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1. 发明专利

SG11201703289YA OPTICAL GAS CONCENTRATION MEASURING METHOD, AND METHOD FOR MONITORING GAS CONCENTRATION BY SAID METHOD 未知
公开(公告)号：SG11201703289YA
公开(公告)日：2017-06-29
申请号：SG11201703289Y
申请日：2015-11-20
申请人： FUJIKIN KK , UNIV TOHOKU
发明人： NAGASE MASAAKI , NISHINO KOJI , IKEDA SHINICHI , YAMAJI MICHIO , SUGAWA SHIGETOSHI , KURODA RIHITO
IPC分类号： C23C16/52 , G01N21/27 , G01N21/33 , H01L21/205
摘要： To provide a concentration measurement method with which the concentrations of predetermined chemical components can be measured non-destructively, accurately, and rapidly by a simple means, up to the concentrations in trace amount ranges, as well as a concentration measurement method with which the concentrations of chemical components in a measurement target can be accurately and rapidly measured in real time up to the concentrations in nano-order trace amount ranges, and which is endowed with a versatility that can be realized in a variety of embodiments and modes. [Solution] In the present invention, a measurement target is irradiated, in a time sharing manner, with light of a first wavelength and light of a second wavelength that have different optical absorption rates with respect to the measurement target. The light of each wavelength, arriving optically via the measurement target as a result of irradiation with the light of each wavelength, is received at a shared light-receiving sensor. A differential signal is formed, the differential signal being of a signal pertaining to the light of the first wavelength and a signal pertaining to the light of the second wavelength, the signals outputted from the light-receiving sensor upon receipt of the light. The concentration of a chemical component in the measurement target is derived on the basis of the differential signal.

2. 发明专利

JP2001158605A REDUCED PRESSURE TYPE WATER GENERATING AND FEEDING DEVICE 失效
公开(公告)号：JP2001158605A
公开(公告)日：2001-06-12
申请号：JP33888299
申请日：1999-11-30
申请人： FUJIKIN KK
发明人： IKEDA SHINICHI , MINAMI YUKIO , KAWADA KOJI , KOMEHANA KATSUNORI , MOTOIDEN TERUO , HIRAI NOBORU , MORIMOTO AKIHIRO , NARAI TOSHIRO , HIRAO KEIJI , TAGUCHI MASAHARU
IPC分类号： C01B5/00
摘要： PROBLEM TO BE SOLVED: To obtain a safety reduced pressure type water generating and feeding device simultaneously realizing feeding of water gas of reduced pressure (e.g. a few Torr) and capable of preventing spontaneous combustion of hydrogen by highly holding inner pressure of a reactor for water generation. SOLUTION: This reduced pressure type water generating and feeding device comprises a reactor for generation of water gas by a catalytic reaction of hydrogen and oxygen, a pressure reducing mean installed on the downstream side of the reactor for generation of water gas, and pressure reducing mean supplies the water gas having reduced pressure to the downstream side and at the same time holds high inner pressure of the reactor. An orifice, a valve or other known members are used as the pressure-reducing mean.

3. 发明专利

JP2001153300A MOISTURE REMOVAL METHOD FOR GAS SUPPLY SYSTEM 失效
公开(公告)号：JP2001153300A
公开(公告)日：2001-06-08
申请号：JP2000269676
申请日：2000-09-06
申请人： FUJIKIN KK
发明人： IKEDA SHINICHI , MORIMOTO AKIHIRO , MINAMI YUKIO , MOTOIDEN AKIO , KAWADA KOJI , KOMEHANA KATSUNORI , HIRAI NOBORU , YAMAJI MICHIO
IPC分类号： F17D3/14 , B01D53/26 , F16T1/00 , F17D1/04
摘要： PROBLEM TO BE SOLVED: To provide a moisture removal method for a gas supply system capable of efficiently removing adsorbed moisture by room temperature exhaust treatment without using a baking method. SOLUTION: This moisture removal method of a gas supply system concerning this invention is a method to remove moisture residing in the inside of the gas supply system by circulating gas for moisture removal in the gas supply system, circulating pressure of gas for moisture removal is set not less than the minimum pressure in which its gas flow becomes a viscous flow and it has a characteristic in a point to be set at not more than saturated vapor pressure of water in flowing temperature of gas for moisture removal. Additionally, a condition that gas for moisture removal becomes the viscous flow is judged as an average free stroke of gas particulates becomes smaller than a diameter of piping of the gas supply system. It is possible to efficiently remove adsorbed moisture on a piping inner surface and in the inside of a valve filter when gas for moisture removal is exhausted in room temperature under such a condition.

