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1. 发明申请

US20130284590A1 SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL 审中-公开
标题翻译：用于形成溅射材料层的系统和方法
公开(公告)号：US20130284590A1
公开(公告)日：2013-10-31
申请号：US13876826
申请日：2011-07-22
申请人： Marcus Bender , Markus Hanika , Evelyn Scheer , Fabio Pieralisi , Guido Mahnke , Ralph Lindenberg , Andreas Lopp , Konrad Schwanitz , Jian Liu
发明人： Marcus Bender , Markus Hanika , Evelyn Scheer , Fabio Pieralisi , Guido Mahnke , Ralph Lindenberg , Andreas Lopp , Konrad Schwanitz , Jian Liu
IPC分类号： C23C14/35
CPC分类号： C23C14/352 , C23C14/35 , H01J37/34 , H01J37/3473
摘要： The present disclosure describes a method of coating a substrate, the method including forming a layer of sputtered material on the substrate. Forming the layer of sputtered material may include: sputtering material from at least one rotatable target over the substrate; varying the relative position between the at least one target and the substrate. In addition, the present disclosure describes varying the distance between a target and a substrate during the sputter process. The present disclosure further describes a system for coating a substrate.
摘要翻译：本公开描述了一种涂覆基底的方法，该方法包括在基底上形成溅射材料层。形成溅射材料层可以包括：从衬底上的至少一个可旋转靶溅射材料; 改变至少一个靶和衬底之间的相对位置。另外，本公开内容描述了在溅射过程期间改变靶和衬底之间的距离。本公开进一步描述了用于涂覆基底的系统。

2. 发明申请

US20140332369A1 MULTIDIRECTIONAL RACETRACK ROTARY CATHODE FOR PVD ARRAY APPLICATIONS 审中-公开
标题翻译： PVD阵列应用的多媒体旋转阴极
公开(公告)号：US20140332369A1
公开(公告)日：2014-11-13
申请号：US14353473
申请日：2011-10-11
申请人： Evelyn Scheer , Markus Hanika , Ralph Lindenberg , Marcus Bender , Andreas Lopp , Konrad Schwanitz , Fabio Pieralisi , Jian Liu
发明人： Evelyn Scheer , Markus Hanika , Ralph Lindenberg , Marcus Bender , Andreas Lopp , Konrad Schwanitz , Fabio Pieralisi , Jian Liu
IPC分类号： H01J37/32 , C23C14/35
CPC分类号： H01J37/32532 , C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/345 , H01J37/3452 , H01J37/3455
摘要： A cathode assembly for a sputter deposition apparatus and a method for coating a substrate is provided. The cathode assembly has a coating side for coating on a substrate. Further, the cathode assembly includes a rotary target assembly adapted for rotating a target material around a rotary axis; at least a first magnet having an inner magnet pole and at least one outer magnet poles and being adapted for generating one or more plasma regions. The cathode assembly has a first angular coordinate for a magnet pole, the magnet pole being provided for the coating side, and a second angular coordinate for a further magnet pole, the magnet pole being provided for the coating side; wherein the first angular coordinate and the second angular coordinate define an angle a larger than about 20 degrees and smaller than about 160 degrees.
摘要翻译：提供了一种用于溅射沉积设备的阴极组件和一种用于涂覆基底的方法。阴极组件具有用于在基板上涂覆的涂层侧。此外，阴极组件包括适于围绕旋转轴线旋转目标材料的旋转靶组件; 至少第一磁体，其具有内磁极和至少一个外磁极，并适于产生一个或多个等离子体区域。阴极组件具有用于磁极的第一角度坐标，为涂层侧提供磁极，并且为另一个磁极设置第二角坐标，为涂层侧提供磁极; 其中所述第一角坐标和所述第二角坐标限定大于约20度且小于约160度的角度。

