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    • 7. 发明专利
    • PACKAGING MACHINE
    • JPH1077010A
    • 1998-03-24
    • JP21910897
    • 1997-07-30
    • SCHUBERT GERHARD GMBH
    • SCHUBERT GERHARD
    • B65B59/04F16M5/00F16M11/20
    • PROBLEM TO BE SOLVED: To perform a certain specific work, to raise multi-purpose level and to respond speedily and easily to a required condition by providing a machine body support table which is connected continuously in a longitudinal direction and which is provided with 2 lines of hollow support table modules held and alienated by a horizontal support. SOLUTION: The machine support table 1 of a packaging machine is provided with hollow support table modules 2, 2' alienated as the first and the second lines. These modules 2, 2' are connected to each other, placed continuously in the longitudinal direction 3 of the machine body support table 1, and are held with an interval sideways by a horizontal support 4 fixed with a screw means at a predetermined position between the modules 2, 2'. These horizontal supports 4 are composed by a plate iron member placed perpendicular and are provided with adjusting leg parts 8. The height and the width of the closed box member composing the support module 2 are always the same. Therefore, the packaging machine can set the machine body support table 1 at a horizontal position or at any other desirable position making it possible to support hoizontally.
    • 10. 发明申请
    • HOLDING DEVICE FOR A SUBSTRATE
    • 保持装置用于基板
    • WO0031774A2
    • 2000-06-02
    • PCT/DE9903638
    • 1999-11-16
    • LEICA MICROSYS LITHOGRAPHY LTDSCHUBERT GERHARDKIRSCHSTEIN ULF CARSTENRISSE STEFANHARNISCH GERDKALKOWSKI GERHARDGUYENOT VOLKER
    • SCHUBERT GERHARDKIRSCHSTEIN ULF-CARSTENRISSE STEFANHARNISCH GERDKALKOWSKI GERHARDGUYENOT VOLKER
    • G03F7/20H01L21/027H01L21/683H01L21/00
    • G03F7/707G03F7/70708H01L21/6831
    • The invention relates to a device for holding a substrate (18) in an exposure apparatus, wherein the surface of the substrate (18) to be exposed lies in a plane which is generated by the coordinates X, Y. The substrate (18) is linked to a table (1) which can be displaced within the coordinates X, Y and material measure means are provided between the table surface (5) and the substrate (18) for adjusting the distance and for orienting the substrate (18) in relation to an exposure optic (2). Particle radiation is emitted from said exposure optic (2) and is directed onto the substrate surface at a right angle in accordance with the coordinate Z. The inventive device provides for two supporting plates (3, 16) which are arranged parallel to the X, Y plane and which are mounted on the table (1) in the direction of the exposure optic (2) and at different distances from the table surface (5). A first supporting plate (3) is directly connected to the table (1) and the second supporting plate (16) is connected to said first supporting plate (3) by means of at least one holding device whose holding function can be switched on or off. A base plate for the substrate (18) is configured on the side of the second supporting plate (16) facing the exposure optic (2).
    • 本发明涉及一种设备,用于在其中待曝光的衬底(18)位于由坐标X跨越的平面的表面的曝光装置与一个在保持基板(18),Y平面,基板(18) 坐标X,Y可动台(1)连接到和所述表面(5)和基片(18)massverkörpernde之间用于间隔所述衬底的调整和对准提供(18)相对于曝光光学系统(2),从该成直角的微粒辐射, 对应于坐标Z,被引导至衬底表面。 在上述类型(2)的装置,两个平行于平面X,Y取向的支撑板(3,16)上的表(1)在从所述表面(5)的距离不同的曝光光学系统的方向提供,其中(第一支撑板 3)直接连接到所述表(1)和通过至少一个保持装置的第二支撑板(16),所述保持功能被关闭,并且(与第一支承板3)连接。 在此情况下,在第二支撑板(16)的面向曝光光学器件(2)的一侧上形成用于基板(18)的支撑平面。