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1. 发明专利

JP2010270380A Holder for plating cylindrical and sac-like workpiece 有权
标题翻译：用于圆柱体和类似工件的支架
公开(公告)号：JP2010270380A
公开(公告)日：2010-12-02
申请号：JP2009125384
申请日：2009-05-25
申请人： Fuji Hatsujo Kk , Kida Seiko Kk , 冨士発條株式会社 , 木田精工株式会社
发明人： KIDA KIYOSHI , KIDA HIROFUMI , FUJII HIROSHI , NAGAOKA KATSUHIKO
IPC分类号： C25D17/12 , C25D17/08 , C25D17/10
摘要： PROBLEM TO BE SOLVED: To provide a holder for plating, which can change a contact position of a cathodic rod without needing hands, and accordingly does not leave a trace of contact on the surface of a cylindrical and sac-like workpiece. SOLUTION: The holder 1 for plating, which holds the cylindrical and sac-like workpiece during plating treatment, includes: a negative electrode having a plurality of contact portions 33 at different positions in a circumferential direction when viewed from the direction of the shaft center of a virtual cylinder CC that is temporarily supposed, which are provided with abutting surfaces 32 formed so as to contact with a part of an outer surface 81 of the virtual cylinder; and a rotation-transmitting unit for rotating the negative electrode around the shaft center of the virtual cylinder. The plurality of the contact portions are arranged so that the cylindrical and sac-like workpiece which is an object to be held does not pass between the abutting surfaces of the adjacent two contact portions. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够改变阴极棒的接触位置而不需要手的电镀用保持器，因此不会在圆筒状和囊状工件的表面上留下痕迹的接触。解决方案：用于在电镀处理期间保持圆柱形和囊状工件的用于电镀的保持器1包括：负极，当从该方向观察时，具有沿圆周方向的不同位置处的多个接触部33 设置有与虚拟气缸的外表面81的一部分接触形成的抵接面32的虚拟气缸CC的轴心; 以及用于使所述负极围绕所述虚拟气缸的轴心旋转的旋转传递单元。多个接触部分被布置成使得被保持物体的圆柱形和囊状工件不会在相邻的两个接触部分的邻接表面之间通过。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2010270381A Holder for plating cylindrical and sac-like workpiece 审中-公开
标题翻译：用于圆柱体和类似工件的支架
公开(公告)号：JP2010270381A
公开(公告)日：2010-12-02
申请号：JP2009125385
申请日：2009-05-25
申请人： Fuji Hatsujo Kk , Kida Seiko Kk , 冨士発條株式会社 , 木田精工株式会社
发明人： KIDA KIYOSHI , KIDA HIROFUMI , FUJII HIROSHI , NAGAOKA KATSUHIKO
IPC分类号： C25D17/08 , C25D7/00 , C25D17/12 , C25D21/10
摘要： PROBLEM TO BE SOLVED: To provide a holder for plating, which can change a contact position of a cathodic rod without needing hands, and accordingly does not leave a trace of contact on the surface of a cylindrical and sac-like workpiece.
SOLUTION: The holder 1 for plating a cylindrical and sac-like workpiece includes a negative electrode 21 that is inserted inside the cylindrical and sac-like workpiece W, and can rotate around the shaft center direction of the cylindrical and sac-like workpiece, which is assumed to be a rotation axis. The negative electrode is formed so as to hold the cylindrical and sac-like workpiece and make the cylindrical and sac-like workpiece rotate by abutting on the inner face of the cylindrical and sac-like workpiece, and includes contact portions 34 for consistently keeping the cylindrical and sac-like workpiece as a cathode when having held the workpiece.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够改变阴极棒的接触位置而不需要手的电镀用保持器，因此不会在圆筒状和囊状工件的表面上留下痕迹的接触。解决方案：用于电镀圆柱形和囊状工件的保持器1包括插入圆柱形和囊状工件W内的负极21，并且可以围绕圆柱形和囊状工件W的轴中心方向旋转工件，其被假设为旋转轴。负极形成为保持圆筒状和囊状工件，并且使圆柱形和囊状工件通过邻接在圆柱形和囊状工件的内表面上而旋转，并且包括接触部分34，用于始终保持圆柱形和囊状工件当保持工件时为阴极。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2007277634A Plating method, plating apparatus and electroplated battery can 有权
