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1. 发明申请

US20100044213A1 COATING CHAMBER WITH A MOVEABLE SHIELD 审中-公开
标题翻译：涂漆室与可移动的屏蔽
公开(公告)号：US20100044213A1
公开(公告)日：2010-02-25
申请号：US12197605
申请日：2008-08-25
申请人： Hans Wolf , Ralph Lindenberg
发明人： Hans Wolf , Ralph Lindenberg
IPC分类号： C23C14/34 , C23C16/00
CPC分类号： C23C16/458 , C23C14/50
摘要： The present invention refers to a method of operating a coating chamber as well as a coating chamber comprising a coating source, a transport device for moving a substrate carrier adapted to be able to carry a substrate to be coated into at least one coating position with respect to the coating source, so that the substrate may be coated, and at least one first shield being arranged in an area between the coating position of the substrate and the coating source to prevent coating of areas other than the surface of the substrate to be coated, wherein the first shield comprises a moving apparatus and a coupling device for coupling the first shield and the substrate carrier, so that first shield and substrate carrier are movable together.
摘要翻译：本发明涉及一种操作涂布室的方法以及包括涂料源的涂布室，用于移动基材载体的输送装置，该输送装置适于能够将待涂覆的基材运送至至少一个涂布位置，涂覆源，使得基底可以被涂覆，并且至少一个第一屏蔽布置在基底的涂覆位置和涂覆源之间的区域中，以防止涂覆被涂布的基底的表面以外的区域，其中所述第一屏蔽包括移动装置和用于联接所述第一屏蔽和所述基板载体的耦合装置，使得第一屏蔽和基板载体可一起移动。

2. 发明申请

US20130284590A1 SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL 审中-公开
标题翻译：用于形成溅射材料层的系统和方法
公开(公告)号：US20130284590A1
公开(公告)日：2013-10-31
申请号：US13876826
申请日：2011-07-22
申请人： Marcus Bender , Markus Hanika , Evelyn Scheer , Fabio Pieralisi , Guido Mahnke , Ralph Lindenberg , Andreas Lopp , Konrad Schwanitz , Jian Liu
发明人： Marcus Bender , Markus Hanika , Evelyn Scheer , Fabio Pieralisi , Guido Mahnke , Ralph Lindenberg , Andreas Lopp , Konrad Schwanitz , Jian Liu
IPC分类号： C23C14/35
CPC分类号： C23C14/352 , C23C14/35 , H01J37/34 , H01J37/3473
摘要： The present disclosure describes a method of coating a substrate, the method including forming a layer of sputtered material on the substrate. Forming the layer of sputtered material may include: sputtering material from at least one rotatable target over the substrate; varying the relative position between the at least one target and the substrate. In addition, the present disclosure describes varying the distance between a target and a substrate during the sputter process. The present disclosure further describes a system for coating a substrate.
摘要翻译：本公开描述了一种涂覆基底的方法，该方法包括在基底上形成溅射材料层。形成溅射材料层可以包括：从衬底上的至少一个可旋转靶溅射材料; 改变至少一个靶和衬底之间的相对位置。另外，本公开内容描述了在溅射过程期间改变靶和衬底之间的距离。本公开进一步描述了用于涂覆基底的系统。

3. 发明申请

US20110299961A1 PROCESSING SYSTEM AND METHOD OF OPERATING A PROCESSING SYSTEM 审中-公开
标题翻译：处理系统和操作处理系统的方法
公开(公告)号：US20110299961A1
公开(公告)日：2011-12-08
申请号：US13000354
申请日：2009-04-07
申请人： Ralph Lindenberg , Erkan Koparal , Thomas Berger
发明人： Ralph Lindenberg , Erkan Koparal , Thomas Berger
IPC分类号： B65H5/00 , H01L21/677
CPC分类号： H01L21/67748 , H01L21/67173
摘要： A coating system 1 comprises a swing station 2 including a swing module and an arrangement of chambers. The arrangement of chambers comprises a lock chamber 3 and a first coating chamber 4. The lock chamber 3 is configured as a combined lock-in/lock-out chamber. The arrangement of chambers has a first substantially linear transport path T1 indicated by dashed lines, and a second substantially linear transport path T2 indicated by dashed lines. The arrangement of the paths T1 and T2 establishes a dual track. The system 1 includes a transport system for moving a substrate through the arrangement of chambers 3, 4 along the first transport path T1 and/or along the second transport path T2 as indicated by arrows. One or particularly both chambers 3 and 4 comprise transfer means for transferring the substrate/carrier from the first path T1 to the second path T2 by a lateral movement of a dual or triple track section and/or from the second path T2 to the first path T1.
摘要翻译：涂覆系统1包括包括摆动模块和室的排列的摆动站2。室的布置包括锁定室3和第一涂覆室4.锁定室3被构造为组合的锁定/锁定室。室的布置具有由虚线表示的第一基本上线性的传输路径T1和由虚线表示的第二基本上线性的传输路径T2。路径T1和T2的布置建立双轨。系统1包括用于沿着第一传送路径T1和/或沿箭头所示的第二传送路径T2移动基板通过室3,4的布置的传送系统。一个或特别是两个腔室3和4包括传送装置，用于通过双轨道或三轨道部分的横向移动和/或从第二路径T2到第一路径将衬底/载体从第一路径T1传送到第二路径T2 T1。

