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1. 发明授权

US08313635B2 Bare aluminum baffles for resist stripping chambers 有权
标题翻译：用于抗剥离室的裸铝挡板
公开(公告)号：US08313635B2
公开(公告)日：2012-11-20
申请号：US12873906
申请日：2010-09-01
申请人： Fred D. Egley , Michael S. Kang , Anthony L. Chen , Jack Kuo , Hong Shih , Duane Outka , Bruno Morel
发明人： Fred D. Egley , Michael S. Kang , Anthony L. Chen , Jack Kuo , Hong Shih , Duane Outka , Bruno Morel
IPC分类号： B23H3/00
CPC分类号： H01J37/32633 , C23C8/02 , C23C8/10 , G03F7/427 , H01J37/32357 , H01J2237/3342
摘要： Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.
摘要翻译：裸铝挡板适用于抗蚀剂剥离室，并且包括外部氧化铝层，其可以是天然氧化铝层或通过化学处理新的或使用的裸铝挡板形成薄的外部氧化铝层而形成的层。

2. 发明申请

US20100319813A1 BARE ALUMINUM BAFFLES FOR RESIST STRIPPING CHAMBERS 有权
标题翻译：用于耐腐蚀剥离室的铝合金棒
公开(公告)号：US20100319813A1
公开(公告)日：2010-12-23
申请号：US12873906
申请日：2010-09-01
申请人： Fred D. Egley , Michael S. Kang , Anthony L. Chen , Jack Kuo , Hong Shih , Duane Outka , Bruno Morel
发明人： Fred D. Egley , Michael S. Kang , Anthony L. Chen , Jack Kuo , Hong Shih , Duane Outka , Bruno Morel
IPC分类号： C23C8/02 , C25F3/30 , C23C8/10 , C25F3/20
CPC分类号： H01J37/32633 , C23C8/02 , C23C8/10 , G03F7/427 , H01J37/32357 , H01J2237/3342
摘要： Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.
摘要翻译：裸铝挡板适用于抗蚀剂剥离室，并且包括外部氧化铝层，其可以是天然氧化铝层或通过化学处理新的或使用的裸铝挡板形成薄的外部氧化铝层而形成的层。

3. 发明授权

US07811409B2 Bare aluminum baffles for resist stripping chambers 有权
标题翻译：用于抗剥离室的裸铝挡板
公开(公告)号：US07811409B2
公开(公告)日：2010-10-12
申请号：US11987419
申请日：2007-11-29
申请人： Fred D. Egley , Michael S. Kang , Anthony L. Chen , Jack Kuo , Hong Shih , Duane Outka , Bruno Morel
发明人： Fred D. Egley , Michael S. Kang , Anthony L. Chen , Jack Kuo , Hong Shih , Duane Outka , Bruno Morel
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/32633 , C23C8/02 , C23C8/10 , G03F7/427 , H01J37/32357 , H01J2237/3342
摘要： Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.
摘要翻译：裸铝挡板适用于抗蚀剂剥离室，并且包括外部氧化铝层，其可以是天然氧化铝层或通过化学处理新的或使用的裸铝挡板形成薄的外部氧化铝层而形成的层。

4. 发明申请

US20080178906A1 Bare aluminum baffles for resist stripping chambers 有权
标题翻译：用于抗剥离室的裸铝挡板
公开(公告)号：US20080178906A1
公开(公告)日：2008-07-31
申请号：US11987419
申请日：2007-11-29
申请人： Fred D. Egley , Michael S. Kang , Anthony L. Chen , Jack Kuo , Hong Shih , Duane Outka , Bruno Morel
发明人： Fred D. Egley , Michael S. Kang , Anthony L. Chen , Jack Kuo , Hong Shih , Duane Outka , Bruno Morel
IPC分类号： B08B7/02 , B08B13/00 , B05D3/10 , C25F3/16
CPC分类号： H01J37/32633 , C23C8/02 , C23C8/10 , G03F7/427 , H01J37/32357 , H01J2237/3342
摘要： Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.
摘要翻译：裸铝挡板适用于抗蚀剂剥离室，并且包括外部氧化铝层，其可以是天然氧化铝层或通过化学处理新的或使用的裸铝挡板形成薄的外部氧化铝层而形成的层。

5. 发明授权

US06344151B1 Gas purge protection of sensors and windows in a gas phase processing reactor 有权
标题翻译：气相处理反应器中传感器和窗户的气体吹扫保护
公开(公告)号：US06344151B1
公开(公告)日：2002-02-05
申请号：US09559795
申请日：2000-04-27
申请人： Anthony L. Chen , John Holland
发明人： Anthony L. Chen , John Holland
IPC分类号： G01N2100
CPC分类号： H01J37/32862 , H01J37/32935 , Y10S156/916
摘要： A gas purged viewport for endpoint detection in a gas phase processing chamber is provided which prevents contamination of an optical monitoring window by use of a purge gas flow. The purge gas purges the viewport and prevents deposition of byproducts and contaminants on the window which will adversely effect endpoint detection. The gas purge viewport includes a prechamber between the optically transparent window and the process chamber. The purge gas is passed through the prechamber and into the processing chamber to purge the window. The gas purge system may also be used to purge other parts such as sensors.
摘要翻译：提供了一种用于在气相处理室中进行端点检测的气体净化视口，其防止通过使用吹扫气流而污染光学监测窗。净化气体清洗视口并防止副反应物和污染物沉积在窗口上，这将不利地影响端点检测。气体净化视口包括在光学透明窗口和处理室之间的预制室。净化气体通过预燃室并进入处理室以净化窗口。气体吹扫系统也可用于吹扫诸如传感器的其它部件。

