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1. 发明授权

US07405825B2 Optical analysis system 失效
标题翻译：光学分析系统
公开(公告)号：US07405825B2
公开(公告)日：2008-07-29
申请号：US10539540
申请日：2003-12-19
申请人： Frank Jeroen Pieter Schuurmans , Michael Cornelis Van Beek , Levinus Pieter Bakker , Wouter Harry Jacinth Rensen , Bernardus Hendrikus Wilhelmus Hendriks , Robert Frans Maria Hendriks , Thomas Steffen
发明人： Frank Jeroen Pieter Schuurmans , Michael Cornelis Van Beek , Levinus Pieter Bakker , Wouter Harry Jacinth Rensen , Bernardus Hendrikus Wilhelmus Hendriks , Robert Frans Maria Hendriks , Thomas Steffen
IPC分类号： G01J3/32 , G01J3/457 , G02B26/02
CPC分类号： G01J3/02 , G01J3/0205 , G01J3/021 , G01J3/10 , G01J3/28 , G01J3/36 , G01N21/274 , G01N21/31 , G01N2021/3196 , G01N2201/129
摘要： The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detecting the weighed optical signal. The optical analysis system (20) may further comprise a dispersive element (2) for spectrally dispersing the optical signal, the multivariate optical element being arranged to receive the dispersed optical signal. The blood analysis system (40) comprises the optical analysis system (20) according to the invention.
摘要翻译：用于确定光信号的主分量的幅度的光学分析系统（20）包括用于反射光信号并由此通过光谱称重功能称重光信号的多元光学元件（10） 9 P，9 N），用于检测加权的光信号。光学分析系统（20）还可以包括用于光谱分散光学信号的色散元件（2），所述多元光学元件被布置成接收分散的光信号。血液分析系统（40）包括根据本发明的光学分析系统（20）。

2. 发明申请

US20090015819A1 OPTICAL ANALYSIS SYSTEM, BLOOD ANALYSIS SYSTEM AND METHOD OF DETERMINING AN AMPLITUDE OF A PRINCIPAL COMPONENT 审中-公开
标题翻译：光学分析系统，血液分析系统和确定主成分的幅度的方法
公开(公告)号：US20090015819A1
公开(公告)日：2009-01-15
申请号：US10596563
申请日：2004-12-13
申请人： Michael Cornelis Van Beek , Bernardus Leonardus Bakker , Wouter Harry Jacinth Rensen , Frank Jeroen Pieter Schuurmans
发明人： Michael Cornelis Van Beek , Bernardus Leonardus Bakker , Wouter Harry Jacinth Rensen , Frank Jeroen Pieter Schuurmans
IPC分类号： G01N33/48
CPC分类号： G01N21/31 , G01J3/28 , G01N21/274 , G01N21/64 , G01N21/6445 , G01N21/65 , G01N2021/3196 , G01N2021/6417 , G01N2021/655
摘要： The optical analysis system (20) is arranged to determine an amplitude of a principal component of an optical signal. The optical analysis system (20) comprises a multivariate optical element (5, 6) for weighing the optical signal by a spectral weighing function and a detector (7, 8) for detecting the weighed optical signal. The optical signal comprises the principal component and a further component which was not accounted for when designing the spectral weighing function. Therefore, the detected weighed optical signal comprises a part relating to the amplitude of the principal component and a further part relating to a further amplitude of the further component. The optical analysis system (20) further comprises a modulator element (13) for modulating the detected weighed optical signal. The difference between the modulated detected weighed optical signal and the detected weighed optical signal relates to the amplitude of the principal component and thus allows for determining the amplitude of the principal component in an accurate way. The blood analysis system (40) comprises such an optical analysis system (20). The method of determining an amplitude of an principal component makes use of the optical analysis system (20).
摘要翻译：光学分析系统（20）被布置成确定光信号的主分量的幅度。光学分析系统（20）包括用于通过光谱称重功能称量光信号的多元光学元件（5,6）和用于检测加权光信号的检测器（7,8）。光信号包括主分量和另外的分量，在设计光谱称重功能时不考虑。因此，检测到的加权光信号包括与主分量的振幅有关的部分，以及与另一分量的另一幅度相关的另一部分。光学分析系统（20）还包括用于调制检测到的称重光信号的调制器元件（13）。调制检测到的称重光信号与检测到的称重光信号之间的差异与主分量的振幅有关，因此允许以准确的方式确定主分量的振幅。血液分析系统（40）包括这样的光学分析系统（20）。确定主成分的振幅的方法利用光学分析系统（20）。