3. 发明申请

US20090114528A1 SPUTTER COATING DEVICE AND COATING METHOD 审中-公开
标题翻译：溅射涂层装置和涂层方法
公开(公告)号：US20090114528A1
公开(公告)日：2009-05-07
申请号：US11936586
申请日：2007-11-07
申请人： Ralph Lindenberg , Marcus Bender , Tobias Stolley , Andreas Kloeppel , Andreas Lopp , Christoph Moelle
发明人： Ralph Lindenberg , Marcus Bender , Tobias Stolley , Andreas Kloeppel , Andreas Lopp , Christoph Moelle
IPC分类号： C23C14/35
CPC分类号： C23C14/3407 , C23C14/35 , H01J37/3408 , H01J37/3452 , H01J37/3455
摘要： A magnet/target assembly 1 comprises a target 2 consisting of a plurality of (virtual) segments 2.1, 2.2, 2.3, 2.4, 2.5, 2.6 arranged side by side, each of them extending along the longitudinal axis x of the target 2. Each of the plurality of target segments 2.1, 2.2, 2.3, 2.4, 2.5, 2.6 has a magnet system 3.1, 3.2, 3.3, 3.4, 3.5, 3.6 attributed to the respective target segment. In an embodiment of the target/magnet assembly 1 according to the present invention the magnet systems 3.1, 3.2, 3.3, 3.4, 3.5, 3.6 are arranged mutually offset relative to their respective adjacent magnet systems 3.1, 3.2, 3.3, 3.4, 3.5 and 3.6, respectively, while scanning the target segments 2.1, 2.2, 2.3, 2.4, 2.5 and 2.6, respectively. Particularly, the first magnet system 3.1, the third magnet system 3.3 and the fifth magnet system 3.5 are a first group of magnet systems moving parallel and synchronously with each other, and the second magnet system 3.2, the forth magnet systems 3.4 and the sixth magnet system 3.6 are a second group of magnet systems moving parallel and synchronously with each other. The first, third and fifth magnet systems 3.1, 3.3, 3.5 are alternately arranged with the second, forth and sixth magnet systems 3.2, 3.4 and 3.6, respectively, in the lateral direction y of the target 2. The paths of movement of the magnet systems are arranged parallel. The first and second groups of magnet systems 3.1, 3.2, 3.3, 3.4, 3.5, 3.6 are arranged offset in a longitudinal direction x of the target 2, i.e. arranged with a distance d between the groups in the longitudinal direction x of the target 2.
摘要翻译：磁体/目标组件1包括由多个（虚拟）段2.1,2.2,2.3,2.4,2.5,2.6组成的目标2，每个段2.1,2.2,2.3,2.4,2.5,2.6每个都沿目标2的纵向轴线x延伸。每个多个目标段2.1,2.2,2.3,2.4,2.5,2.6具有归因于相应目标段的磁体系统3.1,3.2,3.3,3.4,3.5,3.6。在根据本发明的靶/磁体组件1的实施例中，磁体系统3.1,3.2,3.3,3.4,3.5,3.6相对于它们各自相邻的磁体系统3.1,3.2,3.3,3.4,3.5相互偏置地布置，并且 3.6，分别扫描目标段2.1,2.2,2.3,2.4,2.5和2.6。特别地，第一磁体系统3.1，第三磁体系统3.3和第五磁体系统3.5是彼此平行和同步移动的第一组磁体系统，第二磁体系统3.2，第四磁体系统3.4和第六磁体系统3.6是彼此平行和同步移动的第二组磁体系统。第一，第三和第五磁体系统3.1,3.3,3.5分别与目标2的横向y上的第二，第四和第六磁体系统3.2,3.4和3.6交替布置。磁体的运动路径系统并行排列。第一和第二组磁体系统3.1,3.2,3.3,3.4,3.5,3.6在目标2的纵向方向x上偏移布置，即，在目标2的纵向方向x上的组之间设置距离d 。

4. 发明授权

US08137510B2 Coater with a large-area assembly of rotatable magnetrons 有权
标题翻译：涂层机具有可旋转磁控管的大面积组件
公开(公告)号：US08137510B2
公开(公告)日：2012-03-20
申请号：US11121563
申请日：2005-05-04
申请人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schüssler , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schüssler , Tobias Stolley
IPC分类号： C23C14/00
CPC分类号： H01J37/3455 , C23C14/352 , C23C14/56 , H01J37/3405 , H01J2237/3325
摘要： This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.
摘要翻译：本发明涉及一种用于通过阴极溅射涂覆，特别是大面积基板的涂布机，涂布机具有涂覆室，并且在其中设置阴极组件（2），其中待溅射的材料位于具有弯曲表面的靶（4），待溅射的材料特别地位于圆柱体的侧表面上，在单个涂覆室中用于粘附涂层区域，至少三个，优选更多的阴极组件（2）具有位于另一个旁边的可旋转的弯曲目标（4）。