4. 发明申请

US20050252768A1 Coater with a large-area assembly of rotatable magnetrons 有权
标题翻译：涂层机具有可旋转磁控管的大面积组件
公开(公告)号：US20050252768A1
公开(公告)日：2005-11-17
申请号：US11121563
申请日：2005-05-04
申请人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schussler , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schussler , Tobias Stolley
IPC分类号： C23C14/34 , C23C14/35 , C23C14/56 , H01J37/34 , C23C14/32
CPC分类号： H01J37/3455 , C23C14/352 , C23C14/56 , H01J37/3405 , H01J2237/3325
摘要： This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.
摘要翻译：本发明涉及一种用于通过阴极溅射涂覆，特别是大面积基板的涂布机，涂布机具有涂覆室，并且在其中设置阴极组件（2），其中待溅射的材料位于具有弯曲表面的靶（4），待溅射的材料特别地位于圆柱体的侧表面上，在单个涂覆室中用于粘附涂层区域，至少三个，优选更多的阴极组件（2）具有位于另一个旁边的可旋转的弯曲目标（4）。

5. 发明授权

US08431493B2 Replaceable substrate masking on carrier and method for processing a substrate 失效
标题翻译：载体上的可更换衬底掩蔽和用于处理衬底的方法
公开(公告)号：US08431493B2
公开(公告)日：2013-04-30
申请号：US12890194
申请日：2010-09-24
申请人： Ralph Lindenberg
发明人： Ralph Lindenberg
IPC分类号： H01L21/31
CPC分类号： H01J37/20 , C23C14/042 , H01J2237/022 , H01L21/67346
摘要： A holding device adapted for holding a mask and a substrate during processing is described. The holding device includes a substrate carrier adapted for carrying the substrate; and a mask for masking the substrate, wherein the mask is releasably connected to the substrate carrier; wherein the substrate carrier or the mask has at least one recess adapted for receiving a cover for covering the substrate carrier during deposition.
摘要翻译：描述了在处理期间适于保持掩模和基板的保持装置。保持装置包括适于承载基板的基板载体; 以及用于掩蔽所述衬底的掩模，其中所述掩模可释放地连接到所述衬底载体; 其中所述衬底载体或所述掩模具有适于在沉积期间接收用于覆盖所述衬底载体的盖的至少一个凹部。

6. 发明授权

US08137510B2 Coater with a large-area assembly of rotatable magnetrons 有权
标题翻译：涂层机具有可旋转磁控管的大面积组件
公开(公告)号：US08137510B2
公开(公告)日：2012-03-20
申请号：US11121563
申请日：2005-05-04
申请人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schüssler , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Ralph Lindenberg , Andreas Lopp , Uwe Schüssler , Tobias Stolley
IPC分类号： C23C14/00
CPC分类号： H01J37/3455 , C23C14/352 , C23C14/56 , H01J37/3405 , H01J2237/3325
摘要： This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly (2) where the material to be sputtered is located on a target (4) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies (2) with rotatable, curved targets (4) positioned one beside the other.
摘要翻译：本发明涉及一种用于通过阴极溅射涂覆，特别是大面积基板的涂布机，涂布机具有涂覆室，并且在其中设置阴极组件（2），其中待溅射的材料位于具有弯曲表面的靶（4），待溅射的材料特别地位于圆柱体的侧表面上，在单个涂覆室中用于粘附涂层区域，至少三个，优选更多的阴极组件（2）具有位于另一个旁边的可旋转的弯曲目标（4）。