4. 发明专利

JP2001048501A HEAT RADIATING TYPE REACTIONAL FURNACE FOR PRODUCING WATER 失效
公开(公告)号：JP2001048501A
公开(公告)日：2001-02-20
申请号：JP22354899
申请日：1999-08-06
申请人： OMI TADAHIRO , FUJIKIN KK
发明人： OMI TADAHIRO , KAWADA KOJI , MINAMI YUKIO , MORIMOTO AKIHIRO , NAKAMURA OSAMU , KOMEHANA KATSUNORI , MANOHARURARU SHURESUTA , IKEDA SHINICHI , NARAI TOSHIRO , HIRAO YOSHIYUKI
IPC分类号： C01B5/00 , H01L21/31 , H01L21/316
摘要： PROBLEM TO BE SOLVED: To realize a reduction in temperature of a reactional furnace for producing water and increase the ratio of water production without increasing the size of the reactional furnace. SOLUTION: This heat radiating type reactional furnace for producing water comprises a reactional furnace body 1 prepared by combining a furnace body member 2 on the inlet side with a furnace body member 3 on the outlet side and forming a spatial part 6 in the interior thereof, an inlet passage 7 for a raw material gas bored in the furnace body member 2 on the inlet side and capable of introducing the raw material gas into the spatial part 6, a joint 9 connected to the inlet passage 1 for the raw material gas and used for feeding the raw material gas, an outlet passage 10 for the gas of water capable of leading out the produced water from the spatial part 6 bored in the furnace body member 3 on the outlet side, a joint 12 connected to the outlet passage 10 for the gas of water and used for leading out the gas of water, a fin substrate 17 brought into close contact with the outer wall surfaces of the furnace body members 2 and 3 and many fins 18 stood on the fin substrate 17. The generated heat is forcedly radiated with the heat radiating fins 18 to reduce the temperature of the reactional furnace. The heat radiating fins 18 are subjected to an alumite processing to increase the thermal emissivity and remarkably increase the heat radiation efficiency.

5. 发明专利

JP2000323464A APPARATUS AND METHOD FOR SUPPLYING GAS FOR SEMICONDUCTOR MANUFACTURING APPARATUS 失效
公开(公告)号：JP2000323464A
公开(公告)日：2000-11-24
申请号：JP2000103112
申请日：2000-04-05
申请人： TOKYO ELECTRON LTD , FUJIKIN KK
发明人： KITAYAMA HIROBUMI , KURONO YOICHI , IKEDA SHINICHI , MASUDA HISAYA
IPC分类号： C23C16/44 , C23C16/455 , F17D1/04 , H01L21/00 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To downsize the apparatus and reduce the manufacturing cost and maintenance control cost by grouping the same or a plurality of kinds of gases to be fed to a semiconductor device so that the gas in one group is fed to the semiconductor device economically through one flow rate controller. SOLUTION: Required gases are fed from gas feeders A1 to A3 to various processes B1 to B3 executed in a process reactor R.R forming a part of a semiconductor manufacturing apparatus. For the process B1 e.g. in the reactor R.R, a gas feed valve V1 is opened and gas feed valves V2, V3 are closed, and gases in gas feed sources G1 to G4 are switched and fed from a gas supply A1 one after another into the reactor R.R, wherein the gases from the feed sources G1 to G4 are sent to the gas feed valve V1 through gas feed side valves VG1 to VG4 via one flow rate controller FRC and a gas take-out hole F1.