标题翻译：电镀方法，电镀设备和电镀电池
公开(公告)号：JP2007277634A
公开(公告)日：2007-10-25
申请号：JP2006105118
申请日：2006-04-06
申请人： Fuji Hatsujo Kk , Kida Seiko Kk , 冨士発條株式会社 , 木田精工株式会社
发明人： SAKAMOTO KIYOSHI , FUJII SHINJI , FUJII HIROSHI , OSAKO KENJI , KIDA HIROFUMI
IPC分类号： C25D21/10 , C25D7/00 , C25D7/04 , C25D17/08 , C25D17/12 , H01M2/02
CPC分类号： Y02E60/12
摘要： PROBLEM TO BE SOLVED: To provide a plating method and a plating apparatus which can surely and uniformly plate the inside surface of even a thin, long, bottom-blind and cylindrical body so as to provide a battery can for a hybrid car in which a thick plated film is formed on its slender inside surface and even on the inside surface of its bottom surface .
SOLUTION: One end of a holding tool 13 to be used also as a cathode is inserted into an object 10 to be plated from the side of an opening 10a thereof and brought into contact with the inside surface of the object 10 to be plated to hold the object 10 to be plated and the other end of the holding tool 13 is supported to be freely rotated to give a rotatory motion to one end of the holding tool 13. The object 10 to be plated is reciprocated between such a position A that the object 10 to be plated is immersed in a plating solution 14 while keeping the opening 10a upward and such a position B that the opening 10a of the object 10 to be plated is kept lower than the bottom 10b thereof on the outside of the plating solution 14. The object 10 to be plated is plated while repeating the work of immersing the object 10 to be plated in the plating solution 14 and the work of discharging the plating solution in the object 10 to be plated.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够可靠地均匀地平板化薄，长，底部和圆筒体的内表面的电镀方法和电镀装置，以便为混合动力汽车提供电池罐其中在其细长的内表面以及其底表面的内表面上形成厚镀膜。解决方案：也用作阴极的保持工具13的一端插入到要从其开口10a的侧面进行电镀的物体10中，并与物体10的内表面接触电镀以保持要镀覆的物体10，并且保持工具13的另一端被支撑以自由旋转，以向保持工具13的一端进行旋转运动。被镀物体10在这样的位置之间往复运动 A，将要镀覆的物体10浸入电镀液14中，同时保持开口10a向上，并且将待镀物体10的开口10a保持低于其底部10b的位置B 镀覆对象物10，在重复将要镀覆的物体10浸渍在电镀液14中的工序以及将电镀液排出到被镀物体10中的工序的同时进行电镀。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2010031335A Surface treatment apparatus 有权
标题翻译：表面处理设备
公开(公告)号：JP2010031335A
公开(公告)日：2010-02-12
申请号：JP2008196862
申请日：2008-07-30
申请人： Kida Seiko Kk , 木田精工株式会社
发明人： KIDA KIYOSHI , KIDA HIROFUMI
IPC分类号： C25D17/22 , C25D21/10
摘要： PROBLEM TO BE SOLVED: To provide a surface treatment apparatus providing a thicker surface coating film with further uniformized film thickness without increasing current or prolonging the treating time. SOLUTION: The surface treatment apparatus includes: a basket 5; a basket holding means 3 for holding the basket 5 freely rotatably while keeping the erected posture of the basket; a swinging means for swinging the basket holding means 3 between the erected rotating posture and a sideways rotating posture for laying the basket 5 flat sideways; a rotary drive part for transmitting basket rotation drive to the basket holding means 3; and a treating tank 2 arranged at a fixed position to house the whole basket holding means 3. