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1. 发明申请

WO2010099892A3 REAR CONTACT SOLAR CELLS, AND METHOD FOR THE PRODUCTION THEREOF 审中-公开
标题翻译：具有背面接触和方法太阳电池用于生产
公开(公告)号：WO2010099892A3
公开(公告)日：2010-12-02
申请号：PCT/EP2010001152
申请日：2010-02-22
申请人： FRAUNHOFER GES FORSCHUNG , GRANEK FILIP , KRAY DANIEL , MAYER KUNO , ALEMAN MONICA , HOPMAN SYBILLE
发明人： GRANEK FILIP , KRAY DANIEL , MAYER KUNO , ALEMAN MONICA , HOPMAN SYBILLE
IPC分类号： H01L31/18 , H01L21/228 , H01L21/268 , H01L21/283 , H01L31/0224
CPC分类号： H01L31/022441 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The invention relates to a method for producing rear contact solar cells. Said method is based on microstructuring a wafer that has a dielectric layer, doping the microstructured areas on the rear side, and diffusing an emitter on the front side. A metal-containing seed layer is then deposited, and the contacts are galvanically reinforced. The invention also relates to solar cells that can be produced using said method.
摘要翻译：本发明涉及一种用于生产基于设置有dielektrisehen层和微结构化区域的上背面的掺杂和在前侧的发射极扩散的晶片的显微结构的太阳能电池用背面的处理。以下含金属种子层的沉积和在背面上的触点构成的电加强发生。同样，本发明涉及这样的太阳能电池可以制造。

2. 发明申请

WO2010099863A3 FRONT-AND-BACK CONTACT SOLAR CELLS, AND METHOD FOR THE PRODUCTION THEREOF 审中-公开
标题翻译：两侧接触用于制造太阳能电池和方法
公开(公告)号：WO2010099863A3
公开(公告)日：2010-12-29
申请号：PCT/EP2010000921
申请日：2010-02-15
申请人： FRAUNHOFER GES FORSCHUNG , GRANEK FILIP , KRAY DANIEL , MAYER KUNO , ALEMAN MONICA , HOPMANN SYBILLE
发明人： GRANEK FILIP , KRAY DANIEL , MAYER KUNO , ALEMAN MONICA , HOPMANN SYBILLE
IPC分类号： H01L31/0224 , B23K26/00 , B23K26/14 , H01L31/0352 , H01L31/068 , H01L31/18
CPC分类号： H01L31/1804 , B23K26/0084 , B23K26/146 , H01L31/022425 , H01L31/068 , Y02E10/547 , Y02P70/521
摘要： The invention relates to a method for producing front-and-back contact solar cells. Said method is based on microstructuring a wafer that has a dielectric layer, and doping the microstructured areas. A metal-containing seed layer is then deposited, and the contacts are galvanically reinforced. The invention also relates to solar cells that can be produced using said method.
摘要翻译：本发明涉及一种方法，对于双方的制备与基于提供与晶片的掺杂的介电层的一微图案，以及微结构化区域的太阳能电池。以下含金属种子层的沉积和触点构成的电加强发生。同样，本发明涉及这样的太阳能电池可以制造。

3. 发明申请

WO2008107194A2 METHOD FOR THE PRECISION PROCESSING OF SUBSTRATES AND USE OF SAID METHOD 审中-公开
标题翻译：方法精密加工基材和及其用途
公开(公告)号：WO2008107194A2
公开(公告)日：2008-09-12
申请号：PCT/EP2008001807
申请日：2008-03-06
申请人： FRAUNHOFER GES FORSCHUNG , UNIV ALBERT LUDWIGS FREIBURG , MAYER KUNO , ALEMAN MONICA , KRAY DANIEL , GLUNZ STEFAN , METTE ANSGAR , PREU RALF , GROHE ANDREAS
发明人： MAYER KUNO , ALEMAN MONICA , KRAY DANIEL , GLUNZ STEFAN , METTE ANSGAR , PREU RALF , GROHE ANDREAS
IPC分类号： C23C18/16 , C25D5/02 , C25D7/12 , H01L21/288
CPC分类号： C23C18/1612 , C23C18/1667 , C23C18/36 , C25D5/024 , C25D7/123 , C25D7/126 , H01L21/31111 , H01L31/18
摘要： The invention relates to a method for the precision processing of substrates, in particular for the microstructuring of thin layers, for the local introduction of doping agents and the local application of a metal seed layer, wherein a fluid-supported laser, which is to say a laser irradiation of a substrate that is covered in the regions to be processed by an appropriate reactive fluid is conducted.
摘要翻译：本发明涉及一种用于基片的精密加工的方法，特别是对于薄的层的微结构化，本地Dotierstoffeinbringung和金属种子层的局部沉积，其中，激光lüssigkeitsunterstützter女，即其上覆盖在区域的衬底进行加工的合适的反应性液体中的激光照射进行。