6. 发明专利

JP2000213667A ORIFICE BUILT-IN VALVE 失效
公开(公告)号：JP2000213667A
公开(公告)日：2000-08-02
申请号：JP2025699
申请日：1999-01-28
申请人： OMI TADAHIRO , FUJIKIN KK
发明人： OMI TADAHIRO , IDETA EIJI , DOI RYOSUKE , NISHINO KOJI , IKEDA SHINICHI , HIROSE TAKASHI , YAMAJI MICHIO
IPC分类号： F16K7/16 , F16K31/02 , F16K47/08
摘要： PROBLEM TO BE SOLVED: To reduce thermal deformation so as to provide a highly precise flow rate characteristic by removably arranging a heat resistant material orifice body separately from a valve seat body in a gas outflow passage in the valve seat body and forming an orifice throttling the gas outflow passage in the valve seat body in the orifice body. SOLUTION: An orifice built-in valve 1 is constructed of a valve main body 2, a valve seat body 3, an orifice body 4, and an orifice 5. The orifice body 4 is formed of heat resistant material and arranged in a gas outflow passage 12 of the valve seat body 3 separately from the valve seat body 3. In this case, the orifice body 4 is made of metal such as stainless steel, stored in a recess 14 in the valve seat body 3 and formed into a disc shape clamped between a projecting bar 15 in the valve seat body 3 and the valve main body 2. The orifice 5 is formed in the orifice body 4 so as to throttle the gas outflow passage 12 in the valve seat body 3. In this case, the orifice 5 is formed by etching both faces of the middle part in the orifice body 4. In this way, thermal deformation can be reduced.

7. 发明专利

JP2000169108A REACTION FURNACE FOR GENERATING WATER 失效
公开(公告)号：JP2000169108A
公开(公告)日：2000-06-20
申请号：JP34549898
申请日：1998-12-04
申请人： FUJIKIN KK , OMI TADAHIRO
发明人： OMI TADAHIRO , IKEDA SHINICHI , KAWADA KOJI , MORIMOTO AKIHIRO , MINAMI YUKIO , MANOHARU L SHURESTA , TSUBOTA KENJI , MOTOIDEN AKIO , HIRAI NOBORU , KOMEHANA KATSUNORI
IPC分类号： H01L21/31 , B01J19/00 , B01J23/42 , C01B5/00 , F27D1/00 , H01L21/316
摘要： PROBLEM TO BE SOLVED: To improve the safety of a reaction furnace for generating water by completely preventing the generation of ignition of hydrogen or backfire in the inside of a reaction furnace main body for generating water. SOLUTION: The reaction furnace for generating water is for generating water by the reaction of hydrogen with oxygen under a non-combustion condition by arranging an inlet side reflection body 5, an outlet side reflection body 6 and a metallic screen 7 in the inside space of the reaction furnace main body A formed by combining an inlet side furnace main body member 1 having a gas supply port 11a with an outlet side furnace main body member 2, forming a platinum coating film 8b on the inside wall surface of the outlet side furnace main body member and bringing hydrogen and oxygen, which are supplied from the gas supply port to the inside space of the reaction furnace main body, into contact with the platinum coating film to activate the reactivity. A non- catalytic barrier coating film is formed on the other part except the part, on which the platinum coating film is formed, in the inside space of the reaction furnace main body.

8. 发明专利

JP2000146051A FLUID JOINT 失效
公开(公告)号：JP2000146051A
公开(公告)日：2000-05-26
申请号：JP32073798
申请日：1998-11-11
申请人： FUJIKIN KK
发明人： MICHIO YAMAJI , TSUTOMU SHINOHARA , IKEDA SHINICHI
IPC分类号： F16L23/02 , F16D3/80 , F16L23/16 , F16L41/02 , F17D1/02
摘要： PROBLEM TO BE SOLVED: To remove a flow-rate reducing factor caused by a V-shaped passage while advantage by the use of a block shaped joint member having the V-shaped passage, is being maintained. SOLUTION: This fluid joint is equipped with open part passages 75a and 76a wherein the fluid passages 75 and 76 of joint members 12 and 31 are perpendicularly intersected with an abutted end face, and with main passages 75b and 76b connected with the aforesaid open part passages in an inclined shape each. In this case, each diameter of the open part passages 75a and 76a is made equal to each main diameter of gasket pressing annular projections 71a and 72a and each inner diameter of gaskets 73 is made smaller than each diameter of the open part passages 75a and 76a.