5. 发明申请

US20050252768A1 Coater with a large-area assembly of rotatable magnetrons 有权
标题翻译：涂层机具有可旋转磁控管的大面积组件
公开(公告)号：US20050252768A1
公开(公告)日：2005-11-17
申请号：US11121563
申请日：2005-05-04
申请人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schussler , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schussler , Tobias Stolley
IPC分类号： C23C14/34 , C23C14/35 , C23C14/56 , H01J37/34 , C23C14/32
CPC分类号： H01J37/3455 , C23C14/352 , C23C14/56 , H01J37/3405 , H01J2237/3325
摘要： This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.
摘要翻译：本发明涉及一种用于通过阴极溅射涂覆，特别是大面积基板的涂布机，涂布机具有涂覆室，并且在其中设置阴极组件（2），其中待溅射的材料位于具有弯曲表面的靶（4），待溅射的材料特别地位于圆柱体的侧表面上，在单个涂覆室中用于粘附涂层区域，至少三个，优选更多的阴极组件（2）具有位于另一个旁边的可旋转的弯曲目标（4）。

6. 发明申请

US20090178919A1 SPUTTER COATING DEVICE 审中-公开
标题翻译：飞溅涂料装置
公开(公告)号：US20090178919A1
公开(公告)日：2009-07-16
申请号：US12015329
申请日：2008-01-16
申请人： Andreas Lopp , Ralph Lindenberg
发明人： Andreas Lopp , Ralph Lindenberg
IPC分类号： C23C14/35
CPC分类号： C23C14/352 , C23C14/562 , H01J37/3405 , H01J37/3414 , H01J37/3423 , H01J37/3455
摘要： A sputter coating installation 1 comprises a vacuum chamber having an interior space 3′. The interior space 3′ of the vacuum chamber is defined by chamber walls 3. According to the present invention, an array of target units 9 is arranged in line inside the vacuum coating chamber. Particularly, the target units 9 are arranged tiltable relative to the vacuum chamber and relative to a transport path t of a substrate 2. The target units 9 are cathode units or magnetron units and comprise a target and a housing. The housing is attached to the target and defines an interior space of the target unit. Within the interior space of the target units a number of components are arranged, e.g. a combination of a magnet yoke and a magnet system, a magnet yoke drive, a cooling system (arranged near the target), an electric current supply for supplying energy for the sputter process, etc. The combination of the magnet yoke and the magnet system is movable on a linear path to perform a reciprocating movement relative to the target during the operation of the target unit. Outside the housing a vacuum pressure pv is generated vacuum pumps 5 arranged in a chamber wall 3c of the vacuum chamber behind the target units 9 for enabling the sputter coating process. In the interior space of the housing another pressure p may prevail, particularly a considerably higher pressure p. For example, the pressure p in the interior space of the housing may be an atmospheric pressure. Therefore, the housing provides a vacuum sealing of the interior space of the housing relative to the outside of the housing.
摘要翻译：溅射涂覆装置1包括具有内部空间3'的真空室。真空室的内部空间3'由室壁3限定。根据本发明，目标单元9的阵列在真空涂覆室内排成一列。特别地，目标单元9相对于真空室和相对于基板2的输送路径t倾斜布置。目标单元9是阴极单元或磁控管单元，并且包括目标和壳体。壳体附接到目标并且限定目标单元的内部空间。在目标单元的内部空间内，布置了多个部件，例如，磁轭和磁体系的组合，磁轭驱动器，冷却系统（配置在目标附近），用于为溅射处理提供能量的电流源等。磁轭和磁体系统的组合可在线性路径上移动，以在目标单元的操作期间相对于目标进行往复运动。在壳体的外部，产生真空压力pv，真空泵5布置在目标单元9后面的真空室的室壁3c中，以实现溅射涂覆过程。在外壳的内部空间中，另一个压力p可能占优势，特别是相当高的压力p。例如，壳体的内部空间中的压力p可以是大气压。因此，壳体相对于壳体的外部提供壳体的内部空间的真空密封。