4. 发明申请

WO2010099862A2 DEVICE AND METHOD FOR SIMULTANEOUSLY MICROSTRUCTURING AND DOPING SEMICONDUCTOR SUBSTRATES 审中-公开
标题翻译：装置和方法用于同时微结构和半导体衬底掺杂
公开(公告)号：WO2010099862A2
公开(公告)日：2010-09-10
申请号：PCT/EP2010000918
申请日：2010-02-15
申请人： FRAUNHOFER GES FORSCHUNG , UNIV ALBERT LUDWIGS FREIBURG , MAYER KUNO , KROSSING INGO , KNAPP CARSTEN , GRANEK FILIP , MESEC MATTHIAS , RODOFILI ANDREAS
发明人： MAYER KUNO , KROSSING INGO , KNAPP CARSTEN , GRANEK FILIP , MESEC MATTHIAS , RODOFILI ANDREAS
IPC分类号： B23K26/14 , C30B31/04 , H01L21/268
CPC分类号： H01L21/268 , B23K26/0084 , B23K26/146 , H01L21/228 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The invention relates to a device and to a method for simultaneously microstructuring and doping semiconductor substrates with boron, wherein the semiconductor substrate is treated by means of a laser beam coupled into a fluid stream, wherein the fluid stream comprises at least one boron compound. The method according to the invention is used in the area of solar cell technology and in other areas of semiconductor technology, in which a locally limited boron doping is significant.
摘要翻译：本发明涉及一种用于与硼同时微结构，掺杂和半导体基板的设备和方法，其中所述半导体衬底与耦合液体喷射激光束，其中，所述液体射流包含至少一种硼化合物进行处理。使用发现在太阳能电池技术领域，以及在半导体技术中，在其中局部硼掺杂剂具有的意义的其它区域的本发明方法。

5. 发明申请

WO2009071333A3 TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF 审中-公开
标题翻译：用于表面处理晶片的纹理和清洁介质及其用途
公开(公告)号：WO2009071333A3
公开(公告)日：2009-07-23
申请号：PCT/EP2008010402
申请日：2008-12-08
申请人： FRAUNHOFER GES FORSCHUNG , MAYER KUNO , SCHUMANN MARK , KRAY DANIEL , ORELLANA PERES TERESA , RENTSCH JOCHEN , ZIMMER MARTIN , KIRCHGAESSNER ELIAS , ZIMMER EVA , BIRO DANIEL , ROSTAS ARPAD MIHAI
发明人： MAYER KUNO , SCHUMANN MARK , KRAY DANIEL , ORELLANA PERES TERESA , RENTSCH JOCHEN , ZIMMER MARTIN , KIRCHGAESSNER ELIAS , ZIMMER EVA , BIRO DANIEL , ROSTAS ARPAD MIHAI
IPC分类号： C11D7/06 , C11D7/26 , C11D7/32 , C11D11/00
CPC分类号： C11D11/0047 , C11D7/06 , C11D7/26 , C11D7/32
摘要： The invention relates to a fluid medium for the surface treatment of monocrystalline wafers, which contains an alkaline etching agent and at least one organic compound with low volatility. Systems of this type can be used either for cleaning, the removal of defects and the texturing of wafer surfaces in a single etching step or, exclusively, for the texturing of silicon wafers having different surface qualities, such as wafers which are cut by a wire saw and exhibit high surface degradation or chemically polished surfaces having a minimal number of defects.
摘要翻译：本发明涉及一种用于单晶晶片表面处理的液体介质，其含有碱性蚀刻剂和至少一种极易挥发的有机化合物。这样的系统既可以用于清洁，损失率和晶片表面的纹理化在单个蚀刻步骤中，只对具有不同表面质量，无论它们是与强的表面损坏或以最小的损伤密度，金属丝锯晶片进行化学抛光的表面上使用的硅晶片的纹理化。