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种表面处理装置，其在不增加电流或延长处理时间的情况下提供具有进一步均匀膜厚度的较厚表面涂膜。表面处理装置包括：筐5; 篮子保持装置3，用于在保持篮子的竖立姿态的同时自由旋转地保持篮子5; 摆动装置，用于使筐保持装置3摆动在直立的旋转姿势和侧向旋转姿势之间，用于将篮子5平放放置; 用于将筐旋转驱动传递到筐保持装置3的旋转驱动部; 以及设置在固定位置以容纳整个篮子保持装置3的处理槽2.版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2010031336A Surface treatment apparatus 审中-公开
标题翻译：表面处理设备
公开(公告)号：JP2010031336A
公开(公告)日：2010-02-12
申请号：JP2008196863
申请日：2008-07-30
申请人： Kida Seiko Kk , 木田精工株式会社
发明人： KIDA KIYOSHI , KIDA HIROFUMI
IPC分类号： C25D17/26 , C25D17/16 , C25D17/20
摘要： PROBLEM TO BE SOLVED: To provide a surface treatment apparatus with simple and compact structure and with reduced treating time.
SOLUTION: The surface treatment apparatus includes: a treating tank 2; a basket holding means 3 for holding the basket 5 freely rotatably in the treating tank 2; a swinging means 10 for swinging the basket holding means 3; and a rotary drive part 7 for transmitting basket rotary drive to the basket holding means 3. The rotary drive part 7 includes: a driven gear 77 freely rotatable coaxially with a pivot 70 for swinging the basket holding means 3; a transmitting means 78 in the tank to transmit the rotation of the driven gear 77 to the basket 5 held by the basket holding means 3; and a rotation motor 79 for transmitting the rotational force to the rotary gear 77 while the rotation motor 79 is provided outside the treating tank 2.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种表面处理装置，其结构简单紧凑，处理时间缩短。表面处理装置包括：处理槽2; 筐保持装置3，用于将筐5自由旋转地保持在处理槽2中; 用于摆动筐保持装置3的摆动装置10; 以及用于将筐旋转驱动传送到筐保持装置3的旋转驱动部7.旋转驱动部7包括：与用于摆动筐保持装置3的枢轴70同轴地自由旋转的从动齿轮77; 一个传送装置78，用于将从动齿轮77的旋转传递到由筐保持装置3保持的篮子5; 以及旋转马达79，用于在旋转马达79设置在处理槽2的外部时将旋转力传递到旋转齿轮77.版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2005314761A Method for manufacturing substrate of stamper for optical disk, and electroformed article 审中-公开
标题翻译：用于制造光盘印刷机基板的方法和电子文章
公开(公告)号：JP2005314761A
公开(公告)日：2005-11-10
申请号：JP2004135452
申请日：2004-04-30
申请人： Kida Seiko Kk , 木田精工株式会社
发明人： KIDA KIYOSHI , KIDA HIROFUMI
IPC分类号： C25D1/00 , C25D1/10 , G11B7/26
摘要： PROBLEM TO BE SOLVED: To provide a substrate 1 of a stamper suitable for producing an optical disk having data of high density.
SOLUTION: The method for manufacturing the substrate 1 of the stamper for the optical disk by using an electroforming apparatus which rotates a base material 2 having a mirror plane arranged as a cathode 19 so as to face an anode 18 comprises: carrying out electroforming to form an electroformed article 4 on the base material 2; and then peeling the electroformed article 4 from the base metal 2. The electroformed article 4 to be used for the substrate 1 has a surface roughness Ry of 10 nm or less on a peeled surface 5 from the base metal 2.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供适合于制造具有高密度数据的光盘的压模的基板1。解决方案：通过使用使具有布置为阴极19的反射镜面的基材2旋转以面对阳极18的电铸装置制造用于光盘的压模的基板1的方法包括：执行电铸以在基材2上形成电铸制品4; 然后将电铸制品4从基底金属2剥离。用于基板1的电铸制品4在从基体金属2剥离的表面5上具有10nm或更小的表面粗糙度Ry。版权所有：（C）2006，JPO＆NCIPI