3. 发明授权

US07671973B2 Optical analysis system using multivariate optical elements 失效
标题翻译：光学分析系统采用多元光学元件
公开(公告)号：US07671973B2
公开(公告)日：2010-03-02
申请号：US10596564
申请日：2004-12-16
申请人： Michael Cornelis Van Beek , Frank Jeroen Pieter Schuurmans , Levinus Pieter Bakker
发明人： Michael Cornelis Van Beek , Frank Jeroen Pieter Schuurmans , Levinus Pieter Bakker
IPC分类号： G01N33/48
CPC分类号： A61B5/1455 , A61B5/14532 , A61B5/14546 , A61B5/14552 , G01J3/36 , G01N21/65 , G01N33/49
摘要： The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principal component is indicative of the concentration of a particular compound or various compounds of a substance that is subject to spectroscopic analysis. The optical signal is subject to wavelength selective weighting and wavelength selective spatial separation specified by a weighting function. The optical signal is preferably separated into two parts that corresponding to a positive and negative spectral band of the weighting function, respectively. The separation provides separate detection of the separated parts of the optical signal without significant loss of intensity, thereby providing an improved signal to noise ratio of the determined principal component. Separation and weighting of the optical signal is realized by two multivariate optical elements.
摘要翻译：本发明提供了一种用于确定光信号的主分量的幅度的光学分析系统。主要成分指示特定化合物或受光谱分析的物质的各种化合物的浓度。光信号经受由加权函数指定的波长选择加权和波长选择性空间分离。光信号优选分为对应于加权函数的正和负光谱带的两部分。分离提供对光信号的分离部分的单独检测，而没有明显的强度损失，从而提供确定的主要分量的改善的信噪比。光信号的分离和加权由两个多元光学元件实现。

4. 发明申请

US20080265037A1 Optical Scanning Device 审中-公开
标题翻译：光学扫描装置
公开(公告)号：US20080265037A1
公开(公告)日：2008-10-30
申请号：US12094609
申请日：2006-11-24
申请人： Gert T'Hooft , Frank Jeroen Pieter Schuurmans , Bernardus Hendrikus Wilhelmus Hendriks , Mohammed Meftah
发明人： Gert T'Hooft , Frank Jeroen Pieter Schuurmans , Bernardus Hendrikus Wilhelmus Hendriks , Mohammed Meftah
IPC分类号： G06K7/10
CPC分类号： G02B26/005 , G02B3/14 , G11B7/0065 , G11B7/1392
摘要： An optical scanning device for scanning an optical record carrier. The optical scanning device includes: a radiation source system (661; 761); an optical element (1; 101; 201; 301) comprising a first fluid (A) and a second fluid (B; C) separated from each other by a fluid meniscus (16; 116, 138; 216; 316) having an adjustable configuration; and a control system (20; 120; 220; 320) arranged to adjust the fluid meniscus configuration to introduce a first type of wavefront modification. The first type of wavefront modification causes the radiation beam to be redirected from an input radiation beam path (2; 102; 244; 348) onto one of a plurality of output radiation beam paths (24, 26; 140; 246; 350) which each have a different angular displacement (α, β, γ, δ, ∈) from the input radiation beam path. The control system is further arranged to adjust the fluid meniscus configuration to introduce a second type of wavefront modification. The second type of wavefront modification is arranged to compensate a wavefront aberration of the radiation beam, the compensated wavefront aberration being adjusted in accordance with the angular displacement.
摘要翻译：一种用于扫描光学记录载体的光学扫描装置。光学扫描装置包括：辐射源系统（661; 761）; 包括通过流体弯月面（16; 116,138; 216; 316）彼此分离的第一流体（A）和第二流体（B; C）的光学元件（1; 101; 201; 301）组态; 以及布置成调节流体弯月面配置以引入第一类型波前修改的控制系统（20; 120; 220; 320）。第一类型的波前修正使得辐射束从输入辐射束路径（2; 102; 244; 348）重定向到多个输出辐射束路径（24,26; 140; 246; 350）中的一个上，其中每个都具有与输入辐射束路径不同的角位移（α，β，γ，δ，∈）。控制系统进一步布置成调节流体弯液面配置以引入第二类型的波前修改。第二类型的波前修正被布置为补偿辐射束的波前像差，补偿的波前像差根据角位移被调整。