6. 发明申请

WO2009071333A2 TEXTURING AND CLEANING MEDIUM FOR THE SURFACE TREATMENT OF WAFERS AND USE THEREOF 审中-公开
公开(公告)号：WO2009071333A2
公开(公告)日：2009-06-11
申请号：PCT/EP2008010402
申请日：2008-12-08
申请人： FRAUNHOFER GES FORSCHUNG , MAYER KUNO , SCHUMANN MARK , KRAY DANIEL , ORELLANA PERES TERESA , RENTSCH JOCHEN , ZIMMER MARTIN , KIRCHGAESSNER ELIAS , ZIMMER EVA , BIRO DANIEL , ROSTAS ARPAD MIHAI
发明人： MAYER KUNO , SCHUMANN MARK , KRAY DANIEL , ORELLANA PERES TERESA , RENTSCH JOCHEN , ZIMMER MARTIN , KIRCHGAESSNER ELIAS , ZIMMER EVA , BIRO DANIEL , ROSTAS ARPAD MIHAI
IPC分类号： C11D7/06 , C11D7/26 , C11D7/32 , C11D11/00
CPC分类号： C11D11/0047 , C11D7/06 , C11D7/26 , C11D7/32
摘要： The invention relates to a fluid medium for the surface treatment of monocrystalline wafers, which contains an alkaline etching agent and at least one organic compound with low volatility. Systems of this type can be used either for cleaning, the removal of defects and the texturing of wafer surfaces in a single etching step or, exclusively, for the texturing of silicon wafers having different surface qualities, such as wafers which are cut by a wire saw and exhibit high surface degradation or chemically polished surfaces having a minimal number of defects.

7. 发明申请

WO2010081533A3 METHOD AND DEVICE FOR SIMULTANEOUS MICROSTRUCTURING AND PASSIVATING 审中-公开
标题翻译：用于同时微观结构和钝化的方法和装置
公开(公告)号：WO2010081533A3
公开(公告)日：2010-09-30
申请号：PCT/EP2009009309
申请日：2009-12-29
申请人： FRAUNHOFER GES FORSCHUNG , MAYER KUNO , KRAY DANIEL
发明人： MAYER KUNO , KRAY DANIEL
IPC分类号： B23K26/00 , B23K26/14 , B23K26/40
CPC分类号： B23K26/0081 , B23K26/0006 , B23K26/0066 , B23K26/0622 , B23K26/144 , B23K26/146 , B23K26/40 , B23K2201/40 , B23K2203/16 , B23K2203/50 , B23K2203/52 , B23K2203/56 , C03C17/22 , C03C17/225 , C03C17/25 , C03C23/0025 , C03C2217/213 , C03C2217/281 , C03C2217/282 , C03C2218/112 , H01L31/02167 , H01L31/02168 , H01L31/0236 , H01L31/02363 , Y02E10/50
摘要： The invention relates to a method for simultaneously microstructuring and passivating siliceous solid bodies by means of a fluid jet-guided laser process. Local heating of the solid body surface occurs due to the laser, while a precursor for passivating the solid body surface is present in the fluid jet. The invention further relates to a device for simultaneously microstructuring and passivating. The method is used in particular in the production of solar cells.
摘要翻译：本发明涉及一种借助液体射流引导激光工艺同时微结构化和钝化含硅固体的方法。包括固体表面的激光束局部加热，而在液体射流中包括用于钝化固体表面的前体。同样地，本发明涉及用于同时微结构化和钝化的装置。该工艺特别用于太阳能电池的生产。