7. 发明申请

US20110299961A1 PROCESSING SYSTEM AND METHOD OF OPERATING A PROCESSING SYSTEM 审中-公开
标题翻译：处理系统和操作处理系统的方法
公开(公告)号：US20110299961A1
公开(公告)日：2011-12-08
申请号：US13000354
申请日：2009-04-07
申请人： Ralph Lindenberg , Erkan Koparal , Thomas Berger
发明人： Ralph Lindenberg , Erkan Koparal , Thomas Berger
IPC分类号： B65H5/00 , H01L21/677
CPC分类号： H01L21/67748 , H01L21/67173
摘要： A coating system 1 comprises a swing station 2 including a swing module and an arrangement of chambers. The arrangement of chambers comprises a lock chamber 3 and a first coating chamber 4. The lock chamber 3 is configured as a combined lock-in/lock-out chamber. The arrangement of chambers has a first substantially linear transport path T1 indicated by dashed lines, and a second substantially linear transport path T2 indicated by dashed lines. The arrangement of the paths T1 and T2 establishes a dual track. The system 1 includes a transport system for moving a substrate through the arrangement of chambers 3, 4 along the first transport path T1 and/or along the second transport path T2 as indicated by arrows. One or particularly both chambers 3 and 4 comprise transfer means for transferring the substrate/carrier from the first path T1 to the second path T2 by a lateral movement of a dual or triple track section and/or from the second path T2 to the first path T1.
摘要翻译：涂覆系统1包括包括摆动模块和室的排列的摆动站2。室的布置包括锁定室3和第一涂覆室4.锁定室3被构造为组合的锁定/锁定室。室的布置具有由虚线表示的第一基本上线性的传输路径T1和由虚线表示的第二基本上线性的传输路径T2。路径T1和T2的布置建立双轨。系统1包括用于沿着第一传送路径T1和/或沿箭头所示的第二传送路径T2移动基板通过室3,4的布置的传送系统。一个或特别是两个腔室3和4包括传送装置，用于通过双轨道或三轨道部分的横向移动和/或从第二路径T2到第一路径将衬底/载体从第一路径T1传送到第二路径T2 T1。

8. 发明授权

US08431493B2 Replaceable substrate masking on carrier and method for processing a substrate 失效
标题翻译：载体上的可更换衬底掩蔽和用于处理衬底的方法
公开(公告)号：US08431493B2
公开(公告)日：2013-04-30
申请号：US12890194
申请日：2010-09-24
申请人： Ralph Lindenberg
发明人： Ralph Lindenberg
IPC分类号： H01L21/31
CPC分类号： H01J37/20 , C23C14/042 , H01J2237/022 , H01L21/67346
摘要： A holding device adapted for holding a mask and a substrate during processing is described. The holding device includes a substrate carrier adapted for carrying the substrate; and a mask for masking the substrate, wherein the mask is releasably connected to the substrate carrier; wherein the substrate carrier or the mask has at least one recess adapted for receiving a cover for covering the substrate carrier during deposition.
摘要翻译：描述了在处理期间适于保持掩模和基板的保持装置。保持装置包括适于承载基板的基板载体; 以及用于掩蔽所述衬底的掩模，其中所述掩模可释放地连接到所述衬底载体; 其中所述衬底载体或所述掩模具有适于在沉积期间接收用于覆盖所述衬底载体的盖的至少一个凹部。