7. 发明专利

JP2004353078A Electrolytic treatment device 有权
公开(公告)号：JP2004353078A
公开(公告)日：2004-12-16
申请号：JP2003290583
申请日：2003-08-08
申请人： Kida Seiko Kk , Nippon Hyomen Kagaku Kk , 日本表面化学株式会社 , 木田精工株式会社
发明人： KIDA HIROFUMI , KIDA TAKAFUMI
IPC分类号： C25D17/20 , C25D19/00
摘要： PROBLEM TO BE SOLVED: To provide an electrolytic treatment device which performs an electrolytic treatment such as alkaline electroplating (e.g. zinc plating) or its pretreatment, maximizes the treatment efficiency possible, and increases the productivity of a treated article (e.g. a plated article as a finished article) to reduce its cost.
SOLUTION: The electrolytic treatment apparatus has an insoluble counter electrode 7 installed in a treatment vessel. The counter electrode 7 has sterically effective current-carrying planes consisting of the sum of front current-carrying planes formed by parts facing a work 8 and side current-carrying planes formed by parts extending from the front current-carrying planes as the starting points in the direction so as to leave the work 8. Thus, the current-carrying area is maximized.
COPYRIGHT: (C)2005,JPO&NCIPI

8. 发明专利

JP2012097314A Surface treatment device with non-drainage 有权
标题翻译：不排水的表面处理装置
公开(公告)号：JP2012097314A
公开(公告)日：2012-05-24
申请号：JP2010245249
申请日：2010-11-01
申请人： Kida Seiko Kk , 木田精工株式会社
发明人： KIDA TAKAFUMI , KIDA HIROFUMI
IPC分类号： C25D21/08
摘要： PROBLEM TO BE SOLVED: To make an operation with non-drainage substantially possible while reducing running cost in a surface treatment apparatus with non-drainage.SOLUTION: The surface treatment apparatus includes a treatment tank 2, a rinse tank 4 arranged on the side of the treatment tank 2, a collecting tank 3 provided between the treatment tank 2 and the rinse tank 4, a plurality of moving bodies 6 arranged side by side along an arranging direction of each of these tanks 2-4, and a conveying means 7 which conveys the moving bodies 6 in a direction from the treatment tank 2 via the collecting tank 3 toward the rinse tank 4, while lowering the moving bodies 6 at the upper part of each of the tanks 2-4, and raising the moving bodies 6 at the place between the tanks. The treatment tank 2 and the collecting tank 3 are connected together with a first counter-current means 11, and further the collecting tank 3 and the rinse tank 4 are connected together with a second counter-current means 12. The conveying means 7 so inclines the moving bodies 6 that one of corner parts exposed from the outer surface of the moving body 6 comes to the lowest level when the moving bodies 6 are raised between the tanks 2-4.
摘要翻译：要解决的问题：在无排水的表面处理装置中，在降低运行成本的同时，实现非排水的操作。解决方案：表面处理装置包括处理槽2，布置在处理槽2一侧的漂洗槽4，设置在处理槽2和冲洗槽4之间的收集槽3，多个移动体沿着这些槽2-4的排列方向并列配置的排出口6，以及输送装置7，其将移动体6沿着从处理槽2经由收集槽3朝向冲洗槽4的方向输送，同时下降每个罐2-4的上部的移动体6，并且在罐之间的位置处升高移动体6。处理槽2和收集槽3与第一逆流装置11连接在一起，并且进一步的收集罐3和冲洗槽4与第二逆流装置12连接在一起。输送装置7倾斜当移动体6在罐2-4之间升高时，从移动体6的外表面露出的角部之一的移动体6达到最低水平。版权所有（C）2012，JPO＆INPIT

9. 发明专利

JP2010031337A Surface treatment apparatus 审中-公开
标题翻译：表面处理设备
公开(公告)号：JP2010031337A
公开(公告)日：2010-02-12
申请号：JP2008196864
申请日：2008-07-30
申请人： Kida Seiko Kk , 木田精工株式会社
发明人： KIDA KIYOSHI , KIDA HIROFUMI
IPC分类号： C25D17/20
摘要： PROBLEM TO BE SOLVED: To provide a surface treatment apparatus which has high and sure conductivity, provides a thick surface coating film with uniformized thickness without increasing current or prolonging treatment time.
SOLUTION: The surface treatment apparatus includes: a basket 5; a basket holding means 3 for laying the basket 5 on the side and holding the basket 5 freely rotatably; a rotary drive part 7 for transmitting the drive for rotating the basket to the basket holding means 3; and a treatment tank 2 for housing the basket holding means 3. The basket 5 is provided with a cathode part 20 exposed on the inner surface of the basket and a conductive part 21 arranged on the lower surface of the bottom part 13 while electrically connected to the cathode part 20. The basket holding means 3 is provided with an energizing part 51 to be in contact with the conductive part 21.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有高导电性和可靠性的表面处理装置，提供均匀厚度的厚表面涂膜，而不增加电流或延长处理时间。表面处理装置包括：筐5; 篮子保持装置3，用于将篮子5放置在侧面上并自由旋转地保持篮子5; 旋转驱动部7，用于将用于将篮转动的驱动器传送到篮保持装置3; 以及用于容纳筐保持装置3的处理槽2.筐5设置有暴露在筐的内表面上的阴极部分20和布置在底部13的下表面上的导电部分21，同时电连接到阴极部分20.篮子保持装置3设置有与导电部分21接触的激励部分51.版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2016003365A めっき済み複合品及びその製造方法审中-公开
公开(公告)号：JP2016003365A
公开(公告)日：2016-01-12
申请号：JP2014124398
申请日：2014-06-17
申请人： KIDA SEIKO KK
发明人： KIDA KIYOSHI , KIDA TAKAFUMI , KIDA HIROFUMI
IPC分类号： C25D7/00 , C25D5/10 , F16B33/06 , F16B35/04
摘要：【課題】結合したパーツ同士の遊動を円滑な状態に保持しつつ、高い耐食性が得られ且つ外観性を向上させることを可能にする。【解決手段】少なくとも2つのパーツ2,3が相互間の嵌合構造によって遊動自在で且つ分離不能に結合されて成る複合品であって、それぞれのパーツ2,3には、互いの遊動時に摺接し合う嵌合部位にZnめっきを最外層とする表面処理層10が形成されていると共に、前記嵌合部位を除く他の部位にはZnめっきを下地層として当該下地層上に他の金属めっき層を積層させて成る表面処理層11が形成されている。【選択図】図1

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