8. 发明专利

ES2364602T3 PROCEDIMIENTO PARA EL PROCESAMIENTO DE PRECISION DE SUSTRATOS Y SU USO. 未知
公开(公告)号：ES2364602T3
公开(公告)日：2011-09-07
申请号：ES08716322
申请日：2008-03-06
申请人： FRAUNHOFER GES FORSCHUNG , UNIV ALBERT LUDWIGS FREIBURG
发明人： MAYER KUNO , ALEMAN MONICA , KRAY DANIEL , GLUNZ STEFAN , METTE ANSGAR , PREU RALF , GROHE ANDREAS
IPC分类号： C23C18/16 , C25D5/02 , C25D7/12 , H01L21/288
摘要： Procedimiento para la microestructuración, dopado y al menos aplicación por zonas de una capa de nucleación simultáneos de sustratos, en el que se conduce un haz láser dirigido a una superficie del sustrato por las zonas que se van a procesar del sustrato, estando cubierto el sustrato al menos en las zonas del sustrato que se van a procesar por un líquido que contiene reactivo de procesamiento, caracterizado porque como reactivo de procesamiento están contenidos en el líquido un agente decapante, un dopante, al menos un compuesto metálico y un agente reductor.

9. 发明专利

DE102006019461A1 Removing material from solids, especially semiconductor wafers, employs liquid jet containing e.g. halogen compound which is irradiated to produce highly-reactive free radicals 未知
公开(公告)号：DE102006019461A1
公开(公告)日：2007-10-31
申请号：DE102006019461
申请日：2006-04-26
申请人： FRAUNHOFER GES FORSCHUNG
发明人： MAYER KUNO , KRAY DANIEL , BAUMAN SYBILLE
IPC分类号： C23F4/00 , H01L21/3205
摘要： An etchant capable of being activated, is added to the liquid jet (1). It is activated after leaving the nozzle which produces the jet. Activation is effected by irradiation using an annular radiation source (3) close to the jet. Irradiation is at right angles to the jet. A reflective surface (2, 2') at least part-surrounds the jet. Photo- and/or thermochemical activation takes place. Irradiation takes place in the W band of electromagnetic radiation, resulting in photochemical activation. Alternatively, infra red radiation promotes thermochemical activation. In a further variant, the visible waveband is used, causing photochemical activation. The light is incoherent and continuous, or it is pulsed. Ultraviolet light is provided by e.g. a mercury lamp, photodiode and/or a flash lamp. In addition, the location on the solid where the jet impinges, is irradiated using one of the above methods. The etchant is a water-free halogen- containing organic or inorganic compound or mixture. It is a straight chain, branched, aliphatic, cycloaliphatic and/or aromatic C1-C12 hydrocarbon which is at least partially halogenated. It is e.g. carbon tetrachloride, chloroform, bromoform, dichloromethane or a mixture of them. A wide range of further examples is specified in accordance with these principles, including diverse sulfur-, phosphorous- and ammonium compounds. Lewis-acids may be employed, especially boron trichloride or aluminum trichloride. The etchant includes at least one radical initiator, e.g. dibenzoyl peroxide or azo-isobutyronitrile. A radiation absorber is included, e.g. a dye, especially eosin, fluoroscene, phenolphthalein and/or Bengal red. It is alternatively a polycyclic aromatic compound, especially pyrene or napthacene. A solid body of silicon is used. An independent claim IS INCLUDED FOR corresponding apparatus.

10. 发明专利

AT510044T 未知
公开(公告)号：AT510044T
公开(公告)日：2011-06-15
申请号：AT08716322
申请日：2008-03-06
申请人： FRAUNHOFER GES FORSCHUNG , UNIV ALBERT LUDWIGS FREIBURG
发明人： MAYER KUNO , ALEMAN MONICA , KRAY DANIEL , GLUNZ STEFAN , METTE ANSGAR , PREU RALF , GROHE ANDREAS
IPC分类号： C23C18/16 , C25D5/02 , C25D7/12 , H01L21/288

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