0082
摘要： PROBLEM TO BE SOLVED: To provide a polymer electrolyte having large ionic conductivity and durability. SOLUTION: The polymer electrolyte has a repeating structure expressed by Formula (1). The character B in this Formula represents a group with a single bond or a bivalent group, and the character A represents a bivalent aromatic group. The character Y represents -SO 2 -, -SO-, or -CO-. R 1 represents a substituent group, and n1 represents an integer of 0 to 3. L represents a perfluoroalkylene group, and M represents an ionic group. COPYRIGHT: (C)2008,JPO&INPIT

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