会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明授权
    • Nanoimprint lithography processes for forming nanoparticles
    • 用于形成纳米颗粒的纳米压印光刻工艺
    • US08802747B2
    • 2014-08-12
    • US13017259
    • 2011-01-31
    • Frank Y. XuSidlgata V. SreenivasanShuqiang Yang
    • Frank Y. XuSidlgata V. SreenivasanShuqiang Yang
    • B29D11/00C08F20/06B23P15/00B29C35/08
    • G03F7/0002B82Y10/00B82Y40/00
    • A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles.
    • 用于形成纳米颗粒的光刻方法包括在多层基板上图案化牺牲材料。 在一些情况下,将图案转移到多层基板的可移除层或其中,并且将功能材料设置在多层基板的可移除层上并固化。 然后去除功能材料的至少一部分以暴露可移除层的突起,并且功能材料的柱从可除去的层释放以产生纳米颗粒。 在其他情况下,多层基板包括功能材料,并且图案被转移到多层基板的可移除层中或其中。 去除牺牲层,并且功能材料的柱从可除去的层中释放出来以产生纳米颗粒。