7. 发明授权

US07153367B2 Drive mechanism for a vacuum treatment apparatus 失效
标题翻译：真空处理设备的驱动机构
公开(公告)号：US07153367B2
公开(公告)日：2006-12-26
申请号：US10898018
申请日：2004-07-23
申请人： Ralph Lindenberg , Michael Konig , Uwe Schussler , Stefan Bangert
发明人： Ralph Lindenberg , Michael Konig , Uwe Schussler , Stefan Bangert
IPC分类号： C23C16/00 , C23C14/00 , C23F1/00 , H01L21/306 , H01L21/677
CPC分类号： C23C14/568 , C23C16/54 , H01L21/67196 , H01L21/67742
摘要： The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A—A) from an entrance airlock to an exit airlock. A stationary supporting column (1) is disposed in the center and on it a rotatory drive chamber (6) is borne which has control rods (9) for a rotation and a radial displacement of the substrate holders. In the rotatory drive chamber (6), a motor (4) and rotatory displacement drives for the control rods (9) are arranged on the supporting column (1), the control rods being in active connection each with a corresponding substrate holder. To solve the problem of carrying substrates through the vacuum treatment apparatus, even substrates of great area, smoothly, at a slight angle to the vertical, not fastened to the substrate holders, it is provided that a) the motor (4) is joined to a stationary bearing carrier (5) in which a rotatory star-shaped array of cantilevers (14) is mounted, b) the cantilevers (14) are articulated at one end to bell-crank levers (16), each of which has a pivot pin (17), c) the other end of each of the bell-crank levers (16) is articulated to one of the control rods (9), and that d) the pivot pins (17) of the bell-crank levers (16) are guided in a first stationary radial cam (11) whose shape determines the radial movements of the control rods (9). A periodic, variable superposition of the radial movements is performed by variable tangential movements produced by a second stationary radial cam (12) with a bell-crank lever which is joined by a link (24) to the drive chamber (6).
摘要翻译：本发明涉及一种用于真空处理设备的驱动机构，通过该驱动机构，基板保持器可以从轴线（A-A）从入口气闸传送到出口气闸。固定支撑柱（1）设置在中心，并且在其上具有旋转驱动室（6），其具有用于基板保持器的旋转和径向位移的控制杆（9）。在旋转驱动室（6）中，在支撑柱（1）上布置有用于控制杆（9）的马达（4）和旋转位移驱动装置，控制杆主动地连接到相应的基板支架。为了解决通过真空处理装置承载基板的问题，即使是没有紧固到基板保持器上的大面积，平滑地，与垂直方向成微小角度的基板，即使将a）马达（4）接合到固定轴承架（5），其中安装有悬臂（14）的旋转星形阵列，b）悬臂（14）在一端铰接到钟形曲柄杆（16），每一个都具有枢轴销（17），c）每个钟形杠杆（16）的另一端铰接到控制杆（9）中的一个，并且d）钟形曲柄杆（10）的枢轴销（17） 16）在其形状确定控制杆（9）的径向移动的第一固定径向凸轮（11）中引导。径向运动的周期性可变叠加通过由具有连杆（24）连接到驱动室（6）的钟形曲柄杆的第二静止径向凸轮（12）产生的可变切向运动来执行。

8. 发明申请

US20050081791A1 Vacuum treatment installation for flat rectangular or square substrates 审中-公开
标题翻译：平面矩形或方形衬底的真空处理设备
公开(公告)号：US20050081791A1
公开(公告)日：2005-04-21
申请号：US10932563
申请日：2004-09-02
申请人： Ralph Lindenberg , Frank Fuchs , Uwe Schussler , Stefan Bangert , Tobias Stolley
发明人： Ralph Lindenberg , Frank Fuchs , Uwe Schussler , Stefan Bangert , Tobias Stolley
IPC分类号： C23C14/56 , B65G49/06 , H01L21/205 , H01L21/68 , C23C16/00
CPC分类号： C23C14/568 , B65G49/067 , B65G2249/02
摘要： A vacuum treatment installation is provided for flat substrates of large edge lengths, which are conducted to and treated in an at least substantially perpendicular position. The treatment installation comprises a vacuum chamber with at least two treatment chambers, distributed over the circumference and open at the chamber side, a series of interlocks and a rotatable configuration of substrate holders (13) within the vacuum chamber with a driving mechanism (1) for the sequential rotation and radial movement of the substrate holders (13) relative to the treatment chambers. In order to decrease the placement area, the chamber volumes and the evacuation times, to simplify the “handling”, and especially to decrease the contamination hazard of the substrates by spalled-off layer particles, it is proposed that the substrate holders (13) are connected to the driving mechanism (1) in their lower regions via connecting rods (8), and that at least the lower pivot bearings of the connecting rod configurations (8) are disposed below a horizontal center line (M) of the height (H) of the bearing surface of the substrate holders (13). All pivot bearings are preferably disposed below the horizontal center line (M). Alternatively, parallelogram connecting rod configurations suspended on extension arms (4) can be disposed or trapezoidal connecting rod configurations can be placed onto a rotary table. The substrate transport takes place free of frames and preferably in the upward direction sloped at an angle between 1 and 20 degrees with respect to the rotational axis.
摘要翻译：提供了一种真空处理装置，用于大边缘长度的平坦基底，其被传导至至少基本上垂直的位置处理和处理。处理装置包括具有至少两个处理室的真空室，分布在圆周上并在室侧开口，在真空室内具有驱动机构（1）的一系列互锁和基板保持件（13）的可旋转构造，用于衬底保持器（13）相对于处理室的顺序旋转和径向移动。为了减少放置面积，室容积和抽空时间，为了简化“处理”，特别是通过剥离层颗粒来减少基板的污染危害，提出了基板保持件（13）通过连杆（8）在其下部区域连接到驱动机构（1），并且至少连杆结构（8）的下枢转轴承设置在高度的水平中心线（M）的下方（13）的轴承表面。所有枢转轴承优选地设置在水平中心线（M）的下方。或者，可以布置悬挂在延伸臂（4）上的平行四边形连杆构造，或者可以将梯形连杆构造放置在旋转台上。衬底传送发生在没有框架的情况下，并且优选地在向上方向上以相对于旋转轴线以1和20度之间的角度倾斜。