6. 发明授权

US06711621B1 System and method of implementing netware core protocol within a sockets model 失效
标题翻译：在套接字模型中实现网络核心协议的系统和方法
公开(公告)号：US06711621B1
公开(公告)日：2004-03-23
申请号：US09687329
申请日：2000-10-13
申请人： Shital Mitra , Anthony L. Chen
发明人： Shital Mitra , Anthony L. Chen
IPC分类号： G06F1516
CPC分类号： H04L69/16 , H04L69/12 , H04L69/161 , H04L69/162 , Y10S707/99942 , Y10S707/99953
摘要： A system and method of implementing a NetWare Core Protocol (NCP) module within a sockets model, such as a Berkeley Systems Distribution (BSD) Sockets model, is disclosed wherein the NCP module has a NCP reliability sub-module and a NCP library sub-module. The BSD Sockets model has a sockets interface, one or more applications, an Internetwork Packet eXchange (IPX) network layer and a front plane. The system and method of the present invention is implemented such that the NCP library sub-module is located above the sockets interface and the NCP reliability sub-module is located below the sockets interface. This results in many advantages compared to prior implementations which had the entire NCP module located above the sockets layer, including increased performance due to the elimination of task switched data transfer and other interprocess communication steps, such as pipes and selects that impede performance.
摘要翻译：公开了一种在诸如伯克利系统分布（BSD）套接字模型的套接字模型内实现NetWare核心协议（NCP）模块的系统和方法，其中NCP模块具有NCP可靠性子模块和NCP库子模块，模块。 BSD套接字模型具有套接字接口，一个或多个应用，互联网交换（IPX）网络层和前端平面。实施本发明的系统和方法，使得NCP库子模块位于套接字接口上方，并且NCP可靠性子模块位于套接字接口下方。与先前的实现相比，这导致了许多优点，其中整个NCP模块位于套接字层之上，包括由于消除任务交换数据传输和其他进程间通信步骤（例如阻碍性能的管道和选择）而导致的性能提高。

7. 发明授权

US6074516A High sputter, etch resistant window for plasma processing chambers 失效
标题翻译：用于等离子体处理室的高溅射，耐蚀刻窗口
公开(公告)号：US6074516A
公开(公告)日：2000-06-13
申请号：US103357
申请日：1998-06-23
申请人： Arthur M. Howald , Anthony L. Chen , Alan M. Schoepp
发明人： Arthur M. Howald , Anthony L. Chen , Alan M. Schoepp
IPC分类号： H05H1/46 , H01J37/32 , H01L21/302 , H01L21/3065 , C23C16/00
CPC分类号： H01J37/32467 , H01J37/321 , H01J37/32477
摘要： A window of a plasma processing chamber. The window includes a first dielectric portion having a first electrical thickness and a first resistivity to an etching plasma that is formed within the plasma processing chamber. There is further included a second dielectric portion disposed within the first dielectric portion. The second dielectric portion has a second electrical thickness that is less than the first electrical thickness. The second dielectric portion is formed of a substantially transparent material and has a second resistivity to the etching plasma. The second resistivity is higher than the first resistivity.
摘要翻译：等离子体处理室的窗口。窗口包括具有第一电气厚度和形成在等离子体处理室内的蚀刻等离子体的第一电阻率的第一电介质部分。还包括设置在第一电介质部分内的第二电介质部分。第二电介质部分具有小于第一电气厚度的第二电气厚度。第二电介质部分由基本上透明的材料形成，并且对蚀刻等离子体具有第二电阻率。第二电阻率高于第一电阻率。

8. 发明授权

US6071375A Gas purge protection of sensors and windows in a gas phase processing reactor 失效
公开(公告)号：US6071375A
公开(公告)日：2000-06-06
申请号：US1483
申请日：1997-12-31
申请人： Anthony L. Chen , John Holland
发明人： Anthony L. Chen , John Holland
IPC分类号： H01J37/32 , C23F1/02
CPC分类号： H01J37/32862 , H01J37/32935 , Y10S156/916
摘要： A gas purged viewport for endpoint detection in a gas phase processing chamber is provided which prevents contamination of an optical monitoring window by use of a purge gas flow. The purge gas purges the viewport and prevents deposition of byproducts and contaminants on the window which will adversely effect endpoint detection. The gas purge viewport includes a prechamber between the optically transparent window and the process chamber. The purge gas is passed through the prechamber and into the processing chamber to purge the window. The gas purge system may also be used to purge other parts such as sensors.

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