5. 发明授权

US08129702B2 Radiation system with contamination barrier 失效
标题翻译：具有污染屏障的辐射系统
公开(公告)号：US08129702B2
公开(公告)日：2012-03-06
申请号：US12771466
申请日：2010-04-30
申请人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
发明人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
IPC分类号： G21F1/00
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.
摘要翻译：辐射系统包括被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎片的污染屏障。污染屏障包括多个薄片。薄片的表面包括材料。辐射系统还包括被配置成收集来自污染屏障的辐射的收集器。收集器的光学表面包括与薄片表面的材料相同的材料。

6. 发明申请

US20100238311A1 IMAGING DEVICE 审中-公开
标题翻译：成像装置
公开(公告)号：US20100238311A1
公开(公告)日：2010-09-23
申请号：US12161187
申请日：2007-01-16
申请人： Aleksey Kolesnychenko , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
发明人： Aleksey Kolesnychenko , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
IPC分类号： H04N5/228
CPC分类号： G02B27/46 , G02B27/58 , G06E3/00
摘要： An imaging device for forming an image of a sample object includes an optical device and a processing unit. The optical device captures a Fourier spectrum of an object. The processing unit is arranged for processing the Fourier spectrum from the optical device and is adapted for determining the image of the sample object from the intensity of the Fourier spectrum of the sample object and the intensity of the Fourier spectrum of a combination of the sample object and a reference object.
摘要翻译：用于形成样本物体的图像的成像装置包括光学装置和处理单元。光学器件捕获对象的傅里叶谱。处理单元被布置用于从光学装置处理傅立叶频谱，并且适于根据样本对象的傅立叶频谱的强度和样本对象的组合的傅里叶谱的强度来确定样本对象的图像和参考对象。

7. 发明申请

US20090115980A1 Illumination system and filter system 失效
标题翻译：照明系统和过滤系统
公开(公告)号：US20090115980A1
公开(公告)日：2009-05-07
申请号：US12318291
申请日：2008-12-24
申请人： Arnoud Cornelis Wassink , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans
发明人： Arnoud Cornelis Wassink , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Frank Jeroen Pieter Schuurmans
IPC分类号： G03B27/52 , G01J3/10 , G03B27/72
CPC分类号： G03F7/70916
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。冷却系统还被布置成将气体注入到间隙中。

8. 发明授权

US07309869B2 Lithographic apparatus, device manufacturing method and radiation system 有权
标题翻译：光刻设备，设备制造方法和辐射系统
公开(公告)号：US07309869B2
公开(公告)日：2007-12-18
申请号：US11127312
申请日：2005-05-12
申请人： Ralph Kurt , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
发明人： Ralph Kurt , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
IPC分类号： G03B27/52
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/7005 , G21K1/06
摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.
摘要翻译：光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜。照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。辐射源可以可操作地发射EUV波长范围内的辐射。

9. 发明授权

US07307263B2 Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap 有权
标题翻译：平版印刷设备，辐射系统，污染物捕集阱，装置制造方法以及在污染物捕集器中捕获污染物的方法
公开(公告)号：US07307263B2
公开(公告)日：2007-12-11
申请号：US10890404
申请日：2004-07-14
申请人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Cornelis Petrus Andreas Maria Luijkx , Frank Jeroen Pieter Schuurmans
发明人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Cornelis Petrus Andreas Maria Luijkx , Frank Jeroen Pieter Schuurmans
IPC分类号： G03F7/20
CPC分类号： G03F7/70908 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.
摘要翻译：光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑图案形成装置。图案形成装置用于使经调节的辐射束在其横截面上具有图案。该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。

10. 发明授权

US07247866B2 Contamination barrier with expandable lamellas 有权
标题翻译：可扩展薄片的污染屏障
公开(公告)号：US07247866B2
公开(公告)日：2007-07-24
申请号：US10743265
申请日：2003-12-23
申请人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
发明人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
IPC分类号： G21G5/00
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source is disclosed. The contamination barrier includes an inner ring, an outer ring, and a plurality of lamellas. The lamellas extend in a radial direction from a main axis, and each of the lamellas is positioned in a respective plane that include the main axis. At least one outer end of each of the lamellas is slidably connected to at least one of the inner and outer ring.
摘要翻译：公开了一种通过来自辐射源的辐射并捕获来自辐射源的碎片的污染屏障。污染屏障包括内环，外环和多个薄片。薄片从主轴沿径向方向延伸，并且每个薄片位于包括主轴线的相应平面中。每个薄片的至少一个外端可滑动地连接到内圈和外圈中的至少一个。

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