9. 发明专利

JPH11192429A APPARATUS FOR TREATING HYDROGEN-CONTAINING WASTE GAS 失效
公开(公告)号：JPH11192429A
公开(公告)日：1999-07-21
申请号：JP88498
申请日：1998-01-06
申请人： HITACHI LTD , FUJIKIN KK
发明人： TANABE YOSHIKAZU , MINAMI YUKIO , KAWADA KOJI , IKEDA SHINICHI , MORIMOTO AKIHIRO , HIRAO YOSHIYUKI
IPC分类号： B01D53/86 , B01J23/42 , B01D53/87
摘要： PROBLEM TO BE SOLVED: To always stably treat a hydrogen-contg. waste gas by connecting a hydrogen-contg. waste gas discharge source to the suction port of an ejector type vacuum generator and an oxygen supply source to the driving fluid supply port of the vacuum generator and providing a hydrogen-oxygen reaction furnace provided with a catalyst to the driving fluid discharge port of the vacuum generator and a drain tank to the outlet of the reaction furnace. SOLUTION: A prescribed flow rate of O2 is supplied from an O2 supply valve 16 to the driving fluid supply port 7a of a vacuum generator 7, the suction port 7b of the vacuum generator 7 is evacuated and a control valve 14 is opened to suck a hydrogen-contg. waste gas G from a hydrogen annealing furnace 2 into the vacuum generator 7. The waste gas G accompanied by the O2 supplied from the O2 supply valve 16 is introduced into a reaction furnace 5, diffused and charged into the main body of the furnace 5 on the outlet side. The hydrogen and oxygen in the mixed fluid are brought into contact with a hot coating film of a platinum catalyst on the surface of the inner wall of the body of the furnace 5 to be converted into radicals and allow them to react with each other to produce water. The produced water becomes steam, the resultant steam, together with the residual O2 , is discharged into a drain tank 9 connected to the reaction furnace 5 and the steam is condensed and stored as water. Thus, the waste gas G can be completely treated even if the flow rate and hydrogen concn. of the gas G vary.

10. 发明专利

JPH11117915A ORIFICE FOR PRESSURE TYPE FLOW CONTROL DEVICE AND MANUFACTURE THEREOF 失效
公开(公告)号：JPH11117915A
公开(公告)日：1999-04-27
申请号：JP23016097
申请日：1997-08-27
申请人： OMI TADAHIRO , TOKYO ELECTRON LTD , FUJIKIN KK
发明人： OMI TADAHIRO , KAGATSUME SATORU , SUGIYAMA KAZUHIKO , FUKADA OSAMU , OZAWA SUSUMU , SATO YOSHIHIRO , DOI RYOSUKE , UNO TOMIO , NISHINO KOJI , FUKUDA HIROYUKI , IKEDA SHINICHI , YAMAJI MICHIO
IPC分类号： B23P15/00 , B05B1/00 , B23P15/16 , F15D1/08
摘要： PROBLEM TO BE SOLVED: To attain pressure flow control of high accuracy by providing an inlet tapered part, a short throttle parallel part, a short tapered part and a parallel diameter-enlarged part continuously in this order. SOLUTION: An orifice for a pressure type flow control device is composed of an orifice A, an inlet tapered part 1, a throttle parallel part 2, a tapered diameter-enlarged part 3 and a parallel diameter-enlarged part 4. As a concrete example, it is confirmed that linearity between a flow rate and primary pressure P1 is ensured over a range of the flow characteristic P2 /P1 of the orifice (a parallel diameter-enlarged part inner diameter (ϕ2 =0.2 mm) A being P2 /P1 =0.633 (P1 =3.0 kgf/cm abs, P2 =1.89 kgf/cm abs), that is, in spite of a form of the orifice A based on machining of only deburring by an R-cutting tool, a drill and a center drill, the linear characteristic of any orifice A is held to a point of P2 /P1 =0.633 so as to attain flow control of high accuracy.

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