9. 发明申请

US20100044213A1 COATING CHAMBER WITH A MOVEABLE SHIELD 审中-公开
标题翻译：涂漆室与可移动的屏蔽
公开(公告)号：US20100044213A1
公开(公告)日：2010-02-25
申请号：US12197605
申请日：2008-08-25
申请人： Hans Wolf , Ralph Lindenberg
发明人： Hans Wolf , Ralph Lindenberg
IPC分类号： C23C14/34 , C23C16/00
CPC分类号： C23C16/458 , C23C14/50
摘要： The present invention refers to a method of operating a coating chamber as well as a coating chamber comprising a coating source, a transport device for moving a substrate carrier adapted to be able to carry a substrate to be coated into at least one coating position with respect to the coating source, so that the substrate may be coated, and at least one first shield being arranged in an area between the coating position of the substrate and the coating source to prevent coating of areas other than the surface of the substrate to be coated, wherein the first shield comprises a moving apparatus and a coupling device for coupling the first shield and the substrate carrier, so that first shield and substrate carrier are movable together.
摘要翻译：本发明涉及一种操作涂布室的方法以及包括涂料源的涂布室，用于移动基材载体的输送装置，该输送装置适于能够将待涂覆的基材运送至至少一个涂布位置，涂覆源，使得基底可以被涂覆，并且至少一个第一屏蔽布置在基底的涂覆位置和涂覆源之间的区域中，以防止涂覆被涂布的基底的表面以外的区域，其中所述第一屏蔽包括移动装置和用于联接所述第一屏蔽和所述基板载体的耦合装置，使得第一屏蔽和基板载体可一起移动。

10. 发明授权

US07153367B2 Drive mechanism for a vacuum treatment apparatus 失效
标题翻译：真空处理设备的驱动机构
公开(公告)号：US07153367B2
公开(公告)日：2006-12-26
申请号：US10898018
申请日：2004-07-23
申请人： Ralph Lindenberg , Michael Konig , Uwe Schussler , Stefan Bangert
发明人： Ralph Lindenberg , Michael Konig , Uwe Schussler , Stefan Bangert
IPC分类号： C23C16/00 , C23C14/00 , C23F1/00 , H01L21/306 , H01L21/677
CPC分类号： C23C14/568 , C23C16/54 , H01L21/67196 , H01L21/67742
摘要： The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A—A) from an entrance airlock to an exit airlock. A stationary supporting column (1) is disposed in the center and on it a rotatory drive chamber (6) is borne which has control rods (9) for a rotation and a radial displacement of the substrate holders. In the rotatory drive chamber (6), a motor (4) and rotatory displacement drives for the control rods (9) are arranged on the supporting column (1), the control rods being in active connection each with a corresponding substrate holder. To solve the problem of carrying substrates through the vacuum treatment apparatus, even substrates of great area, smoothly, at a slight angle to the vertical, not fastened to the substrate holders, it is provided that a) the motor (4) is joined to a stationary bearing carrier (5) in which a rotatory star-shaped array of cantilevers (14) is mounted, b) the cantilevers (14) are articulated at one end to bell-crank levers (16), each of which has a pivot pin (17), c) the other end of each of the bell-crank levers (16) is articulated to one of the control rods (9), and that d) the pivot pins (17) of the bell-crank levers (16) are guided in a first stationary radial cam (11) whose shape determines the radial movements of the control rods (9). A periodic, variable superposition of the radial movements is performed by variable tangential movements produced by a second stationary radial cam (12) with a bell-crank lever which is joined by a link (24) to the drive chamber (6).
摘要翻译：本发明涉及一种用于真空处理设备的驱动机构，通过该驱动机构，基板保持器可以从轴线（A-A）从入口气闸传送到出口气闸。固定支撑柱（1）设置在中心，并且在其上具有旋转驱动室（6），其具有用于基板保持器的旋转和径向位移的控制杆（9）。在旋转驱动室（6）中，在支撑柱（1）上布置有用于控制杆（9）的马达（4）和旋转位移驱动装置，控制杆主动地连接到相应的基板支架。为了解决通过真空处理装置承载基板的问题，即使是没有紧固到基板保持器上的大面积，平滑地，与垂直方向成微小角度的基板，即使将a）马达（4）接合到固定轴承架（5），其中安装有悬臂（14）的旋转星形阵列，b）悬臂（14）在一端铰接到钟形曲柄杆（16），每一个都具有枢轴销（17），c）每个钟形杠杆（16）的另一端铰接到控制杆（9）中的一个，并且d）钟形曲柄杆（10）的枢轴销（17） 16）在其形状确定控制杆（9）的径向移动的第一固定径向凸轮（11）中引导。径向运动的周期性可变叠加通过由具有连杆（24）连接到驱动室（6）的钟形曲柄杆的第二静止径向凸轮（12）产生的可变切向运动来执行。

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