9. 发明授权

US09640372B2 Method and system for maintaining an edge exclusion shield 有权
公开(公告)号：US09640372B2
公开(公告)日：2017-05-02
申请号：US14440943
申请日：2012-11-15
申请人： Ralph Lindenberg , Erkan Koparal
发明人： Ralph Lindenberg , Erkan Koparal
IPC分类号： C23C14/34 , H01J37/34 , C23C14/04 , C23C14/50 , C23C14/56 , C23C16/04 , C23C16/44 , H01L21/67 , H01L21/677
CPC分类号： H01J37/3441 , C23C14/042 , C23C14/50 , C23C14/564 , C23C14/568 , C23C16/042 , C23C16/4401 , H01J2237/3323 , H01L21/67173 , H01L21/67751 , H01L21/6776
摘要： A method for extracting a shielding element from a processing chamber of a substrate processing system or inserting the shielding element into the processing chamber is provided. The substrate processing system includes the processing chamber, a first shielding element for excluding application of material onto parts of a substrate, and a substrate transportation system for transporting substrates or substrate carriers into and out of the processing chamber. The method includes transporting the first shielding element by the substrate transportation system.

10. 发明授权

US07837799B2 Arrangement for transporting a flat substrate in a vacuum chamber 失效
标题翻译：用于在真空室中输送平面基板的布置
公开(公告)号：US07837799B2
公开(公告)日：2010-11-23
申请号：US10732179
申请日：2003-12-10
申请人： Stefan Bangert , Frank Fuchs , Uwe Schuessler , Ralph Lindenberg , Tobias Stolley
发明人： Stefan Bangert , Frank Fuchs , Uwe Schuessler , Ralph Lindenberg , Tobias Stolley
IPC分类号： C23C16/00 , C23C14/00 , C23F1/00 , H01L21/306 , C25B11/00 , C25B13/00
CPC分类号： B65G49/065 , B65G49/063 , B65G2249/02 , B65G2249/045 , Y10S414/139
摘要： An arrangement for transporting a flat substrate through a coating installation, wherein the coating installation comprises, e.g., several and different sputter cathodes, to which the flat substrate, for example a glass pane, is transported one after the other in vacuo. So that no abrasion is generated between glass pane and contact, the glass pane is kept spaced apart from the contact by means of gas pressure. The gas pressure is herein built up through relatively few and small holes in a gas channel. Since during flooding of the coating installation to atmospheric pressure or during evacuation, due to the small holes, no fast pressure equalization between gas channel and the remaining coating installation is possible, the gas channel is decoupled in terms of gas from the remaining coating installation and provided with a separate gas line, via which gas can be introduced into the gas channel or pumped out of it.
摘要翻译：用于将平坦基底输送通过涂覆装置的布置，其中所述涂覆装置包括例如多个和不同的溅射阴极，平坦基底例如玻璃板在其中真空地彼此输送。因此，玻璃板和接触件之间不会产生磨损，玻璃板通过气体压力与接触件保持间隔开。气体压力通过气体通道中相对较少和小的孔形成。由于涂层装置在大气压下或排空过程中，由于小孔，气体通道和剩余的涂层装置之间无法实现快速压力平衡，所以气体通道与剩余涂层装置的气体相分离，设置有单独的气体管线，通过该气体管线可以将气体引入气体通道中或从其中泵出。

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